CN1130260A - 标线片的装入和取出装置 - Google Patents
标线片的装入和取出装置 Download PDFInfo
- Publication number
- CN1130260A CN1130260A CN95117126A CN95117126A CN1130260A CN 1130260 A CN1130260 A CN 1130260A CN 95117126 A CN95117126 A CN 95117126A CN 95117126 A CN95117126 A CN 95117126A CN 1130260 A CN1130260 A CN 1130260A
- Authority
- CN
- China
- Prior art keywords
- box
- graticule
- order
- packed
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67778—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers
Landscapes
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Library & Information Science (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Warehouses Or Storage Devices (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR21085/94 | 1994-08-25 | ||
KR1019940021085A KR0144945B1 (ko) | 1994-08-25 | 1994-08-25 | 레티클 검출장치 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN1130260A true CN1130260A (zh) | 1996-09-04 |
Family
ID=19391159
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN95117126A Pending CN1130260A (zh) | 1994-08-25 | 1995-08-25 | 标线片的装入和取出装置 |
Country Status (6)
Country | Link |
---|---|
JP (1) | JPH0878325A (ko) |
KR (1) | KR0144945B1 (ko) |
CN (1) | CN1130260A (ko) |
DE (1) | DE19530856A1 (ko) |
FR (1) | FR2723929B1 (ko) |
GB (1) | GB2292636B (ko) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108615332A (zh) * | 2016-12-13 | 2018-10-02 | 海太半导体(无锡)有限公司 | 贴片设备基板位置传感器感应和报警系统 |
CN110609451A (zh) * | 2019-08-19 | 2019-12-24 | 武汉华星光电技术有限公司 | 一种曝光机 |
CN110941145A (zh) * | 2018-09-21 | 2020-03-31 | 上海微电子装备(集团)股份有限公司 | 一种掩膜版检测装置及方法、掩膜版库设备 |
WO2021227903A1 (zh) * | 2020-05-15 | 2021-11-18 | 长鑫存储技术有限公司 | 光罩检测装置、方法、曝光机和光刻设备 |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6142722A (en) * | 1998-06-17 | 2000-11-07 | Genmark Automation, Inc. | Automated opening and closing of ultra clean storage containers |
TW495802B (en) * | 1999-04-13 | 2002-07-21 | Semiconductor 300 Gmbh & Amp C | Arrangement for storing objects, particularly for storing disklike objects such as wafers, flat panels or CDs |
KR100620160B1 (ko) * | 2002-12-30 | 2006-09-01 | 동부일렉트로닉스 주식회사 | 레티클 로딩장치 |
KR100665293B1 (ko) * | 2006-01-04 | 2007-01-17 | 코리아테크노(주) | 마스크 운송박스 박스커버 오프너 |
CN105448783A (zh) * | 2015-12-28 | 2016-03-30 | 江苏创基新能源有限公司 | 装框件的溢胶检查装置 |
JP7186225B2 (ja) * | 2017-11-30 | 2022-12-08 | チャイナ トライアンフ インターナショナル エンジニアリング カンパニー リミテッド | 密閉チャンバ内での基板位置を判定する方法およびこの方法を実行する装置 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4776462A (en) * | 1985-09-27 | 1988-10-11 | Canon Kabushiki Kaisha | Container for a sheet-like article |
JPS6276531A (ja) * | 1985-09-27 | 1987-04-08 | Canon Inc | 基板収納方法 |
JPS6278084A (ja) * | 1985-09-27 | 1987-04-10 | キヤノン株式会社 | 基板収納容器 |
US4999671A (en) * | 1986-07-11 | 1991-03-12 | Canon Kabushiki Kaisha | Reticle conveying device |
DE69123279T2 (de) * | 1990-04-06 | 1997-04-24 | Canon K.K., Tokio/Tokyo | Transportvorrichtung für Substrate und Verfahren zur Kontrolle |
DE4238834A1 (en) * | 1991-11-18 | 1993-05-19 | Fusion Systems Corp | Robotic semiconductor wafer transporter with vertical photodetector array - scans detectors to determine which slots are occupied by wafers illuminated from emitter on robot arm |
US5225691A (en) * | 1992-05-18 | 1993-07-06 | Avalon Engineering, Inc. | Semiconductor wafer cassette mapper with emitter and detector arrays for slot interrogation |
-
1994
- 1994-08-25 KR KR1019940021085A patent/KR0144945B1/ko not_active IP Right Cessation
-
1995
- 1995-08-22 DE DE19530856A patent/DE19530856A1/de not_active Withdrawn
- 1995-08-22 GB GB9517171A patent/GB2292636B/en not_active Expired - Fee Related
- 1995-08-24 FR FR9510047A patent/FR2723929B1/fr not_active Expired - Fee Related
- 1995-08-24 JP JP7239148A patent/JPH0878325A/ja active Pending
- 1995-08-25 CN CN95117126A patent/CN1130260A/zh active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108615332A (zh) * | 2016-12-13 | 2018-10-02 | 海太半导体(无锡)有限公司 | 贴片设备基板位置传感器感应和报警系统 |
CN110941145A (zh) * | 2018-09-21 | 2020-03-31 | 上海微电子装备(集团)股份有限公司 | 一种掩膜版检测装置及方法、掩膜版库设备 |
CN110609451A (zh) * | 2019-08-19 | 2019-12-24 | 武汉华星光电技术有限公司 | 一种曝光机 |
WO2021227903A1 (zh) * | 2020-05-15 | 2021-11-18 | 长鑫存储技术有限公司 | 光罩检测装置、方法、曝光机和光刻设备 |
Also Published As
Publication number | Publication date |
---|---|
GB2292636B (en) | 1998-12-23 |
FR2723929A1 (fr) | 1996-03-01 |
KR960009089A (ko) | 1996-03-22 |
GB9517171D0 (en) | 1995-10-25 |
GB2292636A (en) | 1996-02-28 |
KR0144945B1 (ko) | 1998-08-17 |
DE19530856A1 (de) | 1996-02-29 |
FR2723929B1 (fr) | 1997-07-25 |
JPH0878325A (ja) | 1996-03-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C01 | Deemed withdrawal of patent application (patent law 1993) | ||
WD01 | Invention patent application deemed withdrawn after publication |