JP7203028B2 - 硬化性高屈折率インク組成物及びインク組成物から調製された物品 - Google Patents

硬化性高屈折率インク組成物及びインク組成物から調製された物品 Download PDF

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JP7203028B2
JP7203028B2 JP2019535937A JP2019535937A JP7203028B2 JP 7203028 B2 JP7203028 B2 JP 7203028B2 JP 2019535937 A JP2019535937 A JP 2019535937A JP 2019535937 A JP2019535937 A JP 2019535937A JP 7203028 B2 JP7203028 B2 JP 7203028B2
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group
ink composition
meth
acrylate
aromatic
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JP2020506251A5 (enExample
JP2020506251A (ja
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エル． シュワルツ，エヴァン
ハートマン－トムソン，クレア
ブイ． ハント，ブライアン
ジェイ． シッター，ブレット
エー． ヴォルプ，ケリー
チャクラボーティ，サスワタ
エス． マホニー，ウェイン
エー． シリマン，タビサ
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3M Innovative Properties Co
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3M Innovative Properties Co
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/14—Methyl esters, e.g. methyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/38—Esters containing sulfur
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/26—Esters of unsaturated alcohols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C08L33/08—Homopolymers or copolymers of acrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C08L33/10—Homopolymers or copolymers of methacrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/30—Inkjet printing inks
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/84—Passivation; Containers; Encapsulations
    • H10K50/844—Encapsulations
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/38—Esters containing sulfur
    • C08F220/382—Esters containing sulfur and containing oxygen, e.g. 2-sulfoethyl (meth)acrylate
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301—Details of OLEDs
    • H10K2102/351—Thickness
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301—Details of OLEDs
    • H10K2102/361—Temperature

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Ink Jet Recording Methods And Recording Media Thereof (AREA)
  • Electroluminescent Light Sources (AREA)
  • Laminated Bodies (AREA)
JP2019535937A 2016-12-29 2017-12-27 硬化性高屈折率インク組成物及びインク組成物から調製された物品 Active JP7203028B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201662439973P 2016-12-29 2016-12-29
US62/439,973 2016-12-29
PCT/IB2017/058440 WO2018122748A1 (en) 2016-12-29 2017-12-27 Curable high refractive index ink compositions and articles prepared from the ink compositions

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JP2020506251A JP2020506251A (ja) 2020-02-27
JP2020506251A5 JP2020506251A5 (enExample) 2021-03-04
JP7203028B2 true JP7203028B2 (ja) 2023-01-12

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US (1) US11584863B2 (enExample)
EP (1) EP3562895B1 (enExample)
JP (1) JP7203028B2 (enExample)
KR (1) KR102533500B1 (enExample)
CN (1) CN110121538B (enExample)
WO (1) WO2018122748A1 (enExample)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11667803B2 (en) 2017-07-26 2023-06-06 3M Innovative Properties Company Curable high refractive index ink compositions and articles prepared from the ink compositions
KR102823243B1 (ko) 2018-05-15 2025-06-19 쓰리엠 이노베이티브 프로퍼티즈 컴파니 경화성 고굴절률 조성물 및 이로부터 제조된 물품
WO2020012329A2 (en) 2018-07-12 2020-01-16 3M Innovative Properties Company Composition comprising styrene isobutylene block copolymer and ethylenically unsaturated monomer
US20200339828A1 (en) * 2019-04-26 2020-10-29 Canon Kabushiki Kaisha Photocurable composition
JP2022548052A (ja) 2019-09-12 2022-11-16 アルケマ フランス ３ｄプリンティング用途における使用のための高屈折率モノマーを含有する光硬化性組成物
US12286396B2 (en) 2019-09-30 2025-04-29 3M Innovative Properties Company Dicarboxylic acid compounds, inorganic particles treated with the dicarboxylic acid compounds, and compositions thereof
KR102284512B1 (ko) * 2019-11-25 2021-08-02 주식회사 케이씨텍 수분량이 제어된 무기 산화물 분산액 및 이의 제조방법
US12422749B2 (en) * 2019-11-28 2025-09-23 Tokyo Ohka Kogyo Co., Ltd. Photosensitive ink composition, cured product, display panel, and method for producing cured product
WO2021260601A1 (en) 2020-06-25 2021-12-30 3M Innovative Properties Company Curable high refractive index ink compositions and articles prepared from the ink compositions
CN112322195B (zh) * 2020-11-03 2023-05-16 西安思摩威新材料有限公司 一种紫外光固化组合物胶水及其使用方法和应用
WO2022203081A1 (ja) * 2021-03-26 2022-09-29 パナソニックＩｐマネジメント株式会社 光硬化性樹脂組成物、光学部品、光学部品の製造方法、及び発光装置
US20230061791A1 (en) * 2021-08-16 2023-03-02 Vadient Optics Llc Grin lenses made by 3d printing monomer-based inks
CN113999565B (zh) * 2021-12-10 2023-10-20 西安思摩威新材料有限公司 一种紫外光可固化的高折射率油墨及材料层
WO2023153385A1 (ja) 2022-02-08 2023-08-17 三井化学株式会社 紫外線硬化性樹脂組成物及び表示装置
WO2023187506A1 (en) 2022-04-01 2023-10-05 3M Innovative Properties Company Curable compositions with adhesion promotion agents
US20250261506A1 (en) * 2022-04-29 2025-08-14 3M Innovative Properties Company Curable high refractive index ink compositions with water-sequestration agents
WO2024024687A1 (ja) 2022-07-26 2024-02-01 デンカ株式会社 光硬化性組成物、光硬化性組成物の硬化物及び発光表示装置
CN115216178B (zh) * 2022-08-11 2023-11-28 西安思摩威新材料有限公司 一种oled封装用的油墨组合物及其制备方法
US20240117095A1 (en) * 2022-09-21 2024-04-11 Vadient Optics, Llc Grin lenses made by 3d printing monomer-based inks
WO2024262757A1 (ko) * 2023-06-19 2024-12-26 삼성에스디아이 주식회사 경화성 조성물, 상기 조성물을 이용하여 제조된 경화막, 상기 경화막을 포함하는 디스플레이 장치
JP2025022338A (ja) * 2023-08-03 2025-02-14 エア・ウォーター・パフォーマンスケミカル株式会社 新規なヘテロ環を有する単量体
WO2025037176A1 (en) 2023-08-11 2025-02-20 3M Innovative Properties Company Unsaturated trithiocyanurate derivatives for curable high refractive index compositions, articles thereof, and methods of making such articles
WO2025054893A1 (en) 2023-09-14 2025-03-20 Dow Global Technologies Llc Inkjet printable ultraviolet light curable composition
CN117603108B (zh) * 2023-10-23 2024-06-04 江苏集萃光敏电子材料研究所有限公司 一种高折射可固化单体
WO2025099511A1 (en) 2023-11-08 2025-05-15 3M Innovative Properties Company Hyperbranched polythioethers, curable high refractive index compositions and articles thereof and methods of making such compounds and articles
CN118126565A (zh) * 2024-02-28 2024-06-04 浙江福斯特新材料研究院有限公司 一种油墨组合物、油墨组合物的制备方法及固化层

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009084313A (ja) 2007-09-27 2009-04-23 Fujifilm Corp インク組成物、インクジェット記録方法、及び、印刷物
JP2013185040A (ja) 2012-03-07 2013-09-19 Jnc Corp 光硬化性インクジェットインク
JP2013189532A (ja) 2012-03-13 2013-09-26 Tamura Seisakusho Co Ltd 絶縁膜形成用透明樹脂組成物
US20150361284A1 (en) 2013-02-06 2015-12-17 Sun Chemical Corporation Digital printing inks
US20170114235A1 (en) 2014-06-26 2017-04-27 Agfa Graphics Nv Aqueous radiation curable inkjet inks
WO2018105177A1 (ja) 2016-12-06 2018-06-14 Jnc株式会社 インク組成物およびこれを用いた有機電界発光素子

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU550635B2 (en) 1982-11-11 1986-03-27 Showa Denko Kabushiki Kaisha Polymerizable (meth) acryloyloxyy aromatic ethers
JP2004333687A (ja) * 2003-05-02 2004-11-25 Fuji Photo Film Co Ltd 光学部材、光学部材用重合性組成物および光学部材の製造方法
US20060293463A1 (en) * 2005-06-28 2006-12-28 General Electric Company Compositions for brightness enhancing films
US20080221291A1 (en) 2007-03-07 2008-09-11 3M Innovative Properties Company Microstructured optical films comprising biphenyl difunctional monomers
JP2009074024A (ja) * 2007-08-30 2009-04-09 Nikon-Essilor Co Ltd 光学材料用組成物、光学材料、眼鏡レンズ用基材および眼鏡レンズ
JP2011170073A (ja) 2010-02-18 2011-09-01 Jsr Corp 硬化性組成物及び光学部材
KR101254325B1 (ko) * 2010-10-20 2013-04-12 주식회사 한농화성 페닐티오기를 함유하는 아크릴레이트 화합물 및 그의 제조방법
CN106397658B (zh) * 2011-05-13 2019-12-10 3M创新有限公司 适用于微结构化光学膜的(甲基)丙烯酸苄酯单体
CN103415542B (zh) * 2012-03-12 2015-01-07 Dic株式会社 自由基聚合性组合物、其固化物及塑料透镜
TWI601720B (zh) 2013-03-14 2017-10-11 三菱瓦斯化學股份有限公司 Novel episulfide and optical material compositions
KR102044923B1 (ko) * 2013-04-15 2019-11-15 삼성디스플레이 주식회사 유기발광 표시장치 및 그의 제조방법
US20150349295A1 (en) 2014-05-30 2015-12-03 Samsung Sdi Co., Ltd. Gas permeation multilayer barrier with tunable index decoupling layers
WO2016014690A1 (en) 2014-07-25 2016-01-28 Kateeva, Inc. Organic thin film ink compositions and methods
CN105254588B (zh) * 2015-11-10 2017-10-24 中国乐凯集团有限公司 一种高折射率化合物及其应用
KR102823243B1 (ko) * 2018-05-15 2025-06-19 쓰리엠 이노베이티브 프로퍼티즈 컴파니 경화성 고굴절률 조성물 및 이로부터 제조된 물품

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009084313A (ja) 2007-09-27 2009-04-23 Fujifilm Corp インク組成物、インクジェット記録方法、及び、印刷物
JP2013185040A (ja) 2012-03-07 2013-09-19 Jnc Corp 光硬化性インクジェットインク
JP2013189532A (ja) 2012-03-13 2013-09-26 Tamura Seisakusho Co Ltd 絶縁膜形成用透明樹脂組成物
US20150361284A1 (en) 2013-02-06 2015-12-17 Sun Chemical Corporation Digital printing inks
JP2016513146A (ja) 2013-02-06 2016-05-12 サン・ケミカル・コーポレーション デジタル印刷インク
US20170114235A1 (en) 2014-06-26 2017-04-27 Agfa Graphics Nv Aqueous radiation curable inkjet inks
WO2018105177A1 (ja) 2016-12-06 2018-06-14 Jnc株式会社 インク組成物およびこれを用いた有機電界発光素子

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Publication number Publication date
KR20190098234A (ko) 2019-08-21
EP3562895A1 (en) 2019-11-06
EP3562895B1 (en) 2021-08-18
US11584863B2 (en) 2023-02-21
JP2020506251A (ja) 2020-02-27
CN110121538A (zh) 2019-08-13
US20190352520A1 (en) 2019-11-21
CN110121538B (zh) 2023-05-26
KR102533500B1 (ko) 2023-05-16
WO2018122748A1 (en) 2018-07-05

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