CN112635620A - 一种Gr/MX2/Si太阳能电池的制备方法 - Google Patents
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- 238000000034 method Methods 0.000 title description 27
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 160
- 239000010703 silicon Substances 0.000 claims abstract description 160
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 160
- 239000002135 nanosheet Substances 0.000 claims abstract description 114
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 claims abstract description 90
- 239000000725 suspension Substances 0.000 claims abstract description 61
- 239000013078 crystal Substances 0.000 claims abstract description 46
- 125000001453 quaternary ammonium group Chemical group 0.000 claims abstract description 44
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 42
- 150000003242 quaternary ammonium salts Chemical class 0.000 claims abstract description 34
- 239000011248 coating agent Substances 0.000 claims abstract description 31
- 238000000576 coating method Methods 0.000 claims abstract description 31
- 238000001035 drying Methods 0.000 claims abstract description 30
- 238000003487 electrochemical reaction Methods 0.000 claims abstract description 29
- 238000002360 preparation method Methods 0.000 claims abstract description 27
- 229910021389 graphene Inorganic materials 0.000 claims abstract description 26
- 238000009830 intercalation Methods 0.000 claims abstract description 23
- 230000002687 intercalation Effects 0.000 claims abstract description 23
- 229910002804 graphite Inorganic materials 0.000 claims abstract description 16
- 239000010439 graphite Substances 0.000 claims abstract description 16
- 239000002064 nanoplatelet Substances 0.000 claims abstract description 15
- 238000007789 sealing Methods 0.000 claims abstract description 15
- 238000012546 transfer Methods 0.000 claims abstract description 15
- 238000004140 cleaning Methods 0.000 claims abstract description 3
- 239000003292 glue Substances 0.000 claims abstract description 3
- 238000005406 washing Methods 0.000 claims abstract description 3
- 229910052961 molybdenite Inorganic materials 0.000 claims description 46
- 229910052982 molybdenum disulfide Inorganic materials 0.000 claims description 46
- 229910000807 Ga alloy Inorganic materials 0.000 claims description 15
- 229910003090 WSe2 Inorganic materials 0.000 claims description 15
- 229910016021 MoTe2 Inorganic materials 0.000 claims description 10
- FPGGTKZVZWFYPV-UHFFFAOYSA-M tetrabutylammonium fluoride Chemical compound [F-].CCCC[N+](CCCC)(CCCC)CCCC FPGGTKZVZWFYPV-UHFFFAOYSA-M 0.000 claims description 10
- JRMUNVKIHCOMHV-UHFFFAOYSA-M tetrabutylammonium bromide Chemical compound [Br-].CCCC[N+](CCCC)(CCCC)CCCC JRMUNVKIHCOMHV-UHFFFAOYSA-M 0.000 claims description 9
- HWCKGOZZJDHMNC-UHFFFAOYSA-M tetraethylammonium bromide Chemical compound [Br-].CC[N+](CC)(CC)CC HWCKGOZZJDHMNC-UHFFFAOYSA-M 0.000 claims description 9
- SYZCZDCAEVUSPM-UHFFFAOYSA-M tetrahexylazanium;bromide Chemical group [Br-].CCCCCC[N+](CCCCCC)(CCCCCC)CCCCCC SYZCZDCAEVUSPM-UHFFFAOYSA-M 0.000 claims description 9
- BGQMOFGZRJUORO-UHFFFAOYSA-M tetrapropylammonium bromide Chemical compound [Br-].CCC[N+](CCC)(CCC)CCC BGQMOFGZRJUORO-UHFFFAOYSA-M 0.000 claims description 9
- ODTSDWCGLRVBHJ-UHFFFAOYSA-M tetrahexylazanium;chloride Chemical group [Cl-].CCCCCC[N+](CCCCCC)(CCCCCC)CCCCCC ODTSDWCGLRVBHJ-UHFFFAOYSA-M 0.000 claims description 8
- DPKBAXPHAYBPRL-UHFFFAOYSA-M tetrabutylazanium;iodide Chemical compound [I-].CCCC[N+](CCCC)(CCCC)CCCC DPKBAXPHAYBPRL-UHFFFAOYSA-M 0.000 claims description 5
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 claims description 4
- 229940107816 ammonium iodide Drugs 0.000 claims description 4
- 230000035484 reaction time Effects 0.000 claims description 4
- NHGXDBSUJJNIRV-UHFFFAOYSA-M tetrabutylammonium chloride Chemical compound [Cl-].CCCC[N+](CCCC)(CCCC)CCCC NHGXDBSUJJNIRV-UHFFFAOYSA-M 0.000 claims description 4
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 238000009210 therapy by ultrasound Methods 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 2
- 239000007788 liquid Substances 0.000 claims description 2
- YMBCJWGVCUEGHA-UHFFFAOYSA-M tetraethylammonium chloride Chemical compound [Cl-].CC[N+](CC)(CC)CC YMBCJWGVCUEGHA-UHFFFAOYSA-M 0.000 claims description 2
- UQFSVBXCNGCBBW-UHFFFAOYSA-M tetraethylammonium iodide Chemical compound [I-].CC[N+](CC)(CC)CC UQFSVBXCNGCBBW-UHFFFAOYSA-M 0.000 claims description 2
- QSUJAUYJBJRLKV-UHFFFAOYSA-M tetraethylazanium;fluoride Chemical compound [F-].CC[N+](CC)(CC)CC QSUJAUYJBJRLKV-UHFFFAOYSA-M 0.000 claims description 2
- AAIWQSJMMIXYGQ-UHFFFAOYSA-M tetrahexylazanium;fluoride Chemical group [F-].CCCCCC[N+](CCCCCC)(CCCCCC)CCCCCC AAIWQSJMMIXYGQ-UHFFFAOYSA-M 0.000 claims description 2
- VRKHAMWCGMJAMI-UHFFFAOYSA-M tetrahexylazanium;iodide Chemical group [I-].CCCCCC[N+](CCCCCC)(CCCCCC)CCCCCC VRKHAMWCGMJAMI-UHFFFAOYSA-M 0.000 claims description 2
- FBEVECUEMUUFKM-UHFFFAOYSA-M tetrapropylazanium;chloride Chemical compound [Cl-].CCC[N+](CCC)(CCC)CCC FBEVECUEMUUFKM-UHFFFAOYSA-M 0.000 claims description 2
- POSYVRHKTFDJTR-UHFFFAOYSA-M tetrapropylazanium;fluoride Chemical compound [F-].CCC[N+](CCC)(CCC)CCC POSYVRHKTFDJTR-UHFFFAOYSA-M 0.000 claims description 2
- GKXDJYKZFZVASJ-UHFFFAOYSA-M tetrapropylazanium;iodide Chemical compound [I-].CCC[N+](CCC)(CCC)CCC GKXDJYKZFZVASJ-UHFFFAOYSA-M 0.000 claims description 2
- 230000005525 hole transport Effects 0.000 abstract description 7
- 238000000926 separation method Methods 0.000 abstract description 3
- 239000010410 layer Substances 0.000 description 109
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 51
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 30
- 238000004528 spin coating Methods 0.000 description 30
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 26
- 239000002390 adhesive tape Substances 0.000 description 24
- 238000006243 chemical reaction Methods 0.000 description 23
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 13
- 239000008367 deionised water Substances 0.000 description 13
- 229910021641 deionized water Inorganic materials 0.000 description 13
- 238000004506 ultrasonic cleaning Methods 0.000 description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 13
- 238000012360 testing method Methods 0.000 description 12
- 238000002525 ultrasonication Methods 0.000 description 8
- 238000012512 characterization method Methods 0.000 description 6
- 230000000903 blocking effect Effects 0.000 description 5
- 229910016001 MoSe Inorganic materials 0.000 description 4
- 229910016002 MoS2a Inorganic materials 0.000 description 3
- 239000000969 carrier Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000006798 recombination Effects 0.000 description 3
- 238000005215 recombination Methods 0.000 description 3
- 238000000527 sonication Methods 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 239000011229 interlayer Substances 0.000 description 2
- 239000002055 nanoplate Substances 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- HITXEXPSQXNMAN-UHFFFAOYSA-N bis(tellanylidene)molybdenum Chemical compound [Te]=[Mo]=[Te] HITXEXPSQXNMAN-UHFFFAOYSA-N 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000001548 drop coating Methods 0.000 description 1
- 238000004299 exfoliation Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- -1 quaternary ammonium ions Chemical class 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
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Abstract
本发明涉及一种Gr/MX2/Si太阳能电池的制备方法,属于太阳能电池技术领域。本发明以石墨为阳极,MX2晶体为阴极,在季铵盐/乙腈溶液中恒压电化学反应得到季铵离子插层MX2晶体,季铵离子插层MX2晶体置于DMF/PVP溶液中超声剥离,洗涤得到MX2纳米片悬浮液;硅片窗口区域外进行封胶处理以保留窗口区域外的氧化层,然后在HF溶液中反应去除窗口区域和硅片背面的氧化层,去除硅片氧化层上的胶,清洗吹干得到预处理硅片;预处理硅片的窗口区域引入MX2纳米片悬浮液,烘干得到MX2纳米片膜;将片层石墨烯转移至硅片的窗口区域的MX2纳米片膜上;在硅片氧化层上涂抹导电层,硅片背面涂抹背电极即得Gr/MX2/Si太阳能电池。该MX2纳米片作为空穴传输层有利于提高光生电子‑空穴对的有效分离。
Description
技术领域
本发明涉及一种Gr/MX2/Si太阳能电池的制备方法,属于太阳能电池技术领域。
背景技术
近年来,太阳能因其储量无穷、不受地域限制、清洁无污染等优点而备受世界各国关注。硅太阳能电池(单晶,多晶,非晶)具有丰富的储量、合适的能带结构、优异的可靠性和成熟的制造工艺等优势。石墨烯由于其良好的透光率和较高的载流子迁移速度等优点被广泛应用于太阳能电池中,既能作为透明电极传输载流子,又能与硅片相接触形成异质结,建立内建电场分离光生载流子。目前,已有很多相关石墨烯/硅基肖特基结太阳能电池的有关报道,但是相比其他类型的太阳能电池,其转换效率依旧偏低,最大的限制条件即是石墨烯和硅基之间严重的界面复合,光生电子-空穴分离不充分,光生电流大大降低,不利于构建高性能的光伏器件。界面复合严重对于器件的影响是致命的,光生载流子的产生速率和收集几率降低会大大影响器件的短路电流密度和反向饱和电流。
发明内容
本发明针对现有技术中太阳能电池转换效率问题,提供一种Gr/MX2/Si太阳能电池的制备方法,本发明通过对MX2晶体的电化学插层剥离制备相关二维纳米片,再引入Gr/Si太阳能电池中作为电子阻拦层/空穴传输层,构建Gr/MX2/Si太阳能电池,提高其转换效率。
一种Gr/MX2/Si太阳能电池的制备方法,具体步骤如下:
(1)以石墨为阳极,MX2晶体为阴极,在季铵盐/乙腈溶液中恒压电化学反应得到季铵离子插层MX2晶体,季铵离子插层MX2晶体置于DMF/PVP溶液中超声剥离,经乙醇或异丙醇洗涤得到MX2纳米片悬浮液;MX2纳米片的横向尺寸为0.1~5μm,片层厚度为1~30层;
(2)硅片窗口区域外进行封胶处理以保留窗口区域外的氧化层,然后在HF溶液中反应去除窗口区域和硅片背面的氧化层,去除硅片氧化层上的胶,依次经丙酮、乙醇和去离子水的超声清洗,吹干得到预处理硅片;其中硅片窗口区域为0.3×0.3cm2;
(3)将步骤(1)MX2纳米片悬浮液超声处理,预处理硅片的窗口区域引入MX2纳米片悬浮液,烘干成膜得到MX2纳米片膜;引入方法为滴涂、旋涂或丝网印刷,优选旋涂,旋涂速度为1000~6000rpm,时间为10~60S;成膜温度为25~200℃;
(4)采用湿法转移法,将片层石墨烯转移至步骤(3)的硅片的窗口区域的MX2纳米片膜上;
(5)在硅片的氧化层上涂抹导电层,硅片背面涂抹背电极即得Gr/MX2/Si太阳能电池。
所述步骤(1)MX2晶体为MoS2、WS2、MoSe2、WSe2、MoTe2或WTe2,优选地,MX2晶体为MoS2、WS2或WSe2;
所述季铵盐为氟化季铵、氯化季铵、溴化季铵或碘化季铵。进一步的,氟化季铵为四己基氟化铵、四乙基氟化铵、四丙基氟化铵或四丁基氟化铵;氯化季铵为四己基氯化铵、四乙基氯化铵、四丙基氯化铵或四丁基氯化铵;溴化季铵为四己基溴化铵、四乙基溴化铵、四丙基溴化铵或四丁基溴化铵;碘化季铵为四己基碘化铵、四乙基碘化铵、四丙基碘化铵或四丁基碘化铵。优选为溴化季铵中的四己基溴化铵、四乙基溴化铵、四丙基溴化铵或四丁基溴化铵;
所述季铵盐/乙腈溶液中季铵盐的浓度为0.1~2mol/L,DMF/PVP溶液中DMF浓度为0.1~2mol/L,优选地季铵盐的浓度0.2~1mol/L,DMF浓度为0.2~1mol/L;
所述恒压电化学反应的电压为0.5~50V,时间为1~24h;优选地,反应电压为1~25V,反应时间为2~12h;
所述步骤(2)HF溶液的质量浓度为1%~10%,反应时间为1~10min;优选的,HF溶液的质量浓度为2%~5%,反应时间为2~5min;
所述步骤(3)MX2纳米片膜的厚度为1~30nm;
所述步骤(4)片层石墨烯为1~6层;优选的,片层石墨烯为3~4层;
所述步骤(5)导电层为Au或Ag,背电极为Al或In-Ga合金。
本发明的有益效果是:
(1)本发明通过对MX2晶体的电化学插层剥离制备二维纳米片,再引入Gr/Si太阳能电池中作为电子阻拦层/空穴传输层,构建Gr/MX2/Si太阳能电池,提高其转换效率;
(2)本发明引入电子阻拦层/空穴传输层的目的在于当光生载流子对在内建电场的作用下分离后,电子和空穴迅速传输不再重遇并产生复合,大块的MX2晶体作为间隙半导体,其光学能带0.7~1.6eV,又由于是层状结构的晶体,可以通过层数调控带隙;
(3)本发明采用电化学插层剥离MX2纳米片缺陷相对较少,制备工艺简单。
(4)本发明二维MX2在石墨烯和硅界面处作为空穴传输层能有效地降低石墨烯和硅之间界面载流子复合,有利于提高光生电子-空穴对的有效分离,制备出高效的Gr/MX2/Si太阳能电池。
附图说明
图1为Gr/MX2/Si太阳能电池结构示意图;
图2为电化学插层剥离晶体MX2机理图;
图3为悬浮液中MoS2纳米片的样品TEM表征;
图4为悬浮液中WS2纳米片的样品TEM表征;
图5为旋涂MoS2纳米片于硅片的样品AFM表征;
图6为旋涂WS2纳米片于硅片的样品AFM表征;
图7为最优Gr/MoS2/Si太阳能电池实施例1在100mW白光照射下的电流-电压特征曲线;
图8为最优条件Gr/WS2/Si太阳能电池实施例5在100mW白光照射下的电流-电压特征曲线;
具体实施方式
下面结合具体实施方式对本发明作进一步详细说明,但本发明的保护范围并不限于所述内容。
本发明Gr/MX2/Si太阳能电池的结构见图1,Gr/MX2/Si太阳能电池包括依次连接的前电极、石墨烯层、电子阻挡层/空穴传输层、硅和背电极,石墨烯与硅基结合形成的肖特基结为转换单元;中间层(电子阻挡层/空穴传输层)改善器件性能,太阳能电池的阳极是前电极,优选银电极,阴极是背电极,优选In-Ga合金电极;
电化学插层剥离晶体MX2机理图见图2,以石墨棒作为阳极,MX2晶体作为阴极,在0.2~1mol/L季铵盐/乙腈溶液中进行电化学插层反应,在反应过程中,向阴极施加负电压,以将带正电荷的季铵离子插入晶体中,以达到插层的目的;透过插层的电压和时间可以实现对MX2纳米片的横向尺寸和层数的可控制备,随后将插层反应完成的晶体在0.1~2mol/L的DMF/PVP溶液中超声剥离得到MX2纳米片悬浮液,然后进行3~10次的离心清洗,得到含有MX2纳米片的乙醇或异丙醇溶液。
实施例1:一种Gr/MoS2/Si太阳能电池的制备方法,具体步骤如下:
(1)以石墨为阳极,MoS2晶体为阴极,在季铵盐/乙腈溶液中恒压电化学反应10h得到季铵离子插层MoS2晶体,季铵离子插层MoS2晶体置于DMF/PVP溶液中超声剥离2h,经异丙醇洗涤7次得到MoS2纳米片悬浮液(异丙醇悬浮液);其中季铵盐为四己基溴化铵,四己基溴化铵/乙腈溶液中四己基溴化铵的浓度为0.2mol/L,恒压电化学反应的电压为10V,DMF/PVP溶液中DMF浓度为0.2mol/L;
(2)硅片窗口区域外进行封胶带处理以保留窗口区域外的氧化层,然后在质量浓度为2%HF溶液中反应3min去除窗口区域和硅片背面的氧化层,去除硅片氧化层上的胶带,依次经丙酮、乙醇和去离子水的超声清洗,吹干得到预处理硅片;其中硅片为1×1cm2,硅片窗口区域为0.3×0.3cm2;
(3)将步骤(1)MoS2纳米片悬浮液超声处理2h使MoS2纳米片分散均匀,预处理硅片的窗口区域引入MoS2纳米片悬浮液,烘干成膜得到MoS2纳米片膜;引入方法为旋涂,旋涂速度为3000rpm,时间为30S;成膜温度为70℃;
(4)采用湿法转移法,将3层的片层石墨烯转移至步骤(3)的硅片的窗口区域的MoS2纳米片膜上;
(5)在硅片的氧化层上涂抹导电层(导电银浆),硅片背面涂抹背电极In-Ga合金即得Gr/MX2/Si太阳能电池;
本实施例MoS2纳米片悬浮液中MoS2纳米片的透射图见图3,样品确实呈现片层状,非常薄,几近透明,横向尺寸约为100纳米;本实施例旋涂MoS2纳米片于硅片的样品AFM表征见图5,旋涂在硅片上的纳米片在视野大概9微米范围内的原子力显微镜的三维表征,硅片表面有着起伏的薄膜状纳米片,厚度约为4~5纳米,结合MoS2的层间距约为0.615纳米,判断制备得到的样品为6~8层的MoS2纳米片;
本实施例Gr/MoS2/Si太阳能电池在100mW白光照射下的电流-电压特征曲线见图7,MoS2纳米片引入电池后经过测试,得到的电池的明场曲线,其转换效率可以达到4.29%。
实施例2:一种Gr/MoS2/Si太阳能电池的制备方法,具体步骤如下:
(1)以石墨为阳极,MoS2晶体为阴极,在季铵盐/乙腈溶液中恒压电化学反应1h得到季铵离子插层MoS2晶体,季铵离子插层MoS2晶体置于DMF/PVP溶液中超声剥离2h,经异丙醇洗涤3次得到MoS2纳米片悬浮液(异丙醇悬浮液);其中季铵盐为四丙基溴化铵,四丙基溴化铵/乙腈溶液中四丙基溴化铵的浓度为0.8mol/L,恒压电化学反应的电压为20V,DMF/PVP溶液中DMF浓度为0.8mol/L;MoS2纳米片的横向尺寸约为3~5μm,片层厚度为20~30层;
(2)硅片窗口区域外进行封胶带处理以保留窗口区域外的氧化层,然后在质量浓度为10%HF溶液中反应1min去除窗口区域和硅片背面的氧化层,去除硅片氧化层上的胶带,依次经丙酮、乙醇和去离子水的超声清洗,吹干得到预处理硅片;其中硅片为1×1cm2,硅片窗口区域为0.3×0.3cm2;
(3)将步骤(1)MoS2纳米片悬浮液超声处理1.8h使MoS2纳米片分散均匀,预处理硅片的窗口区域引入MoS2纳米片悬浮液,烘干成膜得到MoS2纳米片膜;引入方法为旋涂,旋涂速度为5000rpm,时间为20S;成膜温度为100℃;
(4)采用湿法转移法,将6层的片层石墨烯转移至步骤(3)的硅片的窗口区域的MoS2纳米片膜上;
(5)在硅片的氧化层上涂抹导电层(导电银浆),硅片背面涂抹背电极In-Ga合金即得Gr/MoS2/Si太阳能电池;
本实施例Gr/MoS2/Si太阳能电池在100mW白光照射下的电流-电压特征曲线可知,MoS2纳米片引入电池后经过测试,得到的电池的明场曲线,其转换效率可以达到3.96%。
实施例3:一种Gr/MoS2/Si太阳能电池的制备方法,具体步骤如下:
(1)以石墨为阳极,MoS2晶体为阴极,在季铵盐/乙腈溶液中恒压电化学反应24h得到季铵离子插层MoS2晶体,季铵离子插层MoS2晶体置于DMF/PVP溶液中超声剥离5h,经异丙醇洗涤10次得到MoS2纳米片悬浮液(异丙醇悬浮液);其中季铵盐为四丁基溴化铵,四丁基溴化铵/乙腈溶液中四丁基溴化铵的浓度为1mol/L,恒压电化学反应的电压为30V,DMF/PVP溶液中DMF浓度为1mol/L;MoS2纳米片的横向尺寸约为0.5~1μm,片层厚度为1~6层;
(2)硅片窗口区域外进行封胶带处理以保留窗口区域外的氧化层,然后在质量浓度为8%HF溶液中反应1.5min去除窗口区域和硅片背面的氧化层,去除硅片氧化层上的胶带,依次经丙酮、乙醇和去离子水的超声清洗,吹干得到预处理硅片;其中硅片为1×1cm2,硅片窗口区域为0.3×0.3cm2;
(3)将步骤(1)MoS2纳米片悬浮液超声处理1.5h使MoS2纳米片分散均匀,预处理硅片的窗口区域引入MoS2纳米片悬浮液,烘干成膜得到MoS2纳米片膜;引入方法为旋涂,旋涂速度为6000rpm,时间为10S;成膜温度为150℃;
(4)采用湿法转移法,将3层的片层石墨烯转移至步骤(3)的硅片的窗口区域的MoS2纳米片膜上;
(5)在硅片的氧化层上涂抹导电层(导电银浆),硅片背面涂抹背电极In-Ga合金即得Gr/MoS2/Si太阳能电池;
本实施例Gr/MoS2/Si太阳能电池在100mW白光照射下的电流-电压特征曲线可知,MoS2纳米片引入电池后经过测试,得到的电池的明场曲线,其转换效率可以达到3.84%。
实施例4:一种Gr/MoS2/Si太阳能电池的制备方法,具体步骤如下:
(1)以石墨为阳极,MoS2晶体为阴极,在季铵盐/乙腈溶液中恒压电化学反应12h得到季铵离子插层MoS2晶体,季铵离子插层MoS2晶体置于DMF/PVP溶液中超声剥离3h,经异丙醇洗涤4次得到MoS2纳米片悬浮液(异丙醇悬浮液);其中季铵盐为四乙基溴化铵,四乙基溴化铵/乙腈溶液中四乙基溴化铵的浓度为1.5mol/L,恒压电化学反应的电压为25V,DMF/PVP溶液中DMF浓度为1.5mol/L;MoS2纳米片的横向尺寸约为1~2μm,片层厚度为10~20层;
(2)硅片窗口区域外进行封胶带处理以保留窗口区域外的氧化层,然后在质量浓度为5%HF溶液中反2.5min去除窗口区域和硅片背面的氧化层,去除硅片氧化层上的胶带,依次经丙酮、乙醇和去离子水的超声清洗,吹干得到预处理硅片;其中硅片为1×1cm2,硅片窗口区域为0.3×0.3cm2;
(3)将步骤(1)MoS2纳米片悬浮液超声处理2h使MoS2纳米片分散均匀,预处理硅片的窗口区域引入MoS2纳米片悬浮液,烘干成膜得到MoS2纳米片膜;引入方法为旋涂,旋涂速度为4000rpm,时间为20S;成膜温度为25℃;
(4)采用湿法转移法,将3层的片层石墨烯转移至步骤(3)的硅片的窗口区域的MoS2纳米片膜上;
(5)在硅片的氧化层上涂抹导电层(导电银浆),硅片背面涂抹背电极In-Ga合金即得Gr/MoS2/Si太阳能电池;
本实施例Gr/MoS2/Si太阳能电池在100mW白光照射下的电流-电压特征曲线可知,MoS2纳米片引入电池后经过测试,得到的电池的明场曲线,其转换效率可以达到3.58%。
实施例5:一种Gr/WS2/Si太阳能电池的制备方法,具体步骤如下:
(1)以石墨为阳极,WS2晶体为阴极,在季铵盐/乙腈溶液中恒压电化学反应10h得到季铵离子插层WS2晶体,季铵离子插层WS2晶体置于DMF/PVP溶液中超声剥离2h,经异丙醇洗涤7次得到WS2纳米片悬浮液(异丙醇悬浮液);其中季铵盐为四乙基溴化铵,四乙基溴化铵/乙腈溶液中四乙基溴化铵的浓度0.2mol/L,恒压电化学反应的电压为10V,DMF/PVP溶液中DMF浓度为0.2mol/L;
(2)硅片窗口区域外进行封胶带处理以保留窗口区域外的氧化层,然后在质量浓度为2%HF溶液中反应3min去除窗口区域和硅片背面的氧化层,去除硅片氧化层上的胶带,依次经丙酮、乙醇和去离子水的超声清洗,吹干得到预处理硅片;其中硅片为1×1cm2,硅片窗口区域为0.3×0.3cm2;
(3)将步骤(1)WS2纳米片悬浮液超声处理2h使MoS2纳米片分散均匀,预处理硅片的窗口区域引入WS2纳米片悬浮液,烘干成膜得到WS2纳米片膜;引入方法为旋涂,旋涂速度为3000rpm,时间为30S;成膜温度为70℃;
(4)采用湿法转移法,将3层的片层石墨烯转移至步骤(3)的硅片的窗口区域的WS2纳米片膜上;
(5)在硅片的氧化层上涂抹导电层(导电银浆),硅片背面涂抹背电极In-Ga合金即得Gr/WS2/Si太阳能电池;
本实施例WS2纳米片悬浮液中WS2纳米片的透射图见图4,样品确实呈现片层状,非常薄,几近透明,横向尺寸约为100纳米;本实施例旋涂WS2纳米片于硅片的样品AFM表征见图6,旋涂在硅片上的纳米片在视野大概9微米范围内的原子力显微镜的三维表征,硅片表面有着起伏的薄膜状纳米片,厚度约为3~5纳米,结合WS2的层间距约为0.6纳米,判断制备得到的样品为5~8层的WS2纳米片;
本实施例Gr/WS2/Si太阳能电池在100mW白光照射下的电流-电压特征曲线见图8,WS2纳米片引入电池后经过测试,得到的电池的明场曲线,其转换效率可以达到5.74%。
实施例6:一种Gr/WS2/Si太阳能电池的制备方法,具体步骤如下:
(1)以石墨为阳极,WS2晶体为阴极,在季铵盐/乙腈溶液中恒压电化学反应2h得到季铵离子插层WS2晶体,季铵离子插层WS2晶体置于DMF/PVP溶液中超声剥离2h,经异丙醇洗涤5次得到WS2纳米片悬浮液(异丙醇悬浮液);其中季铵盐为四丁基溴化铵,四丁基溴化铵/乙腈溶液中四丁基溴化铵的浓度为0.1mol/L,恒压电化学反应的电压为8V,DMF/PVP溶液中DMF浓度为0.1mol/L;WS2纳米片的横向尺寸约为3~5μm,片层厚度为15~30层;
(2)硅片窗口区域外进行封胶带处理以保留窗口区域外的氧化层,然后在质量浓度为7%HF溶液中反应4min去除窗口区域和硅片背面的氧化层,去除硅片氧化层上的胶带,依次经丙酮、乙醇和去离子水的超声清洗,吹干得到预处理硅片;其中硅片为1×1cm2,硅片窗口区域为0.3×0.3cm2;
(3)将步骤(1)WS2纳米片悬浮液超声处理2.5h使MoS2纳米片分散均匀,预处理硅片的窗口区域引入WS2纳米片悬浮液,烘干成膜得到WS2纳米片膜;引入方法为旋涂,旋涂速度为1000rpm,时间为40S;成膜温度为60℃;
(4)采用湿法转移法,将4层的片层石墨烯转移至步骤(3)的硅片的窗口区域的WS2纳米片膜上;
(5)在硅片的氧化层上涂抹导电层(导电银浆),硅片背面涂抹背电极In-Ga合金即得Gr/WS2/Si太阳能电池;
本实施例Gr/WS2/Si太阳能电池在100mW白光照射下的电流-电压特征曲线可知,WS2纳米片引入电池后经过测试,得到的电池的明场曲线,其转换效率可以达到3.79%。
实施例7:一种Gr/WS2/Si太阳能电池的制备方法,具体步骤如下:
(1)以石墨为阳极,WS2晶体为阴极,在季铵盐/乙腈溶液中恒压电化学反应20h得到季铵离子插层WS2晶体,季铵离子插层WS2晶体置于DMF/PVP溶液中超声剥离1h,经异丙醇洗涤6次得到WS2纳米片悬浮液(异丙醇悬浮液);其中季铵盐为四己基溴化铵,四己基溴化铵/乙腈溶液中四己基溴化铵的浓度为1.8mol/L,恒压电化学反应的电压为50V,DMF/PVP溶液中DMF浓度为1.8mol/L;WS2纳米片的横向尺寸约为0.1~1μm,片层厚度为1~5层;
(2)硅片窗口区域外进行封胶带处理以保留窗口区域外的氧化层,然后在质量浓度为8%HF溶液中反应1.2min去除窗口区域和硅片背面的氧化层,去除硅片氧化层上的胶带,依次经丙酮、乙醇和去离子水的超声清洗,吹干得到预处理硅片;其中硅片为1×1cm2,硅片窗口区域为0.3×0.3cm2;
(3)将步骤(1)WS2纳米片悬浮液超声处理3.5h使MoS2纳米片分散均匀,预处理硅片的窗口区域引入WS2纳米片悬浮液,烘干成膜得到WS2纳米片膜;引入方法为旋涂,旋涂速度为2000rpm,时间为50S;成膜温度为200℃;
(4)采用湿法转移法,将2层的片层石墨烯转移至步骤(3)的硅片的窗口区域的WS2纳米片膜上;
(5)在硅片的氧化层上涂抹导电层(导电银浆),硅片背面涂抹背电极In-Ga合金即得Gr/WS2/Si太阳能电池;
本实施例Gr/WS2/Si太阳能电池在100mW白光照射下的电流-电压特征曲线可知,WS2纳米片引入电池后经过测试,得到的电池的明场曲线,其转换效率可以达到4.88%。
实施例8:一种Gr/WS2/Si太阳能电池的制备方法,具体步骤如下:
(1)以石墨为阳极,WS2晶体为阴极,在季铵盐/乙腈溶液中恒压电化学反应15h得到季铵离子插层WS2晶体,季铵离子插层WS2晶体置于DMF/PVP溶液中超声剥离3h,经异丙醇洗涤9次得到WS2纳米片悬浮液(异丙醇悬浮液);其中季铵盐为四丙基溴化铵,四丙基溴化铵/乙腈溶液中四丙基溴化铵的浓度为2mol/L,恒压电化学反应的电压为45V,DMF/PVP溶液中DMF浓度为2mol/L;WS2纳米片的横向尺寸约为1~3μm,片层厚度为10~15层;
(2)硅片窗口区域外进行封胶带处理以保留窗口区域外的氧化层,然后在质量浓度为10%HF溶液中反应1min去除窗口区域和硅片背面的氧化层,去除硅片氧化层上的胶带,依次经丙酮、乙醇和去离子水的超声清洗,吹干得到预处理硅片;其中硅片为1×1cm2,硅片窗口区域为0.3×0.3cm2;
(3)将步骤(1)WS2纳米片悬浮液超声处理4h使MoS2纳米片分散均匀,预处理硅片的窗口区域引入WS2纳米片悬浮液,烘干成膜得到WS2纳米片膜;引入方法为旋涂,旋涂速度为5000rpm,时间为10S;成膜温度为180℃;
(4)采用湿法转移法,将5层的片层石墨烯转移至步骤(3)的硅片的窗口区域的WS2纳米片膜上;
(5)在硅片的氧化层上涂抹导电层(导电银浆),硅片背面涂抹背电极In-Ga合金即得Gr/WS2/Si太阳能电池;
本实施例Gr/WS2/Si太阳能电池在100mW白光照射下的电流-电压特征曲线可知,WS2纳米片引入电池后经过测试,得到的电池的明场曲线,其转换效率可以达到3.67%。
实施例9:一种Gr/MoSe2/Si太阳能电池的制备方法,具体步骤如下:
(1)以石墨为阳极,MoSe2晶体为阴极,在季铵盐/乙腈溶液中恒压电化学反应10h得到季铵离子插层MoSe2晶体,季铵离子插层MoSe2晶体置于DMF/PVP溶液中超声剥离2h,经异丙醇洗涤7次得到MoSe2纳米片悬浮液(异丙醇悬浮液);其中季铵盐为四己基氯化铵,四己基氯化铵/乙腈溶液中四己基氯化铵的浓度为0.2mol/L,恒压电化学反应的电压为10V,DMF/PVP溶液中DMF浓度为0.2mol/L;
(2)硅片窗口区域外进行封胶带处理以保留窗口区域外的氧化层,然后在质量浓度为2%HF溶液中反应3min去除窗口区域和硅片背面的氧化层,去除硅片氧化层上的胶带,依次经丙酮、乙醇和去离子水的超声清洗,吹干得到预处理硅片;其中硅片为1×1cm2,硅片窗口区域为0.3×0.3cm2;
(3)将步骤(1)MoSe2纳米片悬浮液超声处理2h使MoSe2纳米片分散均匀,预处理硅片的窗口区域引入MoSe2纳米片悬浮液,烘干成膜得到MoSe2纳米片膜;引入方法为旋涂,旋涂速度为3000rpm,时间为30S;成膜温度为70℃;
(4)采用湿法转移法,将3层的片层石墨烯转移至步骤(3)的硅片的窗口区域的MoSe2纳米片膜上;
(5)在硅片的氧化层上涂抹导电层(导电银浆),硅片背面涂抹背电极In-Ga合金即得Gr/MoSe2/Si太阳能电池;
本实施例Gr/MoSe2/Si太阳能电池在100mW白光照射下的电流-电压特征曲线可知,MoSe2纳米片引入电池后经过测试,得到的电池的明场曲线,其转换效率可以达6.52%。
实施例9:一种Gr/WSe2/Si太阳能电池的制备方法,具体步骤如下:
(1)以石墨为阳极,WSe2晶体为阴极,在季铵盐/乙腈溶液中恒压电化学反应10h得到季铵离子插层WSe2晶体,季铵离子插层WSe2晶体置于DMF/PVP溶液中超声剥离2h,经异丙醇洗涤7次得到WSe2纳米片悬浮液(异丙醇悬浮液);其中季铵盐为四丁基碘化铵,四丁基碘化铵/乙腈溶液中四丁基碘化铵的浓度为0.2mol/L,恒压电化学反应的电压为10V,DMF/PVP溶液中DMF浓度为0.2mol/L;
(2)硅片窗口区域外进行封胶带处理以保留窗口区域外的氧化层,然后在质量浓度为2%HF溶液中反应3min去除窗口区域和硅片背面的氧化层,去除硅片氧化层上的胶带,依次经丙酮、乙醇和去离子水的超声清洗,吹干得到预处理硅片;其中硅片为1×1cm2,硅片窗口区域为0.3×0.3cm2;
(3)将步骤(1)WSe2纳米片悬浮液超声处理2h使WSe2纳米片分散均匀,预处理硅片的窗口区域引入WSe2纳米片悬浮液,烘干成膜得到WSe2纳米片膜;引入方法为旋涂,旋涂速度为3000rpm,时间为30S;成膜温度为70℃;
(4)采用湿法转移法,将3层的片层石墨烯转移至步骤(3)的硅片的窗口区域的WSe2纳米片膜上;
(5)在硅片的氧化层上涂抹导电层(导电银浆),硅片背面涂抹背电极In-Ga合金即得Gr/WSe2/Si太阳能电池;
本实施例Gr/WSe2/Si太阳能电池在100mW白光照射下的电流-电压特征曲线可知,WSe2纳米片引入电池后经过测试,得到的电池的明场曲线,其转换效率可以达7.38%。
实施例9:一种Gr/MoTe2/Si太阳能电池的制备方法,具体步骤如下:
(1)以石墨为阳极,MoTe2晶体为阴极,在季铵盐/乙腈溶液中恒压电化学反应10h得到季铵离子插层MoTe2晶体,季铵离子插层MoTe2晶体置于DMF/PVP溶液中超声剥离2h,经异丙醇洗涤7次得到MoTe2纳米片悬浮液(异丙醇悬浮液);其中季铵盐为四己基氯化铵,四己基氯化铵/乙腈溶液中四己基氯化铵的浓度为0.2mol/L,恒压电化学反应的电压为10V,DMF/PVP溶液中DMF浓度为0.2mol/L;
(2)硅片窗口区域外进行封胶带处理以保留窗口区域外的氧化层,然后在质量浓度为2%HF溶液中反应3min去除窗口区域和硅片背面的氧化层,去除硅片氧化层上的胶带,依次经丙酮、乙醇和去离子水的超声清洗,吹干得到预处理硅片;其中硅片为1×1cm2,硅片窗口区域为0.3×0.3cm2;
(3)将步骤(1)MoTe2纳米片悬浮液超声处理2h使MoTe2纳米片分散均匀,预处理硅片的窗口区域引入MoTe2纳米片悬浮液,烘干成膜得到MoTe2纳米片膜;引入方法为旋涂,旋涂速度为3000rpm,时间为30S;成膜温度为70℃;
(4)采用湿法转移法,将3层的片层石墨烯转移至步骤(3)的硅片的窗口区域的MoTe2纳米片膜上;
(5)在硅片的氧化层上涂抹导电层(导电银浆),硅片背面涂抹背电极In-Ga合金即得Gr/MoTe2/Si太阳能电池;
本实施例Gr/MoTe2/Si太阳能电池在100mW白光照射下的电流-电压特征曲线可知,MoTe2纳米片引入电池后经过测试,得到的电池的明场曲线,其转换效率可以达5.84%。
实施例9:一种Gr/WTe2/Si太阳能电池的制备方法,具体步骤如下:
(1)以石墨为阳极,WTe2晶体为阴极,在季铵盐/乙腈溶液中恒压电化学反应10h得到季铵离子插层WTe2晶体,季铵离子插层WSe2晶体置于DMF/PVP溶液中超声剥离2h,经异丙醇洗涤7次得到WTe2纳米片悬浮液(异丙醇悬浮液);其中季铵盐为四丁基氟化铵,四丁基氟化铵/乙腈溶液中四丁基氟化铵的浓度为0.2mol/L,恒压电化学反应的电压为10V,DMF/PVP溶液中DMF浓度为0.2mol/L;
(2)硅片窗口区域外进行封胶带处理以保留窗口区域外的氧化层,然后在质量浓度为2%HF溶液中反应3min去除窗口区域和硅片背面的氧化层,去除硅片氧化层上的胶带,依次经丙酮、乙醇和去离子水的超声清洗,吹干得到预处理硅片;其中硅片为1×1cm2,硅片窗口区域为0.3×0.3cm2;
(3)将步骤(1)WSe2纳米片悬浮液超声处理2h使WTe2纳米片分散均匀,预处理硅片的窗口区域引入WTe2纳米片悬浮液,烘干成膜得到WTe2纳米片膜;引入方法为旋涂,旋涂速度为3000rpm,时间为30S;成膜温度为70℃;
(4)采用湿法转移法,将3层的片层石墨烯转移至步骤(3)的硅片的窗口区域的WSe2纳米片膜上;
(5)在硅片的氧化层上涂抹导电层(导电银浆),硅片背面涂抹背电极In-Ga合金即得Gr/WTe2/Si太阳能电池;
本实施例Gr/WTe2/Si太阳能电池在100mW白光照射下的电流-电压特征曲线可知,WSe2纳米片引入电池后经过测试,得到的电池的明场曲线,其转换效率可以达8.12%。
上面对本发明的具体实施例作了详细说明,但是本发明并不限于上述实施例,在本领域普通技术人员所具备的知识范围内,还可以在不脱离本发明宗旨的前提下作出各种变化。
Claims (9)
1.一种Gr/MX2/Si太阳能电池的制备方法,其特征在于,具体步骤如下:
(1)以石墨为阳极,MX2晶体为阴极,在季铵盐/乙腈溶液中恒压电化学反应得到季铵离子插层MX2晶体,季铵离子插层MX2晶体置于DMF/PVP溶液中超声剥离,洗涤得到MX2纳米片悬浮液;
(2)硅片窗口区域外进行封胶处理以保留窗口区域外的氧化层,然后在HF溶液中反应去除窗口区域和硅片背面的氧化层,去除硅片氧化层上的胶,清洗吹干得到预处理硅片;
(3)将步骤(1)MX2纳米片悬浮液超声处理,预处理硅片的窗口区域引入MX2纳米片悬浮液,烘干得到MX2纳米片膜;
(4)采用湿法转移法,将片层石墨烯转移至步骤(3)的硅片的窗口区域的MX2纳米片膜上;
(5)在硅片的氧化层上涂抹导电层,硅片背面涂抹背电极即得Gr/MX2/Si太阳能电池。
2.根据权利要求1所述Gr/MX2/Si太阳能电池的制备方法,其特征在于:步骤(1)MX2晶体为MoS2、WS2、MoSe2、WSe2、MoTe2或WTe2,季铵盐为氟化季铵、氯化季铵、溴化季铵或碘化季铵。
3.根据权利要求2所述Gr/MX2/Si太阳能电池的制备方法,其特征在于:氟化季铵为四己基氟化铵、四乙基氟化铵、四丙基氟化铵或四丁基氟化铵;氯化季铵为四己基氯化铵、四乙基氯化铵、四丙基氯化铵或四丁基氯化铵;溴化季铵为四己基溴化铵、四乙基溴化铵、四丙基溴化铵或四丁基溴化铵;碘化季铵为四己基碘化铵、四乙基碘化铵、四丙基碘化铵或四丁基碘化铵。
4.根据权利要求1所述Gr/MX2/Si太阳能电池的制备方法,其特征在于:季铵盐/乙腈溶液中季铵盐的浓度为0.1~2mol/L,DMF/PVP溶液中DMF浓度为0.1~2mol/L。
5.根据权利要求1所述Gr/MX2/Si太阳能电池的制备方法,其特征在于:恒压电化学反应的电压为0.5~50V,时间为1~24h。
6.根据权利要求1所述Gr/MX2/Si太阳能电池的制备方法,其特征在于:步骤(2)HF溶液的质量浓度为1%~10%,反应时间为1~10min。
7.根据权利要求1所述Gr/MX2/Si太阳能电池的制备方法,其特征在于:步骤(3)MX2纳米片膜的厚度为1~8nm。
8.根据权利要求1所述Gr/MX2/Si太阳能电池的制备方法,其特征在于:步骤(4)片层石墨烯为1~6层。
9.根据权利要求1所述Gr/MX2/Si太阳能电池的制备方法,其特征在于:步骤(5)导电层为Au或Ag,背电极为Al或In-Ga合金。
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