CN108227373B - 用于压印光刻的流体滴落方法和装置 - Google Patents

用于压印光刻的流体滴落方法和装置 Download PDF

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Publication number
CN108227373B
CN108227373B CN201711281189.6A CN201711281189A CN108227373B CN 108227373 B CN108227373 B CN 108227373B CN 201711281189 A CN201711281189 A CN 201711281189A CN 108227373 B CN108227373 B CN 108227373B
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China
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substrate
fluid
fluid dispensing
pass
dispensing port
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Chinese (zh)
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CN108227373A (zh
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E·B·弗莱彻
T·B·斯达霍维克
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Canon Inc
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Canon Inc
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Priority claimed from US15/375,966 external-priority patent/US10634993B2/en
Priority claimed from US15/375,912 external-priority patent/US10481491B2/en
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Publication of CN108227373A publication Critical patent/CN108227373A/zh
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2012—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)
CN201711281189.6A 2016-12-12 2017-12-07 用于压印光刻的流体滴落方法和装置 Active CN108227373B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US15/375,966 US10634993B2 (en) 2016-12-12 2016-12-12 Fluid droplet methodology and apparatus for imprint lithography
US15/375,966 2016-12-12
US15/375,912 2016-12-12
US15/375,912 US10481491B2 (en) 2016-12-12 2016-12-12 Fluid droplet methodology and apparatus for imprint lithography

Publications (2)

Publication Number Publication Date
CN108227373A CN108227373A (zh) 2018-06-29
CN108227373B true CN108227373B (zh) 2022-02-08

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CN201711281189.6A Active CN108227373B (zh) 2016-12-12 2017-12-07 用于压印光刻的流体滴落方法和装置

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JP (1) JP7079085B2 (enExample)
KR (1) KR102205141B1 (enExample)
CN (1) CN108227373B (enExample)
SG (1) SG10201709153VA (enExample)
TW (1) TWI715815B (enExample)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10468247B2 (en) * 2016-12-12 2019-11-05 Canon Kabushiki Kaisha Fluid droplet methodology and apparatus for imprint lithography
US11209730B2 (en) * 2019-03-14 2021-12-28 Canon Kabushiki Kaisha Methods of generating drop patterns, systems for shaping films with the drop pattern, and methods of manufacturing an article with the drop pattern
US11762295B2 (en) 2020-10-28 2023-09-19 Canon Kabushiki Kaisha Fluid droplet methodology and apparatus for imprint lithography
JP7610461B2 (ja) * 2021-04-08 2025-01-08 キヤノン株式会社 インプリント装置、インプリント方法、物品の製造方法、決定方法、およびプログラム
CN120178595B (zh) * 2025-05-20 2025-07-22 普雨科技(苏州)有限公司 一种步进式重复纳米压印设备、控制方法及控制系统

Citations (6)

* Cited by examiner, † Cited by third party
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WO2010047758A1 (en) * 2008-10-21 2010-04-29 Molecular Imprints, Inc. Robust optimization to generate drop patterns in imprint lithography
CN101900937A (zh) * 2009-02-04 2010-12-01 Asml荷兰有限公司 压印光刻方法和设备
CN101990470A (zh) * 2008-04-01 2011-03-23 分子制模股份有限公司 大面积辊子对辊子的刻印平版印刷
CN102566300A (zh) * 2010-11-22 2012-07-11 Asml荷兰有限公司 定位系统、光刻设备和用于定位控制的方法
JP2015213130A (ja) * 2014-05-02 2015-11-26 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
CN105584030A (zh) * 2014-11-11 2016-05-18 佳能株式会社 压印方法、压印设备、模具和产品制造方法

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EP0533486B1 (en) * 1991-09-19 1997-08-06 Canon Kabushiki Kaisha Serial recording system capable of varying resolution
US6536883B2 (en) 2001-02-16 2003-03-25 Eastman Kodak Company Continuous ink-jet printer having two dimensional nozzle array and method of increasing ink drop density
JP3922177B2 (ja) * 2002-02-12 2007-05-30 セイコーエプソン株式会社 成膜方法、成膜装置、液滴吐出装置、カラーフィルタの製造方法、表示装置の製造方法
US7559619B2 (en) * 2002-08-20 2009-07-14 Palo Alto Research Center Incorporated Digital lithography using real time quality control
JP4168788B2 (ja) 2003-03-06 2008-10-22 セイコーエプソン株式会社 成膜方法、カラーフィルタ基板の製造方法、エレクトロルミネッセンス装置用基板の製造方法、表示装置の製造方法
JP4337586B2 (ja) 2004-03-10 2009-09-30 セイコーエプソン株式会社 光学被膜の形成方法及びその方法で製造された光学物品
US8001924B2 (en) 2006-03-31 2011-08-23 Asml Netherlands B.V. Imprint lithography
US8707890B2 (en) * 2006-07-18 2014-04-29 Asml Netherlands B.V. Imprint lithography
JP4908369B2 (ja) 2007-10-02 2012-04-04 株式会社東芝 インプリント方法及びインプリントシステム
JP5495767B2 (ja) 2009-12-21 2014-05-21 キヤノン株式会社 インプリント装置及び方法、並びに物品の製造方法
JP2012015324A (ja) * 2010-06-30 2012-01-19 Fujifilm Corp 液体塗布装置及び液体塗布方法並びにナノインプリントシステム
JP5748291B2 (ja) 2012-02-29 2015-07-15 富士フイルム株式会社 液体吐出装置、ナノインプリントシステム及び液体吐出方法
JP6135119B2 (ja) 2012-12-19 2017-05-31 大日本印刷株式会社 インプリント方法、インプリント樹脂滴下位置決定方法及びインプリント装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101990470A (zh) * 2008-04-01 2011-03-23 分子制模股份有限公司 大面积辊子对辊子的刻印平版印刷
WO2010047758A1 (en) * 2008-10-21 2010-04-29 Molecular Imprints, Inc. Robust optimization to generate drop patterns in imprint lithography
CN101900937A (zh) * 2009-02-04 2010-12-01 Asml荷兰有限公司 压印光刻方法和设备
CN102566300A (zh) * 2010-11-22 2012-07-11 Asml荷兰有限公司 定位系统、光刻设备和用于定位控制的方法
JP2015213130A (ja) * 2014-05-02 2015-11-26 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
CN105584030A (zh) * 2014-11-11 2016-05-18 佳能株式会社 压印方法、压印设备、模具和产品制造方法

Also Published As

Publication number Publication date
JP2018098506A (ja) 2018-06-21
TWI715815B (zh) 2021-01-11
KR20180067415A (ko) 2018-06-20
CN108227373A (zh) 2018-06-29
SG10201709153VA (en) 2018-07-30
JP7079085B2 (ja) 2022-06-01
KR102205141B1 (ko) 2021-01-20
TW201833668A (zh) 2018-09-16

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