CN110764326A - 液晶显示面板及其制备方法 - Google Patents
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- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
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- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133345—Insulating layers
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- G—PHYSICS
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- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136227—Through-hole connection of the pixel electrode to the active element through an insulation layer
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- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
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- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
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- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
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- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
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- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
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- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
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- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
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- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
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- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
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- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
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Abstract
一种液晶显示面板及其制备方法,所述液晶显示面板包括:第一基板,包括有效显示区和非有效显示区;和所述第一基板相对设置的第二基板;薄膜晶体管层,所述薄膜晶体管层包括栅电极层、栅极绝缘层、有源层、以及源漏极层;第一钝化层;彩色光阻层;平坦化层;像素电极层;液晶层;以及设置在所述有效显示区的平坦化层和液晶层之间的第二钝化层,用于阻隔所述平坦化层和所述液晶层。
Description
【技术领域】
本发明涉及显示技术领域,具体涉及液晶显示面板及其制备方法。
【背景技术】
液晶显示面板已广泛使用于各种电子产品中,例如,具显示屏幕的计算机设备和行动电话。液晶显示面板主要包括阵列基板、彩色滤光片基板以及设置于所述阵列基板和所述彩色滤光片基板之间的液晶层。
一种有机高分子膜(polymer film on array,PFA)材料现今被广泛应用于制备液晶显示面板中的平坦化层,该材料具有低介电特性、良好的流平性和透气性等优点,由于PFA材料膜厚较传统氮化硅材料厚,可以有效降低产品的寄生电容。另外,PFA材料的水氧透过性较氮化硅材料更好,有利于在成盒之前将基板中的空气排出,可以减少成盒后的气泡风险。此外,相较于采用传统的氮化硅材料,采用PFA材料的方案,制程较为简化,经曝光即可图案化,不需要干蚀刻和剥膜的程序。
虽然采用PFA材料具有上述优点,然而,由于PFA材料的离子浓度较高,容易扩散到液晶层中,因而引起直流残压(residual direct current),造成影像残留(imagesticking,IS)的问题。
【发明内容】
为解决上述在阵列基板制程中使用的PFA材料,由于其离子浓度较高,容易扩散到液晶层中,因而引起直流残压,造成影像残留的问题,本发明提出一种液晶显示面板,所述液晶显示面板包括:第一基板,包括有效显示区和非有效显示区;第二基板,和所述第一基板相对设置;液晶层,设置在所述第一基板和所述第二基板之间;薄膜晶体管层,设置于所述第一基板之上,所述薄膜晶体管层包括栅电极层、栅极绝缘层、有源层、以及源漏极层;第一钝化层,设置在所述薄膜晶体管层之上;彩色光阻层,设置在所述第一钝化层之上;平坦化层,设置在所述彩色光阻层之上;像素电极层,设置在所述平坦化层之上并且通过过孔与所述源漏极层相接;以及第二钝化层,设置在所述平坦化层和所述液晶层之间,用于阻隔所述平坦化层和所述液晶层。
较佳地,所述第二钝化层设置在所述有效显示区的所述平坦化层和所述液晶层之间。
较佳地,所述平坦化层由有机高分子材料所组成。
较佳地,还包括遮光层设置在所述第二基板之上。
较佳地,还包括共同电极层设置在所述第二基板和所述遮光层之上。
较佳地,所述彩色光阻层包括红色子像素单元、绿色子像素单元以及蓝色子像素单元。
较佳地,所述第一钝化层由硅氧化物或硅氮化物所组成。
较佳地,所述第二钝化层由硅氧化物或硅氮化物所组成。
本发明另外提出一种制备液晶显示面板的方法,包括:提供第一基板,所述第一基板包括有效显示区和非有效显示区;在所述第一基板上制备薄膜晶体管层、第一钝化层、彩色光阻层、平坦化层、以及像素电极层;提供一遮罩,所述遮罩包括对应于所述有效显示区的开口区和对应于所述非有效显示区的遮蔽区;利用所述遮罩在所述第一基板的有效显示区上制备第二钝化层,所述第二钝化层较佳由硅氧化物或硅氮化物所组成;在所述第一基板上制备液晶层;提供第二基板;在所述第二基板上制备遮光层和共同电极层;以及贴合所述第一基板和所述第二基板。
【附图说明】
图1为本案实施例的液晶显示面板的侧视截面示意图;
图2为本案实施例的制备液晶显示面板的流程图;
图3为本案实施例的第一基板的俯视示意图;以及
图4为本案实施例的用于制备第一基板的第二钝化层的遮罩示意图。
【具体实施方式】
以下实施例的说明是参考附加的图示,用以例示本发明可用以实施的特定实施例。本发明所提到的方向用语,例如[上]、[下]、[前]、[后]、[左]、[右]、[内]、[外]、[侧面]等,仅是参考附加图式的方向。因此,使用的方向用语是用以说明及理解本发明,而非用以限制本发明。
以下将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述。显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域技术人员在没有作出创造性劳动前提下所获得的所有其他实施例,都属于本申请保护的范围。
如图1所示,为本案实施例的液晶显示面板10的结构示意图,包括:
第一基板100;第二基板200,和所述第一基板100相对设置,所述第一基板100和所述第二基板200较佳为玻璃基板;液晶层300,设置在所述第一基板100和所述第二基板200之间;薄膜晶体管层,设置于所述第一基板100之上,所述薄膜晶体管层包括栅电极层101、栅极绝缘层102、有源层103、以及源漏极层104;第一钝化层105,设置在所述薄膜晶体管层之上;彩色光阻层106,所述彩色光阻层106包括红色子像素单元、绿色子像素单元以及蓝色子像素单元,设置在所述第一钝化层105之上;平坦化层107,设置在所述彩色光阻层106之上;像素电极层108,所述像素电极层108由氧化铟锡所组成,设置在所述平坦化层107之上并通过过孔110与所述源漏极层104相接;以及第二钝化层109,设置在所述平坦化层107和所述液晶层300之间,用于阻隔所述平坦化层107和所述液晶层300。
本案实施例的液晶显示面板10还包括遮光层201设置在所述第二基板200和所述液晶层300之间。
本案实施例的液晶显示面板10还包括由氧化铟锡所组成的共同电极层202设置在所述第二基板200和所述液晶层300之间。
如图2所示,为本案实施例的制备液晶显示面板的流程图,包括:
S 1,提供第一基板100,较佳为一玻璃基板,所述第一基板100,如图3所示,包括有效显示区1001和非有效显示区1002;
S2,接着,开始在所述第一基板100上进行阵列(Array)制程;
清洗第一基板100后在第一基板100上进行薄膜沉积、光阻涂布、曝光、显影、蚀刻、剥膜等流程,重复数次上述步骤以完成薄膜晶体管层的制备;
接着,继续在薄膜晶体管层上沉积二氧化硅(SiO2)以完成第一钝化层的制备;
在完成第一钝化层的制备之后,以喷墨印刷的方式制备包括红色色阻单元、绿色色阻单元、和蓝色色阻单元的彩色光阻层;
接着,在彩色光阻层上,经由涂布有机高分子溶液及烘烤等流程制备平坦化层;
然后,再以薄膜沉积、光阻涂布、曝光、显影、蚀刻以及剥膜等流程制备像素电极层;
S3,接着,提供一如图4所示的遮罩300,所述遮罩300包括对应于所述第一基板100的有效显示区1001的开口区3001和对应于所述第一基板100的非有效显示区1002的遮蔽区3002;
S4,利用所述遮罩300在所述第一基板100的有效显示区1001上以沉积二氧化硅或硅氮化物的方式制备第二钝化层;
S5,接着,在所述第一基板100上进行配向膜印刷、配向膜配向、密封胶涂布以及注入液晶等流程,以完成液晶层的制备;
S6,提供第二基板200,较佳为一玻璃基板,在所述第二基板200上进行彩色滤光片制程;
S7,在所述第二基板200上以涂布遮光胶黏剂、曝光、显影等方式制备遮光层;然后,再通过薄膜沉积、光阻涂布、曝光、显影、蚀刻、剥膜等流程完成共同电极层的制备;以及
S8,最后,贴合所述第一基板100和所述第二基板200以完成本案实施例的液晶显示面板10的制备。
本案实施例的液晶显示面板,在平坦化层和液晶层之间沉积一层由二氧化硅(SiO2)或硅氮化物(SiNx)组成的第二钝化层薄膜,可以防止由有机高分子材料所组成的平坦化层中的离子扩散到液晶层中,因此,可以避免引起直流残压,造成影像残留的问题。
此外,相较于在像素电极层制备完成前制备第二钝化层,还需再开一道遮罩及进行曝光、干蚀刻、以及光阻剥离等流程以实现像素电极层与薄膜晶体管层的搭接,本案实施例在像素电极层制备完成后,再制备第二钝化层,既可以实现像素电极层与薄膜晶体管层的搭接,也可省去一道遮罩的成本并降低工时。
由于在第一基板的外围有一些金属焊垫(pad)需要和第二基板电连接以进行信号传输,若是在像素电极层图案化后再沉积第二钝化层,会造成外围完全绝缘,无法与第二基板进行信号传输。因此,为了实现外围信号的传输,本案实施例在沉积第二钝化层时采用特制的遮罩进行遮挡,实现第一基板的有效显示区被第二钝化层薄膜覆盖,外围(即非有效显示区)不被第二钝化层薄膜覆盖,这样既可以防止离子扩散到液晶层中,也可以确保外围金属焊垫与第二基板的信号传输。
综上所述,虽然本发明已以优选实施例揭露如上,但上述优选实施例并非用以限制本申请,本领域的普通技术人员,在不脱离本申请的精神和范围内,均可作各种更动与润饰,因此本申请的保护范围以权利要求界定的范围为准。
Claims (10)
1.一种液晶显示面板,其特征在于,包括:
第一基板,包括有效显示区和非有效显示区;
第二基板,和所述第一基板相对设置;
液晶层,设置在所述第一基板和所述第二基板之间;
薄膜晶体管层,设置于所述第一基板之上,所述薄膜晶体管层包括栅电极层、栅极绝缘层、有源层、以及源漏极层;
第一钝化层,设置在所述薄膜晶体管层之上;
彩色光阻层,设置在所述第一钝化层之上;
平坦化层,设置在所述彩色光阻层之上;
像素电极层,设置在所述平坦化层之上并且通过过孔与所述源漏极层相接;以及
第二钝化层,设置在所述平坦化层和所述液晶层之间,用于阻隔所述平坦化层和所述液晶层。
2.如权利要求1所述的液晶显示面板,其特征在于,所述第二钝化层设置在所述有效显示区的所述平坦化层和所述液晶层之间。
3.如权利要求1所述的液晶显示面板,其特征在于,所述平坦化层由有机高分子材料所组成。
4.如权利要求1所述的液晶显示面板,其特征在于,还包括遮光层设置在所述第二基板之上。
5.如权利要求1所述的液晶显示面板,其特征在于,还包括共同电极层设置在所述第二基板和所述遮光层之上。
6.如权利要求1所述的液晶显示面板,其特征在于,所述彩色光阻层包括红色子像素单元、绿色子像素单元以及蓝色子像素单元。
7.如权利要求1所述的液晶显示面板,其特征在于,所述第一钝化层由硅氧化物或硅氮化物所组成。
8.如权利要求1所述的液晶显示面板,其特征在于,所述第二钝化层由硅氧化物或硅氮化物所组成。
9.一种制备液晶显示面板的方法,其特征在于,包括:
提供第一基板,所述第一基板包括有效显示区和非有效显示区;
在所述第一基板上制备薄膜晶体管层、第一钝化层、彩色光阻层、平坦化层、以及像素电极层;
提供一遮罩,所述遮罩包括对应于所述有效显示区的开口区和对应于所述非有效显示区的遮蔽区;
利用所述遮罩在所述第一基板的有效显示区上制备第二钝化层;
在所述第一基板上制备液晶层;
提供第二基板;
在所述第二基板上制备遮光层和共同电极层;以及
贴合所述第一基板和所述第二基板,
其中所述第二钝化层设置在所述平坦化层和所述液晶层之间,用于阻隔所述平坦化层和所述液晶层。
10.如权利要求9所述的方法,其特征在于,所述第二钝化层由硅氧化物或硅氮化物所组成。
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