CN111727208B - 固化性组合物、固化物、滤色器、滤色器的制造方法、固体摄像元件及图像显示装置 - Google Patents
固化性组合物、固化物、滤色器、滤色器的制造方法、固体摄像元件及图像显示装置 Download PDFInfo
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- CN111727208B CN111727208B CN201980013666.1A CN201980013666A CN111727208B CN 111727208 B CN111727208 B CN 111727208B CN 201980013666 A CN201980013666 A CN 201980013666A CN 111727208 B CN111727208 B CN 111727208B
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/32—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
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- C—CHEMISTRY; METALLURGY
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/38—Polymerisation using regulators, e.g. chain terminating agents, e.g. telomerisation
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
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- C—CHEMISTRY; METALLURGY
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
- C08F220/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
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- C—CHEMISTRY; METALLURGY
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/52—Amides or imides
- C08F220/54—Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide
- C08F220/56—Acrylamide; Methacrylamide
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/10—Esters
- C08F222/12—Esters of phenols or saturated alcohols
- C08F222/20—Esters containing oxygen in addition to the carboxy oxygen
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- C—CHEMISTRY; METALLURGY
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/06—Polymers provided for in subclass C08G
- C08F290/061—Polyesters; Polycarbonates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
- C08F290/12—Polymers provided for in subclasses C08C or C08F
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/32—Compounds containing nitrogen bound to oxygen
- C08K5/33—Oximes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3442—Heterocyclic compounds having nitrogen in the ring having two nitrogen atoms in the ring
- C08K5/3445—Five-membered rings
- C08K5/3447—Five-membered rings condensed with carbocyclic rings
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
- C09D133/04—Homopolymers or copolymers of esters
- C09D133/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
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- Architecture (AREA)
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- Optics & Photonics (AREA)
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- Crystallography & Structural Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials For Photolithography (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Optical Filters (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
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Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018029219 | 2018-02-21 | ||
| JP2018-029219 | 2018-02-21 | ||
| PCT/JP2019/003897 WO2019163505A1 (ja) | 2018-02-21 | 2019-02-04 | 硬化性組成物、硬化物、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子及び画像表示装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN111727208A CN111727208A (zh) | 2020-09-29 |
| CN111727208B true CN111727208B (zh) | 2023-10-17 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201980013666.1A Active CN111727208B (zh) | 2018-02-21 | 2019-02-04 | 固化性组合物、固化物、滤色器、滤色器的制造方法、固体摄像元件及图像显示装置 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US11718695B2 (https=) |
| JP (3) | JPWO2019163505A1 (https=) |
| CN (1) | CN111727208B (https=) |
| TW (2) | TW202440699A (https=) |
| WO (1) | WO2019163505A1 (https=) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2020044720A1 (ja) * | 2018-08-30 | 2020-03-05 | 富士フイルム株式会社 | 着色組成物、膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子及び画像表示装置 |
| JP7167312B2 (ja) | 2019-03-27 | 2022-11-08 | 富士フイルム株式会社 | 硬化性組成物、硬化物、カラーフィルタ、固体撮像素子及び画像表示装置 |
| WO2021137090A1 (en) * | 2019-12-30 | 2021-07-08 | 3M Innovative Properties Company | Light and moisture curable compositions |
| TWI907465B (zh) * | 2020-07-29 | 2025-12-11 | 日商富士軟片股份有限公司 | 樹脂組成物、膜、濾光器、固體攝像元件及圖像顯示裝置 |
| CN112409297B (zh) * | 2020-11-17 | 2023-06-20 | 肇庆市名洋涂料有限公司 | 自由基-阳离子混杂光固化单体及其制备方法、辐射固化涂料和应用 |
| EP4410855A4 (en) * | 2021-09-29 | 2024-12-18 | FUJIFILM Corporation | COMPOSITION, RESIN, FILM AND OPTICAL SENSOR |
| TWI830425B (zh) * | 2021-10-25 | 2024-01-21 | 日商旭化成股份有限公司 | 感光性元件、及光阻圖案之形成方法 |
| KR102787025B1 (ko) * | 2022-08-30 | 2025-03-25 | 삼성에스디아이 주식회사 | 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 컬러필터 |
| JPWO2025013624A1 (https=) * | 2023-07-07 | 2025-01-16 | ||
| CN119931382B (zh) * | 2025-04-09 | 2025-08-01 | 珠海基石科技有限公司 | 颜料组合物、图案化组合物、图案化基底、彩色滤光片、半导体器件 |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6582862B1 (en) * | 1999-10-08 | 2003-06-24 | Dai Nippon Printing Co., Ltd. | High photo-sensitivity curable resin, photo-curable resin composition, production method thereof, color filter and liquid crystal display panel |
| CN1656398A (zh) * | 2002-05-24 | 2005-08-17 | 大日本印刷株式会社 | 用于形成滤色片保护膜、rgb用象素、黑底或者隔离物的光固化性树脂组合物以及滤色片 |
| JP2008031234A (ja) * | 2006-07-27 | 2008-02-14 | Kyoeisha Chem Co Ltd | 活性エネルギー線硬化被膜形成組成物用の顔料分散剤 |
| CN101410758A (zh) * | 2006-03-28 | 2009-04-15 | 富士胶片株式会社 | 感光性树脂组合物、感光性转印材料、间壁墙及其形成方法、光学元件及其制造方法以及显示装置 |
| JP2011033951A (ja) * | 2009-08-05 | 2011-02-17 | Toyo Ink Mfg Co Ltd | 感光性組成物 |
| JP2011033952A (ja) * | 2009-08-05 | 2011-02-17 | Toyo Ink Mfg Co Ltd | 感光性組成物 |
| JP2011256330A (ja) * | 2010-06-11 | 2011-12-22 | Dic Corp | 含フッ素硬化性樹脂及びそれを用いた活性エネルギー線硬化型組成物 |
| JP2012031260A (ja) * | 2010-07-29 | 2012-02-16 | Nippon Synthetic Chem Ind Co Ltd:The | 活性エネルギー線硬化型樹脂組成物、及びそれを用いてなるコーティング剤組成物、並びに硬化塗膜 |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2873889B2 (ja) | 1991-01-29 | 1999-03-24 | 富士写真フイルム株式会社 | 感光性転写材料及び画像形成方法 |
| JP3316093B2 (ja) | 1993-08-10 | 2002-08-19 | 富士写真フイルム株式会社 | 感光性積層材料およびその製造方法 |
| JP3681867B2 (ja) | 1997-09-01 | 2005-08-10 | 富士写真フイルム株式会社 | フィルム張付装置 |
| JP3375872B2 (ja) * | 1997-12-16 | 2003-02-10 | 株式会社日本触媒 | 硬化性樹脂組成物の製造方法 |
| FR2779989B1 (fr) | 1998-06-17 | 2000-08-04 | Valeo | Procede de fabrication d'un materiau de friction et plus particulierement d'une couronne de friction pour disque de friction d'embrayage et couronne d'embrayage |
| JP3823579B2 (ja) | 1999-02-05 | 2006-09-20 | 三菱化学株式会社 | カラーフィルター用光重合性着色組成物およびカラーフィルター |
| JP3896389B2 (ja) | 1999-05-28 | 2007-03-22 | 富士フイルムホールディングス株式会社 | フィルムラミネータ |
| JP2002148794A (ja) | 2000-11-15 | 2002-05-22 | Fuji Photo Film Co Ltd | 感光層転写装置及び方法 |
| JP4019726B2 (ja) | 2002-02-07 | 2007-12-12 | 三菱化学株式会社 | カラーフィルタ用感光性組成物およびカラーフィルタ |
| JP2004138950A (ja) | 2002-10-21 | 2004-05-13 | Sumitomo Chem Co Ltd | 着色感光性樹脂組成物 |
| JP2004240216A (ja) | 2003-02-06 | 2004-08-26 | Fuji Photo Film Co Ltd | プリント配線板の製造方法 |
| JP2004333616A (ja) | 2003-05-01 | 2004-11-25 | Fuji Photo Film Co Ltd | 感光性樹脂転写装置および方法 |
| JP2008143941A (ja) * | 2006-12-06 | 2008-06-26 | Showa Highpolymer Co Ltd | 感光性樹脂及びそれを含む感光性樹脂組成物 |
| JP5344790B2 (ja) * | 2006-12-28 | 2013-11-20 | 富士フイルム株式会社 | 硬化性組成物、カラーフィルタ及びその製造方法 |
| JP5200707B2 (ja) * | 2008-07-09 | 2013-06-05 | Jfeスチール株式会社 | 容器用ポリエステル樹脂被覆金属板 |
| JP5393198B2 (ja) * | 2009-02-27 | 2014-01-22 | 東京応化工業株式会社 | 感光性樹脂組成物 |
| JP5579418B2 (ja) | 2009-11-12 | 2014-08-27 | 富士フイルム株式会社 | 放射線硬化性塩化ビニル系共重合体、磁気記録媒体用結合剤、放射線硬化性組成物およびその硬化物、ならびに磁気記録媒体 |
| JP5672706B2 (ja) | 2010-01-29 | 2015-02-18 | 東洋インキScホールディングス株式会社 | 硬化性分散剤、及びそれを用いた顔料組成物並びに顔料分散体 |
| KR101830206B1 (ko) | 2010-12-28 | 2018-02-20 | 후지필름 가부시키가이샤 | 차광막 형성용 티타늄 블랙 분산 조성물과 그 제조방법, 흑색 감방사선성 조성물, 흑색 경화막, 고체촬상소자, 및 흑색 경화막의 제조방법 |
| JP2013057755A (ja) * | 2011-09-07 | 2013-03-28 | Fujifilm Corp | 感光性樹脂組成物、感光性フイルム、感光性積層体、永久パターン形成方法およびプリント基板 |
| JP2014065865A (ja) | 2012-09-27 | 2014-04-17 | Dic Corp | 重合性樹脂、カラーフィルター画素形成用組成物、カラーフィルター、液晶表示装置及び有機el表示装置。 |
| JP6152074B2 (ja) | 2013-07-05 | 2017-06-21 | 富士フイルム株式会社 | 色素多量体、着色組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子および画像表示装置 |
| JP6117072B2 (ja) * | 2013-09-30 | 2017-04-19 | 富士フイルム株式会社 | 顔料分散組成物、インクジェット記録方法、及び化合物の製造方法 |
| JP5692338B2 (ja) | 2013-11-25 | 2015-04-01 | 東洋インキScホールディングス株式会社 | 感光性組成物 |
-
2019
- 2019-02-04 JP JP2020501653A patent/JPWO2019163505A1/ja active Pending
- 2019-02-04 WO PCT/JP2019/003897 patent/WO2019163505A1/ja not_active Ceased
- 2019-02-04 CN CN201980013666.1A patent/CN111727208B/zh active Active
- 2019-02-18 TW TW113125701A patent/TW202440699A/zh unknown
- 2019-02-18 TW TW108105347A patent/TWI862484B/zh active
-
2020
- 2020-08-14 US US16/993,448 patent/US11718695B2/en active Active
-
2022
- 2022-02-09 JP JP2022018994A patent/JP7697895B2/ja active Active
-
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- 2023-09-12 JP JP2023147966A patent/JP2024001022A/ja active Pending
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6582862B1 (en) * | 1999-10-08 | 2003-06-24 | Dai Nippon Printing Co., Ltd. | High photo-sensitivity curable resin, photo-curable resin composition, production method thereof, color filter and liquid crystal display panel |
| CN1656398A (zh) * | 2002-05-24 | 2005-08-17 | 大日本印刷株式会社 | 用于形成滤色片保护膜、rgb用象素、黑底或者隔离物的光固化性树脂组合物以及滤色片 |
| CN101410758A (zh) * | 2006-03-28 | 2009-04-15 | 富士胶片株式会社 | 感光性树脂组合物、感光性转印材料、间壁墙及其形成方法、光学元件及其制造方法以及显示装置 |
| JP2008031234A (ja) * | 2006-07-27 | 2008-02-14 | Kyoeisha Chem Co Ltd | 活性エネルギー線硬化被膜形成組成物用の顔料分散剤 |
| JP2011033951A (ja) * | 2009-08-05 | 2011-02-17 | Toyo Ink Mfg Co Ltd | 感光性組成物 |
| JP2011033952A (ja) * | 2009-08-05 | 2011-02-17 | Toyo Ink Mfg Co Ltd | 感光性組成物 |
| JP2011256330A (ja) * | 2010-06-11 | 2011-12-22 | Dic Corp | 含フッ素硬化性樹脂及びそれを用いた活性エネルギー線硬化型組成物 |
| JP2012031260A (ja) * | 2010-07-29 | 2012-02-16 | Nippon Synthetic Chem Ind Co Ltd:The | 活性エネルギー線硬化型樹脂組成物、及びそれを用いてなるコーティング剤組成物、並びに硬化塗膜 |
Also Published As
| Publication number | Publication date |
|---|---|
| TW202440699A (zh) | 2024-10-16 |
| US20200369810A1 (en) | 2020-11-26 |
| TW201936680A (zh) | 2019-09-16 |
| CN111727208A (zh) | 2020-09-29 |
| US11718695B2 (en) | 2023-08-08 |
| JPWO2019163505A1 (ja) | 2020-12-03 |
| JP2022065057A (ja) | 2022-04-26 |
| WO2019163505A1 (ja) | 2019-08-29 |
| TWI862484B (zh) | 2024-11-21 |
| JP2024001022A (ja) | 2024-01-09 |
| JP7697895B2 (ja) | 2025-06-24 |
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