CN107937870A

CN107937870A - Metallic plate, the manufacture method of metallic plate and the method using metallic plate manufacture deposition mask

Info

Publication number: CN107937870A
Application number: CN201711266179.5A
Authority: CN
Inventors: 池永知加雄
Original assignee: Dai Nippon Printing Co Ltd
Current assignee: Dai Nippon Printing Co Ltd
Priority date: 2013-01-10
Filing date: 2014-01-10
Publication date: 2018-04-20
Also published as: JP2014148743A; KR20170071610A; CN104854254A; KR101749435B1; CN110306155B; JP5382259B1; KR20190116559A; CN104854254B; KR20210112420A; WO2014109393A1; KR20230007527A; CN110306155A; KR20210112419A; CN107858643A; KR20150103654A

Abstract

The present invention relates to metallic plate, the manufacture method of metallic plate and the method using metallic plate manufacture deposition mask.Extend the small metallic plate of rate the object of the present invention is to provide a kind of.The extension rate of the middle body of the width of metallic plate is 10 × 10^‑5Below.In addition, the extension rate of the end of the width of metallic plate is 20 × 10^‑5Below.In addition, the extension rate of the end of the width of metallic plate is more than the maximum of the extension rate of the middle body of the width of metallic plate.

Description

Metallic plate, the manufacture method of metallic plate and use metallic plate manufacture deposition mask Method

The application is divisional application, the China national Application No. 201480003445.3 of its original application, and the applying date is On January 10th, 2014, entitled " metallic plate, the manufacture method of metallic plate and the side using metallic plate manufacture deposition mask Method ".

Technical field

The present invention relates to be used for the metallic plate for manufacturing deposition mask by forming more than 2 through holes.The present invention also relates to And the manufacture method of metallic plate.Moreover, it relates to it is used to be deposited with desired pattern using metallic plate manufacture Deposition mask method.

Background technology

In recent years, the display device for being used in the portable devices such as smart mobile phone and tablet computer, it is desirable to fine, Such as picture element density is more than 300ppi.In addition, in portable device, need improving on correspondence is full HD, it is this In the case of, the picture element density requirement of display device is such as more than 450ppi.

Since response is good, power consumption is low, organic EL display is attracted attention.Pixel shape as organic EL display Into method, it is known that method be, using the deposition mask for including the through hole arranged with desired pattern, with desired figure Case forms pixel.Specifically, first, deposition mask is made to be sealed at the substrate of organic EL display, then, will be closely sealed Deposition mask and substrate together put into evaporation coating device, carry out the evaporation of organic material etc..Generally manufacture obtains deposition mask as follows： Through hole is formed in metallic plate by using the etching of photolithographic techniques, so as to manufacture above-mentioned evaporation mask (example Such as patent document 1).For example, first, forming resist film on a metal plate, then exposed mask is set to be sealed at resist film In the state of by resist film expose to form Resist patterns, thereafter, using Resist patterns as mask to metallic plate progress Etching, so as to form through hole.

Prior art literature

Patent document

Patent document 1：Japanese Unexamined Patent Publication 2004-39319 publications

The content of the invention

In the case of the film forming for carrying out evaporation material on substrate using deposition mask, not only substrate, deposition mask are also attached Evaporation material.For example, there is also along the significantly inclined direction of the normal direction relative to deposition mask in evaporation material And fly to the evaporation material of substrate, such evaporation material can be reached before substrate is reached the wall of the through hole of deposition mask from And adhere to.In this case, it is believed that evaporation material is difficult to the wall for adhering to the through hole positioned at deposition mask in a substrate Region near face, as a result, the thickness ratio other parts of the evaporation material of attachment are small or produce unattached evaporation material Part.I.e., it is possible to think, the evaporation of the near wall of the through hole of deposition mask is unstable.Therefore, in order to form organic EL The pixel of display device and in the case of using deposition mask, the dimensional accuracy and positional precision of pixel reduce, as a result, causing The luminous efficiency of organic EL display reduces.

It is such in order to solve the problems, such as, consider the thickness of the metallic plate for manufacturing deposition mask being thinned.This is because By reducing the thickness of metallic plate, the height of the wall of the through hole of deposition mask can be made to diminish, thus, evaporation material can be reduced In be attached to perforation wall surface of the hole on evaporation material ratio.But the small metallic plate of thickness in order to obtain, in rolling mother metal Need to increase rolling rate during manufacturing metallic plate.Here, rolling rate refers to utilize (thickness-metallic plate of mother metal)/(thickness of mother metal Degree) value that calculates.In the case of the heat treatment such as annealing is implemented after rolling, usual rolling rate is bigger, the deformation based on rolling Degree of irregularity is also bigger.For example, according to the position in width (direction orthogonal with the direction of transfer of mother metal), metallic plate Elongation percentage is different, as a result, undulations occurs in metallic plate, this is well-known.Specifically, can enumerate：In width The shape of the fluctuating of the end in direction, it is referred to as rippled edge；In the undulations of the central portion of width, during it is referred to as Between ripple.If undulations as occurring, the resist film that exposed mask cannot be made fully to be sealed on metallic plate, it is tied Fruit, it is believed that the positional precision and dimensional accuracy of the through hole formed on a metal plate can reduce.If the position essence of through hole Degree and dimensional accuracy reduce, then by using organic EL display obtained from deposition mask pixel dimensional accuracy and position Putting precision can reduce.

In addition, in order to cut down the manufacture cost of deposition mask, first, it is also well known that in the whole region of metallic plate The effective coverage for including more than 2 through holes corresponding with an organic EL display of more than 2 is formed, thereafter, along Metallic plate is cut to more than 2 by the length direction of metallic plate, thus, the elongate deposition mask of more than 2 of producing once out. But the elongation percentage of metallic plate is according to the position of width and in the case of difference, more than 2 elongates being obtained after cut-out The length of deposition mask is different.In this case, the spacing of each through hole of the effective coverage of deposition mask is in each deposition mask In it is also different, as a result, it can also be expected that the size of the pixel by using organic EL display obtained from deposition mask There is deviation because of the difference of individual with position.

The object of the present invention is to provide can effectively solve the problems, such as such metallic plate, the manufacture method of metallic plate and evaporation The manufacture method of mask.

1st present invention is related to a kind of manufacture method of metallic plate, which is used by forming more than 2 through holes In manufacture deposition mask, wherein, the above-mentioned through hole of above-mentioned deposition mask is formed by being etched to above-mentioned metallic plate,

The manufacture method of above-mentioned metallic plate possesses following processes：Rolling process, in the process, mother metal is rolled and Obtain above-mentioned metallic plate；And cut off operation, in the process, the two of the width of above-mentioned metallic plate is cut away with preset range Hold, the above-mentioned metallic plate after above-mentioned cut off operation at least locally has undulations, and the undulations are due to the length of the metallic plate The length in degree direction corresponds to the position of its width and different；By the above-mentioned of the above-mentioned metallic plate after above-mentioned cut off operation The minimum value of length is known as datum length, by the upper of the position of the width of the above-mentioned metallic plate after above-mentioned cut off operation It is full when stating the difference of above-mentioned length and the said reference length of metallic plate and being known as extending rate relative to the ratio of said reference length Sufficient the following conditions (1)~(3),

(1) the above-mentioned extension rate of the middle body of the width of the above-mentioned metallic plate after above-mentioned cut off operation for 10 × 10^-5Below；

(2) the above-mentioned extension rate of the end of the width of the above-mentioned metallic plate after above-mentioned cut off operation is 20 × 10^-5 Below；With

(3) the above-mentioned extension rate of above-mentioned end is more than the maximum of the above-mentioned extension rate of above-mentioned middle body；

The central portion of width of the above-mentioned middle body including the above-mentioned metallic plate after above-mentioned cut off operation, it is to account for State 40% part of the width of metallic plate.

The manufacture method of metallic plate based on the present invention can be further equipped with annealing operation, in the process, will pass through The obtained above-mentioned metallic plate annealing of the rolling process, to remove the internal stress of above-mentioned metallic plate.

In the manufacture method of the metallic plate based on the present invention, above-mentioned annealing operation can be while in length direction stretching Metallic plate is stated while implementing.

In the manufacture method of the metallic plate based on the present invention, above-mentioned annealing operation can be taken at core in above-mentioned metal plate coils Implement in the state of on material.

In the manufacture method of the metallic plate based on the present invention, the thermal coefficient of expansion of preferably above-mentioned mother metal and substrate it is hot swollen Swollen coefficient is equal, on the substrate across the deposition mask manufactured by above-mentioned metallic plate and forming a film has evaporation material.

In the manufacture method of the metallic plate based on the present invention, above-mentioned mother metal can contain invar alloy material.

2nd present invention is related to a kind of metallic plate, which is to be steamed by forming more than 2 through holes to be used to manufacture The metallic plate of mask is plated, wherein, above-mentioned metallic plate at least locally has undulations, and the undulations are due to the length of the metallic plate The length in degree direction corresponds to the position of its width and different, and the minimum value of the above-mentioned length of above-mentioned metallic plate is known as Datum length, by the above-mentioned length of the above-mentioned metallic plate of the position of the width of above-mentioned metallic plate and said reference length Difference relative to said reference length ratio be known as extend rate when, meet the following conditions (1)~(3),

(1) the above-mentioned extension rate of the middle body of the width of above-mentioned metallic plate is 10 × 10^-5Below；

(2) the above-mentioned extension rate of the end of the width of above-mentioned metallic plate is 20 × 10^-5Below；With

Above-mentioned middle body includes the central portion of the width of above-mentioned metallic plate, it is the width for accounting for above-mentioned metallic plate 40% part.

The thermal coefficient of expansion of metallic plate based on the present invention is preferably equal value with the thermal coefficient of expansion of substrate, the substrate On across the deposition mask manufactured by above-mentioned metallic plate and forming a film has evaporation material.

Metallic plate based on the present invention can contain invar alloy material.

3rd present invention is related to a kind of manufacture method of deposition mask, which possesses penetrates through formed with more than 2 The effective coverage in hole and the peripheral region around above-mentioned effective coverage, wherein, which includes following processes：

Prepare the process of metallic plate, which at least locally has undulations, and the undulations are due to the metallic plate The length of length direction correspond to the position of its width and different；

Resist patterns formation process, in the process, Resist patterns is formed on above-mentioned metallic plate；With

Etching work procedure, in the process, is etched above-mentioned metallic plate using above-mentioned Resist patterns as mask, for The recess for being used for marking above-mentioned through hole is formed in the region for the above-mentioned metallic plate for forming above-mentioned effective coverage；

The minimum value of the above-mentioned length of above-mentioned metallic plate is known as datum length, by each of the width of above-mentioned metallic plate The difference of above-mentioned length and the said reference length of above-mentioned metallic plate at position is known as prolonging relative to the ratio of said reference length When stretching rate, meet the following conditions (1)~(3),

In the manufacture method of the deposition mask based on the present invention, wherein, above-mentioned Resist patterns formation process can have Have：The process of resist film is formed on above-mentioned metallic plate, make exposed mask and the closely sealed process of above-mentioned resist film vacuum and Across the process that above-mentioned exposed mask exposes above-mentioned resist film in a predetermined pattern.

In the manufacture method of the deposition mask based on the present invention, the thermal coefficient of expansion of preferably above-mentioned metallic plate and substrate Thermal coefficient of expansion is equal value, on the substrate across the deposition mask manufactured by above-mentioned metallic plate and forming a film has evaporation material.

In the manufacture method of the deposition mask based on the present invention, above-mentioned metallic plate can contain invar alloy material.

According to the present invention, can obtain undulations degree is small and the deviation of each perforation pitch of holes of effective coverage is also small Deposition mask.Therefore, the dimensional accuracy and positional precision for the evaporation material being attached on substrate can be improved.

Brief description of the drawings

Fig. 1 is the figure for illustrating one embodiment of the present invention, to show to include the deposition mask device of deposition mask An example schematic plan.

Fig. 2 is the figure of the method for illustrating to be deposited using the deposition mask device shown in Fig. 1.

Fig. 3 is the top partial view diagram for showing the deposition mask shown in Fig. 1.

Fig. 4 is the sectional view along the IV-IV lines of Fig. 3.

Fig. 5 is the sectional view along the V-V lines of Fig. 3.

Fig. 6 is the sectional view along the line VI -- VI of Fig. 3.

Fig. 7 (a) is to show to obtain having the figure of the process of the metallic plate of desired thickness, Fig. 7 by rolling mother metal (b) to show the figure of process annealed to the metallic plate as obtained from rolling.

Fig. 8 is the stereogram of metallic plate for showing to obtain by the process shown in Fig. 7 (a), (b).

Fig. 9 (a), (b), (c), (d) are respectively along the sectional view of the a-a lines of Fig. 8, b-b lines, c-c lines and d-d lines.

Figure 10 is the figure of the extension rate of the position for the width for showing metallic plate.

Figure 11 is the schematic diagram of an example progress overall description for the manufacture method to the deposition mask shown in Fig. 1.

Figure 12 is the figure of an example of the manufacture method for illustrating deposition mask, to show to form resist on a metal plate The sectional view of the process of film.

Figure 13 is the figure of an example of the manufacture method for illustrating deposition mask, to show the closely sealed exposure on resist film The sectional view of the process of mask.

Figure 14 is the figure of an example of the manufacture method for illustrating deposition mask, to show in the section along normal direction Go out the figure of long metal sheet.

Figure 15 is the figure of an example of the manufacture method for illustrating deposition mask, to show in the section along normal direction Go out the figure of long metal sheet.

Figure 16 is the figure of an example of the manufacture method for illustrating deposition mask, to show in the section along normal direction Go out the figure of long metal sheet.

Figure 17 is the figure of an example of the manufacture method for illustrating deposition mask, to show in the section along normal direction Go out the figure of long metal sheet.

Figure 18 is the figure of an example of the manufacture method for illustrating deposition mask, to show in the section along normal direction Go out the figure of long metal sheet.

Figure 19 is the figure of an example of the manufacture method for illustrating deposition mask, to show in the section along normal direction Go out the figure of long metal sheet.

Figure 20 is the figure of an example of the manufacture method for illustrating deposition mask, to show in the section along normal direction Go out the figure of long metal sheet.

Figure 21 is the top view for showing to be placed in the 1st sample on platform.

Embodiment

One embodiment of the present invention is illustrated referring to the drawings.It is it should be noted that appended in this specification Attached drawing in, for the ease of illustration and it can be readily appreciated that for size ratio of engineer's scale and length and width in kind etc., suitably comparative example Size ratio of ruler and length and width etc. is changed and exaggerated.

Fig. 1~Figure 20 is for illustrating the figure based on one embodiment of the present invention.In following embodiment and its change In shape example, illustrated by taking the manufacture method of deposition mask as an example, which is used for when manufacturing organic EL display Organic material is patterned with desired pattern on substrate.But, however it is not limited to such application, for for various use The manufacture method of the deposition mask on way, the applicable present invention.

It should be noted that in this specification, " plate ", " piece ", the term of " film " are not only based on the difference in address Just can mutually it distinguish.For example, " plate " is also comprising the concept that can be described as component as piece or film, thus, for example " metal Plate " and component only not cannot distinguish between out ibid in address for being known as " sheet metal " or " metal film ".

In addition, " plate face (unilateral, film surface) " refers in entirety or gross examination of skeletal muscle as the tabular (sheet, membranaceous) of object In the case of component, the face consistent with in-plane as the plate-shaped member (sheet component, film member) of object.Separately Outside, the normal direction that is used for the component of tabular (sheet, membranaceous) refers to the plate face (unilateral, film surface) relative to the component Normal direction.

In addition, on being used in this specification to shape or geometric condition and physical characteristic and their degree Carry out specific such as the term and length such as " parallel ", " orthogonal ", " identical ", " equal ", the value of angle and physical characteristic Deng being not limited to stringent implication, but the scope comprising the degree that can expect said function explains.

(deposition mask device)

First, an example on the deposition mask device comprising the deposition mask as manufacture method object, referring especially to Fig. 1~Fig. 6 is illustrated.Herein, Fig. 1 is the top view for an example for showing the deposition mask device comprising deposition mask, and Fig. 2 is Figure for the application method of the deposition mask device shown in explanatory drawin 1.Fig. 3 is the vertical view that deposition mask is shown from the 1st surface side Figure, Fig. 4~Fig. 6 are the sectional view of each position of Fig. 3.

Deposition mask device 10 shown in Fig. 1 and Fig. 2 possesses more than 2 be made of substantially rectangular metallic plate 21 Deposition mask 20 and be installed on more than 2 deposition mask 20 periphery frame 15.Each deposition mask 20 is equipped with substantial amounts of Through hole 25, the substantial amounts of through hole 25 be to the metallic plate 21 with opposite each other the 1st face 21a and the 2nd face 21b at least from 1st face 21a is etched and is formed.As shown in Fig. 2, the deposition mask device 10 is faced as evaporation according to deposition mask 20 Mode of the substrate of object for example below glass substrate 92 is supported in evaporation coating device 90, for substrate to be deposited The evaporation of material.

In evaporation coating device 90, using the magnetic force from magnetite (not shown), deposition mask 20 and glass substrate 92 are closely sealed.Steam In plating appts 90, in the lower section of deposition mask device 10, it is configured with and accommodates evaporation material (being as an example luminous organic material) 98 crucible 94 and the heater 96 of heating crucible 94.Evaporation material 98 in crucible 94 is issued in the heating from heater 96 Angerization distils and is attached to the surface of glass substrate 92.As described above, formed with substantial amounts of through hole in deposition mask 20 25, evaporation material 98 is attached to glass substrate 92 by the through hole 25.As a result, according to the through hole with deposition mask 20 The 25 corresponding desired pattern in position, evaporation material 98 form a film in the surface of glass substrate 92.

As described above, in present embodiment, through hole 25 configures in a predetermined pattern in each effective coverage 22.Need It is bright, it is intended in the case of carrying out colored display, steaming can be made along the orientation (an above-mentioned direction) of through hole 25 Plating mask 20 (deposition mask device 10) and glass substrate 92 relatively move bit by bit, successively the red organic hair of evaporation The luminous organic material of luminescent material, the luminous organic material of green and blueness.

It should be noted that the frame 15 of deposition mask device 10 is installed on the periphery of the deposition mask 20 of rectangle.Frame Deposition mask is maintained at the state of tensioning by frame 15 in the way of bending deposition mask 20.Deposition mask 20 and frame 15 It is fixed each other by such as spot welding.

Implement the inside of evaporation coating device 90 of the vapor deposition treatment under high-temperature atmosphere.Therefore, during vapor deposition treatment, it is maintained at steaming Deposition mask 20, frame 15 and substrate 92 inside plating appts 90 are also heated.At this time, deposition mask, frame 15 and substrate 92 Show the behavior of the change in size based on each thermal expansion.In this case, if deposition mask 20, frame 15 and substrate 92 thermal expansion coefficient difference is larger, then misplaces because of the difference of their change in size, as a result, being attached to substrate 92 On evaporation material dimensional accuracy and positional precision can reduce.It is such in order to solve the problems, such as, preferably deposition mask 20 and frame The thermal coefficient of expansion of frame 15 and the thermal coefficient of expansion of substrate 92 are equal value.For example, use glass substrate 92 as substrate 92 When, as deposition mask 20 and the material of frame 15, the alloy i.e. invar alloy added with 36% nickel in iron can be used Material.

(deposition mask)

The following detailed description of deposition mask 20.As shown in Figure 1, in present embodiment, deposition mask 20 is by 21 structure of metallic plate Into there is substantially quadrangle form in top view, further precisely there is substantially rectangular profile in a top view.Evaporation The metallic plate 21 of mask 20, which includes regularly arranged formation, to be had the effective coverage 22 of through hole 25 and surrounds the week of effective coverage 22 Enclose region 23.Peripheral region 23 is the region for being used to support effective coverage 22, it is not intended to evaporation to the evaporation on substrate The region that material passes through.For example, the deposition mask 20 used in the evaporation of the luminous organic material of organic EL display In, effective coverage 22 is and the area for being used to be formed pixel by the evaporation of luminous organic material on substrate (glass substrate 92) The region in deposition mask 20 that domain faces, is to form made organic EL display substrate with being used on substrate Display surface area surface pair deposition mask 20 in region.But based on various purposes, can also be in 23 shape of peripheral region Into through hole or recess.In example shown in Fig. 1, each effective coverage 22 has substantially quadrangle form in a top view, into one Step precisely has substantially rectangular profile in a top view.

In the example in the figures, the effective coverage 22 of more than 2 of deposition mask 20 is along the length with deposition mask 20 A parallel direction of direction forms a line across predetermined interval.In example illustrated, an effective coverage 22 corresponds to One organic EL display.That is, deposition mask device 10 (deposition mask 20) according to figure 1, can be weighed paragraph by paragraph Multiple evaporation (multiaspect, which is paid, steams).

As shown in figure 3, in the example in the figures, it is effective at this in more than 2 through holes 25 that each effective coverage 22 is formed It is arranged at predetermined intervals respectively along two mutually orthogonal directions in region 22.On the perforation formed on the metallic plate 21 An example in hole 25, is further described in detail referring especially to Fig. 3~Fig. 6.

As shown in Fig. 4~Fig. 6, more than 2 through holes 25 extend between the 1st face 20a and the 2nd face 20b and penetrate through evaporation Mask 20, the 1st face 20a are the side along normal direction of deposition mask 20, and the 2nd face 20b is deposition mask 20 The opposite side along normal direction.In example illustrated, as being explained in detail below, from the method as deposition mask 1st face 21a sides of the metallic plate 21 of the side in line direction are by being etched in the 1st recess 30 of formation on metallic plate 21, from as gold The 2nd face 21b sides for belonging to the opposite side of the normal direction of plate 21 form second recesses 35 on metallic plate 21, utilize the 1st recess 30 Through hole 25 is formed with second recesses 35.

As shown in Fig. 3~Fig. 6, from the 1st face 20a lateral 2nd faces 20b sides of deposition mask 20, on the edge of deposition mask 20 The position of normal direction, sectional area of each 1st recess 30 in the section of the plate face along deposition mask 20 gradually becomes It is small.As shown in Figure 3, the wall 31 of the 1st recess 30 in its whole region in the direction that the normal direction with deposition mask 20 is intersected Extension, exposes towards the side of the normal direction along deposition mask 20.Similarly, in deposition mask 20 along normal direction Position, sectional area of each second recesses 35 in the section of the plate face along deposition mask 20 can be from deposition mask 20 The 2nd face 20b lateral 1st faces 20a sides taper into.The wall 36 of second recesses 35 its whole region with deposition mask 20 The direction extension that intersects of normal direction, expose sectional area section towards along the opposite side of normal direction of deposition mask 20 Product.

It should be noted that as shown in Fig. 4~Fig. 6, the wall 31 of the 1st recess 30 passes through with the wall 36 of second recesses 35 The connecting portion 41 of all shapes and connect.Connecting portion 41 is by inclined 1st recess 30 of normal direction relative to deposition mask The crest line of protuberance that wall 31 and the wall 36 of the inclined second recesses 35 of normal direction relative to deposition mask merge into and Mark.Also, connecting portion 41 marks the breakthrough part 42 of the area minimum of through hole 25 in the top view of deposition mask 20.

As shown in Fig. 4~Fig. 6, the 2nd face of the face of the opposite side along normal direction of deposition mask, i.e. deposition mask 20 On 20b, adjacent two through holes 25 are spaced from each other along the plate face of deposition mask.Manufacture method i.e., as be described hereinafter, from steaming The 2nd face 21b sides for plating the corresponding metallic plates 21 of the 2nd face 20b of mask 20 are etched the metallic plate 21 and make second recesses When 35, remaining has the 2nd face 21b of metallic plate 21 between two adjacent second recesses 35.

On the other hand, as shown in Fig. 4~Fig. 6, in deposition mask along the side of normal direction, i.e. deposition mask 20 1st face 20a sides, adjacent two the 1st recesses 30 connect.Manufacture method i.e., as be described hereinafter, from the 1st face with deposition mask 20 When 1st face 21a sides of the corresponding metallic plates 21 of 20a are etched the metallic plate 21 and form 1 recess 30, adjacent two Remaining there will not be the 1st face 21a of metallic plate 21 between a 1st recess 30.That is, the 1st face 21a of metallic plate 21 is in effective coverage 22 Whole region be etched.Using the 1st face 20a of the deposition mask 20 formed by such 1st recess 30, according to such as figure 1st face 20a of deposition mask 20 shown in 2 in face of evaporation material 98 mode use the deposition mask 20 in the case of, can be effective Improve the utilization ratio of evaporation material 98.

As shown in Fig. 2, in the case where deposition mask device 10 is contained in evaporation coating device 90, such as double dot dash line in Fig. 4 Shown, the 1st face 20a of deposition mask 20 is located at 94 side of crucible for maintaining evaporation material 98, the 2nd face 20b of deposition mask 20 In face of glass substrate 92.Therefore, evaporation material 98 is attached to glass substrate 92 by gradually smaller 1st recess 30 of sectional area On.As shown by the arrows in Figure 4, normal direction of the evaporation material 98 from crucible 94 to glass substrate 92 not only along glass substrate 92 It is mobile, and sometimes in the larger inclined direction movement of the normal direction relative to glass substrate 92.At this time, deposition mask 20 Thickness it is big when, the evaporation material 98 of inclination movement much can reach the 1st before glass substrate 92 is reached by through hole 25 The wall 31 of recess 30 and adhere to.In addition, in the region faced with through hole 25 on glass substrate 92, evaporation material can be produced Material 98 is easy to the region reached and is difficult to the part reached.Therefore, in order to improve the utilization ratio (film forming efficiency of evaporation material： The ratio being attached on glass substrate 92) and save expensive evaporation material and make the film forming that make use of the evaporation material of costliness Stablize in desired region and equably implemented, it is important that according to the evaporation material 98 for making inclination movement as far as possible The mode for reaching glass substrate 92 forms deposition mask 20.That is, in Fig. 4~Fig. 6 orthogonal with piece face of deposition mask 20 Section in, the minimum angles θ 1 (with reference to Fig. 4) that straight line L1 formed relative to the normal direction of deposition mask 20 is fully become It is favourable greatly, the straight line L1 is recessed by the connecting portion 41 and the 1st for being used as the part with minimum sectional area of through hole 25 Any other position of the wall 31 in portion 30.

As one of method for increasing angle, θ 1, it is contemplated that reduce the thickness of deposition mask 20, thus, make The wall 31 of 1st recess 30, the height of the wall 36 of second recesses 35 diminish.I.e., it is possible to say, as forming deposition mask 20 metallic plate 21, preferably using the metallic plate 21 that thickness is as thin as possible in the range of it can ensure that the intensity of deposition mask 20.

As the other methods for increasing angle, θ 1, it is also contemplated that optimize the profile of the 1st recess 30.Such as root According to present embodiment, converged by the wall 31 of two adjacent the 1st recesses 30, compared to do not converge with other recesses have with The recess of wall (profile) shown in dotted line, can significantly increase the angle, θ 1.Illustrate its reason below.

As being explained in detail below, the 1st recess 30 be by the 1st face 21a of metallic plate 21 is etched and Formed.By etching the wall shape generally in curved surface of the recess formed, this is curved raised towards erosion direction.Therefore, The wall 31 of the recess formed by etching is precipitous in the region of etching starting side, in the side opposite with etching starting side The most deep side of region, i.e. recess, significantly tilts relative to the normal direction of metallic plate 21.On the other hand, it is illustrated that steaming Plating in mask 20, the wall 31 of adjacent two the 1st recesses 30 converges in etching starting side, therefore, two the 1st recesses 30 The outer contour of part 43 that converges of front edge 32 of wall 31 be not precipitous shape, but the shape of chamfering.Therefore, may be used So that the wall 31 for forming most 1st recess 30 of through hole 25 effectively inclines relative to the normal direction of deposition mask Tiltedly.I.e., it is possible to increase angle, θ 1.Thus, can accurately stablize while the utilization ratio of evaporation material 98 is effectively improved Implement the evaporation under desired pattern.

But the small metallic plate 21 of thickness is, it is necessary to rolling when increasing by mother metal to manufacture metallic plate 21 in order to obtain Rate.But rolling rate is bigger, the non-uniform degree of the deformation based on rolling is also bigger.For example, the elongation percentage of metallic plate 21 because The position of width (direction orthogonal with the direction of transfer of mother metal) and it is different, as a result, sometimes above-mentioned fluctuating shape Shape is appeared on metallic plate 21.Herein, consider the case when：Each deposition mask 20 shown in Fig. 1 is respectively by the metal of elongate Plate is formed, the metallic plate of the elongate be by will roll the obtained metallic plate of mother metal along its length direction cut off and Obtain.In this case, it is believed that since the length of each deposition mask 20 is different, each deposition mask 20 it is effective The spacing of each through hole 25 in region 22 is also different in each deposition mask 20, as a result, the positional precision of evaporation is reduced, steamed Plating the utilization ratio of material reduces.Therefore, in order to suppress the spacing of each through hole 25 of the effective coverage 22 of each deposition mask 20 Deviation, so as to obtain the small organic EL display of deviation of the size of pixel and position, as described later, it is important that screening Go out the small metallic plate 21 of difference of elongation percentage to use.

The present embodiment with such composition and its effect and effect are illustrated below.Here, first to Illustrated in the manufacture method of the metallic plate of manufacture deposition mask.Then to using obtained metallic plate manufacture deposition mask Method illustrate.Thereafter, to using obtained deposition mask carried out on substrate evaporation material evaporation method into Row explanation.

(manufacture method of metallic plate)

First, with reference to Fig. 7 (a), (b), Fig. 8, Fig. 9 (a), (b), (c), (d) and Figure 10 to the manufacture method of metallic plate into Row explanation.Fig. 7 (a) is to show to obtain having the figure of the process of the metallic plate of desired thickness, Fig. 7 by rolling mother metal (b) it is that the figure of the process to being annealed by rolling obtained metallic plate is shown.

[rolling process]

First as shown in Fig. 7 (a), prepare the mother metal 55 containing invar alloy material, to including a pair of of Rolling roller 56a, 56b Rolling device 56 along arrow D1 shown in sender always transmit the mother metal 55.Reach between a pair of of Rolling roller 56a, 56b Mother metal 55 rolled by a pair of of Rolling roller 56a, 56b, as a result, the thickness of mother metal 55 reduces, while prolonged along direction of transfer Stretch.Thus, it can obtain thickness t₀Long metal sheet 64.As shown in Fig. 7 (a), by batching long metal sheet 64 on core 61 And form coiling body 62.To thickness t₀Occurrence be not particularly limited, be, for example, more than 0.020mm and below 0.100mm In the range of.

[annealing operation]

Thereafter, accumulated to eliminate because of rolling in the residual stress in long metal sheet 64, as shown in Fig. 7 (b), using moving back Fiery device 57 anneals long metal sheet 64.As shown in Fig. 7 (b), annealing operation can on one side by long metal sheet 64 in biography Direction (length direction) is sent to stretch while implementing.As a result, residual stress is can obtain be removed to a certain degree, thickness t₀'s Long metal sheet 64.It should be noted that thickness t₀Maximum gauge Tb generally equal in the peripheral region 23 of deposition mask 20.

It should be noted that the form of rolling process and annealing operation is not particularly limited to Fig. 7 (a), the shape shown in (b) State.For example, rolling process can be implemented using more than 2 couples Rolling roller 56a, 56b.In addition it is also possible to by the way that work will be rolled Sequence and annealing operation are repeated more than 2 times to make thickness t₀Long metal sheet 64.In addition, in Fig. 7 (b), annealing is shown Process stretches long metal sheet 64 while the example implemented in length direction on one side, but it's not limited to that, can also It is taken up in long metal sheet 64 and implements annealing operation in the state of core 61.It should be noted that rolled up in long metal sheet 64 It is taken in the case of implementing annealing operation in the state of core 61, the volume with coiling body 62 can be produced on long metal sheet 64 sometimes The problem of taking the corresponding warpage in footpath.Therefore, according to the material for batching footpath, forming mother metal 55 of coiling body 62, while will long gold Belong to plate 64 to stretch in length direction while it is favourable to implement annealing operation.

[inspection operation]

Thereafter, the inspection operation checked the degree of the extension difference of obtained long metal sheet 64 is implemented.Fig. 8 is Stereogram by the obtained metallic plate of process shown in Fig. 7 (a), (b) is shown.As shown in figure 8, at least office of long metal sheet 64 Portion has a undulations, the undulations due to the length direction D1 of the long metal sheet 64 length because its width D2's Position and it is different.Here, length direction D1 is the direction parallel with direction of transfer during rolling mother metal 55, width D2 For the direction orthogonal with length direction D1.In Fig. 8, the end of the width D2 of long metal sheet 64 is represented with symbol 64e.

The undulations shown in long metal sheet 64 are illustrated.Fig. 9 (a), (b), (c), (d) are respectively along figure 8 a-a lines, b-b lines, the sectional view of c-c lines and d-d lines.The a-a lines of Fig. 8 are along in the width of long metal sheet 64 The line that centre portion 64c extends in length direction, therefore, Fig. 9 (a) show the central portion 64c's of the width of long metal sheet 64 The section of long metal sheet 64.In addition, the d-d lines of Fig. 8 be along long metal sheet 64 width end 64e in length direction The line of extension, therefore, Fig. 9 (d) show the section of the long metal sheet 64 of the end 64e of the width of long metal sheet 64.Base In the long metal sheet 64 of present embodiment occur among ripple, therefore, width central portion 64c in long metal sheet 64 The degree of the undulations of middle appearance than the position of central portion 64c slightly away, the b-b lines of such as Fig. 8 position in long gold The degree for belonging to the undulations occurred in plate 64 is big.In addition, also there is rippled edge in the long metal sheet 64 based on present embodiment, Therefore, width end 64e long metal sheet 64 the undulations of appearance degree ratio in end 64e slightly away Position, such as Fig. 8 c-c lines the degree of undulations that occurs in long metal sheet 64 of position it is big.

In inspection operation, first, in each position of width D2, the long gold in the preset range of length direction D1 is calculated Belong to the length of plate 64.Here, " length " refers to, undulations, length direction D1 length for occurring along in long metal sheet 64 The length of the profile on the surface (the 1st face 64a or the 2nd face 64b) of metallic plate 64.Specifically, such as Fig. 9 (a), (b), (c), (d) It is shown, by the long metal sheet 64 of the position shown in the a-a lines of Fig. 8, b-b lines, c-c lines and d-d lines length la, lb, lc and Ld is also contemplated that the undulations shown in long metal sheet 64 and is measured.To the side of the length for calculating long metal sheet 64 Method is not particularly limited.For example, when calculating the length la of long metal sheet 64 of central portion 64c, first, allow to measure with it is right As the distance between thing range unit width D2 central portion 64c along the length direction D1 of long metal sheet 64 in length Scanned on metallic plate 64, thus alongst D1 at predetermined intervals carries out the height and position on the surface of long metal sheet 64 Measure.In the scope at intervals of such as more than 1mm and below 5mm.Then, depicting will be in smoothing junction between each measuring point Curve, calculates thereafter the length of a curve.Thus, it can obtain the length la of the long metal sheet 64 of central portion 64c.In addition, change Such measure is repeated while the position of width D2, so as to can obtain the long gold of the position of width D2 Belong to the length of plate 64.

Then, will be long on the basis of the setting of the minimum value of the length for the long metal sheet 64 that each position of width D2 obtains Degree.In present embodiment, datum length is set in the length lb of the long metal sheet 64 of the position shown in the b-b lines as Fig. 8. Thereafter, by the length of the long metal sheet 64 of the position of width D2 and the difference of datum length lb relative to datum length lb Ratio can be regarded as extension rate.Such as the extension rate of the long metal sheet 64 of central portion 64c is exported by (la-lb)/lb.Figure 10 be to show that what is calculated extends the figure of the curve 80 of rate.In Figure 10, transverse axis shows the position of the width D2 of long metal sheet 64 Put, the longitudinal axis is with 10^-5The order of magnitude show extension rate.The epimere of the transverse axis of Figure 10 is described with width with the order of magnitude of mm The central portion 64c of D2 be origin in the case of width D2 position.In addition, the hypomere of the transverse axis of Figure 10 shows width with % Spend the ratio of the overall with relative to long metal sheet 64 of the position of direction D2.It should be noted that in Figure 10, to as making The long metal sheet 64 for making deposition mask 20 is illustrated using the long metal sheet with the overall with of 500mm.Thus, for example The ratio for the position that central portion 64c apart from width D2 is+100mm is+20%.In addition, in Figure 10, the a-a lines of Fig. 8, The extension rate of the long metal sheet 64 of the position of b-b lines, c-c lines and d-d lines is represented with symbol A, B, C and D respectively.

Thereafter, the value based on obtained extension rate, implements the screening of long metal sheet 64.Here, in evaporation described later It is used only in the manufacturing process of mask 20 and meets the long metal sheets 64 of following full terms (1)~(3), thus implements long metal The screening of plate 64.

(1) the extension rate of the middle body R1 of long metal sheet 64 is 10 × 10^-5Below；

(2) the extension rate of the end 64e of the width D2 of long metal sheet 64 is 20 × 10^-5Below；With

(3) maximum of extension rate of the extension rate of end 64e more than middle body R1；

Above-mentioned condition (1)~(3) are studied respectively below.It should be noted that in Figure 10, in long metal sheet 64 Centre part represents that the peripheral part on the outside of centrally located part R1 is represented with symbol R2 with symbol R1.In present embodiment, center Part R1 is defined as accounting for 40% part of the overall with of long metal sheet 64, it is included in the width D2 of long metal sheet 64 Centre portion 64c.

It is general as shown in Figure 10 in the long metal sheet 64 for generating middle ripple and rippled edge, in long metal sheet 64 Nearby there is the maximum (point A) of extension rate in the central portion 64c of width.In addition, from the width side of long metal sheet 64 To central portion occur the minimum (point B) of extension rate to periphery side position slightly away.Also, extend rate from point B gradually increases (point C) to the periphery of width, also, reaches maximum in the end of width, the value for extending rate (point D).Therefore, in Fig. 10 as indicated by chain dotted lines, depict and extension rate=10 × 10 are shown in middle body R1^-5, in week Rim portion R2 shows extension rate=20 × 10^-5Datum line 81 in the case of, the curve 80 for extending rate is located at datum line 81 Lower section, this expression meets above-mentioned condition (1) and (2).In the example shown in Figure 10, above-mentioned condition (1) is met (2).

On condition (3), judge whether extension rate, the extension rate i.e. at point D of the end 64e of width D2 be big In the maximum of the extension rate of middle body R1 (in the example shown in Figure 10, for the extension rate at point A).Shown in Figure 10 In example, above-mentioned condition (3) is met.

By screening as implementation, even if causing to go out in long metal sheet 64 because the rolling rate of long metal sheet 64 is big In the case of existing undulations, it can also judge whether the degree of the undulations can be in the system of deposition mask 20 afterwards in advance Make process, organic EL display manufacturing process in become problem.Thus, the elongate of more than 2 made at the same time can be made The degree of the difference of the length of deposition mask 20 is in permissible range.Therefore, it is possible to make the effective district of the deposition mask 20 of manufacture The deviation of the spacing of each through hole 25 in domain 22 is reduced, and thus, can improve the size essence of the pixel of organic EL display Degree and positional precision.In addition, the yield rate during the manufacturing process of deposition mask 20 can be improved.

It should be noted that to curve 80, overall with 500mm length for obtaining having the extension rate shown in Figure 10 The method of metallic plate 64 is not particularly limited.

For example, by rolling mother metal 55, make with the overall with more than 500mm, the long metal of the overall with of such as 700mm The both ends of the width of the long metal sheet thereafter, are cut away preset range, thus can make the long metal sheet of wide 500mm by plate 64.It should be noted that in the long metal sheet of the overall with 700mm, in Figure 10 as shown in double dot dash line, occasionally there are prolong Rate is stretched more than 20 × 10^-5Part.Even if in this case, by the way that both ends are cut away preset range, can obtain meeting above-mentioned The long metal sheet 64 of condition (1)~(3).

Alternatively, in the case where both ends not being cut away preset range, it can also meet above-mentioned condition (1) by rolling making The long metal sheet 64 of~(3).

(manufacture method of deposition mask)

In the following, referring especially to Figure 11~Figure 20, to manufacturing deposition mask 20 using the long metal sheet 64 as above filtered out Method illustrate.In the manufacture method of deposition mask 20 described below, as shown in figure 11, long metal sheet 64 is supplied, Through hole 25, further severing long metal sheet 64, so as to obtain being made of the metallic plate 21 of sheet are formed on the long metal sheet 64 Deposition mask 20.

More specifically, the manufacture method of deposition mask 20 includes：The process for the long metal sheet 64 that supply extension becomes band； Long metal sheet 64 will be implemented on using the etching of photolithographic techniques, the is formed from the 1st face 64a sides on long metal sheet 64 The process of 1 recess 30；With the etching that make use of photolithographic techniques is implemented on long metal sheet 64, in long metal sheet 64 On from the 2nd face 64b sides formed second recesses 35 process.Also, it is formed at the 1st recess 30 and second recesses 35 of long metal sheet 64 Mutually communicate, so as to produce through hole 25 on long metal sheet 64.In the example shown in Figure 11, the formation of second recesses 35 Process is implemented before the formation process of the 1st recess 30, and the formation process in second recesses 35 and the formation of the 1st recess 30 The process sealed to made second recesses 35 is further provided between process.Each operation described further below.

Figure 11 shows the manufacture device 60 for making deposition mask 20.As shown in figure 11, first, prepare long metal Plate 64 is batched in the coiling body 62 formed on core 61.Also, coiling body 62 is unreeled by rotating the core 61, so that such as The long metal sheet 64 that supply extension becomes band as shown in Figure 11.It should be noted that long metal sheet 64 is formed with through hole 25 The metallic plate 21 of sheet is formed afterwards and then forms deposition mask 20.

The long metal sheet 64 being supplied to is sent to Etaching device (etching unit) 70 by transfer roller 72.Using etching unit 70, implement each processing shown in Figure 12~Figure 20.

First, as shown in figure 12, on the 1st face 64a of long metal sheet 64 (on the face of the downside in the paper of Figure 12) and The photonasty anticorrosive additive material of minus is coated with 2nd face 64b, resist film 65c, 65d are formed on long metal sheet 64.Then, Prepare exposed mask 85a, 85b, the exposed mask 85a, 85b do not make light pass through to being removed in resist film 65c, 65d Region, exposed mask 85a, 85b are configured on resist film 65c, 65d as shown in figure 13 respectively.As exposed mask 85a, 85b, using such as glass dry plate, which does not make light pass through to the region to be removed in resist film 65c, 65d.Its Afterwards, make exposed mask 85a, 85b and resist film 65c, 65d fully closely sealed by the way that vacuum is closely sealed.

Need to illustrate when, as photonasty anticorrosive additive material, the photonasty anticorrosive additive material of eurymeric can be used.It is this In the case of, as exposed mask, passed through using light is made to the exposed mask in the region to be removed in resist film.

Here, according to the present embodiment, as described above, extension rate the prolonging more than middle body R1 using end 64e Stretch the long metal sheet 64 of the maximum of rate.That is, the degree of the undulations of the end 64e of the width D2 of long metal sheet 64 The degree of undulations more than the central portion 64c of the width D2 of long metal sheet 64.Generally in vacuum is closely sealed, by making Existing air is arranged between resist film 65c, 65d on long metal sheet 64 and exposed mask 85a, 85b from long metal sheet 64 and resist film 65c, 65d laminate end to outside discharge, it can be achieved that resist film 65c, 65d and exposed mask It is closely sealed between 85a, 85b.Here, it is assumed that the degree of the undulations of the end 64e of long metal sheet 64 is less than long metal sheet 64 Central portion 64c undulations degree, it may be considered that, compared with the region near the central portion of laminate, laminate End near region take the lead in it is closely sealed with exposed mask 85a, 85b, as a result, causing the central portion of laminate existing nearby The overflow channel of air disappears.In contrast, according to the present embodiment, the journey of the undulations of the end 64e of long metal sheet 64 Degree is more than the degree of the undulations of the central portion 64c of long metal sheet 64, therefore, it is possible to reliably ensure that the central portion of laminate The overflow channel of existing air nearby, therefore, it is possible to make exposed mask 85a, 85b and resist film 65c, 65d in whole area Domain is fully closely sealed.

Thereafter, resist film 65c, 65d are exposed across exposed mask 85a, 85b, further by resist film 65c, 65d Development.In this way, as shown in figure 14, Resist patterns (also referred to as resist) can be formed on the 1st face 64a of long metal sheet 64 65a, form Resist patterns (also referred to as resist) 65b on the 2nd face 64b of long metal sheet 64.

Then, as shown in figure 15, using the Resist patterns 65b formed on long metal sheet 64 as mask, etching solution is used (such as iron chloride (III) solution), from the 2nd face 64b lateral erosions of long metal sheet 64.For example, etching solution from nozzle across against corrosion Agent pattern 65b sprays to the 2nd face 64b of long metal sheet 64, and the nozzle configuration is in the 2nd face of the long metal sheet 64 with transmission The side that 64b is faced.As a result, as shown in figure 15, in the region not covered by Resist patterns 65b in long metal sheet 64, Erosion caused by etching solution promotes.In this way, substantial amounts of second recesses 35 are formed on long metal sheet 64 from the 2nd face 64b sides.

Thereafter, as shown in figure 16, have indefatigable resin 69 using to etching solution, the second recesses 35 formed are coated to. That is, have indefatigable resin 69 using to etching solution, second recesses 35 are sealed.In example as shown in figure 16, the film of resin 69 Formed in the way of formed second recesses 35 but also the 2nd face 64b (Resist patterns 65b) of covering are not only covered.

Then, as shown in figure 17, the 2nd etching is carried out to long metal sheet 64.In the 2nd etching, long metal sheet 64 is only It is etched from the 1st face 64a sides, from the 1st face 64a sides, the formation of the 1st recess 30 promotes.Due to the 2nd face 64b of long metal sheet 64 Side is coated with has indefatigable resin 69 to etching solution, therefore, the second recesses for forming desired shape is etched by the 1st time 35 shape is not damaged.

Part based on the erosion of etching being contacted with etching solution in long metal sheet 64 carries out.Therefore, corrode not only Promote in the normal direction (thickness direction) of long metal sheet 64, also promoted in the direction of the plate face along long metal sheet 64.It is tied Fruit, as shown in figure 18, the normal direction for being etched in long metal sheet 64 promote and the 1st recess 30 is connected with second recesses 35, not only In this way, two the 1st recesses 30 formed respectively in the position that the adjacent two hole 66a with Resist patterns 65a is faced are in place Converge on the inside of bridge portion 67a between two hole 66a.

As shown in figure 19, the etching from the 1st face 64a sides of long metal sheet 64 is pushed further into.As shown in figure 19, it is adjacent What two the 1st recesses 30 merged converges the disengaging of part 43 Resist patterns 65a, being somebody's turn to do under Resist patterns 65a Converge in part 43, corroding caused by etching also promotes in the normal direction (thickness direction) of metallic plate 64.Thus, towards along The sharp part 43 of converging in the side of the normal direction of deposition mask is etched from the side of the normal direction along deposition mask, So as to be chamfered as shown in Figure 19.Thus, the wall 31 of the 1st recess 30 can be made relative to the normal direction institute of deposition mask The tiltangleθ 1 of formation increases.

In this way, the erosion of the 1st face 64a of the long metal sheet 64 based on etching long metal sheet 64 be used for form effective district Promoted in the whole region in domain 22.Thus, the long metal sheet 64 in the region for forming effective coverage 22 along normal side To maximum gauge Ta compared to etching before long metal sheet 64 maximum gauge Tb it is thinning.

As described above, the etching from the 1st face 64a sides of long metal sheet 64 only promotes amount set in advance, to long metal sheet 64 the 2nd etching terminates.At this time, the thickness direction of the 1st recess 30 along long metal sheet 64, which extends to, reaches second recesses 35 At position, so as to form through hole 25 on long metal sheet 64 using the 1st recess 30 and second recesses 35 mutually communicated.

Thereafter, as shown in figure 20, resin 69 is removed from long metal sheet 64.Can by using such as alkali system stripper Remove resin film 69.It should be noted that in the case of using alkali system stripper, as shown in figure 20, also removed at the same time with resin 69 Remove Resist patterns 65a, 65b.

Rotating transfer roller 72,72 is carried out to disconnecting device (cutting unit) using to clamp the state of the long metal sheet 64 73 transmission are thusly-formed the long metal sheet 64 of a large amount of through holes 25.It should be noted that by using the transfer roller 72,72 Rotate and act on the tension force (drawing force) of long metal sheet 64, rotate above-mentioned supply core 61, so as to be supplied by coiling body 62 To long metal sheet 64.

Thereafter, the long metal sheet 64 formed with a large amount of recesses 61 is cut into using disconnecting device (cutting unit) 73 predetermined Length and width, so as to obtain the sheet metal plate 21 formed with a large amount of through holes 25.

Operate as above, the available deposition mask 20 being made of the metallic plate 21 formed with a large amount of through holes 25.Here, root According to present embodiment, the whole region of the 1st face 21a of metallic plate 21 in effective coverage 22 is etched.Therefore, deposition mask 20 is made Effective coverage 22 thickness reduce, and can make the 1st face 21a sides formed two the 1st recesses 30 wall 31 elder generation The outer contour for the part 43 that end margin 32 converges is the shape of chamfering.Therefore, above-mentioned angle, θ 1 can be increased, thus, can be improved The utilization ratio of evaporation material and the positional precision of evaporation.

But the long metal sheet 64 with undulations is alongst cut into predetermined width it is meant that by The length for each deposition mask 20 that the elongate metallic plate 21 that is obtained after cut-out is formed is according to cutting out the position of metallic plate 21, exist The position of the width of long metal sheet 64 and it is different.Here, according to the present embodiment, it is based on as described above, using The extension rate of width D2 and the long metal sheet 64 filtered out in advance.Therefore, there is fluctuating shape even in long metal sheet 64 In the case of shape, the degree of the difference of the length for the deposition mask 20 of more than 2 that can also make to make at the same time is in permissible range. Therefore, according to the present embodiment, the of the thickness of the effective coverage 22 that reduces deposition mask 20 and increase deposition mask 20 is passed through The tilt angle theta 1 of the wall 31 of 1 recess 30, can realize the utilization ratio for improving evaporation material and the position essence of evaporation at the same time Spend, reduce the deviation and raising deposition mask manufacture work of the spacing of each through hole 25 of the effective coverage 22 of deposition mask 20 The adaptation of exposure process in sequence, the yield rate of the manufacturing process of raising deposition mask 20.Therefore, offer can be stablized with excellent The deposition mask 20 of different characteristic.

(evaporation coating method)

Then, illustrated to evaporation material is deposited using obtained deposition mask 20 in the method on substrate 92. First, as shown in Fig. 2, making deposition mask 20 and substrate 92 closely sealed.At this time, deposition mask 20 is tensioned on frame 15, from And make the face of deposition mask 20 parallel to the face of substrate 92.Here, according to the present embodiment, use based on width D2's The long metal sheet 64 for extending rate and filtering out in advance.Therefore, compared with the situation of such screening is not carried out, each deposition mask The deviation of 20 length is equably reduced, and then the deviation of the spacing of each through hole 25 of effective coverage 22 obtains equably Reduce.Therefore, it is possible to which evaporation material is deposited on substrate 92 with high positional precision.Therefore, organic EL is formed by evaporation During the pixel of display device, the dimensional accuracy and positional precision of the pixel of organic EL display can be improved.Thus, can produce The organic EL display of fine.

It should be noted that in above-mentioned present embodiment, in the example shown, not by long metal sheet 64 in length The length of the long metal sheet 64 of the position of the width D2 of long metal sheet 64 is calculated in the case of the cut-out of degree direction.But It is, however it is not limited to this, after long metal sheet 64 can also being cut into appropriate length in length direction, in each of width D2 Position calculates the length of the metallic plate after cut-out, implements the screening of metallic plate based on the result.

In addition, in present embodiment, in the example shown, the 1st face 21a of metallic plate 21 is in the whole area of effective coverage 22 Domain is etched.But, however it is not limited to this, a part that can also be only in effective coverage 22 loses the 1st face 21a of metallic plate 21 Carve.

Embodiment

In the following, further illustrate the present invention by embodiment, the present invention without departing from its main points be just not limited to Under embodiment record.

(the 1st sample)

First, above-mentioned rolling process and annealing operation are implemented to the mother metal containing invar alloy material, so as to manufacture length The coiling body (the 1st coiling body) that metallic plate batches.Thereafter, the front end of the 1st coiling body is cut using shearing machine, so that such as Shown in Figure 21, the 1st sample 100 being made of the metallic plate that width is 500mm, projected length is 700mm is obtained.Need what is illustrated It is, in the case that " projected length " refers in the case of metallic plate, i.e. to ignore from surface the undulations of metallic plate The length (size of rolling direction) of metallic plate.In addition, the width of the 1st sample 100 refers to the 1st sample 100 of width A pair of end portions 101, the distance between 102.The portion that a pair of end portions 101,102 of 1st sample 100 is formed by cut off operation Point, in the cut off operation, the both ends of the width of the metallic plate obtained by rolling process and annealing operation are cut away pre- Determine scope, which extends substantially straightly.

Then, as shown in figure 21, the 1st sample 100 is placed horizontally on platform 110.At this time, according in the 1st sample 100 In do not produce the mode of local dent the 1st sample 100 be gently placed on platform 110.Then, the one of the 1st sample 100 A end 101, the physical length of the 1st sample 100 in the region of measure projected length 500mm, the length for considering undulations Degree.It is in it should be noted that the region of projected length 500mm refers to remove from the 1st sample 100 of projected length 700mm The both ends 103,104 of length direction away from sample 1 are region obtained from the region within 100mm.Will be in away from both ends 103, 104 be that to be removed from measure object be in order to prevent based on the 1st sample 100 caused by the cut-out of shearing machine for region within 100mm Crooked influence can involve the measurement result of length.In Figure 21, the region of projected length 500mm is shown in dash-dot lines.

In measure, length direction of the range unit of laser along the 1st sample 100 will be utilized in Figure 21 as shown by arrow s 1st sample 100 is made a relative move, with the surface of an end 101 of the 1st sample 100 of 1mm measuring space length directions Height and position.In addition, depicting the curve in smoothing junction formed between each measuring point, thereafter, the length of a curve is calculated.Make For the range unit of the height and position on the surface for measuring the 1st sample 100, the Lasertec as laser microscope has been used The OPTELICS H1200 of Co., Ltd.'s manufacture.It should be noted that during measure the key element that is moved can be range unit or Any one of 1st sample 100, but herein, using the automatic station of 500mm × 500mm as the platform for loading the 1st sample 100, So that sample 100 is moved and is determined.Laser interferometer is make use of in the control of the automatic station in XY directions.In this way, Determine the length of the 1st sample 100 of an end 101.

Then, to the position of 102 side displacement 20mm of another end, the 1st sample is similarly being measured from an end 101 100 length.Changed by one side with predetermined spacing p the width of the 1st sample 100 position implement repeatedly on one side it is above-mentioned Measure, so as to be measured to the length of the 1st sample of each position of width.Here, spacing p is set as 20mm.It is resulting Measurement result include the measurement result of length of end 101, the measurement result of the length of another end 102 and The measurement result of the measurement result of the length of middle body and the length between middle body and end 101,102.Need Illustrate, in the case of on the basis of an end 101, middle body be one end 101 of distance be more than 150mm and Part in the scope of below 350mm.It should be noted that the following setting that locates of width：In the 1st sample 100 Central portion, i.e. one end 101 of distance and another end implement the measure of length for equal position.

Then, will be long on the basis of the setting of the minimum value of the length for the 1st sample 100 that each position of width obtains Degree.Thereafter, the ratio by the length of the 1st sample 100 of each position of width and the difference of datum length relative to datum length Example can be regarded as extension rate.As a result, the extension rate of an end 101 is 79.9 × 10^-5, another end 102 extension rate For 71.2 × 10^-5, middle body each position extension rate maximum be 15.8 × 10^-5。

The result of calculation of the extension rate of 1st sample 100 is compareed with above-mentioned condition (1)~(3), as a result, the 1st In sample 100, meet condition (3), but be unsatisfactory for condition (1) and (2).Therefore, judge that the 1st sample 100 cannot function as being used to make The material for making deposition mask is used.

It is in addition, multiple alongst using the metallic plate for the 1st coiling body for obtaining the 1st above-mentioned sample 100, manufacture It is provided with the deposition mask of 5 effective coverages.In a regular array formed with substantial amounts of in each effective coverage of each deposition mask Through hole.Then, in order to evaluate the positional precision of obtained deposition mask, total spacing of each deposition mask is measured, and calculate Go out the extent of deviation of total spacing.

Here, total spacing refers to distance between predetermined 2 point in deposition mask.As long as the position of deposition mask can be evaluated Precision, is not particularly limited for 2 points of setting position, here, in the effective coverage of the one end positioned at deposition mask The predetermined mark that is nearby formed, with it is predetermined what is formed near the effective coverage of the another side of deposition mask The distance between mark be measured, as total spacing.In this case total spacing is about 600mm in design.

As the index of the extent of deviation of total spacing, the standard deviation of the measured value of total spacing to each deposition mask is utilized Value, so-called 3 σ obtained from (σ) is multiplied by 3.The deviation (3 σ) of the measured value of total spacing of the deposition mask obtained by the 1st coiling body For 35.2 μm.It should be noted that n numbers when calculating standard deviation (σ) are compared according to described later between each sample On the basis of standard deviation (σ) value have sufficient reliability mode set.Specifically, if n numbers are 400.

(the 2nd sample)

By cutting the front end of 2nd coiling body different from above-mentioned 1st coiling body, obtain by wide 500mm, projected length The 2nd sample that the metallic plate of 700mm is formed.Then, each position in width in the same manner as the situation of above-mentioned 1st sample is surveyed The length of fixed 2nd sample, and calculate extension rate.As a result, the extension rate of an end is 24.7 × 10^-5, another end The extension rate in portion is 29.8 × 10^-5, middle body each position extension rate maximum be 1.0 × 10^-5。

The result of calculation of the extension rate of 2nd sample is compareed with above-mentioned condition (1)~(3), as a result, the 2nd In sample, meet condition (1) and (3), but be unsatisfactory for condition (2).Therefore, it is determined that the 2nd sample is deposited to cannot function as being used for manufacture The material of mask and used.

In addition, in the same manner as the situation of above-mentioned 1st sample, using the metallic plate of the 2nd coiling body, manufacture is multiple to be provided with greatly Measure the deposition mask of through hole.Then, in the same manner as the situation of above-mentioned 1st sample, the total of obtained each deposition mask is measured Spacing, and calculate the deviation (3 σ) of the measured value of total spacing.As a result, the value of 3 σ is 16.1 μm.

(the 3rd sample)

By cutting the front end of 3rd coiling body different from above-mentioned 1st coiling body and the 2nd coiling body, obtain by width The 3rd sample that 500mm, the metallic plate of projected length 700mm are formed.Then, in the same manner as the situation of above-mentioned 1st sample, in width The each position for spending direction measures the length of the 3rd sample, and calculates extension rate.As a result, the extension rate of an end is 18.1×10^-5, another end extension rate be 19.0 × 10^-5, middle body each position extension rate maximum For 13.2 × 10^-5。

The result of calculation of the extension rate of 3rd sample is compareed with above-mentioned condition (1)~(3), as a result, in the 3rd sample In product, meet condition (2) and (3), but be unsatisfactory for condition (1).Therefore, it is determined that the 3rd sample cannot function as being used to manufacture deposition mask Material and used.

In addition, in the same manner as the situation of above-mentioned 1st sample, using the metallic plate of the 3rd coiling body, manufacture is multiple to be provided with greatly Measure the deposition mask of through hole.Then, in the same manner as the situation of above-mentioned 1st sample, the total of obtained each deposition mask is measured Spacing, and calculate the deviation (3 σ) of the measured value of total spacing.As a result, the value of 3 σ is 14.2 μm.

(the 4th sample)

By cutting the front end of 4th coiling body different from above-mentioned 1st coiling body~the 3rd coiling body, obtain by width The 4th sample that 500mm, the metallic plate of projected length 700mm are formed.Then, in the same manner as the situation of above-mentioned 1st sample, in width The each position for spending direction measures the length of the 4th sample, and calculates extension rate.As a result, the extension rate of an end is 26.8×10^-5, another end extension rate be 18.6 × 10^-5, middle body each position extension rate maximum For 3.9 × 10^-5。

The result of calculation of the extension rate of 4th sample is compareed with above-mentioned condition (1)~(3), as a result, in the 4th sample Meet condition (1) and (3) in product, but be unsatisfactory for condition (2).Therefore, it is determined that the 4th sample cannot function as being used to manufacture deposition mask Material and used.

In addition, in the same manner as the situation of above-mentioned 1st sample, using the metallic plate of the 4th coiling body, manufacture is multiple to be provided with greatly Measure the deposition mask of through hole.Then, in the same manner as the situation of above-mentioned 1st sample, the total of obtained each deposition mask is measured Spacing, and calculate the deviation (3 σ) of the measured value of total spacing.As a result, the value of 3 σ is 13.5 μm.

(the 5th sample)

By cutting the front end of 5th coiling body different from above-mentioned 1st coiling body~the 4th coiling body, obtain by width The 5th sample that 500mm, the metallic plate of projected length 700mm are formed.Then, in the same manner as the situation of above-mentioned 1st sample, in width The each position for spending direction measures the length of the 5th sample, and calculates extension rate.As a result, the extension rate of an end is 18.2×10^-5, another end extension rate be 12.3 × 10^-5, middle body each position extension rate maximum For 9.1 × 10^-5。

The result of calculation of the extension rate of 5th sample is compareed with above-mentioned condition (1)~(3), as a result, in the 5th sample Meet the whole of condition (1)~(3) in product.Therefore, it is determined that the 5th sample can as manufacture deposition mask material and into Exercise and use.

In addition, in the same manner as the situation of above-mentioned 1st sample, using the metallic plate of the 5th coiling body, manufacture is multiple to be provided with greatly Measure the deposition mask of through hole.Then, in the same manner as the situation of above-mentioned 1st sample, the total of obtained each deposition mask is measured Spacing, and calculate the deviation (3 σ) of the measured value of total spacing.As a result, the value of 3 σ is 5.6 μm.

(the 6th sample)

By cutting the front end of 6th coiling body different from above-mentioned 1st coiling body~the 5th coiling body, obtain by width The 6th sample that 500mm, the metallic plate of projected length 700mm are formed.Then, in the same manner as the situation of above-mentioned 1st sample, in width The each position for spending direction measures the length of the 6th sample, and calculates extension rate.As a result, the extension rate of an end is 18.2×10^-5, another end extension rate be 8.8 × 10^-5, middle body each position extension rate maximum For 9.1 × 10^-5。

The result of calculation of the extension rate of 6th sample is compareed with above-mentioned condition (1)~(3), as a result, in the 3rd sample Meet condition (1) and (2) in product, but be unsatisfactory for condition (3).Therefore, it is determined that the 6th sample cannot function as being used to manufacture deposition mask Material and used.

In addition, in the same manner as the situation of above-mentioned 1st sample, using the metallic plate of the 6th coiling body, manufacture is multiple to be provided with greatly Measure the deposition mask of through hole.Then, in the same manner as the situation of above-mentioned 1st sample, the total of obtained each deposition mask is measured Spacing, and calculate the deviation (3 σ) of the measured value of total spacing.As a result, the value of 3 σ is 12.6 μm.

(the 7th sample)

By cutting the front end of 7th coiling body different from above-mentioned 1st coiling body~the 6th coiling body, obtain by width The 7th sample that 500mm, the metallic plate of projected length 700mm are formed.Then, in the same manner as the situation of above-mentioned 1st sample, in width The each position for spending direction measures the length of the 7th sample, and calculates extension rate.As a result, the extension rate of an end is 16.5×10^-5, another end extension rate be 3.2 × 10^-5, middle body each position extension rate maximum For 0.8 × 10^-5。

The result of calculation of the extension rate of 7th sample is compareed with above-mentioned condition (1)~(3), as a result, in the 7th sample Meet the whole of condition (1)~(3) in product.Therefore, it is determined that the 7th sample can as manufacture deposition mask material and into Exercise and use.

In addition, in the same manner as the situation of above-mentioned 1st sample, using the metallic plate of the 7th coiling body, manufacture is multiple to be provided with greatly Measure the deposition mask of through hole.Then, in the same manner as the situation of above-mentioned 1st sample, the total of obtained each deposition mask is measured Spacing, and calculate the deviation (3 σ) of the measured value of total spacing.As a result, the value of 3 σ is 4.3 μm.

Make what is well judged based on above-mentioned condition (1)~(3) in this way, being achieved in the metallic plate of the 5th, the 7th coiling body Sample 5,7, in the case of the metallic plate for having used the described 5th, the 7th coiling body, makes the measured value of total spacing of deposition mask Deviation (3 σ) value reduce, specifically can be less than 10 μm.On the other hand, the metal of the 1st~the 4th and the 6th coiling body Achieved in plate and be determined as undesirable sample 1~4 and 6 based on above-mentioned condition (1)~(3), used the 1st~the 4th and the 6th winding In the case of the metallic plate of body, the value of the deviation (3 σ) of the measured value of total spacing of deposition mask is big, specifically, more than 10 μ m.It is possible thereby to think, have between the judgement result and the performance of obtained deposition mask based on above-mentioned condition (1)~(3) There is very big correlation.That is,, can be precisely pre- in the stage of coiling body by using above-mentioned condition (1)~(3) Survey the characteristic of the deposition mask obtained by the metallic plate of the coiling body.Accordingly, it is believed that above-mentioned condition (1)~(3) are to have The determination methods of power.

Symbol description

20 deposition masks

21 metallic plates

1st face of 21a metallic plates

2nd face of 21b metallic plates

22 effective coverages

23 peripheral regions

25 through holes

30 the 1st recesses

31 walls

35 second recesses

36 walls

55 mother metals

56 rolling devices

57 annealing devices

61 cores

62 coiling bodies

64 long metal sheets

1st face of 64a long metal sheets

2nd face of 64b long metal sheets

The central portion of the width of 64c long metal sheets

The end of the width of 64e long metal sheets

65a, 65b Resist patterns

65c, 65d resist film

The curve of 80 extension rates

81 datum lines

85a, 85b exposed mask

Claims

1. a kind of manufacture method of deposition mask, the effective coverage of more than 2 of the deposition mask is along the length with deposition mask A parallel direction of degree direction forms a line across predetermined interval, wherein, which includes following processes：

Prepare the process of metallic plate, which at least locally has undulations, and the undulations are due to the length of the metallic plate The length in degree direction corresponds to the position of its width and different；

Resist patterns formation process, in the process, Resist patterns is formed on the metallic plate；With

Etching work procedure, in the process, is etched the metallic plate using the Resist patterns as mask, for being formed The recess for being used for marking the through hole is formed in the region of the metallic plate of the effective coverage；

The minimum value of the length of the metallic plate is known as datum length, by each position of the width of the metallic plate The length of the metallic plate and the difference of the datum length at place are known as extension difference relative to the ratio of the datum length During rate, meet the following conditions (1)~(3),

(1) the extension rate of the middle body of the width of the metallic plate is 10 × 10^-5Below；

(2) the extension rate of the end of the width of the metallic plate is 20 × 10^-5Below；With

(3) the extension rate of the end is more than the maximum of the extension rate of the middle body；

The middle body includes the central portion of the width of the metallic plate, it is the 40% of the width for accounting for the metallic plate Part.

2. the manufacture method of deposition mask as claimed in claim 1, wherein,

The Resist patterns formation process has：

On the metallic plate formed resist film process,

Make exposed mask and the closely sealed process of the resist film vacuum and

Across the process that the exposed mask exposes the resist film in a predetermined pattern.

3. the manufacture method of deposition mask as claimed in claim 1 or 2, wherein, the thermal coefficient of expansion and base of the metallic plate The thermal coefficient of expansion of plate is equal value, on the substrate across the deposition mask manufactured by the metallic plate and forming a film has evaporation material Material.

4. the manufacture method of deposition mask as claimed in claim 1, wherein, the metallic plate contains invar alloy material.