FR2723929B1 - Dispositif pour charger et decharger des reticules - Google Patents
Dispositif pour charger et decharger des reticulesInfo
- Publication number
- FR2723929B1 FR2723929B1 FR9510047A FR9510047A FR2723929B1 FR 2723929 B1 FR2723929 B1 FR 2723929B1 FR 9510047 A FR9510047 A FR 9510047A FR 9510047 A FR9510047 A FR 9510047A FR 2723929 B1 FR2723929 B1 FR 2723929B1
- Authority
- FR
- France
- Prior art keywords
- crosslinks
- unloading
- loading
- unloading crosslinks
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67778—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Library & Information Science (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Warehouses Or Storage Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019940021085A KR0144945B1 (ko) | 1994-08-25 | 1994-08-25 | 레티클 검출장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2723929A1 FR2723929A1 (fr) | 1996-03-01 |
FR2723929B1 true FR2723929B1 (fr) | 1997-07-25 |
Family
ID=19391159
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR9510047A Expired - Fee Related FR2723929B1 (fr) | 1994-08-25 | 1995-08-24 | Dispositif pour charger et decharger des reticules |
Country Status (6)
Country | Link |
---|---|
JP (1) | JPH0878325A (fr) |
KR (1) | KR0144945B1 (fr) |
CN (1) | CN1130260A (fr) |
DE (1) | DE19530856A1 (fr) |
FR (1) | FR2723929B1 (fr) |
GB (1) | GB2292636B (fr) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6142722A (en) * | 1998-06-17 | 2000-11-07 | Genmark Automation, Inc. | Automated opening and closing of ultra clean storage containers |
TW495802B (en) * | 1999-04-13 | 2002-07-21 | Semiconductor 300 Gmbh & Amp C | Arrangement for storing objects, particularly for storing disklike objects such as wafers, flat panels or CDs |
KR100620160B1 (ko) * | 2002-12-30 | 2006-09-01 | 동부일렉트로닉스 주식회사 | 레티클 로딩장치 |
KR100665293B1 (ko) * | 2006-01-04 | 2007-01-17 | 코리아테크노(주) | 마스크 운송박스 박스커버 오프너 |
CN105448783A (zh) * | 2015-12-28 | 2016-03-30 | 江苏创基新能源有限公司 | 装框件的溢胶检查装置 |
CN108615332A (zh) * | 2016-12-13 | 2018-10-02 | 海太半导体(无锡)有限公司 | 贴片设备基板位置传感器感应和报警系统 |
WO2019104648A1 (fr) * | 2017-11-30 | 2019-06-06 | China Triumph International Engineering Co., Ltd. | Procédé permettant de déterminer une position de substrat dans une chambre fermée et appareil permettant de mettre en œuvre le procédé |
CN110941145B (zh) * | 2018-09-21 | 2021-07-30 | 上海微电子装备(集团)股份有限公司 | 一种掩膜版检测装置及方法、掩膜版库设备 |
CN110609451A (zh) * | 2019-08-19 | 2019-12-24 | 武汉华星光电技术有限公司 | 一种曝光机 |
CN113671799A (zh) * | 2020-05-15 | 2021-11-19 | 长鑫存储技术有限公司 | 光罩检测装置、方法、曝光机和光刻设备 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6278084A (ja) * | 1985-09-27 | 1987-04-10 | キヤノン株式会社 | 基板収納容器 |
US4776462A (en) * | 1985-09-27 | 1988-10-11 | Canon Kabushiki Kaisha | Container for a sheet-like article |
JPS6276531A (ja) * | 1985-09-27 | 1987-04-08 | Canon Inc | 基板収納方法 |
US4999671A (en) * | 1986-07-11 | 1991-03-12 | Canon Kabushiki Kaisha | Reticle conveying device |
EP0452041B1 (fr) * | 1990-04-06 | 1996-11-27 | Canon Kabushiki Kaisha | Dispositif de transport de substrats et sa méthode de contrÔle |
DE4238834A1 (en) * | 1991-11-18 | 1993-05-19 | Fusion Systems Corp | Robotic semiconductor wafer transporter with vertical photodetector array - scans detectors to determine which slots are occupied by wafers illuminated from emitter on robot arm |
US5225691A (en) * | 1992-05-18 | 1993-07-06 | Avalon Engineering, Inc. | Semiconductor wafer cassette mapper with emitter and detector arrays for slot interrogation |
-
1994
- 1994-08-25 KR KR1019940021085A patent/KR0144945B1/ko not_active IP Right Cessation
-
1995
- 1995-08-22 GB GB9517171A patent/GB2292636B/en not_active Expired - Fee Related
- 1995-08-22 DE DE19530856A patent/DE19530856A1/de not_active Withdrawn
- 1995-08-24 FR FR9510047A patent/FR2723929B1/fr not_active Expired - Fee Related
- 1995-08-24 JP JP7239148A patent/JPH0878325A/ja active Pending
- 1995-08-25 CN CN95117126A patent/CN1130260A/zh active Pending
Also Published As
Publication number | Publication date |
---|---|
JPH0878325A (ja) | 1996-03-22 |
GB2292636B (en) | 1998-12-23 |
KR0144945B1 (ko) | 1998-08-17 |
KR960009089A (ko) | 1996-03-22 |
GB2292636A (en) | 1996-02-28 |
FR2723929A1 (fr) | 1996-03-01 |
GB9517171D0 (en) | 1995-10-25 |
DE19530856A1 (de) | 1996-02-29 |
CN1130260A (zh) | 1996-09-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |