CN111628063A - 一种Micro-LED的固晶方法 - Google Patents
一种Micro-LED的固晶方法 Download PDFInfo
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Abstract
本发明提供一种Micro‑LED的固晶方法,所述方法包括以下步骤:(1)在PCB固晶位置镀锡,得到镀锡层;(2)在步骤(1)得到的镀锡层上依次添加保护层以及助焊剂层,得到预处理PCB板;(3)将倒装Micro‑LED芯片转移至步骤(2)得到的所述预处理PCB板上,回流固晶,完成Micro‑LED的固晶。所述方法能减少印刷锡膏的工艺流程,无需投入锡膏印刷机,无需制造钢网,提高效率。
Description
技术领域
本发明属于Micro-LED技术领域,涉及一种Micro-LED的固晶方法。
背景技术
随着点间距的减小,芯片排列密度增大,现有镀金工艺的PCB板需要配合使用印刷机印刷锡膏,锡膏印刷时对钢网的要求和对印刷工艺的精度要求更高,钢网的开孔小且密,钢网的厚度变薄,增加成本,且钢网使用寿命减少。常规的芯片需要使用小粒径的锡膏通过真空充氮回流的方式将芯片固定。
CN 110600496 A公开了一种Micro-LED芯片封装结构,包括:一电路板;所述电路板具有非功能区和电路连接区,非功能区与电路连接区相邻;一Micro-LED芯片,位于所述非功能区,且所述Micro-LED芯片的背面与所述电路板的正面接触固定;一绑定线组,每根绑定线的一端与将Micro-LED芯片的引出极连接,另一端与所述电路板的电路连接区接触连接。
CN 110718611 A公开了一种Micro LED巨量转移方法、装置及封装结构、显示装置,Micro-LED巨量转移方法包括设置驱动电路基板,设置第一载物板及第二载物板,向所述第二载物板倾倒Micro-LED元件,向所述第一载物板及第二载物板施加振动力,将驱动电路基板上的电极与Micro-LED元件键合;Micro-LED巨量转移装置包括上述方法中的部件,封装结构由上述转移方法制备而成;显示装置包括封装结构。在本发明中,通过向第二载物板批量倾倒Micro-LED元件,在振动力的作用下,Micro-LED元件落入第一载物板内,在进行Micro-LED元件与电极的键合后实现Micro-LED元件的巨量转移。
CN 107527896 A公开了一种基于RGB显色的Micro-LED封装结构,该结构包括本体,本体上设有两个独立的腔体一和腔体二,腔体一内设有蓝色芯片一、绿色芯片和封装层一,封装层一将蓝色芯片一与绿色芯片完全包裹封装;腔体二中设有蓝色芯片二和封装层二,封装层二内设有红色荧光粉,封装层二将蓝色芯片二完全包裹封装,红色荧光粉完全吸收蓝色芯片二发出的蓝色光从而腔体二只放射出红光,腔体二中通过蓝色芯片二与封装层二中的红色荧光粉实现红光,与腔体一中的蓝色芯片、绿色芯片发出的蓝光、绿光配合,实现三原色发光,并通过电流控制混色效果。
发明内容
针对现有技术中存在的技术问题,本发明提供一种Micro-LED的固晶方法,所述方法能减少印刷锡膏的工艺流程,无需投入锡膏印刷机,无需制造钢网,提高效率。
为达上述目的,本发明采用以下技术方案:
本发明提供一种Micro-LED的固晶方法,所述方法包括以下步骤:
(1)在PCB固晶位置镀锡,得到镀锡层;
(2)在步骤(1)得到的镀锡层上依次添加保护层以及助焊剂层,得到预处理PCB板;
(3)将倒装Micro-LED芯片转移至步骤(2)得到的所述预处理PCB板上,回流固晶,完成Micro-LED的固晶。
作为本发明优选的技术方案,步骤(1)所述镀锡层的厚度为5~30μm。
作为本发明优选的技术方案,步骤(2)所述添加保护层的方法包括贴保护膜或OSP工艺中的任意一种。
其中,所述保护膜使用时需撕掉,在可操作时限内完成固晶和回流。
作为本发明优选的技术方案,所述助焊剂包括酮类、醇类或酯类的有机免洗助焊剂中的任意一种或至少两种的组合。
作为本发明优选的技术方案,所述助焊剂层的厚度为1~5μm,如1.5μm、2μm、2.5μm、3μm、3.5μm、4μm或4.5μm等,但并不仅限于所列举的数值,该数值范围内其他未列举的数值同样适用。
作为本发明优选的技术方案,所述倒装Micro-LED芯片为带锡的倒装Micro-LED芯片。
作为本发明优选的技术方案,所述回流固晶前调整回流焊曲线。
作为本发明优选的技术方案,所述回流固晶的方法为先抽真空,再充入氮气修正负压,所述氮气浓度大于99.99%。
作为本发明优选的技术方案,所述方法包括以下步骤:
(1)在PCB固晶位置镀锡,得到镀锡层,所述镀锡层的厚度为5~30μm;
(2)在步骤(1)得到的镀锡层上依次添加保护层以及助焊剂层,所述助焊剂层的厚度为1~5μm,所述添加保护层的方法包括帖保护膜或OSP工艺中的任意一种,得到预处理PCB板;
(3)将带锡的倒装Micro-LED芯片转移至步骤(2)得到的所述预处理PCB板上,调整回流焊曲线,回流固晶,完成Micro-LED的固晶。
与现有技术方案相比,本发明至少具有以下有益效果:
本发明采用镀锡加防氧化层的工艺取代镀金,降低PCB板的成本20%-30%,配合使用电极带锡的倒装芯片,能减少印刷锡膏的工艺流程,无需投入锡膏印刷机,无需制造钢网,提高效率。
附图说明
图1是本发明具体实施方式提供的Micro-LED的固晶方法的结构示意图;
图2是本发明具体实施方式使用的PCB板的结构示意图。
下面对本发明进一步详细说明。但下述的实例仅仅是本发明的简易例子,并不代表或限制本发明的权利保护范围,本发明的保护范围以权利要求书为准。
具体实施方式
下面结合附图并通过具体实施方式来进一步说明本发明的技术方案。
为更好地说明本发明,便于理解本发明的技术方案,本发明的典型但非限制性的实施例如下:
实施例1
本实施例提供一种Micro-LED的固晶方法,所述方法包括以下步骤:
(1)在PCB固晶位置镀锡,得到镀锡层,所述镀锡层的厚度为15μm;
(2)在步骤(1)得到的镀锡层上依次添加保护层以及助焊剂层,所述助焊剂层的厚度为1μm,所述添加保护层的方法为帖保护膜,助焊剂层采用喷涂工艺,得到预处理PCB板;
(3)将带锡的倒装Micro-LED芯片转移至步骤(2)得到的所述预处理PCB板上,调整回流焊曲线,回流固晶,完成Micro-LED的固晶。
实施例2
本实施例提供一种Micro-LED的固晶方法,所述方法包括以下步骤:
(1)在PCB固晶位置镀锡,得到镀锡层,所述镀锡层的厚度为30μm;
(2)在步骤(1)得到的镀锡层上依次添加保护层以及助焊剂层,所述助焊剂层的厚度为5μm,所述添加保护层的方法为帖保护膜,助焊剂层采用喷涂工艺,得到预处理PCB板;
(3)将带锡的倒装Micro-LED芯片转移至步骤(2)得到的所述预处理PCB板上,调整回流焊曲线,回流固晶,完成Micro-LED的固晶。
实施例3
本实施例提供一种Micro-LED的固晶方法,所述方法包括以下步骤:
(1)在PCB固晶位置镀锡,得到镀锡层,所述镀锡层的厚度为20μm;
(2)在步骤(1)得到的镀锡层上依次添加保护层以及助焊剂层,所述助焊剂层的厚度为2μm,所述添加保护层的方法为OSP工艺,助焊剂层采用喷涂工艺,得到预处理PCB板;
(3)将带锡的倒装Micro-LED芯片转移至步骤(2)得到的所述预处理PCB板上,调整回流焊曲线,回流固晶,完成Micro-LED的固晶。
实施例4
本实施例提供一种Micro-LED的固晶方法,所述方法包括以下步骤:
(1)在PCB固晶位置镀锡,得到镀锡层,所述镀锡层的厚度为25μm;
(2)在步骤(1)得到的镀锡层上依次添加保护层以及助焊剂层,所述助焊剂层的厚度为3μm,所述添加保护层的方法为OSP工艺,助焊剂层采用喷涂工艺,得到预处理PCB板;
(3)将带锡的倒装Micro-LED芯片转移至步骤(2)得到的所述预处理PCB板上,调整回流焊曲线,回流固晶,完成Micro-LED的固晶。
本发明实施例1-4使用的镀锡方法为化学镀锡法,镀液屮金属离子在还原剂的作用下于基体活性表面上沉积。化学镀锡的锡层厚度均匀,不需要外加电源。
本发明实施例1-4使用回流固晶工艺为先抽真空,再充入氮气修正负压,所述氮气浓度大于99.99%。
本发明实施例1-2使用的保护膜为UV固化膜;实施例3-4的OSP工艺的材料类型有:松香类(Rosin),活性树脂类(ActiveResin)和唑类(Azole),本实施例选择唑类OSP。
本发明实施1-4采用的Micro-LED的固晶方法与传统镀金方法相比,成本可节约20%-30%。
申请人声明,本发明通过上述实施例来说明本发明的详细结构特征,但本发明并不局限于上述详细结构特征,即不意味着本发明必须依赖上述详细结构特征才能实施。所属技术领域的技术人员应该明了,对本发明的任何改进,对本发明所选用部件的等效替换以及辅助部件的增加、具体方式的选择等,均落在本发明的保护范围和公开范围之内。
以上详细描述了本发明的优选实施方式,但是,本发明并不限于上述实施方式中的具体细节,在本发明的技术构思范围内,可以对本发明的技术方案进行多种简单变型,这些简单变型均属于本发明的保护范围。
另外需要说明的是,在上述具体实施方式中所描述的各个具体技术特征,在不矛盾的情况下,可以通过任何合适的方式进行组合,为了避免不必要的重复,本发明对各种可能的组合方式不再另行说明。
此外,本发明的各种不同的实施方式之间也可以进行任意组合,只要其不违背本发明的思想,其同样应当视为本发明所公开的内容。
Claims (9)
1.一种Micro-LED的固晶方法,其特征在于,所述方法包括以下步骤:
(1)在PCB固晶位置镀锡,得到镀锡层;
(2)在步骤(1)得到的镀锡层上依次添加保护层以及助焊剂层,得到预处理PCB板;
(3)将倒装Micro-LED芯片转移至步骤(2)得到的所述预处理PCB板上,回流固晶,完成Micro-LED的固晶。
2.根据权利要求1所述的方法,其特征在于,步骤(1)所述镀锡层的厚度为5~30μm。
3.根据权利要求1或2所述的方法,其特征在于,步骤(2)所述添加保护层的方法包括贴保护膜或OSP工艺中的任意一种。
4.根据权利要求1-3任一项所述的方法,其特征在于,所述助焊剂包括酮类、醇类或酯类的有机免洗助焊剂中的任意一种或至少两种的组合。
5.根据权利要求1-4任一项所述的方法,其特征在于,所述助焊剂层的厚度为1~5μm。
6.根据权利要求1-5任一项所述的方法,其特征在于,所述倒装Micro-LED芯片为带锡的倒装Micro-LED芯片。
7.根据权利要求1-6任一项所述的方法,其特征在于,所述回流固晶前调整回流焊曲线。
8.根据权利要求1-7任一项所述的方法,其特征在于,所述回流固晶的方法为先抽真空,再充入氮气修正负压,所述氮气浓度大于99.99%。
9.根据权利要求1-8任一项所述的方法,其特征在于,所述方法包括以下步骤:
(1)在PCB固晶位置镀锡,得到镀锡层,所述镀锡层的厚度为5~30μm;
(2)在步骤(1)得到的镀锡层上依次添加保护层以及助焊剂层,所述助焊剂层的厚度为1~5μm,所述添加保护层的方法包括贴保护膜或OSP工艺中的任意一种,得到预处理PCB板;
(3)将带锡的倒装Micro-LED芯片转移至步骤(2)得到的所述预处理PCB板上,调整回流焊曲线,回流固晶,完成Micro-LED的固晶。
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