CN110656309B - 蒸发源及蒸镀装置 - Google Patents
蒸发源及蒸镀装置 Download PDFInfo
- Publication number
- CN110656309B CN110656309B CN201811362786.6A CN201811362786A CN110656309B CN 110656309 B CN110656309 B CN 110656309B CN 201811362786 A CN201811362786 A CN 201811362786A CN 110656309 B CN110656309 B CN 110656309B
- Authority
- CN
- China
- Prior art keywords
- reflector
- crucible
- heater
- evaporation source
- source according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000001704 evaporation Methods 0.000 title claims abstract description 49
- 230000008020 evaporation Effects 0.000 title claims abstract description 48
- 238000010438 heat treatment Methods 0.000 claims abstract description 36
- 239000000463 material Substances 0.000 claims description 23
- 238000004381 surface treatment Methods 0.000 claims description 19
- 238000009792 diffusion process Methods 0.000 claims description 13
- 239000000758 substrate Substances 0.000 claims description 11
- 238000004544 sputter deposition Methods 0.000 claims description 7
- 239000000126 substance Substances 0.000 claims description 6
- 238000007747 plating Methods 0.000 claims description 5
- 238000005480 shot peening Methods 0.000 claims description 4
- 238000004891 communication Methods 0.000 claims description 2
- 230000000149 penetrating effect Effects 0.000 claims description 2
- 238000007740 vapor deposition Methods 0.000 abstract description 13
- 238000000265 homogenisation Methods 0.000 abstract 1
- 230000005855 radiation Effects 0.000 description 16
- 238000010586 diagram Methods 0.000 description 9
- 230000000694 effects Effects 0.000 description 6
- 230000007423 decrease Effects 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Control Of Resistance Heating (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018123555A JP7092577B2 (ja) | 2018-06-28 | 2018-06-28 | 蒸発源及び蒸着装置 |
| JP2018-123555 | 2018-06-28 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN110656309A CN110656309A (zh) | 2020-01-07 |
| CN110656309B true CN110656309B (zh) | 2024-03-15 |
Family
ID=69028562
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811362786.6A Active CN110656309B (zh) | 2018-06-28 | 2018-11-16 | 蒸发源及蒸镀装置 |
Country Status (3)
| Country | Link |
|---|---|
| JP (2) | JP7092577B2 (ko) |
| KR (2) | KR20200001956A (ko) |
| CN (1) | CN110656309B (ko) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7092577B2 (ja) * | 2018-06-28 | 2022-06-28 | キヤノントッキ株式会社 | 蒸発源及び蒸着装置 |
| JP2021111870A (ja) | 2020-01-09 | 2021-08-02 | キヤノン株式会社 | 通信装置、制御方法、及びプログラム |
| JP7394242B1 (ja) | 2023-01-13 | 2023-12-07 | 日本碍子株式会社 | 乾燥装置 |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5943871A (ja) * | 1982-09-04 | 1984-03-12 | Konishiroku Photo Ind Co Ltd | 蒸発材料収容器 |
| JPS6467518A (en) * | 1987-09-07 | 1989-03-14 | Matsushita Electric Ind Co Ltd | Catalytic combustion equipment |
| JP2009093933A (ja) * | 2007-10-10 | 2009-04-30 | Negishi Seisakusho:Kk | 赤外線ヒーター装置およびこれを備える加熱装置 |
| JP2011162867A (ja) * | 2010-02-15 | 2011-08-25 | Mitsubishi Heavy Ind Ltd | 真空蒸発装置 |
| TW201416467A (zh) * | 2012-10-22 | 2014-05-01 | Samsung Display Co Ltd | 線型蒸發源及包含其之真空沉積設備 |
| JP2015067850A (ja) * | 2013-09-27 | 2015-04-13 | 株式会社日立ハイテクファインシステムズ | 真空蒸着装置 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0626926A (ja) * | 1992-05-12 | 1994-02-04 | Fujitsu Ltd | 赤外線検知器 |
| JPH06108236A (ja) * | 1992-09-25 | 1994-04-19 | Mitsubishi Electric Corp | 薄膜形成装置 |
| JP4908234B2 (ja) | 2005-01-17 | 2012-04-04 | 株式会社ユーテック | 蒸発源及び蒸着装置 |
| JP2006274336A (ja) | 2005-03-29 | 2006-10-12 | Jfe Steel Kk | 直火式の連続加熱炉による鋼板の加熱方法 |
| JP2012234909A (ja) | 2011-04-28 | 2012-11-29 | Nissan Motor Co Ltd | ヒートシンク、ヒートシンクの製造方法及び灯具 |
| JP3203978U (ja) | 2016-02-18 | 2016-04-28 | 根岸 敏夫 | 有機材料蒸発源 |
| KR20160094347A (ko) * | 2016-03-30 | 2016-08-09 | 한국표준과학연구원 | 유도 가열 선형 증발 증착 장치 |
| JP7092577B2 (ja) * | 2018-06-28 | 2022-06-28 | キヤノントッキ株式会社 | 蒸発源及び蒸着装置 |
-
2018
- 2018-06-28 JP JP2018123555A patent/JP7092577B2/ja active Active
- 2018-10-19 KR KR1020180125582A patent/KR20200001956A/ko not_active IP Right Cessation
- 2018-11-16 CN CN201811362786.6A patent/CN110656309B/zh active Active
-
2022
- 2022-06-16 JP JP2022097249A patent/JP2022113863A/ja active Pending
-
2024
- 2024-03-06 KR KR1020240032014A patent/KR102661888B1/ko active IP Right Grant
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5943871A (ja) * | 1982-09-04 | 1984-03-12 | Konishiroku Photo Ind Co Ltd | 蒸発材料収容器 |
| JPS6467518A (en) * | 1987-09-07 | 1989-03-14 | Matsushita Electric Ind Co Ltd | Catalytic combustion equipment |
| JP2009093933A (ja) * | 2007-10-10 | 2009-04-30 | Negishi Seisakusho:Kk | 赤外線ヒーター装置およびこれを備える加熱装置 |
| JP2011162867A (ja) * | 2010-02-15 | 2011-08-25 | Mitsubishi Heavy Ind Ltd | 真空蒸発装置 |
| TW201416467A (zh) * | 2012-10-22 | 2014-05-01 | Samsung Display Co Ltd | 線型蒸發源及包含其之真空沉積設備 |
| JP2015067850A (ja) * | 2013-09-27 | 2015-04-13 | 株式会社日立ハイテクファインシステムズ | 真空蒸着装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2020002436A (ja) | 2020-01-09 |
| JP7092577B2 (ja) | 2022-06-28 |
| KR20200001956A (ko) | 2020-01-07 |
| KR20240035975A (ko) | 2024-03-19 |
| CN110656309A (zh) | 2020-01-07 |
| JP2022113863A (ja) | 2022-08-04 |
| KR102661888B1 (ko) | 2024-04-26 |
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| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |