BR9911536B1 - composiÇço polimÉrica fotocurÁvel, composiÇço polimÉrica curada, precursor de prancha de impressço flexogrÁfica, prancha de impressço flexogrÁfica, e processo para impressço sobre substrato. - Google Patents
composiÇço polimÉrica fotocurÁvel, composiÇço polimÉrica curada, precursor de prancha de impressço flexogrÁfica, prancha de impressço flexogrÁfica, e processo para impressço sobre substrato.Info
- Publication number
- BR9911536B1 BR9911536B1 BRPI9911536-0A BR9911536A BR9911536B1 BR 9911536 B1 BR9911536 B1 BR 9911536B1 BR 9911536 A BR9911536 A BR 9911536A BR 9911536 B1 BR9911536 B1 BR 9911536B1
- Authority
- BR
- Brazil
- Prior art keywords
- polymeric composition
- printing board
- flexo printing
- flexo
- substrate
- Prior art date
Links
- 238000000034 method Methods 0.000 title 1
- 239000002243 precursor Substances 0.000 title 1
- 239000000758 substrate Substances 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
- B41N1/04—Printing plates or foils; Materials therefor metallic
- B41N1/06—Printing plates or foils; Materials therefor metallic for relief printing or intaglio printing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
- B41N1/12—Printing plates or foils; Materials therefor non-metallic other than stone, e.g. printing plates or foils comprising inorganic materials in an organic matrix
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
- C08L53/02—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers of vinyl-aromatic monomers and conjugated dienes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M1/00—Inking and printing with a printer's forme
- B41M1/02—Letterpress printing, e.g. book printing
- B41M1/04—Flexographic printing
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2205/00—Polymer mixtures characterised by other features
- C08L2205/02—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2666/00—Composition of polymers characterized by a further compound in the blend, being organic macromolecular compounds, natural resins, waxes or and bituminous materials, non-macromolecular organic substances, inorganic substances or characterized by their function in the composition
- C08L2666/02—Organic macromolecular compounds, natural resins, waxes or and bituminous materials
- C08L2666/24—Graft or block copolymers according to groups C08L51/00, C08L53/00 or C08L55/02; Derivatives thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/108—Polyolefin or halogen containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/117—Free radical
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Printing Plates And Materials Therefor (AREA)
- Graft Or Block Polymers (AREA)
- Printing Methods (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US9114598P | 1998-06-29 | 1998-06-29 | |
PCT/EP1999/004349 WO2000000546A1 (en) | 1998-06-29 | 1999-06-23 | Photo-curable polymer composition and flexographic printing plates containing the same |
Publications (2)
Publication Number | Publication Date |
---|---|
BR9911536A BR9911536A (pt) | 2001-03-20 |
BR9911536B1 true BR9911536B1 (pt) | 2009-01-13 |
Family
ID=22226302
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BRPI9911536-0A BR9911536B1 (pt) | 1998-06-29 | 1999-06-23 | composiÇço polimÉrica fotocurÁvel, composiÇço polimÉrica curada, precursor de prancha de impressço flexogrÁfica, prancha de impressço flexogrÁfica, e processo para impressço sobre substrato. |
Country Status (13)
Country | Link |
---|---|
US (1) | US6506541B2 (pt) |
EP (1) | EP1091998B1 (pt) |
JP (1) | JP2002519465A (pt) |
KR (1) | KR100607582B1 (pt) |
CN (1) | CN1138830C (pt) |
AU (1) | AU5409099A (pt) |
BR (1) | BR9911536B1 (pt) |
CA (1) | CA2335977A1 (pt) |
DE (1) | DE69919172T2 (pt) |
ES (1) | ES2221418T3 (pt) |
TR (1) | TR200003824T2 (pt) |
TW (1) | TW467936B (pt) |
WO (1) | WO2000000546A1 (pt) |
Families Citing this family (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU6472099A (en) * | 1998-10-09 | 2000-05-01 | Kraton Polymers Research B.V. | Radiation-curable adhesive |
AU2001250391A1 (en) * | 2000-03-16 | 2001-09-24 | Kraton Polymers Research B.V. | Polymeric composition |
EP1158364A3 (de) * | 2000-05-03 | 2003-04-23 | BASF Drucksysteme GmbH | Fotopolymerisierbare Flexodruckelemente mit SIS/SBS-Gemischen als Bindemittel zur Herstellung von Flexodruckformen |
AU2001274073A1 (en) * | 2000-05-22 | 2001-12-03 | Kraton Polymers Research B.V. | Process for preparing flexographic printing plates |
JP2002080689A (ja) * | 2000-09-07 | 2002-03-19 | Hokushin Ind Inc | 高接着性熱可塑性エラストマー組成物 |
WO2003035752A1 (en) * | 2001-10-18 | 2003-05-01 | Kraton Polymers Research B.V. | Solid curable polymeric composition |
US7012118B2 (en) * | 2002-02-07 | 2006-03-14 | Kraton Polymers U.S. Llc | Photopolymerizable compositions and flexographic plates prepared from controlled distribution block copolymers |
CN1732407B (zh) * | 2002-10-23 | 2010-07-21 | 可乐丽股份有限公司 | 固化性树脂组合物以及使用该固化性树脂组合物制造的胶版印刷版材 |
KR20040044368A (ko) * | 2002-11-20 | 2004-05-28 | 쉬플리 캄파니, 엘.엘.씨. | 다층 포토레지스트 시스템 |
US20060095102A1 (en) * | 2003-09-17 | 2006-05-04 | Thomas Perez | Method and apparatus for sublingual application of light to blood |
EP1677147B1 (en) | 2003-09-25 | 2008-12-10 | Zeon Corporation | Block copolymer composition for photosensitive flexographic plate |
US7241540B2 (en) * | 2004-04-27 | 2007-07-10 | Kraton Polymers U.S. Llc | Photocurable compositions and flexographic printing plates comprising the same |
CN1965266B (zh) | 2004-06-11 | 2010-12-15 | 旭化成电子材料株式会社 | 柔版印刷板用感光树脂及其制造方法 |
JP4798333B2 (ja) * | 2004-10-06 | 2011-10-19 | ジェイエスアール クレイトン エラストマー株式会社 | 感光性印刷版材用ブロック共重合体およびその組成物およびそれを用いた感光性エラストマー組成物 |
CN101057181B (zh) * | 2004-11-11 | 2011-01-12 | 旭化成电子材料株式会社 | 柔性版印刷用感光性树脂组合物 |
JP4868920B2 (ja) * | 2006-04-07 | 2012-02-01 | 旭化成イーマテリアルズ株式会社 | フレキソ印刷用感光性樹脂組成物 |
CN101981121B (zh) | 2008-03-31 | 2013-02-06 | 日本瑞翁株式会社 | 嵌段共聚物组合物、其制备方法及薄膜 |
US8501869B2 (en) | 2008-12-26 | 2013-08-06 | Zeon Corporation | Block copolymer composition and hot-melt adhesive composition |
WO2010074270A1 (ja) | 2008-12-26 | 2010-07-01 | 日本ゼオン株式会社 | ブロック共重合体組成物、フィルムおよびブロック共重合体組成物の製造方法 |
JP5403048B2 (ja) | 2009-02-27 | 2014-01-29 | 日本ゼオン株式会社 | フレキソ版用ブロック共重合体組成物 |
KR20100099048A (ko) * | 2009-03-02 | 2010-09-10 | 주식회사 동진쎄미켐 | 감광성 수지 조성물 |
WO2010113883A1 (ja) | 2009-03-31 | 2010-10-07 | 日本ゼオン株式会社 | ラベル用粘接着剤組成物 |
US8470929B2 (en) | 2009-03-31 | 2013-06-25 | Zeon Corporation | Composition for stretchable film |
KR101591131B1 (ko) | 2009-06-30 | 2016-02-02 | 제온 코포레이션 | 신축성 필름용 조성물 |
US9598622B2 (en) | 2012-09-25 | 2017-03-21 | Cold Chain Technologies, Inc. | Gel comprising a phase-change material, method of preparing the gel, thermal exchange implement comprising the gel, and method of preparing the thermal exchange implement |
JP6138976B2 (ja) * | 2015-01-23 | 2017-05-31 | 株式会社タムラ製作所 | 感光性樹脂組成物 |
JPWO2018168647A1 (ja) * | 2017-03-14 | 2020-01-16 | 日本ゼオン株式会社 | フレキソ版用ブロック共重合体組成物 |
WO2019044369A1 (ja) * | 2017-08-29 | 2019-03-07 | ジェイエスアール クレイトン エラストマー株式会社 | 耐摩耗性に優れた感光性印刷版材用ブロック共重合体及びその製造方法 |
JP7339825B2 (ja) * | 2019-09-19 | 2023-09-06 | 旭化成株式会社 | フレキソ印刷原版、及びブロック共重合体組成物 |
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US4323636A (en) | 1971-04-01 | 1982-04-06 | E. I. Du Pont De Nemours And Company | Photosensitive block copolymer composition and elements |
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US4460675A (en) | 1982-01-21 | 1984-07-17 | E. I. Du Pont De Nemours And Company | Process for preparing an overcoated photopolymer printing plate |
US4753865A (en) | 1986-01-22 | 1988-06-28 | E. I. Du Pont De Nemours And Company | Photosensitive compositions containing microgels |
US4726877A (en) | 1986-01-22 | 1988-02-23 | E. I. Du Pont De Nemours And Company | Methods of using photosensitive compositions containing microgels |
US4894315A (en) | 1988-08-30 | 1990-01-16 | E. I. Du Pont De Nemours And Company | Process for making flexographic printing plates with increased flexibility |
JP2842536B2 (ja) * | 1988-08-31 | 1999-01-06 | 三菱化学株式会社 | 樹脂組成物 |
US5081193A (en) * | 1989-01-23 | 1992-01-14 | Hitachi Chemical Company Ltd. | Low gloss agents, process for production thereof, low gloss thermoplastic resin compositions, and molded articles |
NZ237919A (en) * | 1990-04-26 | 1994-09-27 | Grace W R & Co | Photocurable element comprising photocurable base layer and a photocurable printing layer which comprises two incompatible elastomeric polymers and a photopolymerisable monomer, base layer comprising elastomer, monomer and photoinitiator; relief printing plates |
US5135837A (en) | 1990-09-05 | 1992-08-04 | E. I. Du Pont De Nemours And Company | Photosensitive elastomeric element having improved solvent resistance |
EP0525206B1 (en) | 1991-02-15 | 1998-04-29 | Asahi Kasei Kogyo Kabushiki Kaisha | Photosensitive elastomer composition |
JP2793068B2 (ja) | 1991-04-24 | 1998-09-03 | 日本ペイント株式会社 | 感光性樹脂組成物 |
US5405903A (en) | 1993-03-30 | 1995-04-11 | Shell Oil Company | Process for the preparation of a block copolymer blend |
EP0699961B1 (en) * | 1993-03-31 | 2000-11-15 | Nippon Zeon Co., Ltd. | Photosensitive composition, photosensitive rubber plate and process for producing the plate, and flexographic plate and process for producing the plate |
US5496684A (en) | 1993-09-17 | 1996-03-05 | Chase Elastomer Corporation | Photosensitive compositions and elements for flexographic printing |
US5496685A (en) | 1993-09-17 | 1996-03-05 | Chase Elastomer Corporation | Photosensitive compositions and elements for flexographic printing |
KR960008405A (ko) | 1994-08-10 | 1996-03-22 | 알베르투스 빌헬무스·요아네스 째스트라텐 | 광경화가능한 탄성중합체 조성물로부터의 플렉서 인쇄판 |
US5863704A (en) * | 1995-04-26 | 1999-01-26 | Nippon Zeon Company, Ltd. | Photosensitive composition and photosensitive rubber plate |
-
1999
- 1999-06-23 AU AU54090/99A patent/AU5409099A/en not_active Abandoned
- 1999-06-23 JP JP2000557304A patent/JP2002519465A/ja active Pending
- 1999-06-23 CA CA002335977A patent/CA2335977A1/en not_active Abandoned
- 1999-06-23 DE DE69919172T patent/DE69919172T2/de not_active Expired - Lifetime
- 1999-06-23 CN CNB998080853A patent/CN1138830C/zh not_active Expired - Fee Related
- 1999-06-23 ES ES99939973T patent/ES2221418T3/es not_active Expired - Lifetime
- 1999-06-23 WO PCT/EP1999/004349 patent/WO2000000546A1/en active IP Right Grant
- 1999-06-23 EP EP99939973A patent/EP1091998B1/en not_active Expired - Lifetime
- 1999-06-23 TR TR2000/03824T patent/TR200003824T2/xx unknown
- 1999-06-23 BR BRPI9911536-0A patent/BR9911536B1/pt not_active IP Right Cessation
- 1999-06-23 KR KR1020007014859A patent/KR100607582B1/ko not_active IP Right Cessation
- 1999-10-20 TW TW088118093A patent/TW467936B/zh not_active IP Right Cessation
-
2001
- 2001-05-07 US US09/850,649 patent/US6506541B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
BR9911536A (pt) | 2001-03-20 |
AU5409099A (en) | 2000-01-17 |
ES2221418T3 (es) | 2004-12-16 |
KR100607582B1 (ko) | 2006-08-02 |
CA2335977A1 (en) | 2000-01-06 |
US6506541B2 (en) | 2003-01-14 |
KR20010053228A (ko) | 2001-06-25 |
TW467936B (en) | 2001-12-11 |
WO2000000546A1 (en) | 2000-01-06 |
CN1307614A (zh) | 2001-08-08 |
EP1091998A1 (en) | 2001-04-18 |
DE69919172D1 (de) | 2004-09-09 |
JP2002519465A (ja) | 2002-07-02 |
CN1138830C (zh) | 2004-02-18 |
TR200003824T2 (tr) | 2001-07-23 |
US20020045129A1 (en) | 2002-04-18 |
DE69919172T2 (de) | 2004-12-02 |
EP1091998B1 (en) | 2004-08-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
B06A | Patent application procedure suspended [chapter 6.1 patent gazette] | ||
B06A | Patent application procedure suspended [chapter 6.1 patent gazette] | ||
B09A | Decision: intention to grant [chapter 9.1 patent gazette] | ||
B16A | Patent or certificate of addition of invention granted [chapter 16.1 patent gazette] |
Free format text: PRAZO DE VALIDADE: 20 (VINTE) ANOS CONTADOS A PARTIR DE 23/06/1999, OBSERVADAS AS CONDICOES LEGAIS. |
|
B24C | Patent annual fee: request for for restoration |
Free format text: REFERENTE A 11A E 12A ANUIDADE(S). |
|
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