CN1138830C - 光固化聚合物组合物和含有该组合物的苯胺印板 - Google Patents

光固化聚合物组合物和含有该组合物的苯胺印板 Download PDF

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Publication number
CN1138830C
CN1138830C CNB998080853A CN99808085A CN1138830C CN 1138830 C CN1138830 C CN 1138830C CN B998080853 A CNB998080853 A CN B998080853A CN 99808085 A CN99808085 A CN 99808085A CN 1138830 C CN1138830 C CN 1138830C
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CN
China
Prior art keywords
weight
block
segmented copolymer
flexographic printing
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB998080853A
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English (en)
Chinese (zh)
Other versions
CN1307614A (zh
Inventor
Lm
L·M·凯戈雷
X·穆伊尔德曼斯
杉山信吾
塚越信幸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shell Internationale Research Maatschappij BV
Original Assignee
Shell Internationale Research Maatschappij BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shell Internationale Research Maatschappij BV filed Critical Shell Internationale Research Maatschappij BV
Publication of CN1307614A publication Critical patent/CN1307614A/zh
Application granted granted Critical
Publication of CN1138830C publication Critical patent/CN1138830C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/04—Printing plates or foils; Materials therefor metallic
    • B41N1/06—Printing plates or foils; Materials therefor metallic for relief printing or intaglio printing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/12—Printing plates or foils; Materials therefor non-metallic other than stone, e.g. printing plates or foils comprising inorganic materials in an organic matrix
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C08L53/02—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers of vinyl-aromatic monomers and conjugated dienes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M1/00—Inking and printing with a printer's forme
    • B41M1/02—Letterpress printing, e.g. book printing
    • B41M1/04—Flexographic printing
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2205/00—Polymer mixtures characterised by other features
    • C08L2205/02—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2666/00—Composition of polymers characterized by a further compound in the blend, being organic macromolecular compounds, natural resins, waxes or and bituminous materials, non-macromolecular organic substances, inorganic substances or characterized by their function in the composition
    • C08L2666/02—Organic macromolecular compounds, natural resins, waxes or and bituminous materials
    • C08L2666/24—Graft or block copolymers according to groups C08L51/00, C08L53/00 or C08L55/02; Derivatives thereof
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/108—Polyolefin or halogen containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Printing Methods (AREA)
  • Graft Or Block Polymers (AREA)
CNB998080853A 1998-06-29 1999-06-23 光固化聚合物组合物和含有该组合物的苯胺印板 Expired - Fee Related CN1138830C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US9114598P 1998-06-29 1998-06-29
US60/091,145 1998-06-29

Publications (2)

Publication Number Publication Date
CN1307614A CN1307614A (zh) 2001-08-08
CN1138830C true CN1138830C (zh) 2004-02-18

Family

ID=22226302

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB998080853A Expired - Fee Related CN1138830C (zh) 1998-06-29 1999-06-23 光固化聚合物组合物和含有该组合物的苯胺印板

Country Status (13)

Country Link
US (1) US6506541B2 (enExample)
EP (1) EP1091998B1 (enExample)
JP (1) JP2002519465A (enExample)
KR (1) KR100607582B1 (enExample)
CN (1) CN1138830C (enExample)
AU (1) AU5409099A (enExample)
BR (1) BR9911536B1 (enExample)
CA (1) CA2335977A1 (enExample)
DE (1) DE69919172T2 (enExample)
ES (1) ES2221418T3 (enExample)
TR (1) TR200003824T2 (enExample)
TW (1) TW467936B (enExample)
WO (1) WO2000000546A1 (enExample)

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EP1158364A3 (de) * 2000-05-03 2003-04-23 BASF Drucksysteme GmbH Fotopolymerisierbare Flexodruckelemente mit SIS/SBS-Gemischen als Bindemittel zur Herstellung von Flexodruckformen
WO2001090818A1 (en) * 2000-05-22 2001-11-29 Kraton Polymers Research B.V. Process for preparing flexographic printing plates
JP2002080689A (ja) * 2000-09-07 2002-03-19 Hokushin Ind Inc 高接着性熱可塑性エラストマー組成物
ES2256568T3 (es) * 2001-10-18 2006-07-16 Kraton Polymers Research B.V. Composicion polimerica solida curable.
US7012118B2 (en) * 2002-02-07 2006-03-14 Kraton Polymers U.S. Llc Photopolymerizable compositions and flexographic plates prepared from controlled distribution block copolymers
US7432037B2 (en) 2002-10-23 2008-10-07 Kuraray Co., Ltd. Curable resin composition and flexographic plate material using the same
JP2004177952A (ja) * 2002-11-20 2004-06-24 Rohm & Haas Electronic Materials Llc 多層フォトレジスト系
US20060095102A1 (en) * 2003-09-17 2006-05-04 Thomas Perez Method and apparatus for sublingual application of light to blood
DE602004018362D1 (de) * 2003-09-25 2009-01-22 Zeon Corp Block-copolymerzusammensetzung für eine lichtempfindliche flexographische platte
US7241540B2 (en) * 2004-04-27 2007-07-10 Kraton Polymers U.S. Llc Photocurable compositions and flexographic printing plates comprising the same
JP4651037B2 (ja) 2004-06-11 2011-03-16 旭化成イーマテリアルズ株式会社 フレキソ印刷版用感光性樹脂
JP4798333B2 (ja) * 2004-10-06 2011-10-19 ジェイエスアール クレイトン エラストマー株式会社 感光性印刷版材用ブロック共重合体およびその組成物およびそれを用いた感光性エラストマー組成物
JP4675334B2 (ja) * 2004-11-11 2011-04-20 旭化成イーマテリアルズ株式会社 フレキソ印刷用感光性樹脂組成物
JP4868920B2 (ja) * 2006-04-07 2012-02-01 旭化成イーマテリアルズ株式会社 フレキソ印刷用感光性樹脂組成物
EP2264101B1 (en) 2008-03-31 2014-05-28 Zeon Corporation Block copolymer composition, method for producing the same, and film of the same
WO2010074270A1 (ja) 2008-12-26 2010-07-01 日本ゼオン株式会社 ブロック共重合体組成物、フィルムおよびブロック共重合体組成物の製造方法
WO2010074267A1 (ja) 2008-12-26 2010-07-01 日本ゼオン株式会社 ブロック共重合体組成物およびホットメルト粘接着剤組成物
CN102334068B (zh) 2009-02-27 2013-08-28 日本瑞翁株式会社 柔性版用嵌段共聚物组合物
KR20100099048A (ko) * 2009-03-02 2010-09-10 주식회사 동진쎄미켐 감광성 수지 조성물
PL2415846T3 (pl) 2009-03-31 2018-03-30 Zeon Corporation Kompozycja klejowa do etykiet
EP2415836B1 (en) 2009-03-31 2014-08-20 Zeon Corporation Composition for stretchable film
US8722800B2 (en) 2009-06-30 2014-05-13 Zeon Corporation Composition for stretchable film
US9598622B2 (en) 2012-09-25 2017-03-21 Cold Chain Technologies, Inc. Gel comprising a phase-change material, method of preparing the gel, thermal exchange implement comprising the gel, and method of preparing the thermal exchange implement
JP6138976B2 (ja) * 2015-01-23 2017-05-31 株式会社タムラ製作所 感光性樹脂組成物
WO2018168647A1 (ja) * 2017-03-14 2018-09-20 日本ゼオン株式会社 フレキソ版用ブロック共重合体組成物
US20210070087A1 (en) * 2017-08-29 2021-03-11 Kraton Jsr Elastomers K.K. Block copolymer for photosensitive printing plate material having excellent abrasion resistance and method for producing same
JP7339825B2 (ja) * 2019-09-19 2023-09-06 旭化成株式会社 フレキソ印刷原版、及びブロック共重合体組成物

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Also Published As

Publication number Publication date
US6506541B2 (en) 2003-01-14
CA2335977A1 (en) 2000-01-06
BR9911536B1 (pt) 2009-01-13
EP1091998B1 (en) 2004-08-04
US20020045129A1 (en) 2002-04-18
KR20010053228A (ko) 2001-06-25
WO2000000546A1 (en) 2000-01-06
KR100607582B1 (ko) 2006-08-02
ES2221418T3 (es) 2004-12-16
DE69919172T2 (de) 2004-12-02
BR9911536A (pt) 2001-03-20
EP1091998A1 (en) 2001-04-18
DE69919172D1 (de) 2004-09-09
AU5409099A (en) 2000-01-17
TR200003824T2 (tr) 2001-07-23
JP2002519465A (ja) 2002-07-02
CN1307614A (zh) 2001-08-08
TW467936B (en) 2001-12-11

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Granted publication date: 20040218

Termination date: 20110623