ES2221418T3 - Composicion polimerica fotocurable y placas impresoras flexograficas que la continen. - Google Patents
Composicion polimerica fotocurable y placas impresoras flexograficas que la continen.Info
- Publication number
- ES2221418T3 ES2221418T3 ES99939973T ES99939973T ES2221418T3 ES 2221418 T3 ES2221418 T3 ES 2221418T3 ES 99939973 T ES99939973 T ES 99939973T ES 99939973 T ES99939973 T ES 99939973T ES 2221418 T3 ES2221418 T3 ES 2221418T3
- Authority
- ES
- Spain
- Prior art keywords
- weight
- block
- block copolymer
- polymerized
- photocurable
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 109
- 229920001400 block copolymer Polymers 0.000 claims abstract description 88
- 239000000178 monomer Substances 0.000 claims abstract description 43
- 229920000642 polymer Polymers 0.000 claims abstract description 35
- 125000003118 aryl group Chemical group 0.000 claims abstract description 26
- 229920001577 copolymer Polymers 0.000 claims abstract description 23
- 150000001993 dienes Chemical class 0.000 claims abstract description 22
- 239000007822 coupling agent Substances 0.000 claims abstract description 18
- 239000004593 Epoxy Chemical group 0.000 claims abstract description 7
- 238000000034 method Methods 0.000 claims description 15
- 239000002243 precursor Substances 0.000 claims description 14
- 230000005855 radiation Effects 0.000 claims description 9
- 239000000758 substrate Substances 0.000 claims description 8
- 239000003431 cross linking reagent Substances 0.000 claims description 7
- 238000000926 separation method Methods 0.000 claims description 2
- 125000003545 alkoxy group Chemical group 0.000 abstract description 6
- 125000000524 functional group Chemical group 0.000 abstract description 4
- 239000004793 Polystyrene Substances 0.000 description 14
- 229920002223 polystyrene Polymers 0.000 description 14
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 12
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 12
- 229920000359 diblock copolymer Polymers 0.000 description 11
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 10
- 239000010410 layer Substances 0.000 description 10
- 239000004014 plasticizer Substances 0.000 description 10
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 8
- -1 cartons Polymers 0.000 description 8
- 239000003795 chemical substances by application Substances 0.000 description 7
- 238000006116 polymerization reaction Methods 0.000 description 7
- ROGIWVXWXZRRMZ-UHFFFAOYSA-N 2-methylbuta-1,3-diene;styrene Chemical compound CC(=C)C=C.C=CC1=CC=CC=C1 ROGIWVXWXZRRMZ-UHFFFAOYSA-N 0.000 description 6
- 229920002633 Kraton (polymer) Polymers 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 5
- 239000012965 benzophenone Substances 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 229920000428 triblock copolymer Polymers 0.000 description 5
- 239000003963 antioxidant agent Substances 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 229920001971 elastomer Polymers 0.000 description 4
- 150000002148 esters Chemical class 0.000 description 4
- 239000003999 initiator Substances 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 229920001195 polyisoprene Polymers 0.000 description 4
- 239000003381 stabilizer Substances 0.000 description 4
- WXPWZZHELZEVPO-UHFFFAOYSA-N (4-methylphenyl)-phenylmethanone Chemical compound C1=CC(C)=CC=C1C(=O)C1=CC=CC=C1 WXPWZZHELZEVPO-UHFFFAOYSA-N 0.000 description 3
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 239000007983 Tris buffer Substances 0.000 description 3
- 238000005299 abrasion Methods 0.000 description 3
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 3
- 230000008878 coupling Effects 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000005859 coupling reaction Methods 0.000 description 3
- 239000000806 elastomer Substances 0.000 description 3
- 230000004927 fusion Effects 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 125000002816 methylsulfanyl group Chemical group [H]C([H])([H])S[*] 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- HPAFOABSQZMTHE-UHFFFAOYSA-N phenyl-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)C1=CC=CC=C1 HPAFOABSQZMTHE-UHFFFAOYSA-N 0.000 description 3
- APQIUTYORBAGEZ-UHFFFAOYSA-N 1,1-dibromoethane Chemical compound CC(Br)Br APQIUTYORBAGEZ-UHFFFAOYSA-N 0.000 description 2
- SDJHPPZKZZWAKF-UHFFFAOYSA-N 2,3-dimethylbuta-1,3-diene Chemical compound CC(=C)C(C)=C SDJHPPZKZZWAKF-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- QRLSTWVLSWCGBT-UHFFFAOYSA-N 4-((4,6-bis(octylthio)-1,3,5-triazin-2-yl)amino)-2,6-di-tert-butylphenol Chemical compound CCCCCCCCSC1=NC(SCCCCCCCC)=NC(NC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)=N1 QRLSTWVLSWCGBT-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- 244000028419 Styrax benzoin Species 0.000 description 2
- 235000000126 Styrax benzoin Nutrition 0.000 description 2
- 235000008411 Sumatra benzointree Nutrition 0.000 description 2
- 239000012963 UV stabilizer Substances 0.000 description 2
- BGYHLZZASRKEJE-UHFFFAOYSA-N [3-[3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoyloxy]-2,2-bis[3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoyloxymethyl]propyl] 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoate Chemical compound CC(C)(C)C1=C(O)C(C(C)(C)C)=CC(CCC(=O)OCC(COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)(COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)=C1 BGYHLZZASRKEJE-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 238000010539 anionic addition polymerization reaction Methods 0.000 description 2
- 229960002130 benzoin Drugs 0.000 description 2
- 238000004587 chromatography analysis Methods 0.000 description 2
- ZJIPHXXDPROMEF-UHFFFAOYSA-N dihydroxyphosphanyl dihydrogen phosphite Chemical compound OP(O)OP(O)O ZJIPHXXDPROMEF-UHFFFAOYSA-N 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- 235000019382 gum benzoic Nutrition 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- AQSJGOWTSHOLKH-UHFFFAOYSA-N phosphite(3-) Chemical class [O-]P([O-])[O-] AQSJGOWTSHOLKH-UHFFFAOYSA-N 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 229920001748 polybutylene Polymers 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 150000003512 tertiary amines Chemical class 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 description 1
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 1
- ABFCPWCUXLLRSC-UHFFFAOYSA-N 1,1-bis(2,4-ditert-butylphenyl)-2,2-bis(hydroxymethyl)propane-1,3-diol Chemical compound C(C)(C)(C)C1=C(C=CC(=C1)C(C)(C)C)C(O)(C(CO)(CO)CO)C1=C(C=C(C=C1)C(C)(C)C)C(C)(C)C ABFCPWCUXLLRSC-UHFFFAOYSA-N 0.000 description 1
- NVZWEEGUWXZOKI-UHFFFAOYSA-N 1-ethenyl-2-methylbenzene Chemical compound CC1=CC=CC=C1C=C NVZWEEGUWXZOKI-UHFFFAOYSA-N 0.000 description 1
- QEDJMOONZLUIMC-UHFFFAOYSA-N 1-tert-butyl-4-ethenylbenzene Chemical compound CC(C)(C)C1=CC=C(C=C)C=C1 QEDJMOONZLUIMC-UHFFFAOYSA-N 0.000 description 1
- HQTRGFZLVRBFPT-UHFFFAOYSA-N 2,2-bis(hydroxymethyl)-3-octadecylhenicosane-1,3-diol Chemical compound CCCCCCCCCCCCCCCCCCC(O)(C(CO)(CO)CO)CCCCCCCCCCCCCCCCCC HQTRGFZLVRBFPT-UHFFFAOYSA-N 0.000 description 1
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 1
- VSKJLJHPAFKHBX-UHFFFAOYSA-N 2-methylbuta-1,3-diene;styrene Chemical compound CC(=C)C=C.C=CC1=CC=CC=C1.C=CC1=CC=CC=C1 VSKJLJHPAFKHBX-UHFFFAOYSA-N 0.000 description 1
- KTALPKYXQZGAEG-UHFFFAOYSA-N 2-propan-2-ylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C(C)C)=CC=C3SC2=C1 KTALPKYXQZGAEG-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- SDJUKATYFRSDAS-UHFFFAOYSA-N 2-tert-butyl-3-methylphenol Chemical compound CC1=CC=CC(O)=C1C(C)(C)C SDJUKATYFRSDAS-UHFFFAOYSA-N 0.000 description 1
- AIBRSVLEQRWAEG-UHFFFAOYSA-N 3,9-bis(2,4-ditert-butylphenoxy)-2,4,8,10-tetraoxa-3,9-diphosphaspiro[5.5]undecane Chemical compound CC(C)(C)C1=CC(C(C)(C)C)=CC=C1OP1OCC2(COP(OC=3C(=CC(=CC=3)C(C)(C)C)C(C)(C)C)OC2)CO1 AIBRSVLEQRWAEG-UHFFFAOYSA-N 0.000 description 1
- WPMYUUITDBHVQZ-UHFFFAOYSA-N 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoic acid Chemical compound CC(C)(C)C1=CC(CCC(O)=O)=CC(C(C)(C)C)=C1O WPMYUUITDBHVQZ-UHFFFAOYSA-N 0.000 description 1
- UJAWGGOCYUPCPS-UHFFFAOYSA-N 4-(2-phenylpropan-2-yl)-n-[4-(2-phenylpropan-2-yl)phenyl]aniline Chemical compound C=1C=C(NC=2C=CC(=CC=2)C(C)(C)C=2C=CC=CC=2)C=CC=1C(C)(C)C1=CC=CC=C1 UJAWGGOCYUPCPS-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- IKVYHNPVKUNCJM-UHFFFAOYSA-N 4-propan-2-ylthioxanthen-9-one Chemical compound S1C2=CC=CC=C2C(=O)C2=C1C(C(C)C)=CC=C2 IKVYHNPVKUNCJM-UHFFFAOYSA-N 0.000 description 1
- APMOEFCWQRJOPS-UHFFFAOYSA-N 5-ethenyl-1,5-dimethylcyclohexa-1,3-diene Chemical compound CC1=CC=CC(C)(C=C)C1 APMOEFCWQRJOPS-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 125000005037 alkyl phenyl group Chemical group 0.000 description 1
- 125000004414 alkyl thio group Chemical group 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 150000004982 aromatic amines Chemical class 0.000 description 1
- 150000008365 aromatic ketones Chemical class 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 125000006267 biphenyl group Chemical group 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001728 carbonyl compounds Chemical class 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 125000004386 diacrylate group Chemical group 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 239000000374 eutectic mixture Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 229920002457 flexible plastic Polymers 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 230000035876 healing Effects 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- SDWMXYYPUUUNGS-UHFFFAOYSA-N hexane-1,6-diol;2-methylprop-2-enoic acid Chemical compound CC(=C)C(O)=O.CC(=C)C(O)=O.OCCCCCCO SDWMXYYPUUUNGS-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- UBJFKNSINUCEAL-UHFFFAOYSA-N lithium;2-methylpropane Chemical compound [Li+].C[C-](C)C UBJFKNSINUCEAL-UHFFFAOYSA-N 0.000 description 1
- WGOPGODQLGJZGL-UHFFFAOYSA-N lithium;butane Chemical compound [Li+].CC[CH-]C WGOPGODQLGJZGL-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- GVKQRLXYDPFTKR-UHFFFAOYSA-N n-phenylaniline;styrene Chemical compound C=CC1=CC=CC=C1.C=1C=CC=CC=1NC1=CC=CC=C1 GVKQRLXYDPFTKR-UHFFFAOYSA-N 0.000 description 1
- SSDSCDGVMJFTEQ-UHFFFAOYSA-N octadecyl 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)CCC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 SSDSCDGVMJFTEQ-UHFFFAOYSA-N 0.000 description 1
- 210000000056 organ Anatomy 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 239000002530 phenolic antioxidant Substances 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 1
- 239000006069 physical mixture Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 239000012744 reinforcing agent Substances 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 150000003464 sulfur compounds Chemical class 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229920002725 thermoplastic elastomer Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- WGKLOLBTFWFKOD-UHFFFAOYSA-N tris(2-nonylphenyl) phosphite Chemical compound CCCCCCCCCC1=CC=CC=C1OP(OC=1C(=CC=CC=1)CCCCCCCCC)OC1=CC=CC=C1CCCCCCCCC WGKLOLBTFWFKOD-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
- B41N1/04—Printing plates or foils; Materials therefor metallic
- B41N1/06—Printing plates or foils; Materials therefor metallic for relief printing or intaglio printing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
- B41N1/12—Printing plates or foils; Materials therefor non-metallic other than stone, e.g. printing plates or foils comprising inorganic materials in an organic matrix
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
- C08L53/02—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers of vinyl-aromatic monomers and conjugated dienes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M1/00—Inking and printing with a printer's forme
- B41M1/02—Letterpress printing, e.g. book printing
- B41M1/04—Flexographic printing
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2205/00—Polymer mixtures characterised by other features
- C08L2205/02—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2666/00—Composition of polymers characterized by a further compound in the blend, being organic macromolecular compounds, natural resins, waxes or and bituminous materials, non-macromolecular organic substances, inorganic substances or characterized by their function in the composition
- C08L2666/02—Organic macromolecular compounds, natural resins, waxes or and bituminous materials
- C08L2666/24—Graft or block copolymers according to groups C08L51/00, C08L53/00 or C08L55/02; Derivatives thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/108—Polyolefin or halogen containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/117—Free radical
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Printing Plates And Materials Therefor (AREA)
- Printing Methods (AREA)
- Graft Or Block Polymers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US9114598P | 1998-06-29 | 1998-06-29 | |
| US91145P | 1998-06-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ES2221418T3 true ES2221418T3 (es) | 2004-12-16 |
Family
ID=22226302
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES99939973T Expired - Lifetime ES2221418T3 (es) | 1998-06-29 | 1999-06-23 | Composicion polimerica fotocurable y placas impresoras flexograficas que la continen. |
Country Status (13)
| Country | Link |
|---|---|
| US (1) | US6506541B2 (enExample) |
| EP (1) | EP1091998B1 (enExample) |
| JP (1) | JP2002519465A (enExample) |
| KR (1) | KR100607582B1 (enExample) |
| CN (1) | CN1138830C (enExample) |
| AU (1) | AU5409099A (enExample) |
| BR (1) | BR9911536B1 (enExample) |
| CA (1) | CA2335977A1 (enExample) |
| DE (1) | DE69919172T2 (enExample) |
| ES (1) | ES2221418T3 (enExample) |
| TR (1) | TR200003824T2 (enExample) |
| TW (1) | TW467936B (enExample) |
| WO (1) | WO2000000546A1 (enExample) |
Families Citing this family (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU6472099A (en) * | 1998-10-09 | 2000-05-01 | Kraton Polymers Research B.V. | Radiation-curable adhesive |
| AU2001250391A1 (en) * | 2000-03-16 | 2001-09-24 | Kraton Polymers Research B.V. | Polymeric composition |
| EP1158364A3 (de) * | 2000-05-03 | 2003-04-23 | BASF Drucksysteme GmbH | Fotopolymerisierbare Flexodruckelemente mit SIS/SBS-Gemischen als Bindemittel zur Herstellung von Flexodruckformen |
| WO2001090818A1 (en) * | 2000-05-22 | 2001-11-29 | Kraton Polymers Research B.V. | Process for preparing flexographic printing plates |
| JP2002080689A (ja) * | 2000-09-07 | 2002-03-19 | Hokushin Ind Inc | 高接着性熱可塑性エラストマー組成物 |
| ES2256568T3 (es) * | 2001-10-18 | 2006-07-16 | Kraton Polymers Research B.V. | Composicion polimerica solida curable. |
| US7012118B2 (en) * | 2002-02-07 | 2006-03-14 | Kraton Polymers U.S. Llc | Photopolymerizable compositions and flexographic plates prepared from controlled distribution block copolymers |
| US7432037B2 (en) | 2002-10-23 | 2008-10-07 | Kuraray Co., Ltd. | Curable resin composition and flexographic plate material using the same |
| JP2004177952A (ja) * | 2002-11-20 | 2004-06-24 | Rohm & Haas Electronic Materials Llc | 多層フォトレジスト系 |
| US20060095102A1 (en) * | 2003-09-17 | 2006-05-04 | Thomas Perez | Method and apparatus for sublingual application of light to blood |
| DE602004018362D1 (de) * | 2003-09-25 | 2009-01-22 | Zeon Corp | Block-copolymerzusammensetzung für eine lichtempfindliche flexographische platte |
| US7241540B2 (en) * | 2004-04-27 | 2007-07-10 | Kraton Polymers U.S. Llc | Photocurable compositions and flexographic printing plates comprising the same |
| JP4651037B2 (ja) | 2004-06-11 | 2011-03-16 | 旭化成イーマテリアルズ株式会社 | フレキソ印刷版用感光性樹脂 |
| JP4798333B2 (ja) * | 2004-10-06 | 2011-10-19 | ジェイエスアール クレイトン エラストマー株式会社 | 感光性印刷版材用ブロック共重合体およびその組成物およびそれを用いた感光性エラストマー組成物 |
| JP4675334B2 (ja) * | 2004-11-11 | 2011-04-20 | 旭化成イーマテリアルズ株式会社 | フレキソ印刷用感光性樹脂組成物 |
| JP4868920B2 (ja) * | 2006-04-07 | 2012-02-01 | 旭化成イーマテリアルズ株式会社 | フレキソ印刷用感光性樹脂組成物 |
| EP2264101B1 (en) | 2008-03-31 | 2014-05-28 | Zeon Corporation | Block copolymer composition, method for producing the same, and film of the same |
| WO2010074270A1 (ja) | 2008-12-26 | 2010-07-01 | 日本ゼオン株式会社 | ブロック共重合体組成物、フィルムおよびブロック共重合体組成物の製造方法 |
| WO2010074267A1 (ja) | 2008-12-26 | 2010-07-01 | 日本ゼオン株式会社 | ブロック共重合体組成物およびホットメルト粘接着剤組成物 |
| CN102334068B (zh) | 2009-02-27 | 2013-08-28 | 日本瑞翁株式会社 | 柔性版用嵌段共聚物组合物 |
| KR20100099048A (ko) * | 2009-03-02 | 2010-09-10 | 주식회사 동진쎄미켐 | 감광성 수지 조성물 |
| PL2415846T3 (pl) | 2009-03-31 | 2018-03-30 | Zeon Corporation | Kompozycja klejowa do etykiet |
| EP2415836B1 (en) | 2009-03-31 | 2014-08-20 | Zeon Corporation | Composition for stretchable film |
| US8722800B2 (en) | 2009-06-30 | 2014-05-13 | Zeon Corporation | Composition for stretchable film |
| US9598622B2 (en) | 2012-09-25 | 2017-03-21 | Cold Chain Technologies, Inc. | Gel comprising a phase-change material, method of preparing the gel, thermal exchange implement comprising the gel, and method of preparing the thermal exchange implement |
| JP6138976B2 (ja) * | 2015-01-23 | 2017-05-31 | 株式会社タムラ製作所 | 感光性樹脂組成物 |
| WO2018168647A1 (ja) * | 2017-03-14 | 2018-09-20 | 日本ゼオン株式会社 | フレキソ版用ブロック共重合体組成物 |
| US20210070087A1 (en) * | 2017-08-29 | 2021-03-11 | Kraton Jsr Elastomers K.K. | Block copolymer for photosensitive printing plate material having excellent abrasion resistance and method for producing same |
| JP7339825B2 (ja) * | 2019-09-19 | 2023-09-06 | 旭化成株式会社 | フレキソ印刷原版、及びブロック共重合体組成物 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3149182A (en) | 1957-10-28 | 1964-09-15 | Shell Oil Co | Process for preparing block copolymers utilizing organolithium catalysts |
| BE627652A (enExample) | 1962-01-29 | |||
| BE637822A (enExample) | 1962-09-27 | |||
| US3239478A (en) | 1963-06-26 | 1966-03-08 | Shell Oil Co | Block copolymer adhesive compositions and articles prepared therefrom |
| US3231635A (en) | 1963-10-07 | 1966-01-25 | Shell Oil Co | Process for the preparation of block copolymers |
| US3431323A (en) | 1964-01-20 | 1969-03-04 | Shell Oil Co | Hydrogenated block copolymers of butadiene and a monovinyl aryl hydrocarbon |
| US4323636A (en) | 1971-04-01 | 1982-04-06 | E. I. Du Pont De Nemours And Company | Photosensitive block copolymer composition and elements |
| US4234676A (en) | 1978-01-23 | 1980-11-18 | W. R. Grace & Co. | Polythiol effect curable polymeric composition |
| US4460675A (en) | 1982-01-21 | 1984-07-17 | E. I. Du Pont De Nemours And Company | Process for preparing an overcoated photopolymer printing plate |
| US4753865A (en) | 1986-01-22 | 1988-06-28 | E. I. Du Pont De Nemours And Company | Photosensitive compositions containing microgels |
| US4726877A (en) | 1986-01-22 | 1988-02-23 | E. I. Du Pont De Nemours And Company | Methods of using photosensitive compositions containing microgels |
| US4894315A (en) | 1988-08-30 | 1990-01-16 | E. I. Du Pont De Nemours And Company | Process for making flexographic printing plates with increased flexibility |
| JP2842536B2 (ja) * | 1988-08-31 | 1999-01-06 | 三菱化学株式会社 | 樹脂組成物 |
| US5081193A (en) * | 1989-01-23 | 1992-01-14 | Hitachi Chemical Company Ltd. | Low gloss agents, process for production thereof, low gloss thermoplastic resin compositions, and molded articles |
| CA2041023C (en) * | 1990-04-26 | 2002-03-12 | William K. Goss | Photocurable elements and flexographic printing plates prepared therefrom |
| US5135837A (en) | 1990-09-05 | 1992-08-04 | E. I. Du Pont De Nemours And Company | Photosensitive elastomeric element having improved solvent resistance |
| AU644949B2 (en) | 1991-02-15 | 1993-12-23 | Asahi Kasei Kogyo Kabushiki Kaisha | Photosensitive elastomer composition |
| JP2793068B2 (ja) | 1991-04-24 | 1998-09-03 | 日本ペイント株式会社 | 感光性樹脂組成物 |
| US5405903A (en) | 1993-03-30 | 1995-04-11 | Shell Oil Company | Process for the preparation of a block copolymer blend |
| DE69426298T2 (de) * | 1993-03-31 | 2001-07-12 | Nippon Zeon Co., Ltd. | Lichtempfindliche zusammensetzung, lichtempfindliche kautschukplatte und verfahren zur herstellung dieser platte, flexografische platte und verfahren zur herstellung dieser platte |
| US5496685A (en) | 1993-09-17 | 1996-03-05 | Chase Elastomer Corporation | Photosensitive compositions and elements for flexographic printing |
| US5496684A (en) | 1993-09-17 | 1996-03-05 | Chase Elastomer Corporation | Photosensitive compositions and elements for flexographic printing |
| KR960008405A (ko) | 1994-08-10 | 1996-03-22 | 알베르투스 빌헬무스·요아네스 째스트라텐 | 광경화가능한 탄성중합체 조성물로부터의 플렉서 인쇄판 |
| US5863704A (en) * | 1995-04-26 | 1999-01-26 | Nippon Zeon Company, Ltd. | Photosensitive composition and photosensitive rubber plate |
-
1999
- 1999-06-23 DE DE69919172T patent/DE69919172T2/de not_active Expired - Lifetime
- 1999-06-23 KR KR1020007014859A patent/KR100607582B1/ko not_active Expired - Fee Related
- 1999-06-23 EP EP99939973A patent/EP1091998B1/en not_active Expired - Lifetime
- 1999-06-23 WO PCT/EP1999/004349 patent/WO2000000546A1/en not_active Ceased
- 1999-06-23 ES ES99939973T patent/ES2221418T3/es not_active Expired - Lifetime
- 1999-06-23 AU AU54090/99A patent/AU5409099A/en not_active Abandoned
- 1999-06-23 CN CNB998080853A patent/CN1138830C/zh not_active Expired - Fee Related
- 1999-06-23 TR TR2000/03824T patent/TR200003824T2/xx unknown
- 1999-06-23 BR BRPI9911536-0A patent/BR9911536B1/pt not_active IP Right Cessation
- 1999-06-23 JP JP2000557304A patent/JP2002519465A/ja active Pending
- 1999-06-23 CA CA002335977A patent/CA2335977A1/en not_active Abandoned
- 1999-10-20 TW TW088118093A patent/TW467936B/zh not_active IP Right Cessation
-
2001
- 2001-05-07 US US09/850,649 patent/US6506541B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CN1138830C (zh) | 2004-02-18 |
| US6506541B2 (en) | 2003-01-14 |
| CA2335977A1 (en) | 2000-01-06 |
| BR9911536B1 (pt) | 2009-01-13 |
| EP1091998B1 (en) | 2004-08-04 |
| US20020045129A1 (en) | 2002-04-18 |
| KR20010053228A (ko) | 2001-06-25 |
| WO2000000546A1 (en) | 2000-01-06 |
| KR100607582B1 (ko) | 2006-08-02 |
| DE69919172T2 (de) | 2004-12-02 |
| BR9911536A (pt) | 2001-03-20 |
| EP1091998A1 (en) | 2001-04-18 |
| DE69919172D1 (de) | 2004-09-09 |
| AU5409099A (en) | 2000-01-17 |
| TR200003824T2 (tr) | 2001-07-23 |
| JP2002519465A (ja) | 2002-07-02 |
| CN1307614A (zh) | 2001-08-08 |
| TW467936B (en) | 2001-12-11 |
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