CN1157342A - 用多晶硅原料制备熔硅的方法 - Google Patents

用多晶硅原料制备熔硅的方法 Download PDF

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Publication number
CN1157342A
CN1157342A CN96117958A CN96117958A CN1157342A CN 1157342 A CN1157342 A CN 1157342A CN 96117958 A CN96117958 A CN 96117958A CN 96117958 A CN96117958 A CN 96117958A CN 1157342 A CN1157342 A CN 1157342A
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CN
China
Prior art keywords
polycrystalline silicon
granular polycrystalline
crucible
silicon
chunk polysilicon
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Pending
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CN96117958A
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English (en)
Chinese (zh)
Inventor
K-M·吉姆
L·A·艾伦
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SunEdison Inc
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SunEdison Inc
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Application filed by SunEdison Inc filed Critical SunEdison Inc
Publication of CN1157342A publication Critical patent/CN1157342A/zh
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/02—Single-crystal growth by pulling from a melt, e.g. Czochralski method adding crystallising materials or reactants forming it in situ to the melt
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02—Elements

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Silicon Compounds (AREA)
CN96117958A 1996-02-01 1996-12-25 用多晶硅原料制备熔硅的方法 Pending CN1157342A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/595,075 US5814148A (en) 1996-02-01 1996-02-01 Method for preparing molten silicon melt from polycrystalline silicon charge
US595,075 1996-02-01

Publications (1)

Publication Number Publication Date
CN1157342A true CN1157342A (zh) 1997-08-20

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN96117958A Pending CN1157342A (zh) 1996-02-01 1996-12-25 用多晶硅原料制备熔硅的方法

Country Status (8)

Country Link
US (1) US5814148A (enExample)
EP (1) EP0787836B1 (enExample)
JP (1) JPH09328391A (enExample)
KR (1) KR970062081A (enExample)
CN (1) CN1157342A (enExample)
DE (1) DE69611597T2 (enExample)
MY (1) MY112066A (enExample)
SG (1) SG76498A1 (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102598272A (zh) * 2009-04-29 2012-07-18 卡利太阳能有限公司 升级冶金级硅原料的质量控制方法
CN102732945A (zh) * 2012-04-13 2012-10-17 英利能源（中国）有限公司 一种单晶硅铸锭装料方法
CN103074681A (zh) * 2013-02-17 2013-05-01 英利集团有限公司 一种二次加料方法
CN112080791A (zh) * 2019-06-14 2020-12-15 硅电子股份公司 用于制备硅晶圆的方法
CN115404356A (zh) * 2022-09-22 2022-11-29 同创普润(上海)机电高科技有限公司 一种降低高纯铝熔体中不熔物含量的方法

Families Citing this family (22)

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EP0856599A3 (en) * 1997-01-31 2000-03-22 Komatsu Electronic Metals Co., Ltd Apparatus for feeding raw material into a quartz crucible and method of feeding the same
JP3189764B2 (ja) * 1997-09-29 2001-07-16 住友金属工業株式会社 シリコン単結晶原料の溶解方法
US5919303A (en) * 1997-10-16 1999-07-06 Memc Electronic Materials, Inc. Process for preparing a silicon melt from a polysilicon charge
US6589332B1 (en) 1998-11-03 2003-07-08 Memc Electronic Materials, Inc. Method and system for measuring polycrystalline chunk size and distribution in the charge of a Czochralski process
US6284040B1 (en) 1999-01-13 2001-09-04 Memc Electronic Materials, Inc. Process of stacking and melting polycrystalline silicon for high quality single crystal production
US6344083B1 (en) 2000-02-14 2002-02-05 Memc Electronic Materials, Inc. Process for producing a silicon melt
US6749683B2 (en) 2000-02-14 2004-06-15 Memc Electronic Materials, Inc. Process for producing a silicon melt
US8021483B2 (en) * 2002-02-20 2011-09-20 Hemlock Semiconductor Corporation Flowable chips and methods for the preparation and use of same, and apparatus for use in the methods
US7141114B2 (en) * 2004-06-30 2006-11-28 Rec Silicon Inc Process for producing a crystalline silicon ingot
NO324710B1 (no) * 2004-12-29 2007-12-03 Elkem Solar As Fremgangsmate for fylling av digel med silisium av solcellekvalitet
JP4961753B2 (ja) * 2006-01-20 2012-06-27 株式会社Ｓｕｍｃｏ 単結晶製造管理システム及び方法
JP4753308B2 (ja) * 2006-07-13 2011-08-24 Ｓｕｍｃｏ Ｔｅｃｈｘｉｖ株式会社 半導体ウェーハ素材の溶解方法及び半導体ウェーハの結晶育成方法
CN101148777B (zh) * 2007-07-19 2011-03-23 任丙彦 直拉法生长掺镓硅单晶的方法和装置
US20090120353A1 (en) * 2007-11-13 2009-05-14 Memc Electronic Materials, Inc. Reduction of air pockets in silicon crystals by avoiding the introduction of nearly-insoluble gases into the melt
US20100107966A1 (en) * 2008-11-05 2010-05-06 Memc Electronic Materials, Inc. Methods for preparing a melt of silicon powder for silicon crystal growth
JP2012140285A (ja) * 2010-12-28 2012-07-26 Siltronic Japan Corp シリコン単結晶インゴットの製造方法
US20120260845A1 (en) * 2011-04-14 2012-10-18 Rec Silicon Inc Polysilicon system
CN102953117B (zh) * 2011-08-31 2015-06-10 上海普罗新能源有限公司 硅锭的铸造方法
WO2014037965A1 (en) * 2012-09-05 2014-03-13 MEMC ELECTRONIC METERIALS S.p.A. Method of loading a charge of polysilicon into a crucible
CN107604446A (zh) * 2017-10-25 2018-01-19 宁晋晶兴电子材料有限公司 一种新型的熔融表皮料结构及其熔融方法
CN114086243A (zh) * 2021-11-29 2022-02-25 曲靖晶龙电子材料有限公司 单晶硅棒的制备方法
CN115467013A (zh) * 2022-08-22 2022-12-13 包头美科硅能源有限公司 一种用于拉晶生产中提高颗粒硅投料量的方法

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US4249988A (en) * 1978-03-15 1981-02-10 Western Electric Company, Inc. Growing crystals from a melt by controlling additions of material thereto
WO1986006764A1 (en) * 1985-05-17 1986-11-20 J.C. Schumacher Company Continuously pulled single crystal silicon ingots
JPS6287489A (ja) * 1985-10-12 1987-04-21 Sumitomo Electric Ind Ltd るつぼの回収方法及び装置
JPH01148779A (ja) * 1987-12-03 1989-06-12 Toshiba Ceramics Co Ltd 結晶成分の供給方法
JPH01286995A (ja) * 1988-05-12 1989-11-17 Toshiba Ceramics Co Ltd シリコン単結晶の製造方法
JPH03193694A (ja) * 1989-12-21 1991-08-23 Sumitomo Metal Ind Ltd 結晶成長装置
JPH03199189A (ja) * 1989-12-27 1991-08-30 Kawasaki Steel Corp 半導体単結晶の製造方法
DE4106589C2 (de) 1991-03-01 1997-04-24 Wacker Siltronic Halbleitermat Kontinuierliches Nachchargierverfahren mit flüssigem Silicium beim Tiegelziehen nach Czochralski
US5242667A (en) 1991-07-26 1993-09-07 Ferrofluidics Corporation Solid pellet feeder for controlled melt replenishment in continuous crystal growing process
JPH05139886A (ja) * 1991-11-21 1993-06-08 Toshiba Corp 砒素化合物単結晶の製造方法
JP2506525B2 (ja) * 1992-01-30 1996-06-12 信越半導体株式会社 シリコン単結晶の製造方法
JP2531415B2 (ja) * 1992-03-24 1996-09-04 住友金属工業株式会社 結晶成長方法
JPH05319978A (ja) * 1992-05-22 1993-12-03 Sumitomo Metal Ind Ltd 溶融層法による単結晶引き上げ方法
US5588993A (en) * 1995-07-25 1996-12-31 Memc Electronic Materials, Inc. Method for preparing molten silicon melt from polycrystalline silicon charge

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102598272A (zh) * 2009-04-29 2012-07-18 卡利太阳能有限公司 升级冶金级硅原料的质量控制方法
CN102598272B (zh) * 2009-04-29 2015-08-26 思利科材料有限公司 升级冶金级硅原料的质量控制方法
CN102732945A (zh) * 2012-04-13 2012-10-17 英利能源（中国）有限公司 一种单晶硅铸锭装料方法
CN102732945B (zh) * 2012-04-13 2015-11-25 英利能源（中国）有限公司 一种单晶硅铸锭装料方法
CN103074681A (zh) * 2013-02-17 2013-05-01 英利集团有限公司 一种二次加料方法
CN103074681B (zh) * 2013-02-17 2016-03-16 英利集团有限公司 一种二次加料方法
CN112080791A (zh) * 2019-06-14 2020-12-15 硅电子股份公司 用于制备硅晶圆的方法
CN113966414A (zh) * 2019-06-14 2022-01-21 硅电子股份公司 由硅制备半导体晶片的方法
CN112080791B (zh) * 2019-06-14 2022-07-29 硅电子股份公司 用于制备硅晶圆的方法
CN113966414B (zh) * 2019-06-14 2023-10-03 硅电子股份公司 由硅制备半导体晶片的方法
US12480225B2 (en) 2019-06-14 2025-11-25 Siltronic Ag Method for producing silicon semiconductor wafers having low concentrations of pinholes
CN115404356A (zh) * 2022-09-22 2022-11-29 同创普润(上海)机电高科技有限公司 一种降低高纯铝熔体中不熔物含量的方法
CN115404356B (zh) * 2022-09-22 2024-03-22 同创普润(上海)机电高科技有限公司 一种降低高纯铝熔体中不熔物含量的方法

Also Published As

Publication number Publication date
JPH09328391A (ja) 1997-12-22
MY112066A (en) 2001-03-31
EP0787836A3 (en) 1998-04-01
KR970062081A (ko) 1997-09-12
US5814148A (en) 1998-09-29
DE69611597D1 (de) 2001-02-22
SG76498A1 (en) 2000-11-21
DE69611597T2 (de) 2001-05-31
EP0787836A2 (en) 1997-08-06
EP0787836B1 (en) 2001-01-17

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