CN1124252C - 对苯二甲酸的回收方法及装置 - Google Patents
对苯二甲酸的回收方法及装置 Download PDFInfo
- Publication number
- CN1124252C CN1124252C CN98813576A CN98813576A CN1124252C CN 1124252 C CN1124252 C CN 1124252C CN 98813576 A CN98813576 A CN 98813576A CN 98813576 A CN98813576 A CN 98813576A CN 1124252 C CN1124252 C CN 1124252C
- Authority
- CN
- China
- Prior art keywords
- terephthalic acid
- partial crystallization
- crystallization groove
- section
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 title claims abstract description 175
- 238000000034 method Methods 0.000 title claims abstract description 36
- 238000002425 crystallisation Methods 0.000 claims abstract description 88
- 230000008025 crystallization Effects 0.000 claims abstract description 87
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 14
- 239000003054 catalyst Substances 0.000 claims abstract description 7
- 239000007791 liquid phase Substances 0.000 claims abstract description 7
- 239000002184 metal Substances 0.000 claims abstract description 7
- 229910052751 metal Inorganic materials 0.000 claims abstract description 7
- 238000001704 evaporation Methods 0.000 claims abstract description 4
- 239000007788 liquid Substances 0.000 claims description 19
- 239000002994 raw material Substances 0.000 claims description 14
- 238000011084 recovery Methods 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 9
- 239000000243 solution Substances 0.000 claims description 8
- KUCOHFSKRZZVRO-UHFFFAOYSA-N terephthalaldehyde Chemical compound O=CC1=CC=C(C=O)C=C1 KUCOHFSKRZZVRO-UHFFFAOYSA-N 0.000 claims description 8
- 238000005984 hydrogenation reaction Methods 0.000 claims description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 5
- 238000001816 cooling Methods 0.000 claims description 5
- 239000001257 hydrogen Substances 0.000 claims description 5
- 229910052739 hydrogen Inorganic materials 0.000 claims description 5
- 238000005496 tempering Methods 0.000 claims description 5
- 238000010790 dilution Methods 0.000 claims description 4
- 239000012895 dilution Substances 0.000 claims description 4
- 239000007787 solid Substances 0.000 claims description 4
- 238000005406 washing Methods 0.000 claims description 4
- 230000014759 maintenance of location Effects 0.000 claims description 3
- 239000011260 aqueous acid Substances 0.000 claims 1
- LPNBBFKOUUSUDB-UHFFFAOYSA-N p-toluic acid Chemical compound CC1=CC=C(C(O)=O)C=C1 LPNBBFKOUUSUDB-UHFFFAOYSA-N 0.000 abstract description 42
- 239000007864 aqueous solution Substances 0.000 abstract description 14
- 239000012535 impurity Substances 0.000 abstract description 13
- 239000013078 crystal Substances 0.000 abstract description 9
- URLKBWYHVLBVBO-UHFFFAOYSA-N Para-Xylene Chemical group CC1=CC=C(C)C=C1 URLKBWYHVLBVBO-UHFFFAOYSA-N 0.000 abstract description 6
- 230000008020 evaporation Effects 0.000 abstract description 2
- 230000003647 oxidation Effects 0.000 abstract description 2
- 238000007254 oxidation reaction Methods 0.000 abstract description 2
- 238000000746 purification Methods 0.000 abstract description 2
- 238000000926 separation method Methods 0.000 description 12
- 230000000052 comparative effect Effects 0.000 description 11
- 239000002253 acid Substances 0.000 description 7
- GOUHYARYYWKXHS-UHFFFAOYSA-N 4-formylbenzoic acid Chemical compound OC(=O)C1=CC=C(C=O)C=C1 GOUHYARYYWKXHS-UHFFFAOYSA-N 0.000 description 5
- 230000005496 eutectics Effects 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000007670 refining Methods 0.000 description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 150000002500 ions Chemical group 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 230000008901 benefit Effects 0.000 description 1
- 238000004517 catalytic hydrocracking Methods 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 230000008676 import Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000000935 solvent evaporation Methods 0.000 description 1
- 150000003504 terephthalic acids Chemical class 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C63/00—Compounds having carboxyl groups bound to a carbon atoms of six-membered aromatic rings
- C07C63/14—Monocyclic dicarboxylic acids
- C07C63/15—Monocyclic dicarboxylic acids all carboxyl groups bound to carbon atoms of the six-membered aromatic ring
- C07C63/26—1,4 - Benzenedicarboxylic acid
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C51/00—Preparation of carboxylic acids or their salts, halides or anhydrides
- C07C51/42—Separation; Purification; Stabilisation; Use of additives
- C07C51/43—Separation; Purification; Stabilisation; Use of additives by change of the physical state, e.g. crystallisation
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C51/00—Preparation of carboxylic acids or their salts, halides or anhydrides
- C07C51/42—Separation; Purification; Stabilisation; Use of additives
- C07C51/487—Separation; Purification; Stabilisation; Use of additives by treatment giving rise to chemical modification
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
Description
第1晶析槽操作温度 | 第2晶析槽操作温度 | 第3晶析槽操作温度 | 第4晶析槽操作温度 | 第5晶析槽操作温度 | PTA结晶中PT含有量 | 备考 | |
实施例1 | 237℃ | 207℃ | 182℃ | 162℃ | 145℃ | 62ppm | |
实施例2 | 230℃ | 195℃ | 167℃ | - | 145℃ | 76ppm | 4段晶析 |
比较例1 | 205℃ | 190℃ | 175℃ | 160℃ | 145℃ | 104ppm | |
比较例2 | 250℃ | 220℃ | 187 | 11660℃ | 145℃ | 96ppm | |
比较例3 | 235℃ | 205℃ | 183℃ | 162℃ | 145℃ | 129ppm | 滞留时间5分钟 |
比较例4 | 235℃ | 205℃ | 182℃ | 163℃ | 145℃ | 205ppm | 供给于气相部 |
实施例3 | 220℃ | 167℃ | - | - | 145℃ | 87ppm | 3段晶析 |
比较例5 | 229℃ | 195℃ | 165℃ | 145℃ | 99℃ | 330ppm | |
实施例4 | 230℃ | 194℃ | 166℃ | 145℃ | 100℃ | 84ppm | 供给稀释水 |
比较例6 | 235℃ | 208℃ | 185℃ | 165℃ | 99℃ | 102ppm | |
实施例5 | 238℃ | 207℃ | 184℃ | 163℃ | 146℃ | 65ppm |
Claims (6)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30863/1998 | 1998-02-13 | ||
JP03086398A JP3648372B2 (ja) | 1998-02-13 | 1998-02-13 | テレフタル酸の回収方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1284940A CN1284940A (zh) | 2001-02-21 |
CN1124252C true CN1124252C (zh) | 2003-10-15 |
Family
ID=12315575
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN98813576A Expired - Lifetime CN1124252C (zh) | 1998-02-13 | 1998-09-30 | 对苯二甲酸的回收方法及装置 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP3648372B2 (zh) |
KR (1) | KR100355334B1 (zh) |
CN (1) | CN1124252C (zh) |
TW (1) | TW577873B (zh) |
WO (1) | WO1999041225A1 (zh) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005225916A (ja) * | 2004-02-10 | 2005-08-25 | Fuji Xerox Co Ltd | 有機機能性材料の製造方法、有機機能性材料、および、これを用いた有機電界発光素子 |
KR100883288B1 (ko) * | 2004-05-28 | 2009-02-11 | 미쓰비시 가가꾸 가부시키가이샤 | 고순도 테레프탈산의 제조 방법 |
WO2005115956A1 (ja) * | 2004-05-28 | 2005-12-08 | Mitsubishi Chemical Corporation | 高純度テレフタル酸の製造方法 |
JP4747544B2 (ja) * | 2004-09-30 | 2011-08-17 | 株式会社日立プラントテクノロジー | テレフタル酸の精製方法 |
ATE348093T1 (de) * | 2004-12-15 | 2007-01-15 | Saudi Basic Ind Corp | Verfahren zur herstellung gereinigter terephtalsäure |
WO2008105087A1 (ja) * | 2007-02-28 | 2008-09-04 | Hitachi Plant Technologies, Ltd. | 水素化精製用粗製芳香族ジカルボン酸の製造方法 |
CN101624343B (zh) * | 2009-08-13 | 2012-12-19 | 中国纺织工业设计院 | 精对苯二甲酸装置精制单元氢气回收方法及装置 |
KR102394714B1 (ko) * | 2016-09-14 | 2022-05-06 | 미쯔비시 가스 케미칼 컴파니, 인코포레이티드 | 고순도 테레프탈산의 제조방법 |
CN108623065B (zh) * | 2017-03-22 | 2020-08-25 | 天华化工机械及自动化研究设计院有限公司 | Pta精制单元母液的回收利用方法 |
CN112774579B (zh) * | 2020-12-28 | 2023-05-30 | 南京延长反应技术研究院有限公司 | 一种粗对苯二甲酸加氢精制的智能微界面反应系统及方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07215914A (ja) * | 1994-02-03 | 1995-08-15 | Mitsubishi Chem Corp | スラリー特性に優れたテレフタル酸の製造方法 |
JPH08208561A (ja) * | 1994-11-16 | 1996-08-13 | Mitsubishi Chem Corp | テレフタル酸の製造方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1087555A (ja) * | 1996-09-17 | 1998-04-07 | Hitachi Ltd | テレフタル酸の回収方法 |
-
1998
- 1998-02-13 JP JP03086398A patent/JP3648372B2/ja not_active Expired - Lifetime
- 1998-09-30 KR KR1020007008682A patent/KR100355334B1/ko not_active IP Right Cessation
- 1998-09-30 WO PCT/JP1998/004413 patent/WO1999041225A1/ja active IP Right Grant
- 1998-09-30 CN CN98813576A patent/CN1124252C/zh not_active Expired - Lifetime
-
1999
- 1999-01-27 TW TW088101253A patent/TW577873B/zh not_active IP Right Cessation
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07215914A (ja) * | 1994-02-03 | 1995-08-15 | Mitsubishi Chem Corp | スラリー特性に優れたテレフタル酸の製造方法 |
JPH08208561A (ja) * | 1994-11-16 | 1996-08-13 | Mitsubishi Chem Corp | テレフタル酸の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JP3648372B2 (ja) | 2005-05-18 |
CN1284940A (zh) | 2001-02-21 |
TW577873B (en) | 2004-03-01 |
KR100355334B1 (ko) | 2002-10-12 |
JPH11228492A (ja) | 1999-08-24 |
KR20010040788A (ko) | 2001-05-15 |
WO1999041225A1 (fr) | 1999-08-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: HITACHI PLANT TECHNOLOGIES, LTD. Free format text: FORMER OWNER: HITACHI CO., LTD. Effective date: 20061020 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20061020 Address after: Tokyo, Japan, Japan Patentee after: Hitachi Plant Technologies Ltd. Address before: Tokyo, Japan Patentee before: Hitachi Ltd. |
|
ASS | Succession or assignment of patent right |
Owner name: HITACHI,LTD. Free format text: FORMER OWNER: HITACHI PLANT TECHNOLOGIES LTD. Effective date: 20140305 |
|
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20140305 Address after: Tokyo, Japan Patentee after: Hitachi Ltd. Address before: Tokyo, Japan, Japan Patentee before: Hitachi Plant Technologies Ltd. |
|
CX01 | Expiry of patent term |
Granted publication date: 20031015 |
|
CX01 | Expiry of patent term |