CN109298594B - 玻璃再生处理方法、再生玻璃基板及使用其的光掩模坯料和光掩模 - Google Patents

玻璃再生处理方法、再生玻璃基板及使用其的光掩模坯料和光掩模 Download PDF

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Publication number
CN109298594B
CN109298594B CN201811229615.6A CN201811229615A CN109298594B CN 109298594 B CN109298594 B CN 109298594B CN 201811229615 A CN201811229615 A CN 201811229615A CN 109298594 B CN109298594 B CN 109298594B
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China
Prior art keywords
photomask
glass substrate
treatment
thin film
metal thin
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Chinese (zh)
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CN109298594A (zh
Inventor
木下一树
二岛悟
青木阳祐
板仓敬二郎
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Dai Nippon Printing Co Ltd
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Dai Nippon Printing Co Ltd
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B09—DISPOSAL OF SOLID WASTE; RECLAMATION OF CONTAMINATED SOIL
    • B09B—DISPOSAL OF SOLID WASTE NOT OTHERWISE PROVIDED FOR
    • B09B5/00—Operations not covered by a single other subclass or by a single other group in this subclass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/32—After-treatment
    • C03C2218/328—Partly or completely removing a coating
    • C03C2218/33—Partly or completely removing a coating by etching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Environmental & Geological Engineering (AREA)
  • Surface Treatment Of Glass (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
CN201811229615.6A 2012-09-26 2013-09-19 玻璃再生处理方法、再生玻璃基板及使用其的光掩模坯料和光掩模 Active CN109298594B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2012211636 2012-09-26
JP2012-211636 2012-09-26
JP2013116166 2013-05-31
JP2013-116166 2013-05-31
CN201380047359.8A CN104620176B (zh) 2012-09-26 2013-09-19 玻璃再生处理方法、再生玻璃基板及使用其的光掩模坯料和光掩模

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CN201380047359.8A Division CN104620176B (zh) 2012-09-26 2013-09-19 玻璃再生处理方法、再生玻璃基板及使用其的光掩模坯料和光掩模

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Publication Number Publication Date
CN109298594A CN109298594A (zh) 2019-02-01
CN109298594B true CN109298594B (zh) 2021-12-24

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CN201811229615.6A Active CN109298594B (zh) 2012-09-26 2013-09-19 玻璃再生处理方法、再生玻璃基板及使用其的光掩模坯料和光掩模
CN201380047359.8A Active CN104620176B (zh) 2012-09-26 2013-09-19 玻璃再生处理方法、再生玻璃基板及使用其的光掩模坯料和光掩模

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Country Status (5)

Country Link
JP (2) JP6256344B2 (ko)
KR (3) KR101963996B1 (ko)
CN (2) CN109298594B (ko)
TW (1) TWI558677B (ko)
WO (1) WO2014050700A1 (ko)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104932194A (zh) * 2015-07-22 2015-09-23 京东方科技集团股份有限公司 一种掩膜板及其制备方法、掩膜板的回收方法
CN112404100A (zh) * 2020-11-03 2021-02-26 福建晶安光电有限公司 一种滤波器基片的回收工艺

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CN101101440A (zh) * 2006-07-06 2008-01-09 富士通日立等离子显示器股份有限公司 图案形成用玻璃掩模及其制造方法和制造装置
KR20080076807A (ko) * 2007-02-14 2008-08-20 주식회사 코젝스 감광성 수지조성물을 이용한 글라스 가공방법
CN101821058A (zh) * 2008-06-11 2010-09-01 信越化学工业株式会社 合成石英玻璃基板用抛光剂
CN102372424A (zh) * 2010-08-12 2012-03-14 Hoya株式会社 掩模坯用基板、掩模坯和转印用掩模的制造方法

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JPS626259A (ja) * 1985-07-02 1987-01-13 Sharp Corp フオトマスク基板
JPH02102142A (ja) 1988-10-07 1990-04-13 Sony Corp 石英製治具の再生方法
JPH05143981A (ja) * 1991-11-25 1993-06-11 Kao Corp 基板の洗浄方法
JPH07230081A (ja) * 1994-02-17 1995-08-29 Toppan Printing Co Ltd ガラス基板の回収方法
JPH0839025A (ja) * 1994-07-28 1996-02-13 Olympus Optical Co Ltd 洗浄方法
JPH08151599A (ja) * 1994-11-30 1996-06-11 Olympus Optical Co Ltd 仕上げ洗浄用組成物および仕上げ洗浄方法
JPH09241684A (ja) * 1996-03-04 1997-09-16 Olympus Optical Co Ltd 洗浄組成物及び洗浄方法
JPH11172148A (ja) * 1997-12-12 1999-06-29 Kobe Steel Ltd 親水性塗料及び親水性基材の製造方法
JP4035251B2 (ja) * 1999-02-03 2008-01-16 株式会社神戸製鋼所 表面親水性を有する基材及びその製造方法
KR20010068561A (ko) * 2000-01-06 2001-07-23 윤여선 마스크 재생방법
JP3764734B2 (ja) * 2002-07-17 2006-04-12 Ｈｏｙａ株式会社 マスクブランクスの製造方法
US20040137828A1 (en) * 2002-07-17 2004-07-15 Hoya Corporation Glass substrate for a mask blank, method of producing a glass substrate for a mask blank, mask blank, method of producing the mask blank, transfer mask, and method of producing a transfer mask
JP2004089807A (ja) * 2002-08-30 2004-03-25 Central Glass Co Ltd 洗浄装置および洗浄方法
US7691279B2 (en) * 2003-03-27 2010-04-06 Hoya Corporation Method of producing a glass substrate for a mask blank and method of producing a mask blank
JP4497909B2 (ja) * 2003-12-16 2010-07-07 Ｈｏｙａ株式会社 マスクブランクス用ガラス基板の再生方法、マスクブランクスの製造方法及び転写用マスクの製造方法
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JP5578708B2 (ja) * 2010-04-19 2014-08-27 Ｈｏｙａ株式会社 Ｆｐｄ製造用再生フォトマスク基板の製造方法、再生フォトマスク用ブランクの製造方法、ペリクル付再生フォトマスクの製造方法及びパターン転写方法
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KR20080076807A (ko) * 2007-02-14 2008-08-20 주식회사 코젝스 감광성 수지조성물을 이용한 글라스 가공방법
CN101821058A (zh) * 2008-06-11 2010-09-01 信越化学工业株式会社 合成石英玻璃基板用抛光剂
CN102372424A (zh) * 2010-08-12 2012-03-14 Hoya株式会社 掩模坯用基板、掩模坯和转印用掩模的制造方法

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Publication number Publication date
JP2018045253A (ja) 2018-03-22
KR20180129996A (ko) 2018-12-05
JPWO2014050700A1 (ja) 2016-08-22
JP6256344B2 (ja) 2018-01-10
KR101963996B1 (ko) 2019-03-29
CN104620176A (zh) 2015-05-13
KR101848983B1 (ko) 2018-04-13
CN104620176B (zh) 2019-02-26
KR20170125119A (ko) 2017-11-13
KR102085058B1 (ko) 2020-03-05
CN109298594A (zh) 2019-02-01
TW201427918A (zh) 2014-07-16
WO2014050700A1 (ja) 2014-04-03
TWI558677B (zh) 2016-11-21
KR20150050557A (ko) 2015-05-08

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