CN110121538B - 可固化的高折射率墨组合物和由墨组合物制备的制品 - Google Patents

可固化的高折射率墨组合物和由墨组合物制备的制品 Download PDF

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CN110121538B
CN110121538B CN201780081859.1A CN201780081859A CN110121538B CN 110121538 B CN110121538 B CN 110121538B CN 201780081859 A CN201780081859 A CN 201780081859A CN 110121538 B CN110121538 B CN 110121538B
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ink composition
group
meth
aromatic
acrylate
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CN110121538A (zh
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埃文·L·施瓦茨
克拉里·哈特曼-汤普森
布赖恩·V·亨特
布雷特·J·西特尔
凯利·A·福尔普
萨斯瓦塔·查克拉博蒂
韦恩·S·马奥尼
塔比瑟·A·西利曼
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3M Innovative Properties Co
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/30—Inkjet printing inks
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/14—Methyl esters, e.g. methyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/38—Esters containing sulfur
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/26—Esters of unsaturated alcohols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C08L33/08—Homopolymers or copolymers of acrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C08L33/10—Homopolymers or copolymers of methacrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/84—Passivation; Containers; Encapsulations
    • H10K50/844—Encapsulations
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/38—Esters containing sulfur
    • C08F220/382—Esters containing sulfur and containing oxygen, e.g. 2-sulfoethyl (meth)acrylate
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301—Details of OLEDs
    • H10K2102/351—Thickness
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301—Details of OLEDs
    • H10K2102/361—Temperature

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Ink Jet Recording Methods And Recording Media Thereof (AREA)
  • Electroluminescent Light Sources (AREA)
  • Laminated Bodies (AREA)
CN201780081859.1A 2016-12-29 2017-12-27 可固化的高折射率墨组合物和由墨组合物制备的制品 Active CN110121538B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201662439973P 2016-12-29 2016-12-29
US62/439,973 2016-12-29
PCT/IB2017/058440 WO2018122748A1 (en) 2016-12-29 2017-12-27 Curable high refractive index ink compositions and articles prepared from the ink compositions

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CN110121538A CN110121538A (zh) 2019-08-13
CN110121538B true CN110121538B (zh) 2023-05-26

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US (1) US11584863B2 (enExample)
EP (1) EP3562895B1 (enExample)
JP (1) JP7203028B2 (enExample)
KR (1) KR102533500B1 (enExample)
CN (1) CN110121538B (enExample)
WO (1) WO2018122748A1 (enExample)

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CN112424245B (zh) 2018-07-12 2024-09-17 3M创新有限公司 包含苯乙烯-异丁烯嵌段共聚物和烯键式不饱和单体的组合物
US20200339828A1 (en) * 2019-04-26 2020-10-29 Canon Kabushiki Kaisha Photocurable composition
US12492275B2 (en) 2019-09-12 2025-12-09 Arkema France Photo-curable compositions containing high refractive index monomers for use in 3D printing applications
US12286396B2 (en) 2019-09-30 2025-04-29 3M Innovative Properties Company Dicarboxylic acid compounds, inorganic particles treated with the dicarboxylic acid compounds, and compositions thereof
KR102284512B1 (ko) * 2019-11-25 2021-08-02 주식회사 케이씨텍 수분량이 제어된 무기 산화물 분산액 및 이의 제조방법
CN114761497B (zh) * 2019-11-28 2024-02-20 东京应化工业株式会社 感光性油墨组合物、固化物、显示面板、及固化物的制造方法
WO2021260601A1 (en) 2020-06-25 2021-12-30 3M Innovative Properties Company Curable high refractive index ink compositions and articles prepared from the ink compositions
CN112322195B (zh) * 2020-11-03 2023-05-16 西安思摩威新材料有限公司 一种紫外光固化组合物胶水及其使用方法和应用
CN117016043A (zh) * 2021-03-26 2023-11-07 松下知识产权经营株式会社 光固化性树脂组合物、光学部件、光学部件的制造方法和发光装置
US20230061791A1 (en) * 2021-08-16 2023-03-02 Vadient Optics Llc Grin lenses made by 3d printing monomer-based inks
CN113999565B (zh) * 2021-12-10 2023-10-20 西安思摩威新材料有限公司 一种紫外光可固化的高折射率油墨及材料层
WO2023153385A1 (ja) 2022-02-08 2023-08-17 三井化学株式会社 紫外線硬化性樹脂組成物及び表示装置
US20250215128A1 (en) 2022-04-01 2025-07-03 3M Innovative Properties Company Curable compositions with adhesion promotion agents
KR20250006134A (ko) * 2022-04-29 2025-01-10 쓰리엠 이노베이티브 프로퍼티즈 컴파니 물-격리제를 갖는 경화성 고굴절률 잉크 조성물
CN119604544A (zh) 2022-07-26 2025-03-11 电化株式会社 光固化性组合物、光固化性组合物的固化物和发光显示装置
CN115216178B (zh) * 2022-08-11 2023-11-28 西安思摩威新材料有限公司 一种oled封装用的油墨组合物及其制备方法
US20240117095A1 (en) * 2022-09-21 2024-04-11 Vadient Optics, Llc Grin lenses made by 3d printing monomer-based inks
WO2024262757A1 (ko) * 2023-06-19 2024-12-26 삼성에스디아이 주식회사 경화성 조성물, 상기 조성물을 이용하여 제조된 경화막, 상기 경화막을 포함하는 디스플레이 장치
JP2025022338A (ja) * 2023-08-03 2025-02-14 エア・ウォーター・パフォーマンスケミカル株式会社 新規なヘテロ環を有する単量体
WO2025037176A1 (en) 2023-08-11 2025-02-20 3M Innovative Properties Company Unsaturated trithiocyanurate derivatives for curable high refractive index compositions, articles thereof, and methods of making such articles
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Publication number Publication date
EP3562895B1 (en) 2021-08-18
CN110121538A (zh) 2019-08-13
EP3562895A1 (en) 2019-11-06
JP7203028B2 (ja) 2023-01-12
KR20190098234A (ko) 2019-08-21
US11584863B2 (en) 2023-02-21
JP2020506251A (ja) 2020-02-27
KR102533500B1 (ko) 2023-05-16
US20190352520A1 (en) 2019-11-21
WO2018122748A1 (en) 2018-07-05

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