CN111276459A - 半导体装置用接合线 - Google Patents

半导体装置用接合线 Download PDF

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Publication number
CN111276459A
CN111276459A CN202010092522.4A CN202010092522A CN111276459A CN 111276459 A CN111276459 A CN 111276459A CN 202010092522 A CN202010092522 A CN 202010092522A CN 111276459 A CN111276459 A CN 111276459A
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CN
China
Prior art keywords
bonding wire
wire
bonding
concentration
core material
Prior art date
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Pending
Application number
CN202010092522.4A
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English (en)
Chinese (zh)
Inventor
山田隆
小田大造
榛原照男
宇野智裕
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Micrometal Corp
Nippon Steel Chemical and Materials Co Ltd
Original Assignee
Nippon Steel and Sumikin Chemical Co Ltd
Nippon Micrometal Corp
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Filing date
Publication date
Application filed by Nippon Steel and Sumikin Chemical Co Ltd, Nippon Micrometal Corp filed Critical Nippon Steel and Sumikin Chemical Co Ltd
Publication of CN111276459A publication Critical patent/CN111276459A/zh
Pending legal-status Critical Current

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    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/06Wires; Strips; Foils
    • C25D7/0607Wires
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    • H10W20/00Interconnections in chips, wafers or substrates
    • H10W20/40Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
    • H10W20/41Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes characterised by their conductive parts
    • H10W20/44Conductive materials thereof
    • H10W20/4403Conductive materials thereof based on metals, e.g. alloys, metal silicides
    • H10W20/4421Conductive materials thereof based on metals, e.g. alloys, metal silicides the principal metal being copper
    • H10W20/4424Copper alloys
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    • H10W70/40Leadframes
    • H10W70/464Additional interconnections in combination with leadframes
    • H10W70/465Bumps or wires
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
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    • C22F1/00Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/08Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of copper or alloys based thereon
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116324000A (zh) * 2020-10-20 2023-06-23 日铁新材料股份有限公司 半导体装置用Ag合金接合线

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6167227B2 (ja) 2014-04-21 2017-07-19 新日鉄住金マテリアルズ株式会社 半導体装置用ボンディングワイヤ
CN106463495B (zh) 2015-08-12 2020-09-04 日铁新材料股份有限公司 半导体装置用接合线
JP6002300B1 (ja) * 2015-09-02 2016-10-05 田中電子工業株式会社 ボールボンディング用パラジウム(Pd)被覆銅ワイヤ
US10950571B2 (en) * 2017-02-22 2021-03-16 Nippon Steel Chemical & Material Co., Ltd. Bonding wire for semiconductor device
WO2019031498A1 (ja) * 2017-08-09 2019-02-14 日鉄ケミカル&マテリアル株式会社 半導体装置用Cu合金ボンディングワイヤ
US10790259B2 (en) * 2017-08-09 2020-09-29 Nippon Steel Chemical & Material Co., Ltd. Cu alloy bonding wire for semiconductor device
DE112017000346T5 (de) * 2017-12-28 2019-08-29 Nippon Micrometal Corporation Bonddraht für Halbleiterbauelement
JP6487108B1 (ja) * 2018-11-26 2019-03-20 田中電子工業株式会社 パラジウム被覆銅ボンディングワイヤ及びその製造方法
CN109599381A (zh) * 2018-11-30 2019-04-09 合肥中晶新材料有限公司 一种固定比例金基/银基键合线及其制备方法
JP6507329B1 (ja) * 2019-02-08 2019-04-24 田中電子工業株式会社 パラジウム被覆銅ボンディングワイヤ、ワイヤ接合構造、半導体装置及び半導体装置の製造方法
JP7156975B2 (ja) 2019-02-26 2022-10-19 三菱重工業株式会社 運営評価装置、運営評価方法、およびプログラム
PH12021552178A1 (en) * 2019-03-12 2022-08-08 Tanaka Electronics Ind Palladium-coated copper bonding wire, manufacturing method of palladium-coated copper bonding wire, wire bonding structure using the same, semiconductor device and manufacturing method thereof
WO2020218968A1 (en) * 2019-04-26 2020-10-29 Heraeus Materials Singapore Pte. Ltd. Coated wire
PH12021553019A1 (en) * 2019-06-04 2022-11-07 Tanaka Electronics Ind Palladium-coated copper bonding wire, manufacturing method of palladium-coated copper bonding wire, semiconductor device using the same, and manufacturing method thereof
WO2021065036A1 (ja) * 2019-10-01 2021-04-08 田中電子工業株式会社 ワイヤ接合構造とそれに用いられるボンディングワイヤ及び半導体装置
EP4130310A4 (en) * 2020-03-25 2024-08-07 Nippon Micrometal Corporation Bonding wire for semiconductor device
WO2022202658A1 (ja) * 2021-03-26 2022-09-29 株式会社ヨコオ プローブ
WO2023248491A1 (ja) * 2022-06-24 2023-12-28 日鉄ケミカル&マテリアル株式会社 半導体装置用ボンディングワイヤ
KR20250016058A (ko) * 2022-06-24 2025-02-03 닛테츠 케미컬 앤드 머티리얼 가부시키가이샤 반도체 장치용 본딩 와이어
CN116657207B (zh) 2023-06-25 2024-04-26 上海万生合金材料有限公司 一种铜镀钯金键合线及其电镀工艺
TW202548036A (zh) * 2024-03-28 2025-12-16 日商拓自達電線股份有限公司 接合線
JP7723875B1 (ja) * 2024-03-28 2025-08-14 タツタ電線株式会社 ボンディングワイヤ

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090127317A1 (en) * 2007-11-15 2009-05-21 Infineon Technologies Ag Device and method for producing a bonding connection
CN101689517A (zh) * 2007-07-24 2010-03-31 新日铁高新材料株式会社 半导体装置用接合线和线接合方法
CN101802994A (zh) * 2008-01-25 2010-08-11 新日铁高新材料株式会社 半导体装置用接合线
CN101828255A (zh) * 2007-12-03 2010-09-08 新日铁高新材料株式会社 半导体装置用接合线
CN102422404A (zh) * 2009-07-30 2012-04-18 新日铁高新材料株式会社 半导体用接合线
CN103339719A (zh) * 2011-12-21 2013-10-02 田中电子工业株式会社 被覆Pd的铜球焊线
CN104060281A (zh) * 2013-03-21 2014-09-24 吕传盛 固相扩散反应铜钯合金线及其制造方法
CN104241237A (zh) * 2013-06-13 2014-12-24 田中电子工业株式会社 超声波键合用镀覆铜丝结构

Family Cites Families (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5223969B1 (https=) 1966-12-28 1977-06-28
EP0112635B1 (en) * 1982-12-01 1987-04-22 Electrofoils Technology Limited Treatment of copper foil
JPS60160554U (ja) 1984-03-31 1985-10-25 古河電気工業株式会社 半導体用ボンディング細線
JPS6120693A (ja) 1984-07-06 1986-01-29 Toshiba Corp ボンデイングワイヤ−
JPS6148543A (ja) 1984-08-10 1986-03-10 Sumitomo Electric Ind Ltd 半導体素子結線用銅合金線
JPS6152332A (ja) 1984-08-21 1986-03-15 Toshiba Corp ボンデイングワイヤ−
JPS6152333A (ja) 1984-08-21 1986-03-15 Toshiba Corp ボンデイングワイヤ−
JPH0736431B2 (ja) * 1985-06-28 1995-04-19 三菱マテリアル株式会社 半導体装置のボンディングワイヤ用高純度銅の製造法
JPS61255045A (ja) * 1985-05-07 1986-11-12 Nippon Mining Co Ltd 半導体装置用ボンデイングワイヤ及びその製造方法
GB2181156A (en) * 1985-10-04 1987-04-15 London Scandinavian Metall Grain refining copper-bowed metals
JPS62130248A (ja) 1985-11-29 1987-06-12 Furukawa Electric Co Ltd:The ボンデイング用銅細線
JPH01263289A (ja) 1988-04-13 1989-10-19 Hitachi Cable Ltd 高純度無酸素銅の製造方法
JP3481392B2 (ja) * 1996-06-13 2003-12-22 古河電気工業株式会社 電子部品リード部材及びその製造方法
JP3379412B2 (ja) * 1997-05-30 2003-02-24 松下電器産業株式会社 パラジウムめっき液とこれを用いたパラジウムめっき皮膜及びこのパラジウムめっき皮膜を有する半導体装置用リードフレーム
JP2004064033A (ja) * 2001-10-23 2004-02-26 Sumitomo Electric Wintec Inc ボンディングワイヤー
TW200414453A (en) 2002-03-26 2004-08-01 Sumitomo Electric Wintec Inc Bonding wire and IC device using the bonding wire
KR100514312B1 (ko) * 2003-02-14 2005-09-13 헤라우스오리엔탈하이텍 주식회사 반도체 소자용 본딩 와이어
US20070235887A1 (en) 2003-10-20 2007-10-11 Shingo Kaimori Bonding Wire and Integrated Circuit Device Using the Same
JP2005167020A (ja) 2003-12-03 2005-06-23 Sumitomo Electric Ind Ltd ボンディングワイヤーおよびそれを使用した集積回路デバイス
JP4158928B2 (ja) 2004-09-02 2008-10-01 古河電気工業株式会社 ボンディングワイヤー及びその製造方法
KR101019811B1 (ko) * 2005-01-05 2011-03-04 신닛테츠 마테리알즈 가부시키가이샤 반도체 장치용 본딩 와이어
CN101925992B (zh) * 2009-03-17 2012-08-22 新日铁高新材料株式会社 半导体用接合线
JP5497360B2 (ja) 2009-07-30 2014-05-21 新日鉄住金マテリアルズ株式会社 半導体用ボンディングワイヤー
JP4637256B1 (ja) 2009-09-30 2011-02-23 新日鉄マテリアルズ株式会社 半導体用ボンディングワイヤー
WO2011118009A1 (ja) * 2010-03-25 2011-09-29 田中電子工業株式会社 高純度Cuボンディングワイヤ
TW201205695A (en) * 2010-07-16 2012-02-01 Nippon Steel Materials Co Ltd Bonding wire for semiconductor
JP4919364B2 (ja) 2010-08-11 2012-04-18 田中電子工業株式会社 ボールボンディング用金被覆銅ワイヤ
JP5403702B2 (ja) * 2011-04-11 2014-01-29 タツタ電線株式会社 銅ボンディングワイヤ
JP4958249B2 (ja) 2011-04-26 2012-06-20 田中電子工業株式会社 ボールボンディング用金被覆銅ワイヤ
CN102324392B (zh) * 2011-10-19 2013-03-27 广东佳博电子科技有限公司 一种防氧化的铜基键合丝的制备工艺
JP2013172032A (ja) * 2012-02-21 2013-09-02 Nippon Micrometal Corp ボンディングワイヤの製造方法
CN203192789U (zh) 2013-02-01 2013-09-11 风青实业股份有限公司 半导体用焊线
US8680660B1 (en) * 2013-03-12 2014-03-25 Freescale Semiconductor, Inc. Brace for bond wire

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101689517A (zh) * 2007-07-24 2010-03-31 新日铁高新材料株式会社 半导体装置用接合线和线接合方法
US20090127317A1 (en) * 2007-11-15 2009-05-21 Infineon Technologies Ag Device and method for producing a bonding connection
CN101828255A (zh) * 2007-12-03 2010-09-08 新日铁高新材料株式会社 半导体装置用接合线
CN101802994A (zh) * 2008-01-25 2010-08-11 新日铁高新材料株式会社 半导体装置用接合线
CN102422404A (zh) * 2009-07-30 2012-04-18 新日铁高新材料株式会社 半导体用接合线
CN103339719A (zh) * 2011-12-21 2013-10-02 田中电子工业株式会社 被覆Pd的铜球焊线
CN104060281A (zh) * 2013-03-21 2014-09-24 吕传盛 固相扩散反应铜钯合金线及其制造方法
CN104241237A (zh) * 2013-06-13 2014-12-24 田中电子工业株式会社 超声波键合用镀覆铜丝结构

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116324000A (zh) * 2020-10-20 2023-06-23 日铁新材料股份有限公司 半导体装置用Ag合金接合线
CN116324000B (zh) * 2020-10-20 2025-10-14 日铁新材料股份有限公司 半导体装置用Ag合金接合线

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