SG10201709153VA - Fluid droplet methodology and apparatus for imprint lithography - Google Patents

Fluid droplet methodology and apparatus for imprint lithography

Info

Publication number
SG10201709153VA
SG10201709153VA SG10201709153VA SG10201709153VA SG10201709153VA SG 10201709153V A SG10201709153V A SG 10201709153VA SG 10201709153V A SG10201709153V A SG 10201709153VA SG 10201709153V A SG10201709153V A SG 10201709153VA SG 10201709153V A SG10201709153V A SG 10201709153VA
Authority
SG
Singapore
Prior art keywords
fluid
imprint lithography
dispense
fluid droplet
transmit information
Prior art date
Application number
SG10201709153VA
Other languages
English (en)
Inventor
Brian Fletcher Edward
Brian Stachowiak Timothy
Original Assignee
Canon Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US15/375,966 external-priority patent/US10634993B2/en
Priority claimed from US15/375,912 external-priority patent/US10481491B2/en
Application filed by Canon Kk filed Critical Canon Kk
Publication of SG10201709153VA publication Critical patent/SG10201709153VA/en

Links

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)
SG10201709153VA 2016-12-12 2017-11-07 Fluid droplet methodology and apparatus for imprint lithography SG10201709153VA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US15/375,966 US10634993B2 (en) 2016-12-12 2016-12-12 Fluid droplet methodology and apparatus for imprint lithography
US15/375,912 US10481491B2 (en) 2016-12-12 2016-12-12 Fluid droplet methodology and apparatus for imprint lithography

Publications (1)

Publication Number Publication Date
SG10201709153VA true SG10201709153VA (en) 2018-07-30

Family

ID=62634796

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201709153VA SG10201709153VA (en) 2016-12-12 2017-11-07 Fluid droplet methodology and apparatus for imprint lithography

Country Status (5)

Country Link
JP (1) JP7079085B2 (enExample)
KR (1) KR102205141B1 (enExample)
CN (1) CN108227373B (enExample)
SG (1) SG10201709153VA (enExample)
TW (1) TWI715815B (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10468247B2 (en) * 2016-12-12 2019-11-05 Canon Kabushiki Kaisha Fluid droplet methodology and apparatus for imprint lithography
US11209730B2 (en) * 2019-03-14 2021-12-28 Canon Kabushiki Kaisha Methods of generating drop patterns, systems for shaping films with the drop pattern, and methods of manufacturing an article with the drop pattern
US11762295B2 (en) 2020-10-28 2023-09-19 Canon Kabushiki Kaisha Fluid droplet methodology and apparatus for imprint lithography
JP7610461B2 (ja) * 2021-04-08 2025-01-08 キヤノン株式会社 インプリント装置、インプリント方法、物品の製造方法、決定方法、およびプログラム
CN120178595B (zh) * 2025-05-20 2025-07-22 普雨科技(苏州)有限公司 一种步进式重复纳米压印设备、控制方法及控制系统

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0533486B1 (en) * 1991-09-19 1997-08-06 Canon Kabushiki Kaisha Serial recording system capable of varying resolution
US6536883B2 (en) 2001-02-16 2003-03-25 Eastman Kodak Company Continuous ink-jet printer having two dimensional nozzle array and method of increasing ink drop density
JP3922177B2 (ja) * 2002-02-12 2007-05-30 セイコーエプソン株式会社 成膜方法、成膜装置、液滴吐出装置、カラーフィルタの製造方法、表示装置の製造方法
US7559619B2 (en) * 2002-08-20 2009-07-14 Palo Alto Research Center Incorporated Digital lithography using real time quality control
JP4168788B2 (ja) 2003-03-06 2008-10-22 セイコーエプソン株式会社 成膜方法、カラーフィルタ基板の製造方法、エレクトロルミネッセンス装置用基板の製造方法、表示装置の製造方法
JP4337586B2 (ja) 2004-03-10 2009-09-30 セイコーエプソン株式会社 光学被膜の形成方法及びその方法で製造された光学物品
US8001924B2 (en) 2006-03-31 2011-08-23 Asml Netherlands B.V. Imprint lithography
US8707890B2 (en) * 2006-07-18 2014-04-29 Asml Netherlands B.V. Imprint lithography
JP4908369B2 (ja) 2007-10-02 2012-04-04 株式会社東芝 インプリント方法及びインプリントシステム
US8187515B2 (en) * 2008-04-01 2012-05-29 Molecular Imprints, Inc. Large area roll-to-roll imprint lithography
US8586126B2 (en) * 2008-10-21 2013-11-19 Molecular Imprints, Inc. Robust optimization to generate drop patterns in imprint lithography which are tolerant of variations in drop volume and drop placement
NL2003875A (en) * 2009-02-04 2010-08-05 Asml Netherlands Bv Imprint lithography method and apparatus.
JP5495767B2 (ja) 2009-12-21 2014-05-21 キヤノン株式会社 インプリント装置及び方法、並びに物品の製造方法
JP2012015324A (ja) * 2010-06-30 2012-01-19 Fujifilm Corp 液体塗布装置及び液体塗布方法並びにナノインプリントシステム
NL2007633A (en) * 2010-11-22 2012-05-23 Asml Netherlands Bv A positioning system, a lithographic apparatus and a method for positional control.
JP5748291B2 (ja) 2012-02-29 2015-07-15 富士フイルム株式会社 液体吐出装置、ナノインプリントシステム及び液体吐出方法
JP6135119B2 (ja) 2012-12-19 2017-05-31 大日本印刷株式会社 インプリント方法、インプリント樹脂滴下位置決定方法及びインプリント装置
JP6329425B2 (ja) * 2014-05-02 2018-05-23 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
US10620532B2 (en) * 2014-11-11 2020-04-14 Canon Kabushiki Kaisha Imprint method, imprint apparatus, mold, and article manufacturing method

Also Published As

Publication number Publication date
JP2018098506A (ja) 2018-06-21
TWI715815B (zh) 2021-01-11
CN108227373B (zh) 2022-02-08
KR20180067415A (ko) 2018-06-20
CN108227373A (zh) 2018-06-29
JP7079085B2 (ja) 2022-06-01
KR102205141B1 (ko) 2021-01-20
TW201833668A (zh) 2018-09-16

Similar Documents

Publication Publication Date Title
SG10201709153VA (en) Fluid droplet methodology and apparatus for imprint lithography
WO2017076872A3 (de) Verfahren und applikationsvorrichtung zum applizieren einer übertragungslage einer folie auf ein substrat
EP3627224A4 (en) FILM-FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FORMING FILM IN LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY AND PATTERN FORMING METHOD
MY165977A (en) Imprint lithography system and method
EP3543790A4 (en) RADIATION-SENSITIVE COMPOSITION, ORIGINAL PLATE FOR LITHOGRAPHIC PRINTING PLATE AND METHOD FOR PRODUCING A LITHOGRAPHIC PRINTING PLATE
WO2017052709A3 (en) Transfer learning in neural networks
EP3453523A4 (en) METHOD OF DELIVERING INKS FOR THREE-DIMENSIONAL PRINTING AND THREE-DIMENSIONAL PRINTING METHOD THEREWITH
EP3184590A4 (en) Color developing composition, lithographic printing original plate, method for making lithographic printing plate, and color developer
PH12017500317A1 (en) Transfer film and method for producing a transfer film
TW200609692A (en) Imprint alignment method, system, and template
CL2008000867A1 (es) Un metodo y aparato para generar un modelo de un objeto.
EP3409499A4 (en) Lithographic printing original plate and plate making method for lithographic printing plates
FR3025801B1 (fr) Composition de liquide, notamment encre, pour l'impression par jet continu devie binaire, a gouttes non chargees, utilisation de ladite composition, procede de marquage, et substrat marque.
WO2011016849A3 (en) Adjacent field alignment
EP3654102A4 (en) COMPOSITION FOR THE FORMING OF UNDERLAYER FILMS, PATTERN FORMATION PROCESS AND COPOLYMER FOR FORMING AN UNDERLAYMENT FILM USED FOR THE FORMATION OF PATTERNS
SG10201708703TA (en) Template replication
EP3421555A4 (en) INK COMPOSITION FOR 3D PRINTING SUPPORT AND 3D PRINTING MANUFACTURING THEREWITH
BR112018067683A2 (pt) formulação pré-revestimento para impressão, substrato para impressão, método de preparo de uma superfície para impressão, métodos para impressão de um padrão em um substrato, métodos para padronização de uma superfície, artigos padronizados, método de formação de um padrão linear sobre uma superfície, sistemas de impressão de tinta, e kit
CL2018003243A1 (es) Método para mejorar la adherencia de un tóner líquido impreso sobre un substrato, y productos de éste.
EP3128369A4 (en) Photosensitive resin composition, lithographic printing original plate and method for producing lithographic printing plate
WO2017030632A3 (en) Methods of providing semiconductor devices and semiconductor devices thereof
EP3632696A4 (en) LITHOGRAPHIC PRINTING PLATE PRECURSOR, PRODUCTION METHOD FOR LITHOGRAPHIC PRINTING PLATE, POLYMER PARTICLES AND COMPOSITION
EP3409498A4 (en) LITHOGRAPHIC ORIGINAL PRINTING PLATE FOR DEVELOPMENT ON THE PRESSURE PRESSURE, METHOD FOR PRODUCING A LITHOGRAPHIC PRINTING PLATE AND LITHOGRAPHIC PRINTING METHOD
MA40162B1 (fr) Impression électrostatique de compositions de cyclodextrine
EP2942667A3 (en) Patterning method using imprint mold, pattern structure fabricated by the method, and imprinting system