CN110117807B - 一种二维材料-过渡金属异质结薄片的制备方法 - Google Patents
一种二维材料-过渡金属异质结薄片的制备方法 Download PDFInfo
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- CN110117807B CN110117807B CN201910563956.5A CN201910563956A CN110117807B CN 110117807 B CN110117807 B CN 110117807B CN 201910563956 A CN201910563956 A CN 201910563956A CN 110117807 B CN110117807 B CN 110117807B
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- 229910052723 transition metal Inorganic materials 0.000 title claims abstract description 67
- 238000002360 preparation method Methods 0.000 title claims description 7
- 239000000463 material Substances 0.000 claims abstract description 39
- 150000003624 transition metals Chemical class 0.000 claims abstract description 32
- 238000000034 method Methods 0.000 claims abstract description 26
- -1 transition metal cations Chemical class 0.000 claims abstract description 23
- 239000002135 nanosheet Substances 0.000 claims abstract description 14
- 239000002904 solvent Substances 0.000 claims abstract description 11
- 238000004140 cleaning Methods 0.000 claims abstract description 10
- 238000009830 intercalation Methods 0.000 claims abstract description 6
- 230000002687 intercalation Effects 0.000 claims abstract description 6
- 239000003795 chemical substances by application Substances 0.000 claims abstract 3
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 claims description 18
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 18
- 239000003960 organic solvent Substances 0.000 claims description 15
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 14
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims description 11
- 239000000138 intercalating agent Substances 0.000 claims description 11
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 8
- 150000004770 chalcogenides Chemical class 0.000 claims description 7
- 229910002804 graphite Inorganic materials 0.000 claims description 7
- 239000010439 graphite Substances 0.000 claims description 7
- 238000009210 therapy by ultrasound Methods 0.000 claims description 6
- 229910052799 carbon Inorganic materials 0.000 claims description 5
- 230000010355 oscillation Effects 0.000 claims description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 4
- 229910052798 chalcogen Inorganic materials 0.000 claims description 4
- 150000001787 chalcogens Chemical group 0.000 claims description 4
- 150000002892 organic cations Chemical class 0.000 claims description 4
- 229910052750 molybdenum Inorganic materials 0.000 claims description 3
- 229910052711 selenium Inorganic materials 0.000 claims description 3
- 229910052717 sulfur Inorganic materials 0.000 claims description 3
- 229910052714 tellurium Inorganic materials 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 229910052721 tungsten Inorganic materials 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 3
- 229910052735 hafnium Inorganic materials 0.000 claims description 2
- 229910052758 niobium Inorganic materials 0.000 claims description 2
- 229910052757 nitrogen Inorganic materials 0.000 claims description 2
- 229910052702 rhenium Inorganic materials 0.000 claims description 2
- 150000003839 salts Chemical class 0.000 claims description 2
- 229910052715 tantalum Inorganic materials 0.000 claims description 2
- 229910052713 technetium Inorganic materials 0.000 claims description 2
- 229910052720 vanadium Inorganic materials 0.000 claims description 2
- 229910052726 zirconium Inorganic materials 0.000 claims description 2
- 239000003014 ion exchange membrane Substances 0.000 claims 1
- 239000013078 crystal Substances 0.000 abstract description 13
- 239000003792 electrolyte Substances 0.000 abstract description 10
- 230000007613 environmental effect Effects 0.000 abstract description 2
- 230000005684 electric field Effects 0.000 abstract 1
- 230000005518 electrochemistry Effects 0.000 abstract 1
- 239000000203 mixture Substances 0.000 description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 8
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- 229910052759 nickel Inorganic materials 0.000 description 6
- HQASLXJEKYYFNY-UHFFFAOYSA-N selenium(2-);titanium(4+) Chemical compound [Ti+4].[Se-2].[Se-2] HQASLXJEKYYFNY-UHFFFAOYSA-N 0.000 description 6
- 238000005119 centrifugation Methods 0.000 description 5
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 5
- CYSGHNMQYZDMIA-UHFFFAOYSA-N 1,3-Dimethyl-2-imidazolidinon Chemical compound CN1CCN(C)C1=O CYSGHNMQYZDMIA-UHFFFAOYSA-N 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 4
- 239000002923 metal particle Substances 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- SIBIBHIFKSKVRR-UHFFFAOYSA-N phosphanylidynecobalt Chemical compound [Co]#P SIBIBHIFKSKVRR-UHFFFAOYSA-N 0.000 description 4
- XYFCBTPGUUZFHI-UHFFFAOYSA-O phosphonium Chemical group [PH4+] XYFCBTPGUUZFHI-UHFFFAOYSA-O 0.000 description 4
- 125000001453 quaternary ammonium group Chemical group 0.000 description 4
- 239000012752 auxiliary agent Substances 0.000 description 3
- 238000004070 electrodeposition Methods 0.000 description 3
- 239000004744 fabric Substances 0.000 description 3
- 239000006228 supernatant Substances 0.000 description 3
- KMTRUDSVKNLOMY-UHFFFAOYSA-N Ethylene carbonate Chemical compound O=C1OCCO1 KMTRUDSVKNLOMY-UHFFFAOYSA-N 0.000 description 2
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000002484 cyclic voltammetry Methods 0.000 description 2
- 229910052733 gallium Inorganic materials 0.000 description 2
- 229910052732 germanium Inorganic materials 0.000 description 2
- 229910021389 graphene Inorganic materials 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000001000 micrograph Methods 0.000 description 2
- 239000002055 nanoplate Substances 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- WXJVQQPLIMTRFK-UHFFFAOYSA-N C(CCC)[P](CCCC)(CCCC)CCCC Chemical compound C(CCC)[P](CCCC)(CCCC)CCCC WXJVQQPLIMTRFK-UHFFFAOYSA-N 0.000 description 1
- 229910005543 GaSe Inorganic materials 0.000 description 1
- 229910005866 GeSe Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910021397 glassy carbon Inorganic materials 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000001027 hydrothermal synthesis Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000011031 large-scale manufacturing process Methods 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- 238000001878 scanning electron micrograph Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- DZLFLBLQUQXARW-UHFFFAOYSA-N tetrabutylammonium Chemical compound CCCC[N+](CCCC)(CCCC)CCCC DZLFLBLQUQXARW-UHFFFAOYSA-N 0.000 description 1
- GJSGYPDDPQRWPK-UHFFFAOYSA-N tetrapentylammonium Chemical compound CCCCC[N+](CCCCC)(CCCCC)CCCCC GJSGYPDDPQRWPK-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/54—Electroplating of non-metallic surfaces
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Battery Electrode And Active Subsutance (AREA)
Abstract
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CN110963505B (zh) * | 2019-12-06 | 2023-04-28 | 深圳市中科墨磷科技有限公司 | 一种Li插层H型二维纳米片的制备方法及其在光电固氮中的应用 |
CN113751035A (zh) * | 2020-06-03 | 2021-12-07 | 深圳先进技术研究院 | 一种复合催化剂及其制备方法 |
CN112176372B (zh) * | 2020-09-27 | 2021-10-15 | 东北大学 | 一种以二氯化钴和五氯化钽为原料低温制备钴钽合金涂层的方法 |
CN112611923B (zh) * | 2020-11-24 | 2023-05-05 | 安徽大学 | 智能模块、多功能装置及其在无线充电、电场感知、接近感知中的应用 |
CN112635620A (zh) * | 2020-12-21 | 2021-04-09 | 昆明理工大学 | 一种Gr/MX2/Si太阳能电池的制备方法 |
CN114452826B (zh) * | 2021-12-14 | 2022-11-08 | 长安大学 | 一种光驱动自清洁的Ti3C2@TiO2-C3N4异质结分离膜的制备方法 |
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JPS59169077A (ja) * | 1983-03-17 | 1984-09-22 | Toshiba Corp | 燃料電池 |
BR112012033012A2 (pt) * | 2010-06-25 | 2016-12-20 | Univ Singapore | método de formação de grafeno por esfoliação de grafite |
CN102701187B (zh) * | 2011-07-13 | 2016-03-09 | 华东理工大学 | 一种石墨烯的制备方法和使用该方法制备的石墨烯 |
CN102807213B (zh) * | 2012-08-30 | 2015-09-09 | 中国科学院苏州纳米技术与纳米仿生研究所 | 电化学制备石墨烯的方法 |
CN103215628B (zh) * | 2013-04-17 | 2015-11-18 | 中国石油大学(华东) | 一种电化学复合石墨烯与金属氧化物的方法 |
CN103466603B (zh) * | 2013-08-09 | 2016-01-27 | 中国科学院苏州纳米技术与纳米仿生研究所 | 石墨烯分散液以及石墨烯薄膜的制备方法 |
CN104200873B (zh) * | 2014-09-09 | 2017-08-22 | 郑州轻工业学院 | 大尺寸石墨烯‑金属精细颗粒复合膜及其制法与用途 |
CN104505497B (zh) * | 2014-12-12 | 2017-01-04 | 盐城市新能源化学储能与动力电源研究中心 | 一种石墨烯镍复合材料和使用该材料制备的石墨烯镍电极 |
CN104846418A (zh) * | 2015-04-10 | 2015-08-19 | 南京理工大学 | 基于双脉冲电沉积的石墨烯/镍基复合镀层制备工艺 |
CN104779380B (zh) * | 2015-04-10 | 2017-03-08 | 北京石油化工学院 | 一种利用电化学制备磷烯的方法 |
CN105336919B (zh) * | 2015-10-10 | 2017-12-15 | 岭南师范学院 | 一种类石墨烯ws2/氮、磷共掺杂石墨烯电化学储钠复合电极的制备方法 |
CN105800597B (zh) * | 2016-02-26 | 2018-04-17 | 成都新柯力化工科技有限公司 | 一种机械剥离高导电性复合石墨烯的制备方法 |
CN105699368B (zh) * | 2016-03-16 | 2018-07-06 | 济南大学 | 一种基于二维复合材料构建的双功能过氧化氢无酶传感器的制备方法及应用 |
CN107805730B (zh) * | 2017-09-15 | 2019-08-27 | 广东工业大学 | 自支撑石墨烯纳米片表面修饰铜基复合材料及其制备方法和应用 |
CN108550866B (zh) * | 2018-05-02 | 2020-07-03 | 太原理工大学 | 二维材料辅助浸渍法制备固体氧化物燃料电池阳极的方法 |
CN108862254A (zh) * | 2018-07-12 | 2018-11-23 | 西安交通大学 | 一种电化学阴阳双电极剥离制备石墨烯的方法 |
CN109179351B (zh) * | 2018-08-17 | 2022-01-14 | 湖北中科墨磷科技有限公司 | 多孔三维磷烯及其制备方法和应用 |
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