JP2002519465A - 光硬化性ポリマー組成物および光硬化性ポリマー組成物を含有するフレキソ印刷版 - Google Patents

光硬化性ポリマー組成物および光硬化性ポリマー組成物を含有するフレキソ印刷版

Info

Publication number
JP2002519465A
JP2002519465A JP2000557304A JP2000557304A JP2002519465A JP 2002519465 A JP2002519465 A JP 2002519465A JP 2000557304 A JP2000557304 A JP 2000557304A JP 2000557304 A JP2000557304 A JP 2000557304A JP 2002519465 A JP2002519465 A JP 2002519465A
Authority
JP
Japan
Prior art keywords
block copolymer
weight
polymer composition
photocurable
printing plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000557304A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002519465A5 (enExample
Inventor
キーグリー，ラリー・マツカーサー
ミユイルデルマン，グザビエ
信吾 杉山
信幸 塚越
Original Assignee
シエル・インターナシヨナル・リサーチ・マートスハツペイ・ベー・ヴエー
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by シエル・インターナシヨナル・リサーチ・マートスハツペイ・ベー・ヴエー filed Critical シエル・インターナシヨナル・リサーチ・マートスハツペイ・ベー・ヴエー
Publication of JP2002519465A publication Critical patent/JP2002519465A/ja
Publication of JP2002519465A5 publication Critical patent/JP2002519465A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/04—Printing plates or foils; Materials therefor metallic
    • B41N1/06—Printing plates or foils; Materials therefor metallic for relief printing or intaglio printing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/12—Printing plates or foils; Materials therefor non-metallic other than stone, e.g. printing plates or foils comprising inorganic materials in an organic matrix
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C08L53/02—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers of vinyl-aromatic monomers and conjugated dienes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M1/00—Inking and printing with a printer's forme
    • B41M1/02—Letterpress printing, e.g. book printing
    • B41M1/04—Flexographic printing
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2205/00—Polymer mixtures characterised by other features
    • C08L2205/02—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2666/00—Composition of polymers characterized by a further compound in the blend, being organic macromolecular compounds, natural resins, waxes or and bituminous materials, non-macromolecular organic substances, inorganic substances or characterized by their function in the composition
    • C08L2666/02—Organic macromolecular compounds, natural resins, waxes or and bituminous materials
    • C08L2666/24—Graft or block copolymers according to groups C08L51/00, C08L53/00 or C08L55/02; Derivatives thereof
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/108—Polyolefin or halogen containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Printing Methods (AREA)
  • Graft Or Block Polymers (AREA)
  • Printing Plates And Materials Therefor (AREA)
JP2000557304A 1998-06-29 1999-06-23 光硬化性ポリマー組成物および光硬化性ポリマー組成物を含有するフレキソ印刷版 Pending JP2002519465A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US9114598P 1998-06-29 1998-06-29
US60/091,145 1998-06-29
PCT/EP1999/004349 WO2000000546A1 (en) 1998-06-29 1999-06-23 Photo-curable polymer composition and flexographic printing plates containing the same

Publications (2)

Publication Number Publication Date
JP2002519465A true JP2002519465A (ja) 2002-07-02
JP2002519465A5 JP2002519465A5 (enExample) 2006-08-10

Family

ID=22226302

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000557304A Pending JP2002519465A (ja) 1998-06-29 1999-06-23 光硬化性ポリマー組成物および光硬化性ポリマー組成物を含有するフレキソ印刷版

Country Status (13)

Country Link
US (1) US6506541B2 (enExample)
EP (1) EP1091998B1 (enExample)
JP (1) JP2002519465A (enExample)
KR (1) KR100607582B1 (enExample)
CN (1) CN1138830C (enExample)
AU (1) AU5409099A (enExample)
BR (1) BR9911536B1 (enExample)
CA (1) CA2335977A1 (enExample)
DE (1) DE69919172T2 (enExample)
ES (1) ES2221418T3 (enExample)
TR (1) TR200003824T2 (enExample)
TW (1) TW467936B (enExample)
WO (1) WO2000000546A1 (enExample)

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002080689A (ja) * 2000-09-07 2002-03-19 Hokushin Ind Inc 高接着性熱可塑性エラストマー組成物
JP2002527568A (ja) * 1998-10-09 2002-08-27 クレイトン・ポリマーズ・リサーチ・ベー・ベー 照射硬化性接着剤
WO2005031459A1 (ja) 2003-09-25 2005-04-07 Zeon Corporation 感光性フレキソ版用ブロック共重合体組成物
JP2006104359A (ja) * 2004-10-06 2006-04-20 Kraton Jsr Elastomers Kk 感光性印刷版材用ブロック共重合体およびその組成物およびそれを用いた感光性エラストマー組成物
JP2007279422A (ja) * 2006-04-07 2007-10-25 Asahi Kasei Chemicals Corp フレキソ印刷用感光性樹脂組成物
WO2010098356A1 (ja) 2009-02-27 2010-09-02 日本ゼオン株式会社 フレキソ版用ブロック共重合体組成物
US7960088B2 (en) 2004-06-11 2011-06-14 Asahi Kasei Chemicals Corporation Photosensitive resin for flexographic printing plate
US8470929B2 (en) 2009-03-31 2013-06-25 Zeon Corporation Composition for stretchable film
US8492480B2 (en) 2008-03-31 2013-07-23 Zeon Corporation Block copolymer composition, method for producing the same, and film of the same
US8501869B2 (en) 2008-12-26 2013-08-06 Zeon Corporation Block copolymer composition and hot-melt adhesive composition
US8598271B2 (en) 2008-12-26 2013-12-03 Zeon Corporation Block copolymer composition, film, and method for producing block copolymer composition
US8722800B2 (en) 2009-06-30 2014-05-13 Zeon Corporation Composition for stretchable film
US8791196B2 (en) 2009-03-31 2014-07-29 Zeon Corporation Adhesive composition for labels
JP2016139127A (ja) * 2015-01-23 2016-08-04 株式会社タムラ製作所 感光性樹脂組成物
WO2018168647A1 (ja) * 2017-03-14 2018-09-20 日本ゼオン株式会社 フレキソ版用ブロック共重合体組成物
JP2021047322A (ja) * 2019-09-19 2021-03-25 旭化成株式会社 フレキソ印刷原版、及びブロック共重合体組成物

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AU2001250391A1 (en) * 2000-03-16 2001-09-24 Kraton Polymers Research B.V. Polymeric composition
EP1158364A3 (de) * 2000-05-03 2003-04-23 BASF Drucksysteme GmbH Fotopolymerisierbare Flexodruckelemente mit SIS/SBS-Gemischen als Bindemittel zur Herstellung von Flexodruckformen
AU2001274073A1 (en) * 2000-05-22 2001-12-03 Kraton Polymers Research B.V. Process for preparing flexographic printing plates
EP1442079B1 (en) * 2001-10-18 2006-03-29 KRATON Polymers Research B.V. Solid curable polymeric composition
US7012118B2 (en) * 2002-02-07 2006-03-14 Kraton Polymers U.S. Llc Photopolymerizable compositions and flexographic plates prepared from controlled distribution block copolymers
US7432037B2 (en) 2002-10-23 2008-10-07 Kuraray Co., Ltd. Curable resin composition and flexographic plate material using the same
JP2004177952A (ja) * 2002-11-20 2004-06-24 Rohm & Haas Electronic Materials Llc 多層フォトレジスト系
US20060095102A1 (en) * 2003-09-17 2006-05-04 Thomas Perez Method and apparatus for sublingual application of light to blood
US7241540B2 (en) * 2004-04-27 2007-07-10 Kraton Polymers U.S. Llc Photocurable compositions and flexographic printing plates comprising the same
CN101057181B (zh) * 2004-11-11 2011-01-12 旭化成电子材料株式会社 柔性版印刷用感光性树脂组合物
KR20100099048A (ko) * 2009-03-02 2010-09-10 주식회사 동진쎄미켐 감광성 수지 조성물
US9598622B2 (en) 2012-09-25 2017-03-21 Cold Chain Technologies, Inc. Gel comprising a phase-change material, method of preparing the gel, thermal exchange implement comprising the gel, and method of preparing the thermal exchange implement
EP3677608A4 (en) * 2017-08-29 2021-05-26 Kraton JSR Elastomers K.K. SEQUENCED COPOLYMER FOR PHOTOSENSITIVE PRINTING PLATE MATERIAL WITH EXCELLENT ABRASION RESISTANCE AND ITS PRODUCTION PROCESS

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Cited By (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002527568A (ja) * 1998-10-09 2002-08-27 クレイトン・ポリマーズ・リサーチ・ベー・ベー 照射硬化性接着剤
JP2002080689A (ja) * 2000-09-07 2002-03-19 Hokushin Ind Inc 高接着性熱可塑性エラストマー組成物
US7318985B2 (en) 2003-09-25 2008-01-15 Zeon Corporation Block copolymer composition for photosensitive flexographic plate
WO2005031459A1 (ja) 2003-09-25 2005-04-07 Zeon Corporation 感光性フレキソ版用ブロック共重合体組成物
JP4539561B2 (ja) * 2003-09-25 2010-09-08 日本ゼオン株式会社 感光性フレキソ版用ブロック共重合体組成物
JPWO2005031459A1 (ja) * 2003-09-25 2007-11-15 日本ゼオン株式会社 感光性フレキソ版用ブロック共重合体組成物
US7960088B2 (en) 2004-06-11 2011-06-14 Asahi Kasei Chemicals Corporation Photosensitive resin for flexographic printing plate
JP2006104359A (ja) * 2004-10-06 2006-04-20 Kraton Jsr Elastomers Kk 感光性印刷版材用ブロック共重合体およびその組成物およびそれを用いた感光性エラストマー組成物
JP2007279422A (ja) * 2006-04-07 2007-10-25 Asahi Kasei Chemicals Corp フレキソ印刷用感光性樹脂組成物
US8492480B2 (en) 2008-03-31 2013-07-23 Zeon Corporation Block copolymer composition, method for producing the same, and film of the same
US8598271B2 (en) 2008-12-26 2013-12-03 Zeon Corporation Block copolymer composition, film, and method for producing block copolymer composition
US8501869B2 (en) 2008-12-26 2013-08-06 Zeon Corporation Block copolymer composition and hot-melt adhesive composition
WO2010098356A1 (ja) 2009-02-27 2010-09-02 日本ゼオン株式会社 フレキソ版用ブロック共重合体組成物
US8578852B2 (en) 2009-02-27 2013-11-12 Zeon Corporation Block copolymer composition for flexographic printing plates
US8470929B2 (en) 2009-03-31 2013-06-25 Zeon Corporation Composition for stretchable film
US8791196B2 (en) 2009-03-31 2014-07-29 Zeon Corporation Adhesive composition for labels
US8722800B2 (en) 2009-06-30 2014-05-13 Zeon Corporation Composition for stretchable film
JP2016139127A (ja) * 2015-01-23 2016-08-04 株式会社タムラ製作所 感光性樹脂組成物
WO2018168647A1 (ja) * 2017-03-14 2018-09-20 日本ゼオン株式会社 フレキソ版用ブロック共重合体組成物
JPWO2018168647A1 (ja) * 2017-03-14 2020-01-16 日本ゼオン株式会社 フレキソ版用ブロック共重合体組成物
JP2021047322A (ja) * 2019-09-19 2021-03-25 旭化成株式会社 フレキソ印刷原版、及びブロック共重合体組成物
JP7339825B2 (ja) 2019-09-19 2023-09-06 旭化成株式会社 フレキソ印刷原版、及びブロック共重合体組成物

Also Published As

Publication number Publication date
BR9911536B1 (pt) 2009-01-13
CN1307614A (zh) 2001-08-08
CN1138830C (zh) 2004-02-18
US6506541B2 (en) 2003-01-14
KR20010053228A (ko) 2001-06-25
DE69919172D1 (de) 2004-09-09
DE69919172T2 (de) 2004-12-02
ES2221418T3 (es) 2004-12-16
CA2335977A1 (en) 2000-01-06
WO2000000546A1 (en) 2000-01-06
KR100607582B1 (ko) 2006-08-02
EP1091998B1 (en) 2004-08-04
TW467936B (en) 2001-12-11
AU5409099A (en) 2000-01-17
TR200003824T2 (tr) 2001-07-23
US20020045129A1 (en) 2002-04-18
BR9911536A (pt) 2001-03-20
EP1091998A1 (en) 2001-04-18

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