SG10201709153VA - Fluid droplet methodology and apparatus for imprint lithography - Google Patents

Fluid droplet methodology and apparatus for imprint lithography

Info

Publication number
SG10201709153VA
SG10201709153VA SG10201709153VA SG10201709153VA SG10201709153VA SG 10201709153V A SG10201709153V A SG 10201709153VA SG 10201709153V A SG10201709153V A SG 10201709153VA SG 10201709153V A SG10201709153V A SG 10201709153VA SG 10201709153V A SG10201709153V A SG 10201709153VA
Authority
SG
Singapore
Prior art keywords
fluid
imprint lithography
dispense
fluid droplet
transmit information
Prior art date
Application number
SG10201709153VA
Inventor
Brian Fletcher Edward
Brian Stachowiak Timothy
Original Assignee
Canon Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US15/375,912 external-priority patent/US10481491B2/en
Priority claimed from US15/375,966 external-priority patent/US10634993B2/en
Application filed by Canon Kk filed Critical Canon Kk
Publication of SG10201709153VA publication Critical patent/SG10201709153VA/en

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)

Abstract

FLUID DROPLET METHODOLOGY AND APPARATUS FOR IMPRINT LITHOGRAPHY An apparatus for imprint lithography is disclosed. The apparatus can include a fluid dispense system including fluid dispense ports, a stage; and a logic element. The logic element can be configured to determine a fluid droplet pattern; transmit information to dispense a formable material onto the substrate during a first pass, wherein the substrate and the fluid dispense ports move relative to each other in a translating direction; transmit information to offset the substrate and the fluid dispense ports relative to each other in another direction other than the translating direction; and transmit information to dispense the formable material onto the substrate during a second pass. A method of generating the fluid droplet pattern can be performed using the apparatus. < FIG. 7 >
SG10201709153VA 2016-12-12 2017-11-07 Fluid droplet methodology and apparatus for imprint lithography SG10201709153VA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US15/375,912 US10481491B2 (en) 2016-12-12 2016-12-12 Fluid droplet methodology and apparatus for imprint lithography
US15/375,966 US10634993B2 (en) 2016-12-12 2016-12-12 Fluid droplet methodology and apparatus for imprint lithography

Publications (1)

Publication Number Publication Date
SG10201709153VA true SG10201709153VA (en) 2018-07-30

Family

ID=62634796

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201709153VA SG10201709153VA (en) 2016-12-12 2017-11-07 Fluid droplet methodology and apparatus for imprint lithography

Country Status (5)

Country Link
JP (1) JP7079085B2 (en)
KR (1) KR102205141B1 (en)
CN (1) CN108227373B (en)
SG (1) SG10201709153VA (en)
TW (1) TWI715815B (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10468247B2 (en) * 2016-12-12 2019-11-05 Canon Kabushiki Kaisha Fluid droplet methodology and apparatus for imprint lithography
US11209730B2 (en) * 2019-03-14 2021-12-28 Canon Kabushiki Kaisha Methods of generating drop patterns, systems for shaping films with the drop pattern, and methods of manufacturing an article with the drop pattern
US11762295B2 (en) 2020-10-28 2023-09-19 Canon Kabushiki Kaisha Fluid droplet methodology and apparatus for imprint lithography

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69221410T2 (en) * 1991-09-19 1997-12-11 Canon Kk Serial recording process with the possibility to change the resolution
US6536883B2 (en) * 2001-02-16 2003-03-25 Eastman Kodak Company Continuous ink-jet printer having two dimensional nozzle array and method of increasing ink drop density
JP3922177B2 (en) * 2002-02-12 2007-05-30 セイコーエプソン株式会社 Film forming method, film forming apparatus, droplet discharge apparatus, color filter manufacturing method, display apparatus manufacturing method
US7559619B2 (en) * 2002-08-20 2009-07-14 Palo Alto Research Center Incorporated Digital lithography using real time quality control
JP4168788B2 (en) * 2003-03-06 2008-10-22 セイコーエプソン株式会社 Film forming method, color filter substrate manufacturing method, electroluminescent device substrate manufacturing method, display device manufacturing method
JP4337586B2 (en) 2004-03-10 2009-09-30 セイコーエプソン株式会社 Method of forming optical coating and optical article manufactured by the method
US8001924B2 (en) * 2006-03-31 2011-08-23 Asml Netherlands B.V. Imprint lithography
US8707890B2 (en) 2006-07-18 2014-04-29 Asml Netherlands B.V. Imprint lithography
JP4908369B2 (en) * 2007-10-02 2012-04-04 株式会社東芝 Imprint method and imprint system
US8187515B2 (en) * 2008-04-01 2012-05-29 Molecular Imprints, Inc. Large area roll-to-roll imprint lithography
US8586126B2 (en) * 2008-10-21 2013-11-19 Molecular Imprints, Inc. Robust optimization to generate drop patterns in imprint lithography which are tolerant of variations in drop volume and drop placement
NL2003875A (en) * 2009-02-04 2010-08-05 Asml Netherlands Bv Imprint lithography method and apparatus.
JP5495767B2 (en) 2009-12-21 2014-05-21 キヤノン株式会社 Imprint apparatus and method, and article manufacturing method
JP2012015324A (en) 2010-06-30 2012-01-19 Fujifilm Corp Liquid coating apparatus and method and nano in-print system
NL2007633A (en) * 2010-11-22 2012-05-23 Asml Netherlands Bv A positioning system, a lithographic apparatus and a method for positional control.
JP5748291B2 (en) 2012-02-29 2015-07-15 富士フイルム株式会社 Liquid ejection apparatus, nanoimprint system, and liquid ejection method
JP6135119B2 (en) 2012-12-19 2017-05-31 大日本印刷株式会社 Imprint method, imprint resin dripping position determination method, and imprint apparatus
JP6329425B2 (en) * 2014-05-02 2018-05-23 キヤノン株式会社 Imprint apparatus, imprint method, and article manufacturing method
US10620532B2 (en) * 2014-11-11 2020-04-14 Canon Kabushiki Kaisha Imprint method, imprint apparatus, mold, and article manufacturing method

Also Published As

Publication number Publication date
CN108227373A (en) 2018-06-29
JP7079085B2 (en) 2022-06-01
KR102205141B1 (en) 2021-01-20
TW201833668A (en) 2018-09-16
KR20180067415A (en) 2018-06-20
TWI715815B (en) 2021-01-11
CN108227373B (en) 2022-02-08
JP2018098506A (en) 2018-06-21

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