SG10201709153VA - Fluid droplet methodology and apparatus for imprint lithography - Google Patents

Fluid droplet methodology and apparatus for imprint lithography

Info

Publication number
SG10201709153VA
SG10201709153VA SG10201709153VA SG10201709153VA SG10201709153VA SG 10201709153V A SG10201709153V A SG 10201709153VA SG 10201709153V A SG10201709153V A SG 10201709153VA SG 10201709153V A SG10201709153V A SG 10201709153VA SG 10201709153V A SG10201709153V A SG 10201709153VA
Authority
SG
Singapore
Prior art keywords
fluid
imprint lithography
dispense
fluid droplet
transmit information
Prior art date
Application number
SG10201709153VA
Other languages
English (en)
Inventor
Brian Fletcher Edward
Brian Stachowiak Timothy
Original Assignee
Canon Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US15/375,966 external-priority patent/US10634993B2/en
Priority claimed from US15/375,912 external-priority patent/US10481491B2/en
Application filed by Canon Kk filed Critical Canon Kk
Publication of SG10201709153VA publication Critical patent/SG10201709153VA/en

Links

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)
SG10201709153VA 2016-12-12 2017-11-07 Fluid droplet methodology and apparatus for imprint lithography SG10201709153VA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US15/375,966 US10634993B2 (en) 2016-12-12 2016-12-12 Fluid droplet methodology and apparatus for imprint lithography
US15/375,912 US10481491B2 (en) 2016-12-12 2016-12-12 Fluid droplet methodology and apparatus for imprint lithography

Publications (1)

Publication Number Publication Date
SG10201709153VA true SG10201709153VA (en) 2018-07-30

Family

ID=62634796

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201709153VA SG10201709153VA (en) 2016-12-12 2017-11-07 Fluid droplet methodology and apparatus for imprint lithography

Country Status (5)

Country Link
JP (1) JP7079085B2 (enExample)
KR (1) KR102205141B1 (enExample)
CN (1) CN108227373B (enExample)
SG (1) SG10201709153VA (enExample)
TW (1) TWI715815B (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10468247B2 (en) * 2016-12-12 2019-11-05 Canon Kabushiki Kaisha Fluid droplet methodology and apparatus for imprint lithography
US11209730B2 (en) * 2019-03-14 2021-12-28 Canon Kabushiki Kaisha Methods of generating drop patterns, systems for shaping films with the drop pattern, and methods of manufacturing an article with the drop pattern
US11762295B2 (en) 2020-10-28 2023-09-19 Canon Kabushiki Kaisha Fluid droplet methodology and apparatus for imprint lithography
JP7610461B2 (ja) * 2021-04-08 2025-01-08 キヤノン株式会社 インプリント装置、インプリント方法、物品の製造方法、決定方法、およびプログラム
CN120178595B (zh) * 2025-05-20 2025-07-22 普雨科技(苏州)有限公司 一种步进式重复纳米压印设备、控制方法及控制系统

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0533486B1 (en) * 1991-09-19 1997-08-06 Canon Kabushiki Kaisha Serial recording system capable of varying resolution
US6536883B2 (en) 2001-02-16 2003-03-25 Eastman Kodak Company Continuous ink-jet printer having two dimensional nozzle array and method of increasing ink drop density
JP3922177B2 (ja) * 2002-02-12 2007-05-30 セイコーエプソン株式会社 成膜方法、成膜装置、液滴吐出装置、カラーフィルタの製造方法、表示装置の製造方法
US7559619B2 (en) * 2002-08-20 2009-07-14 Palo Alto Research Center Incorporated Digital lithography using real time quality control
JP4168788B2 (ja) 2003-03-06 2008-10-22 セイコーエプソン株式会社 成膜方法、カラーフィルタ基板の製造方法、エレクトロルミネッセンス装置用基板の製造方法、表示装置の製造方法
JP4337586B2 (ja) * 2004-03-10 2009-09-30 セイコーエプソン株式会社 光学被膜の形成方法及びその方法で製造された光学物品
US8001924B2 (en) 2006-03-31 2011-08-23 Asml Netherlands B.V. Imprint lithography
US8707890B2 (en) * 2006-07-18 2014-04-29 Asml Netherlands B.V. Imprint lithography
JP4908369B2 (ja) 2007-10-02 2012-04-04 株式会社東芝 インプリント方法及びインプリントシステム
US8187515B2 (en) * 2008-04-01 2012-05-29 Molecular Imprints, Inc. Large area roll-to-roll imprint lithography
US8586126B2 (en) * 2008-10-21 2013-11-19 Molecular Imprints, Inc. Robust optimization to generate drop patterns in imprint lithography which are tolerant of variations in drop volume and drop placement
NL2003875A (en) * 2009-02-04 2010-08-05 Asml Netherlands Bv Imprint lithography method and apparatus.
JP5495767B2 (ja) * 2009-12-21 2014-05-21 キヤノン株式会社 インプリント装置及び方法、並びに物品の製造方法
JP2012015324A (ja) * 2010-06-30 2012-01-19 Fujifilm Corp 液体塗布装置及び液体塗布方法並びにナノインプリントシステム
NL2007633A (en) * 2010-11-22 2012-05-23 Asml Netherlands Bv A positioning system, a lithographic apparatus and a method for positional control.
JP5748291B2 (ja) * 2012-02-29 2015-07-15 富士フイルム株式会社 液体吐出装置、ナノインプリントシステム及び液体吐出方法
JP6135119B2 (ja) * 2012-12-19 2017-05-31 大日本印刷株式会社 インプリント方法、インプリント樹脂滴下位置決定方法及びインプリント装置
JP6329425B2 (ja) * 2014-05-02 2018-05-23 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
US10620532B2 (en) * 2014-11-11 2020-04-14 Canon Kabushiki Kaisha Imprint method, imprint apparatus, mold, and article manufacturing method

Also Published As

Publication number Publication date
TWI715815B (zh) 2021-01-11
KR102205141B1 (ko) 2021-01-20
TW201833668A (zh) 2018-09-16
KR20180067415A (ko) 2018-06-20
CN108227373B (zh) 2022-02-08
JP2018098506A (ja) 2018-06-21
JP7079085B2 (ja) 2022-06-01
CN108227373A (zh) 2018-06-29

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