SG10201709153VA - Fluid droplet methodology and apparatus for imprint lithography - Google Patents
Fluid droplet methodology and apparatus for imprint lithographyInfo
- Publication number
- SG10201709153VA SG10201709153VA SG10201709153VA SG10201709153VA SG10201709153VA SG 10201709153V A SG10201709153V A SG 10201709153VA SG 10201709153V A SG10201709153V A SG 10201709153VA SG 10201709153V A SG10201709153V A SG 10201709153VA SG 10201709153V A SG10201709153V A SG 10201709153VA
- Authority
- SG
- Singapore
- Prior art keywords
- fluid
- imprint lithography
- dispense
- fluid droplet
- transmit information
- Prior art date
Links
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Coating Apparatus (AREA)
Abstract
FLUID DROPLET METHODOLOGY AND APPARATUS FOR IMPRINT LITHOGRAPHY An apparatus for imprint lithography is disclosed. The apparatus can include a fluid dispense system including fluid dispense ports, a stage; and a logic element. The logic element can be configured to determine a fluid droplet pattern; transmit information to dispense a formable material onto the substrate during a first pass, wherein the substrate and the fluid dispense ports move relative to each other in a translating direction; transmit information to offset the substrate and the fluid dispense ports relative to each other in another direction other than the translating direction; and transmit information to dispense the formable material onto the substrate during a second pass. A method of generating the fluid droplet pattern can be performed using the apparatus. < FIG. 7 >
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US15/375,912 US10481491B2 (en) | 2016-12-12 | 2016-12-12 | Fluid droplet methodology and apparatus for imprint lithography |
| US15/375,966 US10634993B2 (en) | 2016-12-12 | 2016-12-12 | Fluid droplet methodology and apparatus for imprint lithography |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG10201709153VA true SG10201709153VA (en) | 2018-07-30 |
Family
ID=62634796
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG10201709153VA SG10201709153VA (en) | 2016-12-12 | 2017-11-07 | Fluid droplet methodology and apparatus for imprint lithography |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP7079085B2 (en) |
| KR (1) | KR102205141B1 (en) |
| CN (1) | CN108227373B (en) |
| SG (1) | SG10201709153VA (en) |
| TW (1) | TWI715815B (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10468247B2 (en) * | 2016-12-12 | 2019-11-05 | Canon Kabushiki Kaisha | Fluid droplet methodology and apparatus for imprint lithography |
| US11209730B2 (en) * | 2019-03-14 | 2021-12-28 | Canon Kabushiki Kaisha | Methods of generating drop patterns, systems for shaping films with the drop pattern, and methods of manufacturing an article with the drop pattern |
| US11762295B2 (en) | 2020-10-28 | 2023-09-19 | Canon Kabushiki Kaisha | Fluid droplet methodology and apparatus for imprint lithography |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE69221410T2 (en) * | 1991-09-19 | 1997-12-11 | Canon Kk | Serial recording process with the possibility to change the resolution |
| US6536883B2 (en) * | 2001-02-16 | 2003-03-25 | Eastman Kodak Company | Continuous ink-jet printer having two dimensional nozzle array and method of increasing ink drop density |
| JP3922177B2 (en) * | 2002-02-12 | 2007-05-30 | セイコーエプソン株式会社 | Film forming method, film forming apparatus, droplet discharge apparatus, color filter manufacturing method, display apparatus manufacturing method |
| US7559619B2 (en) * | 2002-08-20 | 2009-07-14 | Palo Alto Research Center Incorporated | Digital lithography using real time quality control |
| JP4168788B2 (en) * | 2003-03-06 | 2008-10-22 | セイコーエプソン株式会社 | Film forming method, color filter substrate manufacturing method, electroluminescent device substrate manufacturing method, display device manufacturing method |
| JP4337586B2 (en) | 2004-03-10 | 2009-09-30 | セイコーエプソン株式会社 | Method of forming optical coating and optical article manufactured by the method |
| US8001924B2 (en) * | 2006-03-31 | 2011-08-23 | Asml Netherlands B.V. | Imprint lithography |
| US8707890B2 (en) | 2006-07-18 | 2014-04-29 | Asml Netherlands B.V. | Imprint lithography |
| JP4908369B2 (en) * | 2007-10-02 | 2012-04-04 | 株式会社東芝 | Imprint method and imprint system |
| US8187515B2 (en) * | 2008-04-01 | 2012-05-29 | Molecular Imprints, Inc. | Large area roll-to-roll imprint lithography |
| US8586126B2 (en) * | 2008-10-21 | 2013-11-19 | Molecular Imprints, Inc. | Robust optimization to generate drop patterns in imprint lithography which are tolerant of variations in drop volume and drop placement |
| NL2003875A (en) * | 2009-02-04 | 2010-08-05 | Asml Netherlands Bv | Imprint lithography method and apparatus. |
| JP5495767B2 (en) | 2009-12-21 | 2014-05-21 | キヤノン株式会社 | Imprint apparatus and method, and article manufacturing method |
| JP2012015324A (en) | 2010-06-30 | 2012-01-19 | Fujifilm Corp | Liquid coating apparatus and method and nano in-print system |
| NL2007633A (en) * | 2010-11-22 | 2012-05-23 | Asml Netherlands Bv | A positioning system, a lithographic apparatus and a method for positional control. |
| JP5748291B2 (en) | 2012-02-29 | 2015-07-15 | 富士フイルム株式会社 | Liquid ejection apparatus, nanoimprint system, and liquid ejection method |
| JP6135119B2 (en) | 2012-12-19 | 2017-05-31 | 大日本印刷株式会社 | Imprint method, imprint resin dripping position determination method, and imprint apparatus |
| JP6329425B2 (en) * | 2014-05-02 | 2018-05-23 | キヤノン株式会社 | Imprint apparatus, imprint method, and article manufacturing method |
| US10620532B2 (en) * | 2014-11-11 | 2020-04-14 | Canon Kabushiki Kaisha | Imprint method, imprint apparatus, mold, and article manufacturing method |
-
2017
- 2017-11-07 SG SG10201709153VA patent/SG10201709153VA/en unknown
- 2017-11-13 TW TW106139141A patent/TWI715815B/en active
- 2017-12-04 KR KR1020170164864A patent/KR102205141B1/en active IP Right Grant
- 2017-12-07 CN CN201711281189.6A patent/CN108227373B/en active Active
- 2017-12-08 JP JP2017236264A patent/JP7079085B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN108227373A (en) | 2018-06-29 |
| JP7079085B2 (en) | 2022-06-01 |
| KR102205141B1 (en) | 2021-01-20 |
| TW201833668A (en) | 2018-09-16 |
| KR20180067415A (en) | 2018-06-20 |
| TWI715815B (en) | 2021-01-11 |
| CN108227373B (en) | 2022-02-08 |
| JP2018098506A (en) | 2018-06-21 |
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