KR102533500B1 - 경화성 고굴절률 잉크 조성물 및 잉크 조성물로부터 제조된 물품 - Google Patents
경화성 고굴절률 잉크 조성물 및 잉크 조성물로부터 제조된 물품 Download PDFInfo
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- KR102533500B1 KR102533500B1 KR1020197021734A KR20197021734A KR102533500B1 KR 102533500 B1 KR102533500 B1 KR 102533500B1 KR 1020197021734 A KR1020197021734 A KR 1020197021734A KR 20197021734 A KR20197021734 A KR 20197021734A KR 102533500 B1 KR102533500 B1 KR 102533500B1
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- acrylate
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/30—Inkjet printing inks
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/10—Printing inks based on artificial resins
- C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/14—Methyl esters, e.g. methyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/38—Esters containing sulfur
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/10—Esters
- C08F222/26—Esters of unsaturated alcohols
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/04—Homopolymers or copolymers of esters
- C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
- C08L33/08—Homopolymers or copolymers of acrylic acid esters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/04—Homopolymers or copolymers of esters
- C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
- C08L33/10—Homopolymers or copolymers of methacrylic acid esters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/844—Encapsulations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/38—Esters containing sulfur
- C08F220/382—Esters containing sulfur and containing oxygen, e.g. 2-sulfoethyl (meth)acrylate
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2102/00—Constructional details relating to the organic devices covered by this subclass
- H10K2102/301—Details of OLEDs
- H10K2102/351—Thickness
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2102/00—Constructional details relating to the organic devices covered by this subclass
- H10K2102/301—Details of OLEDs
- H10K2102/361—Temperature
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Polymers & Plastics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Ink Jet Recording Methods And Recording Media Thereof (AREA)
- Electroluminescent Light Sources (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201662439973P | 2016-12-29 | 2016-12-29 | |
| US62/439,973 | 2016-12-29 | ||
| PCT/IB2017/058440 WO2018122748A1 (en) | 2016-12-29 | 2017-12-27 | Curable high refractive index ink compositions and articles prepared from the ink compositions |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20190098234A KR20190098234A (ko) | 2019-08-21 |
| KR102533500B1 true KR102533500B1 (ko) | 2023-05-16 |
Family
ID=61028099
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020197021734A Active KR102533500B1 (ko) | 2016-12-29 | 2017-12-27 | 경화성 고굴절률 잉크 조성물 및 잉크 조성물로부터 제조된 물품 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US11584863B2 (enExample) |
| EP (1) | EP3562895B1 (enExample) |
| JP (1) | JP7203028B2 (enExample) |
| KR (1) | KR102533500B1 (enExample) |
| CN (1) | CN110121538B (enExample) |
| WO (1) | WO2018122748A1 (enExample) |
Families Citing this family (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110945090A (zh) | 2017-07-26 | 2020-03-31 | 3M创新有限公司 | 可固化的高折射率油墨组合物和由油墨组合物制备的制品 |
| KR102823243B1 (ko) | 2018-05-15 | 2025-06-19 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 경화성 고굴절률 조성물 및 이로부터 제조된 물품 |
| CN112424245B (zh) | 2018-07-12 | 2024-09-17 | 3M创新有限公司 | 包含苯乙烯-异丁烯嵌段共聚物和烯键式不饱和单体的组合物 |
| US20200339828A1 (en) * | 2019-04-26 | 2020-10-29 | Canon Kabushiki Kaisha | Photocurable composition |
| US12492275B2 (en) | 2019-09-12 | 2025-12-09 | Arkema France | Photo-curable compositions containing high refractive index monomers for use in 3D printing applications |
| US12286396B2 (en) | 2019-09-30 | 2025-04-29 | 3M Innovative Properties Company | Dicarboxylic acid compounds, inorganic particles treated with the dicarboxylic acid compounds, and compositions thereof |
| KR102284512B1 (ko) * | 2019-11-25 | 2021-08-02 | 주식회사 케이씨텍 | 수분량이 제어된 무기 산화물 분산액 및 이의 제조방법 |
| CN114761497B (zh) * | 2019-11-28 | 2024-02-20 | 东京应化工业株式会社 | 感光性油墨组合物、固化物、显示面板、及固化物的制造方法 |
| WO2021260601A1 (en) | 2020-06-25 | 2021-12-30 | 3M Innovative Properties Company | Curable high refractive index ink compositions and articles prepared from the ink compositions |
| CN112322195B (zh) * | 2020-11-03 | 2023-05-16 | 西安思摩威新材料有限公司 | 一种紫外光固化组合物胶水及其使用方法和应用 |
| CN117016043A (zh) * | 2021-03-26 | 2023-11-07 | 松下知识产权经营株式会社 | 光固化性树脂组合物、光学部件、光学部件的制造方法和发光装置 |
| US20230061791A1 (en) * | 2021-08-16 | 2023-03-02 | Vadient Optics Llc | Grin lenses made by 3d printing monomer-based inks |
| CN113999565B (zh) * | 2021-12-10 | 2023-10-20 | 西安思摩威新材料有限公司 | 一种紫外光可固化的高折射率油墨及材料层 |
| WO2023153385A1 (ja) | 2022-02-08 | 2023-08-17 | 三井化学株式会社 | 紫外線硬化性樹脂組成物及び表示装置 |
| US20250215128A1 (en) | 2022-04-01 | 2025-07-03 | 3M Innovative Properties Company | Curable compositions with adhesion promotion agents |
| KR20250006134A (ko) * | 2022-04-29 | 2025-01-10 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 물-격리제를 갖는 경화성 고굴절률 잉크 조성물 |
| CN119604544A (zh) | 2022-07-26 | 2025-03-11 | 电化株式会社 | 光固化性组合物、光固化性组合物的固化物和发光显示装置 |
| CN115216178B (zh) * | 2022-08-11 | 2023-11-28 | 西安思摩威新材料有限公司 | 一种oled封装用的油墨组合物及其制备方法 |
| US20240117095A1 (en) * | 2022-09-21 | 2024-04-11 | Vadient Optics, Llc | Grin lenses made by 3d printing monomer-based inks |
| WO2024262757A1 (ko) * | 2023-06-19 | 2024-12-26 | 삼성에스디아이 주식회사 | 경화성 조성물, 상기 조성물을 이용하여 제조된 경화막, 상기 경화막을 포함하는 디스플레이 장치 |
| JP2025022338A (ja) * | 2023-08-03 | 2025-02-14 | エア・ウォーター・パフォーマンスケミカル株式会社 | 新規なヘテロ環を有する単量体 |
| WO2025037176A1 (en) | 2023-08-11 | 2025-02-20 | 3M Innovative Properties Company | Unsaturated trithiocyanurate derivatives for curable high refractive index compositions, articles thereof, and methods of making such articles |
| WO2025054893A1 (en) | 2023-09-14 | 2025-03-20 | Dow Global Technologies Llc | Inkjet printable ultraviolet light curable composition |
| CN117603108B (zh) * | 2023-10-23 | 2024-06-04 | 江苏集萃光敏电子材料研究所有限公司 | 一种高折射可固化单体 |
| WO2025099511A1 (en) | 2023-11-08 | 2025-05-15 | 3M Innovative Properties Company | Hyperbranched polythioethers, curable high refractive index compositions and articles thereof and methods of making such compounds and articles |
| CN118126565A (zh) * | 2024-02-28 | 2024-06-04 | 浙江福斯特新材料研究院有限公司 | 一种油墨组合物、油墨组合物的制备方法及固化层 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013185040A (ja) * | 2012-03-07 | 2013-09-19 | Jnc Corp | 光硬化性インクジェットインク |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| AU550635B2 (en) | 1982-11-11 | 1986-03-27 | Showa Denko Kabushiki Kaisha | Polymerizable (meth) acryloyloxyy aromatic ethers |
| JP2004333687A (ja) * | 2003-05-02 | 2004-11-25 | Fuji Photo Film Co Ltd | 光学部材、光学部材用重合性組成物および光学部材の製造方法 |
| US20060293463A1 (en) * | 2005-06-28 | 2006-12-28 | General Electric Company | Compositions for brightness enhancing films |
| US20080221291A1 (en) | 2007-03-07 | 2008-09-11 | 3M Innovative Properties Company | Microstructured optical films comprising biphenyl difunctional monomers |
| JP2009074024A (ja) * | 2007-08-30 | 2009-04-09 | Nikon-Essilor Co Ltd | 光学材料用組成物、光学材料、眼鏡レンズ用基材および眼鏡レンズ |
| JP2009084313A (ja) * | 2007-09-27 | 2009-04-23 | Fujifilm Corp | インク組成物、インクジェット記録方法、及び、印刷物 |
| JP2011170073A (ja) * | 2010-02-18 | 2011-09-01 | Jsr Corp | 硬化性組成物及び光学部材 |
| KR101254325B1 (ko) * | 2010-10-20 | 2013-04-12 | 주식회사 한농화성 | 페닐티오기를 함유하는 아크릴레이트 화합물 및 그의 제조방법 |
| SG194729A1 (en) * | 2011-05-13 | 2013-12-30 | 3M Innovative Properties Co | Benzyl (meth)acrylate monomers suitable for microstructured optical films |
| US9150680B2 (en) * | 2012-03-12 | 2015-10-06 | Dic Corporation | Radically polymerizable composition, cured product thereof, and plastic lens |
| JP5996894B2 (ja) | 2012-03-13 | 2016-09-21 | 株式会社タムラ製作所 | 絶縁膜形成用透明樹脂組成物 |
| JP2016513146A (ja) * | 2013-02-06 | 2016-05-12 | サン・ケミカル・コーポレーション | デジタル印刷インク |
| TWI601720B (zh) | 2013-03-14 | 2017-10-11 | 三菱瓦斯化學股份有限公司 | Novel episulfide and optical material compositions |
| KR102044923B1 (ko) | 2013-04-15 | 2019-11-15 | 삼성디스플레이 주식회사 | 유기발광 표시장치 및 그의 제조방법 |
| US20150349295A1 (en) | 2014-05-30 | 2015-12-03 | Samsung Sdi Co., Ltd. | Gas permeation multilayer barrier with tunable index decoupling layers |
| EP2960306B1 (en) * | 2014-06-26 | 2020-12-23 | Agfa Nv | Aqueous radiation curable inkjet inks |
| KR20170036701A (ko) | 2014-07-25 | 2017-04-03 | 카티바, 인크. | 유기 박막 잉크 조성물 및 방법 |
| CN105254588B (zh) * | 2015-11-10 | 2017-10-24 | 中国乐凯集团有限公司 | 一种高折射率化合物及其应用 |
| JPWO2018105177A1 (ja) | 2016-12-06 | 2019-10-24 | Jnc株式会社 | インク組成物およびこれを用いた有機電界発光素子 |
| KR102823243B1 (ko) * | 2018-05-15 | 2025-06-19 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 경화성 고굴절률 조성물 및 이로부터 제조된 물품 |
-
2017
- 2017-12-27 KR KR1020197021734A patent/KR102533500B1/ko active Active
- 2017-12-27 EP EP17835711.7A patent/EP3562895B1/en active Active
- 2017-12-27 JP JP2019535937A patent/JP7203028B2/ja active Active
- 2017-12-27 US US16/473,841 patent/US11584863B2/en active Active
- 2017-12-27 WO PCT/IB2017/058440 patent/WO2018122748A1/en not_active Ceased
- 2017-12-27 CN CN201780081859.1A patent/CN110121538B/zh active Active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013185040A (ja) * | 2012-03-07 | 2013-09-19 | Jnc Corp | 光硬化性インクジェットインク |
Also Published As
| Publication number | Publication date |
|---|---|
| EP3562895B1 (en) | 2021-08-18 |
| CN110121538B (zh) | 2023-05-26 |
| CN110121538A (zh) | 2019-08-13 |
| EP3562895A1 (en) | 2019-11-06 |
| JP7203028B2 (ja) | 2023-01-12 |
| KR20190098234A (ko) | 2019-08-21 |
| US11584863B2 (en) | 2023-02-21 |
| JP2020506251A (ja) | 2020-02-27 |
| US20190352520A1 (en) | 2019-11-21 |
| WO2018122748A1 (en) | 2018-07-05 |
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