KR102205141B1 - 임프린트 리소그래피를 위한 유체 액적 방법 및 장치 - Google Patents

임프린트 리소그래피를 위한 유체 액적 방법 및 장치 Download PDF

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KR102205141B1
KR102205141B1 KR1020170164864A KR20170164864A KR102205141B1 KR 102205141 B1 KR102205141 B1 KR 102205141B1 KR 1020170164864 A KR1020170164864 A KR 1020170164864A KR 20170164864 A KR20170164864 A KR 20170164864A KR 102205141 B1 KR102205141 B1 KR 102205141B1
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Prior art keywords
fluid
substrate
fluid distribution
formable material
pitch
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Korean (ko)
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KR20180067415A (ko
Inventor
브라이언 에드워드 플렛쳐
브라이언 티모시 스태초위악
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캐논 가부시끼가이샤
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Priority claimed from US15/375,966 external-priority patent/US10634993B2/en
Priority claimed from US15/375,912 external-priority patent/US10481491B2/en
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2012—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)
KR1020170164864A 2016-12-12 2017-12-04 임프린트 리소그래피를 위한 유체 액적 방법 및 장치 Active KR102205141B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US15/375,966 US10634993B2 (en) 2016-12-12 2016-12-12 Fluid droplet methodology and apparatus for imprint lithography
US15/375,966 2016-12-12
US15/375,912 2016-12-12
US15/375,912 US10481491B2 (en) 2016-12-12 2016-12-12 Fluid droplet methodology and apparatus for imprint lithography

Publications (2)

Publication Number Publication Date
KR20180067415A KR20180067415A (ko) 2018-06-20
KR102205141B1 true KR102205141B1 (ko) 2021-01-20

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KR1020170164864A Active KR102205141B1 (ko) 2016-12-12 2017-12-04 임프린트 리소그래피를 위한 유체 액적 방법 및 장치

Country Status (5)

Country Link
JP (1) JP7079085B2 (enExample)
KR (1) KR102205141B1 (enExample)
CN (1) CN108227373B (enExample)
SG (1) SG10201709153VA (enExample)
TW (1) TWI715815B (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10468247B2 (en) * 2016-12-12 2019-11-05 Canon Kabushiki Kaisha Fluid droplet methodology and apparatus for imprint lithography
US11209730B2 (en) * 2019-03-14 2021-12-28 Canon Kabushiki Kaisha Methods of generating drop patterns, systems for shaping films with the drop pattern, and methods of manufacturing an article with the drop pattern
US11762295B2 (en) 2020-10-28 2023-09-19 Canon Kabushiki Kaisha Fluid droplet methodology and apparatus for imprint lithography
JP7610461B2 (ja) * 2021-04-08 2025-01-08 キヤノン株式会社 インプリント装置、インプリント方法、物品の製造方法、決定方法、およびプログラム
CN120178595B (zh) * 2025-05-20 2025-07-22 普雨科技(苏州)有限公司 一种步进式重复纳米压印设备、控制方法及控制系统

Citations (7)

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US20020113849A1 (en) 2001-02-16 2002-08-22 Eastman Kodak Company Continuous ink-jet printer having two dimensional nozzle array and method of increasing ink drop density
US20040228964A1 (en) 2003-03-06 2004-11-18 Tatsuya Ito Film-forming method, film-forming apparatus, apparatus and a method for manufacturing color filter substrate, apparatus and method for manufacturing substrate for electroluminescent device, method for manufacturing display device, display device, and electronic apparatus
US20060051498A1 (en) 2002-02-12 2006-03-09 Seiko Epson Corporation Display device having a color filter
US20070035597A1 (en) * 2002-08-20 2007-02-15 Palo Alto Research Center Incorporated Digital lithography using real time quality control
US20070237886A1 (en) 2006-03-31 2007-10-11 Asml Netherlands B.V. Imprint lithography
US20080018875A1 (en) * 2006-07-18 2008-01-24 Asml Netherlands B.V. Imprint lithography
US20090267268A1 (en) 2007-10-02 2009-10-29 Ikuo Yoneda Imprint system and imprint method

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Publication number Priority date Publication date Assignee Title
EP0533486B1 (en) * 1991-09-19 1997-08-06 Canon Kabushiki Kaisha Serial recording system capable of varying resolution
JP4337586B2 (ja) 2004-03-10 2009-09-30 セイコーエプソン株式会社 光学被膜の形成方法及びその方法で製造された光学物品
US8187515B2 (en) * 2008-04-01 2012-05-29 Molecular Imprints, Inc. Large area roll-to-roll imprint lithography
US8586126B2 (en) * 2008-10-21 2013-11-19 Molecular Imprints, Inc. Robust optimization to generate drop patterns in imprint lithography which are tolerant of variations in drop volume and drop placement
NL2003875A (en) * 2009-02-04 2010-08-05 Asml Netherlands Bv Imprint lithography method and apparatus.
JP5495767B2 (ja) 2009-12-21 2014-05-21 キヤノン株式会社 インプリント装置及び方法、並びに物品の製造方法
JP2012015324A (ja) * 2010-06-30 2012-01-19 Fujifilm Corp 液体塗布装置及び液体塗布方法並びにナノインプリントシステム
NL2007633A (en) * 2010-11-22 2012-05-23 Asml Netherlands Bv A positioning system, a lithographic apparatus and a method for positional control.
JP5748291B2 (ja) 2012-02-29 2015-07-15 富士フイルム株式会社 液体吐出装置、ナノインプリントシステム及び液体吐出方法
JP6135119B2 (ja) 2012-12-19 2017-05-31 大日本印刷株式会社 インプリント方法、インプリント樹脂滴下位置決定方法及びインプリント装置
JP6329425B2 (ja) * 2014-05-02 2018-05-23 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
US10620532B2 (en) * 2014-11-11 2020-04-14 Canon Kabushiki Kaisha Imprint method, imprint apparatus, mold, and article manufacturing method

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020113849A1 (en) 2001-02-16 2002-08-22 Eastman Kodak Company Continuous ink-jet printer having two dimensional nozzle array and method of increasing ink drop density
US20060051498A1 (en) 2002-02-12 2006-03-09 Seiko Epson Corporation Display device having a color filter
US20070035597A1 (en) * 2002-08-20 2007-02-15 Palo Alto Research Center Incorporated Digital lithography using real time quality control
US20040228964A1 (en) 2003-03-06 2004-11-18 Tatsuya Ito Film-forming method, film-forming apparatus, apparatus and a method for manufacturing color filter substrate, apparatus and method for manufacturing substrate for electroluminescent device, method for manufacturing display device, display device, and electronic apparatus
US20070237886A1 (en) 2006-03-31 2007-10-11 Asml Netherlands B.V. Imprint lithography
US20080018875A1 (en) * 2006-07-18 2008-01-24 Asml Netherlands B.V. Imprint lithography
US20090267268A1 (en) 2007-10-02 2009-10-29 Ikuo Yoneda Imprint system and imprint method

Also Published As

Publication number Publication date
JP2018098506A (ja) 2018-06-21
TWI715815B (zh) 2021-01-11
CN108227373B (zh) 2022-02-08
KR20180067415A (ko) 2018-06-20
CN108227373A (zh) 2018-06-29
SG10201709153VA (en) 2018-07-30
JP7079085B2 (ja) 2022-06-01
TW201833668A (zh) 2018-09-16

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