CN104854254A - Metal plate, metal plate production method, and method for producing vapor deposition mask using metal plate - Google Patents
Metal plate, metal plate production method, and method for producing vapor deposition mask using metal plate Download PDFInfo
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- CN104854254A CN104854254A CN201480003445.3A CN201480003445A CN104854254A CN 104854254 A CN104854254 A CN 104854254A CN 201480003445 A CN201480003445 A CN 201480003445A CN 104854254 A CN104854254 A CN 104854254A
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- 239000002184 metal Substances 0.000 title claims abstract description 399
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 399
- 238000004519 manufacturing process Methods 0.000 title claims description 92
- 238000007740 vapor deposition Methods 0.000 title description 3
- 230000008021 deposition Effects 0.000 claims description 259
- 238000000034 method Methods 0.000 claims description 80
- 239000000463 material Substances 0.000 claims description 55
- 239000000758 substrate Substances 0.000 claims description 55
- 239000011148 porous material Substances 0.000 claims description 48
- 238000005096 rolling process Methods 0.000 claims description 37
- 238000005530 etching Methods 0.000 claims description 33
- 238000000137 annealing Methods 0.000 claims description 21
- 230000015572 biosynthetic process Effects 0.000 claims description 20
- 239000000956 alloy Substances 0.000 claims description 10
- 229910001374 Invar Inorganic materials 0.000 claims description 9
- 230000002093 peripheral effect Effects 0.000 claims description 8
- 238000001704 evaporation Methods 0.000 description 28
- 230000008020 evaporation Effects 0.000 description 28
- 239000011521 glass Substances 0.000 description 19
- 238000005520 cutting process Methods 0.000 description 11
- 238000000576 coating method Methods 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 8
- 239000011368 organic material Substances 0.000 description 8
- 238000004364 calculation method Methods 0.000 description 7
- 239000011347 resin Substances 0.000 description 7
- 229920005989 resin Polymers 0.000 description 7
- 230000003628 erosive effect Effects 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- 238000012216 screening Methods 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- 230000000996 additive effect Effects 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 4
- 206010034972 Photosensitivity reaction Diseases 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000036211 photosensitivity Effects 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 230000003292 diminished effect Effects 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- 238000009499 grossing Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
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- 229910052742 iron Inorganic materials 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 238000010008 shearing Methods 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
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- 238000005516 engineering process Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
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- SZVJSHCCFOBDDC-UHFFFAOYSA-N iron(II,III) oxide Inorganic materials O=[Fe]O[Fe]O[Fe]=O SZVJSHCCFOBDDC-UHFFFAOYSA-N 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
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- 210000002027 skeletal muscle Anatomy 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21B—ROLLING OF METAL
- B21B1/00—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations
- B21B1/22—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling plates, strips, bands or sheets of indefinite length
-
- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D1/00—General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
- C21D1/26—Methods of annealing
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5806—Thermal treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/02—Local etching
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/02—Local etching
- C23F1/04—Chemical milling
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/20—Changing the shape of the active layer in the devices, e.g. patterning
- H10K71/231—Changing the shape of the active layer in the devices, e.g. patterning by etching of existing layers
- H10K71/233—Changing the shape of the active layer in the devices, e.g. patterning by etching of existing layers by photolithographic etching
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The purpose of the present invention is to provide a metal plate having a low differential expansion rate. The differential expansion rate in the central area of the metal plate in the width direction is no more than 10 10-5. The differential expansion rate in the end sections of the metal plate in the width direction is no more than 20 10-5. Furthermore, the differential expansion rate in the end sections of the metal plate in the width direction is greater than the maximum value for the differential expansion rate in the central area of the metal plate in the width direction.
Description
Technical field
The present invention relates to by forming more than 2 communicating poress and for the manufacture of the metal sheet of deposition mask.The invention still further relates to the manufacture method of metal sheet.In addition, the invention still further relates to the manufacture of use metal sheet for carrying out the method for the deposition mask of evaporation with desired pattern.
Background technology
In recent years, for the display unit used in the portable device such as smart mobile phone and panel computer, require that fine, such as picture element density are more than 300ppi.In addition, in portable device, needing on correspondence is full HD improves, and in this case, the picture element density of display unit requires as such as more than 450ppi.
Because responsiveness is good, power consumption is low, organic EL display is attracted attention.As the pixel formation method of organic EL display, known method is, uses the deposition mask comprised with the communicating pores of desired pattern arrangement, forms pixel with desired pattern.Specifically, first, make deposition mask be sealed at the substrate of organic EL display, then, closely sealed deposition mask and substrate are together dropped into evaporation coating device, carry out the evaporation of organic materials etc.Deposition mask generally following manufacture obtains: form communicating pores by make use of the etching of photolithographic techniques at metal sheet, thus manufacture above-mentioned evaporation mask (such as patent documentation 1).Such as, first, resist film is formed on a metal plate, then under the state making exposed mask be sealed at resist film, resist film is exposed to form Resist patterns, thereafter, Resist patterns is etched metal sheet as mask, thus form communicating pores.
Prior art document
Patent documentation
Patent documentation 1: Japanese Unexamined Patent Publication 2004-39319 publication
Summary of the invention
When using deposition mask to carry out the film forming of deposition material on substrate, not only substrate, deposition mask is also attached with deposition material.Such as, also there is the direction that significantly tilts along the normal direction relative to deposition mask and fly to the deposition material of substrate in deposition material, such deposition material can arrive the wall of the communicating pores of deposition mask thus attachment before arriving substrate.In this case, can think, deposition material is difficult to the region being positioned at the near wall of the communicating pores of deposition mask adhered in a substrate, its result, and other parts of the Thickness Ratio of the deposition material of attachment are little or produce the part of not adhering to deposition material.That is, can think, the evaporation of the near wall of the communicating pores of deposition mask is unstable.Therefore, when forming the pixel of organic EL display and use deposition mask in stomach, the dimensional precision of pixel and positional precision reduce, and its result, causes the luminous efficiency of organic EL display to reduce.
In order to solve such problem, consider the reduced thickness of the metal sheet for the manufacture of deposition mask.This is because, by reducing the thickness of metal sheet, the height of the wall of the communicating pores of deposition mask can be made to diminish, thus, the ratio being attached to the deposition material on communicating pores wall in deposition material can be reduced.But, in order to obtain the little metal sheet of thickness, need when rolling mother metal manufactures metal sheet to strengthen rolling rate.At this, rolling rate refers to the value that utilization (thickness-metal sheet of mother metal)/(thickness of mother metal) calculates.Under implementing the heat treated situations such as annealing after rolling, usual rolling rate is larger, and the degree of irregularity based on the distortion of rolling is also larger.Such as, according to the position in width (direction orthogonal with the delivery direction of mother metal), the unit elongation of metal sheet is different, and its result, undulations appears in metal sheet, and this is well-known.Specifically, can enumerate: in the shape of the fluctuating of the end of width, it is called as wavy edge; In the undulations of the central part of width, it is called as middle ripple.If there is such undulations, then exposed mask can not be made fully to be sealed at resist film on metal sheet, and its result, can think that the positional precision of the communicating pores formed on a metal plate and dimensional precision can reduce.If the positional precision of communicating pores and dimensional precision reduce, then dimensional precision and the positional precision of the pixel of the organic EL display obtained by using deposition mask can reduce.
In addition, in order to cut down the manufacturing cost of deposition mask, first, it is well known that, form the effective area that comprise more than 2 communicating poress corresponding with an organic EL display of more than 2 in the whole region of metal sheet, thereafter, metal sheet is cut to more than 2 by the length direction along metal sheet, thus, to produce once out the elongate deposition mask of more than 2.But when the unit elongation of metal sheet is different according to the position of width, the length of more than 2 the elongate deposition masks obtained after cut-out is different.In this case, the spacing of each communicating pores of the effective area of deposition mask is also different in each deposition mask, its result, also can think, size and the position of the pixel of the organic EL display obtained by using deposition mask occur deviation because of the difference of individuality.
The object of this invention is to provide the manufacture method that effectively can solve the metal sheet of such problem, the manufacture method of metal sheet and deposition mask.
The present invention of 1st relates to a kind of manufacture method of metal sheet, and by formation more than 2 communicating poress, for the manufacture of deposition mask, wherein, the above-mentioned communicating pores of above-mentioned deposition mask is formed by etching above-mentioned metal sheet this metal sheet,
The manufacture method of above-mentioned metal sheet possesses following operation: rolling process, in this operation, is rolled and obtains above-mentioned metal sheet to mother metal; With cut-out operation, in this operation, the two ends of the width of above-mentioned metal sheet are cut away with pre-determined range, above-mentioned metal sheet after above-mentioned cut-out operation at least local has undulations, and this undulations is different due to the position of length its width corresponding of the length direction of this metal sheet; The minimum value of the above-mentioned length of the above-mentioned metal sheet after above-mentioned cut-out operation is called datum length, by the above-mentioned length of the above-mentioned metal sheet of the position of the width of the above-mentioned metal sheet after above-mentioned cut-out operation and the difference of said reference length relative to the ratio of said reference length be called extend rate time, meet the following conditions (1) ~ (3)
(1) the above-mentioned extension rate of the middle body of the width of the above-mentioned metal sheet after above-mentioned cut-out operation is 10 × 10
-5below;
(2) the above-mentioned extension rate of the end of the width of the above-mentioned metal sheet after above-mentioned cut-out operation is 20 × 10
-5below; With
(3) the above-mentioned extension rate of above-mentioned end is greater than the maximum value of the above-mentioned extension rate of above-mentioned middle body;
Above-mentioned middle body comprises the central part of the width of the above-mentioned metal sheet after above-mentioned cut-out operation, and it is the part of 40% of the width accounting for above-mentioned metal sheet.
Manufacture method based on metal sheet of the present invention can possess annealing operation further, in this operation, by the above-mentioned metal sheet annealing obtained by the rolling operation, to remove the internal stress of above-mentioned metal sheet.
In the manufacture method based on metal sheet of the present invention, above-mentioned annealing operation can stretch above-mentioned metal sheet while implement at length direction.
In the manufacture method based on metal sheet of the present invention, above-mentioned annealing operation is implemented can be taken at the state on core at above-mentioned metal plate coils under.
In the manufacture method based on metal sheet of the present invention, on an equal basis, on this substrate, across the deposition mask manufactured by above-mentioned metal sheet, film forming has deposition material for the thermal expansivity of preferred above-mentioned mother metal and the thermal expansivity of substrate.
In the manufacture method based on metal sheet of the present invention, above-mentioned mother metal can contain Invar alloy material.
The present invention of 2nd relates to a kind of metal sheet, this metal sheet is by forming more than 2 communicating poress and for the manufacture of the metal sheet of deposition mask, wherein, above-mentioned metal sheet at least local has undulations, this undulations is different due to the position of length its width corresponding of the length direction of this metal sheet, the minimum value of the above-mentioned length of above-mentioned metal sheet is called datum length, by the above-mentioned length of the above-mentioned metal sheet of the position of the width of above-mentioned metal sheet and the difference of said reference length relative to the ratio of said reference length be called extend rate time, meet the following conditions (1) ~ (3),
(1) the above-mentioned extension rate of the middle body of the width of above-mentioned metal sheet is 10 × 10
-5below;
(2) the above-mentioned extension rate of the end of the width of above-mentioned metal sheet is 20 × 10
-5below; With
(3) the above-mentioned extension rate of above-mentioned end is greater than the maximum value of the above-mentioned extension rate of above-mentioned middle body;
Above-mentioned middle body comprises the central part of the width of above-mentioned metal sheet, and it is the part of 40% of the width accounting for above-mentioned metal sheet.
Thermal expansivity based on metal sheet of the present invention is preferably equal value with the thermal expansivity of substrate, and on this substrate, across the deposition mask manufactured by above-mentioned metal sheet, film forming has deposition material.
Invar alloy material can be contained based on metal sheet of the present invention.
The present invention of 3rd relates to a kind of manufacture method of deposition mask, and this deposition mask possesses the peripheral region of the effective area being formed with more than 2 communicating poress and the surrounding being positioned at above-mentioned effective area, and wherein, this manufacture method comprises following operation:
Prepare the operation of metal sheet, this metal sheet at least local has undulations, and this undulations is different due to the position of length its width corresponding of the length direction of this metal sheet;
Resist patterns formation process, in this operation, above-mentioned metal sheet forms Resist patterns; With
Etching work procedure, in this operation, etches above-mentioned Resist patterns above-mentioned metal sheet as mask, forms the recess for marking above-mentioned communicating pores in the region of the above-mentioned metal sheet for the formation of above-mentioned effective area;
The minimum value of the above-mentioned length of above-mentioned metal sheet is called datum length, by the above-mentioned length of the above-mentioned metal sheet of the position of the width of above-mentioned metal sheet and the difference of said reference length relative to the ratio of said reference length be called extend rate time, meet the following conditions (1) ~ (3)
(1) the above-mentioned extension rate of the middle body of the width of above-mentioned metal sheet is 10 × 10
-5below;
(2) the above-mentioned extension rate of the end of the width of above-mentioned metal sheet is 20 × 10
-5below; With
(3) the above-mentioned extension rate of above-mentioned end is greater than the maximum value of the above-mentioned extension rate of above-mentioned middle body;
Above-mentioned middle body comprises the central part of the width of above-mentioned metal sheet, and it is the part of 40% of the width accounting for above-mentioned metal sheet.
In the manufacture method based on deposition mask of the present invention, wherein, above-mentioned Resist patterns formation process can have: on above-mentioned metal sheet, form the operation of resist film, make exposed mask and the closely sealed operation of above-mentioned resist film vacuum and across above-mentioned exposed mask by above-mentioned resist film with the operation of predetermined pattern exposure.
In the manufacture method based on deposition mask of the present invention, the thermal expansivity of preferred above-mentioned metal sheet and the thermal expansivity of substrate are equal value, and on this substrate, across the deposition mask manufactured by above-mentioned metal sheet, film forming has deposition material.
In the manufacture method based on deposition mask of the present invention, above-mentioned metal sheet can contain Invar alloy material.
According to the present invention, the little and deposition mask that deviation that is each communicating pores spacing of effective area is also little of the degree that can obtain undulations.Therefore, dimensional precision and the positional precision of the deposition material be attached on substrate can be improved.
Accompanying drawing explanation
Fig. 1 is the figure for illustration of one embodiment of the present invention, for illustrating the schematic plan of an example of the deposition mask device comprising deposition mask.
Fig. 2 is for carrying out the figure of the method for evaporation for illustration of the deposition mask device shown in use Fig. 1.
Fig. 3 is for illustrating the top partial view diagram of the deposition mask shown in Fig. 1.
Fig. 4 is the sectional view of the IV-IV line along Fig. 3.
Fig. 5 is the sectional view of the V-V line along Fig. 3.
Fig. 6 is the sectional view of the VI-VI line along Fig. 3.
Fig. 7 (a) obtains the figure of the operation of the metal sheet with desired thickness by rolling mother metal for illustrating, Fig. 7 (b) is for illustrating the figure to the operation that the metal sheet obtained by rolling is annealed.
Fig. 8 is for illustrating the stereographic map of the metal sheet obtained by the operation shown in Fig. 7 (a), (b).
Fig. 9 (a), (b), (c), (d) are respectively the sectional view along the a-a line of Fig. 8, b-b line, c-c line and d-d line.
Figure 10 is the figure of the extension rate of the position of the width that metal sheet is shown.
Figure 11 is for carrying out the schematic diagram of overall description for an example of the manufacture method to the deposition mask shown in Fig. 1.
Figure 12 is the figure of an example of manufacture method for illustration of deposition mask, for illustrating the sectional view of the operation forming resist film on a metal plate.
Figure 13 is the figure of an example of manufacture method for illustration of deposition mask, for illustrating the sectional view of the operation of closely sealed exposed mask on resist film.
Figure 14 is the figure of an example of manufacture method for illustration of deposition mask, is the figure of long metal sheet shown in the cross section along normal direction.
Figure 15 is the figure of an example of manufacture method for illustration of deposition mask, is the figure of long metal sheet shown in the cross section along normal direction.
Figure 16 is the figure of an example of manufacture method for illustration of deposition mask, is the figure of long metal sheet shown in the cross section along normal direction.
Figure 17 is the figure of an example of manufacture method for illustration of deposition mask, is the figure of long metal sheet shown in the cross section along normal direction.
Figure 18 is the figure of an example of manufacture method for illustration of deposition mask, is the figure of long metal sheet shown in the cross section along normal direction.
Figure 19 is the figure of an example of manufacture method for illustration of deposition mask, is the figure of long metal sheet shown in the cross section along normal direction.
Figure 20 is the figure of an example of manufacture method for illustration of deposition mask, is the figure of long metal sheet shown in the cross section along normal direction.
Figure 21 is the vertical view that the 1st sample be placed on platform is shown.
Embodiment
Referring to accompanying drawing, one embodiment of the present invention is described.It should be noted that, in accompanying drawing appended in this specification sheets, for the ease of diagram and easy to understand, for the scale of material object and the size ratio etc. of length and width, suitably the size ratio etc. of comparative example chi and length and width changes and exaggerates.
Fig. 1 ~ Figure 20 is for illustration of the figure based on one embodiment of the present invention.In following embodiment and variation thereof, be described for the manufacture method of deposition mask, this deposition mask for manufacture organic EL display time by organic materials with desired pattern patterning on substrate.But, be not limited to such application, for the manufacture method of the deposition mask for various uses, all applicable the present invention.
It should be noted that, in this specification sheets, the term of " plate ", " sheet ", " film " is not only just can mutually distinguish based on the difference in address.Such as, " plate " is also comprise the concept that can be described as sheet or the such parts of film, and therefore, such as " metal sheet " and the parts being called " tinsel " or " metallic membrane " are only not the samely can not distinguishing of calling.
In addition, " plate face (unilateral, face) " refers to when parts as the tabular (sheet, membranaceous) of object of overall or gross examination of skeletal muscle, as the face consistent with in-plane of the plate-shaped member (sheet component, film member) of object.In addition, the normal direction used for the parts of tabular (sheet, membranaceous) refers to the normal direction in the plate face (unilateral, face) relative to these parts.
In addition, about what use in this specification sheets, with physical property and their degree, the value etc. of the specific such as term such as " parallel ", " orthogonal ", " identical ", " on an equal basis " and length, angle and physical property is carried out to shape or geometric condition, be not limited to strict implication, but the scope comprising the degree can expecting said function makes an explanation.
(deposition mask device)
First, about an example of the deposition mask device of the deposition mask comprised as manufacture method object, main reference Fig. 1 ~ Fig. 6 is described.Herein, Fig. 1 is the vertical view of the example that the deposition mask device comprising deposition mask is shown, Fig. 2 is the figure of the using method for illustration of the deposition mask device shown in Fig. 1.Fig. 3 is the vertical view that deposition mask is shown from the 1st side, and Fig. 4 ~ Fig. 6 is the sectional view of each position of Fig. 3.
Deposition mask device 10 shown in Fig. 1 and Fig. 2 possesses the deposition mask 20 of more than 2 that is made up of the metal sheet 21 being roughly rectangle and is installed on the framework 15 of periphery of deposition mask 20 of more than 2.Each deposition mask 20 is provided with a large amount of communicating poress 25, and this large amount of communicating pores 25 at least etches from the 1st 21a the metal sheet 21 with the 1st 21a and the 2nd 21b in opposite directions each other and formed.As shown in Figure 2, this deposition mask device 10 is supported in evaporation coating device 90, for carrying out the evaporation of deposition material to substrate as the mode below the substrate such as glass substrate 92 of evaporation object faced by deposition mask 20.
In evaporation coating device 90, utilize the magnetic force from not shown magnetite, deposition mask 20 is closely sealed with glass substrate 92.In evaporation coating device 90, in the below of deposition mask device 10, be configured with and hold deposition material (as an example for the luminous organic material) crucible 94 of 98 and the well heater 96 of heating crucible 94.Deposition material 98 in crucible 94 generating gasification or distillation and be attached to the surface of glass substrate 92 under the heating from well heater 96.As mentioned above, be formed with a large amount of communicating poress 25 in deposition mask 20, deposition material 98 is attached to glass substrate 92 by this communicating pores 25.Its result, the pattern desired by corresponding according to the position of the communicating pores 25 with deposition mask 20, deposition material 98 film forming is in the surface of glass substrate 92.
As mentioned above, in present embodiment, communicating pores 25 in each effective area 22 with predetermined pattern arrangement.It should be noted that, when for carrying out colored display, deposition mask 20 (deposition mask device 10) and glass substrate 92 relative movement bit by bit can be made, evaporation is red successively luminous organic material, green luminous organic material and blue luminous organic material along the orientation of communicating pores 25 (an above-mentioned direction).
It should be noted that, the framework 15 of deposition mask device 10 is installed on the periphery of the deposition mask 20 of rectangle.Deposition mask is remained on the state of tensioning by framework 15 according to the mode not making deposition mask 20 bend.Deposition mask 20 and framework 15 are fixed by such as spot welding mutually.
The internal implementation of the evaporation coating device 90 of vapor deposition treatment under high-temperature atmosphere.Therefore, during vapor deposition treatment, remain on the deposition mask 20 of evaporation coating device 90 inside, framework 15 and substrate 92 and also heated.Now, deposition mask, framework 15 and substrate 92 demonstrate the behavior of the dimensional change based on each thermal expansion.In this case, if deposition mask 20, framework 15 are comparatively large with the thermal expansion coefficient difference of substrate 92, then misplace because of the difference of their dimensional change, its result, the dimensional precision and the positional precision that are attached to the deposition material on substrate 92 can reduce.In order to solve such problem, the thermal expansivity of preferred deposition mask 20 and framework 15 and the thermal expansivity of substrate 92 are equal value.Such as, when using glass substrate 92 as substrate 92, as the material of deposition mask 20 and framework 15, alloy and the Invar alloy material of the nickel being added with 36% can be used in iron.
(deposition mask)
The following detailed description of deposition mask 20.As shown in Figure 1, in present embodiment, deposition mask 20 is made up of metal sheet 21, has roughly quadrangle form in vertical view, precisely has substantially rectangular profile in a top view further.The metal sheet 21 of deposition mask 20 comprises the regularly arranged effective area 22 being formed with communicating pores 25 and surrounds the peripheral region 23 of effective area 22.Peripheral region 23 is the region for supporting effective area 22, and it is not intended to the region that evaporation passes through to the deposition material on substrate.Such as, in the deposition mask 20 used in the evaporation of the luminous organic material of organic EL display, effective area 22 is the regions in the deposition mask 20 right with the area surface forming pixel for the evaporation by luminous organic material on substrate (glass substrate 92), is namely the region in the deposition mask 20 right with the area surface of the display surface for the formation of made organic EL display substrate on substrate.But, based on various object, also communicating pores or recess can be formed in region 23 around.In example shown in Fig. 1, each effective area 22 has roughly quadrangle form in a top view, precisely has substantially rectangular profile in a top view further.
In the example in the figures, deposition mask 20 the effective area 22 of more than 2 along and the parallel direction of the length direction of deposition mask 20 form a line across predetermined interval.In illustrated example, an effective area 22 corresponds to an organic EL display.That is, the deposition mask device 10 (deposition mask 20) according to Fig. 1, can repeat evaporation (multiaspect is paid and steamed) piecemeal.
As shown in Figure 3, in the example in the figures, more than 2 communicating poress 25 formed in each effective area 22 arrange at predetermined intervals respectively along mutually orthogonal two directions in this effective area 22.About an example of the communicating pores 25 that this metal sheet 21 is formed, main reference Fig. 3 ~ Fig. 6 is described in detail further.
As shown in Fig. 4 ~ Fig. 6, more than 2 communicating poress 25 extend and through deposition mask 20 between the 1st 20a and the 2nd 20b, described 1st 20a is the side along normal direction of deposition mask 20, and described 2nd 20b is the opposite side along normal direction of deposition mask 20.In illustrated example, as below describe in detail, the 1st recess 30 is formed by being etched in metal sheet 21 from the 1st 21a side of the metal sheet 21 of the side of the normal direction as deposition mask, form the 2nd recess 35 from the 2nd 21b side of the opposite side of the normal direction as metal sheet 21 at metal sheet 21, utilize the 1st recess 30 and the 2nd recess 35 to form communicating pores 25.
As shown in Fig. 3 ~ Fig. 6, from the 1st 20a side direction the 2nd 20b side of deposition mask 20, in the position along normal direction of deposition mask 20, the sectional area of each 1st recess 30 in the cross section in the plate face along deposition mask 20 diminishes gradually.As shown in Figure 3, the wall 31 of the 1st recess 30 extends in the direction that the normal direction with deposition mask 20 is intersected in its whole region, and the side towards the normal direction along deposition mask 20 is exposed.Similarly, in the position along normal direction of deposition mask 20, the sectional area of each 2nd recess 35 in the cross section in the plate face along deposition mask 20 can diminish gradually from the 2nd of a deposition mask 20 20b side direction the 1st 20a side.The wall 36 of the 2nd recess 35 extends in the direction that the normal direction with deposition mask 20 is intersected in its whole region, and the opposite side towards the normal direction along deposition mask 20 exposes sectional area sectional area.
It should be noted that, as shown in Fig. 4 ~ Fig. 6, the wall 31 of the 1st recess 30 is connected by the connection section 41 of all shapes with the wall 36 of the 2nd recess 35.Connection section 41 is marked by the crest line of the protuberance that the wall 31 of the 1st recess 30 tilted relative to the normal direction of deposition mask merges into the wall 36 of the 2nd recess 35 tilted relative to the normal direction of deposition mask.Further, connection section 41 marks the minimum breakthrough part 42 of the area of communicating pores 25 in the vertical view of deposition mask 20.
As shown in Fig. 4 ~ Fig. 6, on the 2nd 20b in the face of the opposite side along normal direction of deposition mask, i.e. deposition mask 20, two adjacent communicating poress 25 are spaced from each other along the plate face of deposition mask.That is, as manufacture method described later, when this metal sheet 21 being etched from the 2nd 21b side of the 2nd metal sheet that 20b is corresponding 21 with deposition mask 20 and make the 2nd recess 35, remaining the 2nd 21b having metal sheet 21 between adjacent two the 2nd recesses 35.
On the other hand, as shown in Fig. 4 ~ Fig. 6, in the 1st 20a side of the side along normal direction of deposition mask, i.e. deposition mask 20, two adjacent the 1st recesses 30 connect.Namely, as manufacture method described later, when this metal sheet 21 being etched from the 1st 21a side of the 1st metal sheet that 20a is corresponding 21 with deposition mask 20 and form the 1st recess 30, remainingly can not there is the 1st 21a of metal sheet 21 between adjacent two the 1st recesses 30.That is, the 1st 21a of metal sheet 21 is etched in the whole region of effective area 22.Utilize the 1st 20a of the deposition mask 20 formed by the 1st such recess 30, when according to deposition mask 20 as shown in Figure 2 the 1st 20a in the face of the mode of deposition material 98 use this deposition mask 20, effectively can improve the utilising efficiency of deposition material 98.
As shown in Figure 2, when deposition mask device 10 is contained in evaporation coating device 90, as shown in two dot chain line in Fig. 4, the 1st 20a of deposition mask 20 is positioned at crucible 94 side maintaining deposition material 98, and the 2nd 20b of deposition mask 20 is in the face of glass substrate 92.Therefore, the 1st recess 30 that diminished gradually by sectional area of deposition material 98 and being attached on glass substrate 92.As shown by the arrows in Figure 4, deposition material 98 not only moves along the normal direction of glass substrate 92 from crucible 94 to glass substrate 92, and sometimes moves in the direction relative to the larger inclination of the normal direction of glass substrate 92.Now, when the thickness of deposition mask 20 is large, the deposition material 98 of inclination movement much can arrive the wall 31 of the 1st recess 30 and adhere to before arriving glass substrate 92 by communicating pores 25.In addition, on glass substrate 92 with in the region faced by communicating pores 25, can produce deposition material 98 be easy to arrive region and be difficult to arrive part.Therefore, save expensive deposition material to improve the utilising efficiency (film forming efficiency: be attached to the ratio on glass substrate 92) of deposition material and the film forming that make use of expensive deposition material stablized in desired region and implements equably, importantly according to making the deposition material 98 of inclination movement arrive the mode of glass substrate 92 to form deposition mask 20 as far as possible.Namely, in the cross section of Fig. 4 ~ Fig. 6 orthogonal with sheet face of deposition mask 20, minimum angles θ 1 (with reference to Fig. 4) the abundant change that straight line L1 is formed relative to the normal direction of deposition mask 20 is greatly favourable, and described straight line L1 is by other optional positions as the connection section 41 of part and the wall 31 of the 1st recess 30 with minimum sectional area of communicating pores 25.
As one of method for adding wide-angle θ 1, can consider, the thickness of deposition mask 20 is reduced, thus, the height of the wall 36 of the wall 31 of the 1st recess 30, the 2nd recess 35 be diminished.That is, can saying, as the metal sheet 21 for forming deposition mask 20, in the scope of intensity can guaranteeing deposition mask 20, preferably using the metal sheet 21 that thickness is thin as far as possible.
As the additive method for adding wide-angle θ 1, it is also conceivable to the profile optimizing making the 1st recess 30.Such as according to the present embodiment, converged by the wall 31 of adjacent two the 1st recesses 30, compare having with the recess of the wall (profile) shown in dotted line of not converging with other recesses, significantly can strengthen this angle θ 1.Its reason is below described.
As below describe in detail, the 1st recess 30 is formed by etching the 1st 21a of metal sheet 21.The wall of the recess formed by etching is generally in curved, and this curved projection is towards erosion direction.Therefore, the wall 31 of the recess formed by etching starts in the region of side precipitous in etching, starting the darkest side of region, the i.e. recess of contrary side, side, to tilt significantly relative to the normal direction of metal sheet 21 with etching.On the other hand, in illustrated deposition mask 20, the wall 31 of two adjacent the 1st recesses 30 starts side in etching and converges, therefore, the shape that the outline of the part 43 that the front edge 32 of the wall 31 of two the 1st recesses 30 converges is not precipitous, but the shape of chamfering.Therefore, the wall 31 of most 1st recess 30 of formation communicating pores 25 can be made effectively to tilt relative to the normal direction of deposition mask.That is, wide-angle θ 1 can be added.Thus, can while the utilising efficiency effectively improving deposition material 98, the evaporation under the pattern accurately desired by steady implementation.
But, in order to obtain the little metal sheet of thickness 21, need to strengthen rolling rate when manufacturing metal sheet 21 by mother metal.But rolling rate is larger, the uneven degree based on the distortion of rolling is also larger.Such as, the unit elongation of metal sheet 21 is different because of the position of width (direction orthogonal with the delivery direction of mother metal), and its result, sometimes above-mentioned undulations appears on metal sheet 21., consider following situation herein: each deposition mask 20 shown in Fig. 1 is made up of the metal sheet of elongate respectively, the metal sheet of this elongate carries out cutting off obtaining along its length direction by the metal sheet obtained by rolling mother metal.In this case, can think, because the length of each deposition mask 20 is different, therefore, the spacing of each communicating pores 25 of the effective area 22 of each deposition mask 20 is also different in each deposition mask 20, its result, and the positional precision of evaporation reduces, the utilising efficiency of deposition material reduces.Therefore, in order to suppress the deviation of the spacing of each communicating pores 25 of the effective area 22 of each deposition mask 20 thus obtain the little organic EL display of the deviation of the size of pixel and position, as described later, the metal sheet 21 importantly filtering out the difference of unit elongation little uses.
Below the present embodiment and effect thereof with such formation are described.At this, first the manufacture method of the metal sheet for the manufacture of deposition mask is described.Then the method using the metal sheet obtained to manufacture deposition mask is described.Thereafter, the method using the deposition mask obtained to carry out the evaporation of deposition material on substrate is described.
(manufacture method of metal sheet)
First, be described with reference to Fig. 7 (a), (b), Fig. 8, Fig. 9 (a), (b), (c), (d) and the manufacture method of Figure 10 to metal sheet.Fig. 7 (a) obtains the figure of the operation of the metal sheet with desired thickness by rolling mother metal for illustrating, Fig. 7 (b) is for illustrating the figure to the operation that the metal sheet obtained by rolling is annealed.
[rolling process]
First, as shown in Fig. 7 (a), prepare the mother metal 55 containing Invar alloy material, always transmit this mother metal 55 to the reduction unit 56 comprising a pair Rolling roller 56a, 56b along the sender shown in arrow D1.Arrive mother metal 55 between a pair Rolling roller 56a, 56b by a pair Rolling roller 56a, 56b rolling, its result, the thickness of mother metal 55 reduces, and is extended along delivery direction simultaneously.Thus, thickness t can be obtained
0long metal sheet 64.As shown in Fig. 7 (a), form coiling body 62 by being batched on core 61 by long metal sheet 64.To thickness t
0occurrence be not particularly limited, be such as more than 0.020mm and in the scope of below 0.100mm.
[annealing operation]
Thereafter, accumulate the unrelieved stress in long metal sheet 64 in order to eliminate because of rolling, as shown in Fig. 7 (b), use annealing device 57 pairs of long metal sheets 64 to anneal.As shown in Fig. 7 (b), long metal sheet 64 can stretch while implement in delivery direction (length direction) by annealing operation.Its result, can obtain unrelieved stress be removed to a certain degree, thickness t
0long metal sheet 64.It should be noted that, thickness t
0be generally equal to the maximum ga(u)ge Tb in the peripheral region 23 of deposition mask 20.
It should be noted that, the form of rolling process and annealing operation is not particularly limited to the form shown in Fig. 7 (a), (b).Such as, rolling process can utilize 2 to implement above Rolling roller 56a, 56b.In addition, also can by rolling process and annealing operation be carried out more than 2 times to make thickness t repeatedly
0long metal sheet 64.In addition, in Fig. 7 (b), show annealing operation and long metal sheet 64 is being stretched while carry out the example implemented in length direction, but be not limited thereto, also can be taken up at long metal sheet 64 and implement annealing operation under the state of core 61.It should be noted that, long metal sheet 64 be taken up under the state of core 61, implement annealing operation when, sometimes can produce the problem of batching the corresponding warpage in footpath with coiling body 62 on long metal sheet 64.Therefore, according to the material batching footpath, form mother metal 55 of coiling body 62, long metal sheet 64 is stretched while it is favourable for implementing annealing operation in length direction.
[inspection operation]
Thereafter, the inspection operation that the degree of the extension difference of obtained long metal sheet 64 is checked is implemented.Fig. 8 is for illustrating the stereographic map of the metal sheet obtained by the operation shown in Fig. 7 (a), (b).As shown in Figure 8, long metal sheet 64 at least local has undulations, and it is different because of the position of its width D2 that this undulations results from the length of length direction D1 of this long metal sheet 64.At this, length direction D1 is the direction parallel with delivery direction during rolling mother metal 55, and width D2 is the direction orthogonal with length direction D1.In Fig. 8, the end of the width D2 of long metal sheet 64 represents with symbol 64e.
The undulations shown in long metal sheet 64 is described.Fig. 9 (a), (b), (c), (d) are respectively the sectional view along the a-a line of Fig. 8, b-b line, c-c line and d-d line.The a-a line of Fig. 8 is the line extended at length direction along the central part 64c of the width of long metal sheet 64, and therefore, Fig. 9 (a) shows the cross section of the long metal sheet 64 of the central part 64c of the width of long metal sheet 64.In addition, the d-d line of Fig. 8 is the line extended at length direction along the end 64e of the width of long metal sheet 64, and therefore, Fig. 9 (d) shows the cross section of the long metal sheet 64 of the end 64e of the width of long metal sheet 64.Based on occurring middle ripple in the long metal sheet 64 of present embodiment, therefore, the degree of the undulations occurred in long metal sheet 64 at the central part 64c of width than leaving the position of central part 64c a little, the degree of undulations that the position of the b-b line of such as Fig. 8 occurs in long metal sheet 64 is large.In addition, also wavy edge is there is based in the long metal sheet 64 of present embodiment, therefore, larger than the degree of the undulations occurred in long metal sheet 64 in the position slightly off the position of beginning portion 64e, the c-c line of such as Fig. 8 in the degree of the undulations occurred at long metal sheet 64 at the end 64e of width.
Check in operation, first, in each position of width D2, calculate the length of the long metal sheet 64 in the pre-determined range of length direction D1.At this, " length " refers to, the undulations occurred in long metal sheet 64, the length of the profile on the surface (the 1st 64a or the 2nd 64b) of the long metal sheet 64 of length direction D1.Specifically, as shown in Fig. 9 (a), (b), (c), (d), also to consider that the undulations shown in long metal sheet 64 measures by the length la of the long metal sheet 64 of the position shown in the a-a line of Fig. 8, b-b line, c-c line and d-d line, lb, lc and ld.The method of the length for calculating long metal sheet 64 is not particularly limited.Such as, when calculating the length la of long metal sheet 64 of central part 64c, first, the range unit allowing to the distance measured between object scans along the length direction D1 of long metal sheet 64 at the central part 64c of width D2 on long metal sheet 64, and alongst D1 measures the height location on the surface of long metal sheet 64 at predetermined intervals thus.This is spaced apart such as more than 1mm and in the scope of below 5mm.Then, depict curve in smoothing junction between each measuring point, calculate thereafter this length of a curve.Thus, the length la of the long metal sheet 64 of central part 64c can be obtained.In addition, repeatedly carry out such mensuration while changing the position of width D2, thus the length of the long metal sheet 64 of the position of width D2 can be obtained.
Then, the minimum value of the length of the long metal sheet 64 each position at width D2 obtained is set as datum length.In present embodiment, be set to datum length at the length lb of the long metal sheet 64 by the position shown in the b-b line of Fig. 8.Thereafter, the length of the long metal sheet 64 of the position of width D2 and the difference of datum length lb be can be regarded as extension rate relative to the ratio of datum length lb.The extension rate of the long metal sheet 64 of such as central part 64c is derived by (la-lb)/lb.Figure 10 is the figure of the curve 80 that the extension rate calculated is shown.In Figure 10, transverse axis illustrates the position of the width D2 of long metal sheet 64, and the longitudinal axis is with 10
-5the order of magnitude extension rate is shown.The epimere of the transverse axis of Figure 10 describes with the order of magnitude of mm with the position of the central part 64c of width D2 for width D2 when initial point.In addition, the hypomere of the transverse axis of Figure 10 illustrates the ratio of the overall with relative to long metal sheet 64 of the position of width D2 with %.It should be noted that, Tu10Zhong, use the situation with the long metal sheet of the overall with of 500mm to be described to as the long metal sheet 64 for the manufacture of deposition mask 20.Therefore, the such as central part 64c of distance width D2 is the ratio of the position of+100mm is+20%.In addition, the extension rate of the long metal sheet 64 of the position of the a-a line of Tu10Zhong, Fig. 8, b-b line, c-c line and d-d line represents with symbol A, B, C and D respectively.
Thereafter, based on the value of obtained extension rate, implement the screening of long metal sheet 64.At this, in the manufacturing process of deposition mask 20 described later, only use the long metal sheet 64 meeting following full terms (1) ~ (3), implement the screening of long metal sheet 64 thus.
(1) the extension rate of the middle body R1 of long metal sheet 64 is 10 × 10
-5below;
(2) the extension rate of the end 64e of the width D2 of long metal sheet 64 is 20 × 10
-5below; With
(3) the extension rate of end 64e is greater than the maximum value of the extension rate of middle body R1;
Below above-mentioned condition (1) ~ (3) are studied respectively.It should be noted that, Tu10Zhong, the middle body of long metal sheet 64 represents with symbol R1, and the peripheral part be positioned at outside middle body R1 represents with symbol R2.In present embodiment, middle body R1 is defined as the part of 40% of the overall with accounting for long metal sheet 64, and it comprises the central part 64c of the width D2 of long metal sheet 64.
In the long metal sheet 64 creating middle ripple and wavy edge, generally as shown in Figure 10, near the central part 64c of the width of long metal sheet 64, there is the maximum value (point A) extending rate.In addition, there is the mnm. (some B) extending rate in the position that the central part of the width from long metal sheet 64 leaves a little to periphery side.Further, extending rate increases (some C) gradually from a B to the periphery of width, and in the end of width, the value extending rate reaches maximum (some D).Therefore, in Fig. 10 as indicated by chain dotted lines, depict, at middle body R1, extension rate=10 × 10 are shown
-5, at peripheral part R2, extension rate=20 × 10 are shown
-5reference line 81 when, extend the below that the curve 80 of rate is positioned at reference line 81, this expression meets above-mentioned condition (1) and (2).In the example shown in Figure 10, meet above-mentioned condition (1) and (2).
About condition (3), judge whether the extension rate of the end 64e of width D2, i.e. the extension rate at some D place are greater than the maximum value (in the example shown in Figure 10, the extension rate for an A place) of the extension rate of middle body R1.In example shown in Figure 10, meet above-mentioned condition (3).
By implementing such screening, even if when causing occurring undulations in long metal sheet 64 because the rolling rate of long metal sheet 64 is large, also can judge whether the degree of this undulations can become problem in the manufacturing process of the manufacturing process of deposition mask 20 afterwards, organic EL display in advance.Thus, the degree of the difference of the length of the elongate deposition mask 20 of more than 2 that simultaneously make can be made to be in tolerable limit.Therefore, it is possible to make the deviation of the spacing of each communicating pores 25 of the effective area 22 of the deposition mask 20 of manufacture be reduced, thus, dimensional precision and the positional precision of the pixel of organic EL display can be improved.In addition, the yield rate in the manufacturing process of deposition mask 20 can be improved.
It should be noted that, the method for obtaining long metal sheet 64 that have the curve 80 of the extension rate shown in Figure 10, overall with 500mm is not particularly limited.
Such as, by rolling mother metal 55, make the long metal sheet had more than the overall with of 500mm, the overall with of such as 700mm, thereafter, pre-determined range is cut away at the two ends of the width of this long metal sheet, the long metal sheet 64 of wide 500mm can be made thus.It should be noted that to have in the long metal sheet of the overall with of 700mm, as shown in two dot chain line in Figure 10, sometimes exist and extend rate more than 20 × 10
-5part.Even if in this case, by pre-determined range is cut away at two ends, the long metal sheet 64 of above-mentioned condition (1) ~ (3) can be met.
Or, when pre-determined range not being cut away at two ends, also can make by rolling the long metal sheet 64 meeting above-mentioned condition (1) ~ (3).
(manufacture method of deposition mask)
Below, main with reference to Figure 11 ~ Figure 20, be described to the method manufacturing deposition mask 20 utilizing the long metal sheet 64 as above filtered out.In the manufacture method of the deposition mask 20 below illustrated, as shown in figure 11, supply long metal sheet 64, this long metal sheet 64 forms communicating pores 25, further severing long metal sheet 64, thus obtains the deposition mask 20 that is made up of the metal sheet 21 of sheet.
More particularly, the manufacture method of deposition mask 20 comprises: supply extends into the operation of banded long metal sheet 64; To the etching of photolithographic techniques be utilized to be implemented on long metal sheet 64, long metal sheet 64 is formed from the 1st 64a side the operation of the 1st recess 30; With, the etching that make use of photolithographic techniques is implemented on long metal sheet 64, long metal sheet 64 is formed from the 2nd 64b side the operation of the 2nd recess 35.Further, the 1st recess 30 and the 2nd recess 35 that are formed at long metal sheet 64 communicate mutually, thus produce communicating pores 25 on long metal sheet 64.In the example shown in Figure 11, the formation process of the 2nd recess 35 was implemented before the formation process of the 1st recess 30, and was provided with the operation sealed the 2nd made recess 35 further between the formation process and the formation process of the 1st recess 30 of the 2nd recess 35.Below describe each operation in detail.
Figure 11 shows the manufacturing installation 60 for making deposition mask 20.As shown in figure 11, first, prepare long metal sheet 64 to batch the coiling body 62 on core 61.Further, by rotating this core 61, coiling body 62 is unreeled, thus supply extends into banded long metal sheet 64 as shown in Figure 11.It should be noted that, long metal sheet 64 forms the metal sheet 21 of sheet and then forms deposition mask 20 after being formed with communicating pores 25.
The long metal sheet 64 be supplied to is sent to etching system (etching unit) 70 by transfer roller 72.Utilize etching unit 70, implement each process shown in Figure 12 ~ Figure 20.
First, as shown in figure 12, on the 1st 64a of long metal sheet 64, the photosensitivity anticorrosive additive material of coating minus on (on the face of the downside in the paper of Figure 12) and the 2nd 64b, long metal sheet 64 is formed resist film 65c, 65d.Then, prepare exposed mask 85a, 85b, this exposed mask 85a, 85b do not make light transmission to the region for removing in resist film 65c, 65d, exposed mask 85a, 85b are configured at as shown in figure 13 respectively on resist film 65c, 65d.As exposed mask 85a, 85b, use such as glass dry plate, this glass dry plate does not make light transmission to the region for removing in resist film 65c, 65d.Thereafter, by vacuum closely sealed make exposed mask 85a, 85b and resist film 65c, 65d fully closely sealed.
Need illustrate time, as photosensitivity anticorrosive additive material, the photosensitivity anticorrosive additive material of eurymeric can be used.In this case, as exposed mask, make light transmission to the exposed mask in the region for removing in resist film.
At this, according to the present embodiment, as mentioned above, the extension rate of end 64e is used to be greater than the long metal sheet 64 of the maximum value of the extension rate of middle body R1.That is, the degree of the undulations of the end 64e of the width D2 of long metal sheet 64 is greater than the degree of the undulations of the central part 64c of the width D2 of long metal sheet 64.It is general in vacuum is closely sealed, by making resist film 65c, 65d of being arranged on long metal sheet 64 and the air that exists between exposed mask 85a, 85b externally discharge from the end of the laminate of long metal sheet 64 and resist film 65c, 65d, resist film 65c, 65d and closely sealed between exposed mask 85a, 85b can be realized.Herein, suppose that the degree of the undulations of the end 64e of long metal sheet 64 is less than the degree of the undulations of the central part 64c of long metal sheet 64, then can think, compared with the region near the central part of laminate, region near the end of laminate takes the lead in closely sealed with exposed mask 85a, 85b, its result, causes the overflow channel of the air existed near the central part of laminate to disappear.Relative to this, according to the present embodiment, the degree of the undulations of the end 64e of long metal sheet 64 is greater than the degree of the undulations of the central part 64c of long metal sheet 64, therefore, reliably can guarantee the overflow channel of the air existed near the central part of laminate, therefore, it is possible to make exposed mask 85a, 85b and resist film 65c, 65d fully closely sealed in whole region.
Thereafter, across exposed mask 85a, 85b, resist film 65c, 65d are exposed, further resist film 65c, 65d are developed.So, as shown in figure 14, Resist patterns (also referred to as resist) 65a can be formed on the 64a of the 1st of long metal sheet 64, on the 2nd 64b of long metal sheet 64, form Resist patterns (also referred to as resist) 65b.
Then, as shown in figure 15, using the Resist patterns 65b of formation on long metal sheet 64 as mask, use etching solution (such as iron(ic) chloride (III) solution), carve from the 2nd 64b lateral erosion of long metal sheet 64.Such as, etching solution sprays to the 2nd 64b of long metal sheet 64 across Resist patterns 65b from nozzle, the side of described nozzle arrangement faced by the 2nd 64b of the long metal sheet 64 with transmission.Its result, as shown in figure 15, in the region do not covered by Resist patterns 65b in long metal sheet 64, the erosion caused by etching solution advances.So, the 2nd a large amount of recesses 35 is formed from the 2nd 64b side at long metal sheet 64.
Thereafter, as shown in figure 16, utilize the indefatigable resin 69 of etching solution tool, the 2nd formed recess 35 is coated to.That is, utilize the indefatigable resin 69 of etching solution tool, the 2nd recess 35 is sealed.In example as shown in figure 16, the film of resin 69 is formed according to the mode not only covering the 2nd recess 35 but also covering the 2nd 64b (Resist patterns 65b) formed.
Then, as shown in figure 17, the 2nd etching is carried out to long metal sheet 64.In the 2nd etching, long metal sheet 64 is only etched from the 1st 64a side, and from the 1st 64a side, the formation of the 1st recess 30 advances.The 2nd the 64b side due to long metal sheet 64 is coated with the indefatigable resin 69 of etching solution tool, and therefore, the shape of the 2nd recess 35 of the shape desired by being formed by the 1st etching can not be impaired.
The part that with etching solution contact of erosion in long metal sheet 64 based on etching is carried out.Therefore, corrode and not only advance in the normal direction (thickness direction) of long metal sheet 64, also advance in the direction in the plate face along long metal sheet 64.Its result, as shown in figure 18, the normal direction being etched in long metal sheet 64 advances and the 1st recess 30 is connected with the 2nd recess 35, moreover, two the 1st recesses 30 that the position faced by two adjacent hole 66a of Resist patterns 65a is formed respectively converge in the inner side of the bridge portion 67a between two hole 66a.
As shown in figure 19, advance further from the etching of the 1st 64a side of long metal sheet 64.As shown in figure 19, the part 43 of converging that two adjacent the 1st recesses 30 merge departs from Resist patterns 65a, this being under Resist patterns 65a converges in part 43, and the erosion caused by etching also advances in the normal direction (thickness direction) of metal sheet 64.Thus, what the side towards the normal direction along deposition mask was sharp-pointed converge part 43 is etched from the side of the normal direction along deposition mask, thus chamfering as shown in Figure 19.Thus, the tiltangleθ 1 that the wall 31 of the 1st recess 30 can be made to be formed relative to the normal direction of deposition mask increases.
So, based on erosion the advancing for the formation of in the whole region of effective area 22 at long metal sheet 64 of the 1st 64a of the long metal sheet 64 of etching.Thus, the maximum ga(u)ge Tb of the long metal sheet before etching 64 is compared for the formation of the maximum ga(u)ge Ta along normal direction of the long metal sheet 64 in the region of effective area 22 thinning.
As mentioned above, only advance from the etching of the 1st 64a side of long metal sheet 64 amount preset, the 2nd etching of long metal sheet 64 is terminated.Now, the 1st recess 30 extends to the position of arrival the 2nd recess 35 along the thickness direction of long metal sheet 64, thus utilizes the 1st recess 30 that mutually communicates and the 2nd recess 35 to form communicating pores 25 on long metal sheet 64.
Thereafter, as shown in figure 20, resin 69 is removed from long metal sheet 64.Resin molding 69 can be removed by using such as alkali system stripping liquid.It should be noted that, when using alkali system stripping liquid, as shown in figure 20, also remove Resist patterns 65a, 65b with resin 69 simultaneously.
The transfer roller 72,72 carrying out rotating with the state clamping this long metal sheet 64 is utilized to transmit the long metal sheet 64 being so formed with a large amount of communicating pores 25 to shut-off device (cutting unit) 73.It should be noted that, acting on the tension force (drawing force) of long metal sheet 64 by utilizing the rotation of this transfer roller 72,72, above-mentioned supply core 61 being rotated, thus supplies long metal sheet 64 by coiling body 62.
Thereafter, utilize shut-off device (cutting unit) 73 that the long metal sheet 64 being formed with a large amount of recess 61 is cut into predetermined length and width, thus obtain the sheet metal plate 21 being formed with a large amount of communicating pores 25.
As above operate, the deposition mask 20 be made up of the metal sheet 21 being formed with a large amount of communicating pores 25 can be obtained.At this, according to the present embodiment, the 1st 21a of metal sheet 21 is etched in the whole region of effective area 22.Therefore, the thickness of the effective area 22 of deposition mask 20 is reduced, and the outline of the part 43 that the first end margin 32 of the wall 31 of two the 1st recesses 30 formed the 1st 21a side can be made to converge is the shape of chamfering.Therefore, above-mentioned angle θ 1 can be increased, thus, the utilising efficiency of deposition material and the positional precision of evaporation can be improved.
But, the long metal sheet 64 with undulations is alongst cut into predetermined width mean, the length of each deposition mask 20 be made up of the elongate metal sheet 21 obtained after cutting off is according to the position, namely different in the position of the width of long metal sheet 64 cutting out metal sheet 21.At this, according to the present embodiment, as mentioned above, the long metal sheet 64 filtered out in advance based on the extension rate at width D2 is used.Therefore, even if when long metal sheet 64 has undulations, also can make the degree of the difference of the length of the deposition mask 20 of more than 2 that simultaneously make in tolerable limit.Therefore, according to the present embodiment, by reducing the thickness of the effective area 22 of deposition mask 20 and increasing the tilt angle theta 1 of wall 31 of the 1st recess 30 of deposition mask 20, the positional precision that simultaneously can realize improving the utilising efficiency of deposition material and evaporation, the deviation reducing the spacing of each communicating pores 25 of the effective area 22 of deposition mask 20 and improve the adaptation of the exposure process in deposition mask manufacturing process, improve the yield rate of the manufacturing process of deposition mask 20.Therefore, Absorbable organic halogens provides the deposition mask 20 with excellent specific property.
(evaporation coating method)
Then, to using the deposition mask 20 obtained the method for deposition material evaporation on substrate 92 to be described.First, as shown in Figure 2, make deposition mask 20 and substrate 92 closely sealed.Now, deposition mask 20 tensioning is located on framework 15, thus makes the face of deposition mask 20 be parallel to the face of substrate 92.At this, according to the present embodiment, the extension rate based on width D2 is employed and the long metal sheet 64 filtered out in advance.Therefore, compared with not implementing the situation of such screening, the deviation of the length of each deposition mask 20 is reduced equably, and then the deviation of the spacing of each communicating pores 25 of effective area 22 is reduced equably.Therefore, it is possible to high positional precision by deposition material evaporation on substrate 92.Therefore, when forming the pixel of organic EL display by evaporation, dimensional precision and the positional precision of the pixel of organic EL display can be improved.Thus, the organic EL display of fine can be produced.
It should be noted that, in above-mentioned present embodiment, in the example illustrated, long metal sheet 64 is not being calculated the length of long metal sheet 64 of position of width D2 of long metal sheet 64 when length direction cuts off.But, be not limited to this, also can by long metal sheet 64 after length direction cut into suitable length, the length of the metal sheet after each position of width D2 calculates cut-out, implements the screening of metal sheet based on this result.
In addition, in present embodiment, in the example illustrated, the 1st 21a of metal sheet 21 is etched in the whole region of effective area 22.But, be not limited to this, also can the 1st of metal sheet 21 the 21a be etched the part only in effective area 22.
Embodiment
, further illustrate the present invention by embodiment below, the present invention only otherwise exceed the record that its main points are just not limited to following embodiment.
(the 1st sample)
First, above-mentioned rolling process and annealing operation are implemented to the mother metal containing Invar alloy material, thus the coiling body (the 1st coiling body) that manufacture long metal sheet batches.Thereafter, use shearing machine to be cut the leading section of the 1st coiling body, thus as shown in figure 21, obtain by width be 500mm, projecting length is the 1st sample 100 that the metal sheet of 700mm is formed.It should be noted that, " projecting length " refer to from directly over observe metal sheet, namely ignore the undulations of metal sheet when the length (size of rolling direction) of metal sheet.In addition, the width of the 1st sample 100 refers to the distance between the pair of end portions 101,102 of the 1st sample 100 of width.The part that the pair of end portions 101,102 of the 1st sample 100 is passed through cut-out operation and formed, in this cut-out operation, pre-determined range is cut away at the two ends of the width of the metal sheet obtained by rolling process and annealing operation, and this pair of end portions 101,102 extends roughly as the crow flies.
Then, as shown in figure 21, the 1st sample 100 is placed horizontally on platform 110.Now, according to the mode not producing local dent in the 1st sample 100, the 1st sample 100 is placed on platform 110 lightly.Then, in an end 101 of the 1st sample 100, measure the physical length of the 1st sample 100 in the region of projecting length 500mm, namely consider the length of undulations.It should be noted that, the region of projecting length 500mm refers to that from the 1st sample 100 of projecting length 700mm, to remove the two ends 103,104 be in apart from the length direction of sample 1 is the region within 100mm and the region that obtains.By being in, to remove from determination object apart from two ends 103,104 for the region within 100mm be measurement result in order to prevent the crooked impact based on the 1st sample 100 caused by the cut-out of shearing machine from can involve length.In Figure 21, the region of projecting length 500mm illustrates with long and short dash line.
In mensuration, in Figure 21 as shown in arrow s, the length direction utilizing the range unit of laser along the 1st sample 100 is carried out relative movement to the 1st sample 100, with the height location on the surface of an end 101 of the 1st sample 100 of 1mm measuring space length direction.In addition, depict curve in smoothing junction between each measuring point, thereafter, calculate this length of a curve.As the range unit of the height location on the surface for measuring the 1st sample 100, employ the OPTELICS H1200 that the Lasertec Co., Ltd. as laser microscope manufactures.It should be noted that, the key element be moved during mensuration can be any one of range unit or the 1st sample 100, but herein, uses the platform of automatic station as mounting the 1st sample 100 of 500mm × 500mm, thus make sample 100 move and measure.Laser interferometer is make use of in the control of the automatic station in XY direction.So, the length of the 1st sample 100 of an end 101 is determined.
Then, from an end 101 to the position of another end 102 side displacement 20mm, the length of the 1st sample 100 is similarly measured.By while said determination is on one side implemented repeatedly in the position changing the width of the 1st sample 100 with predetermined spacing p, thus the length of the 1st sample of each position of width is measured.At this, if spacing p is 20mm.The measurement result obtained comprises the measurement result of the length of an end 101, the measurement result of the length of another end 102 and the measurement result in the measurement result of the length of middle body and the length between middle body and end 101,102.It should be noted that, when with an end 101 for benchmark, middle body is that distance end 101 is more than 150mm and part in the scope of below 350mm.It should be noted that, the following setting that locates of width: the mensuration at the central part of the 1st sample 100, i.e. a distance end 101 and another end being equal position enforcement length.
Then, the minimum value of the length of the 1st sample 100 each position at width obtained is set as datum length.Thereafter, the length of the 1st sample 100 of each position of width and the difference of datum length be can be regarded as extension rate relative to the ratio of datum length.As a result, the extension rate of an end 101 is 79.9 × 10
-5, another end 102 extension rate be 71.2 × 10
-5, middle body the maximum value of extension rate of each position be 15.8 × 10
-5.
The calculation result of the extension rate of the 1st sample 100 contrasted with above-mentioned condition (1) ~ (3), result, in the 1st sample 100, satisfy condition (3), but do not satisfy condition (1) and (2).Therefore, judge that the 1st sample 100 can not use as the material for the manufacture of deposition mask.
In addition, use the metal sheet obtaining the 1st coiling body of the 1st above-mentioned sample 100, manufacture multiple deposition mask being alongst provided with 5 effective areas.A large amount of communicating poress is formed with the arrangement of rule in each effective area of each deposition mask.Then, in order to evaluate the positional precision of obtained deposition mask, measuring total spacing of each deposition mask, and calculating the extent of deviation of total spacing.
At this, total spacing refer to 2 predetermined dot spacings in deposition mask from.As long as the positional precision of deposition mask can be evaluated, the setting position of 2 is not particularly limited, at this, distance between the predetermined mark formed near the effective area of the end side at deposition mask and the predetermined mark formed near the effective area of another side at deposition mask is measured, as total spacing.Total spacing in this situation is about 600mm in design.
As the index of the extent of deviation of total spacing, the standard deviation (σ) of the measured value of the total spacing to each deposition mask is utilized to be multiplied by 3 and the value obtained, so-called 3 σ.The deviation (3 σ) of the measured value of total spacing of the deposition mask obtained by the 1st coiling body is 35.2 μm.It should be noted that, the mode that n number when calculating standard deviation (σ) has sufficient reliability according to the value of standard deviation (σ) on the basis compared between described later and each sample sets.Specifically, if n number is 400.
(the 2nd sample)
By cutting the leading section of 2nd coiling body different from above-mentioned 1st coiling body, obtain the 2nd sample be made up of the metal sheet of wide 500mm, projecting length 700mm.Then, measure the length of the 2nd sample in each position of width in the same manner as the situation of above-mentioned 1st sample, and calculate extension rate.As a result, the extension rate of an end is 24.7 × 10
-5, another end extension rate be 29.8 × 10
-5, middle body the maximum value of extension rate of each position be 1.0 × 10
-5.
The calculation result of the extension rate of the 2nd sample contrasted with above-mentioned condition (1) ~ (3), result, in the 2nd sample, satisfy condition (1) and (3), but do not satisfy condition (2).Therefore judge that the 2nd sample is as not using as the material for the manufacture of deposition mask.
In addition, in the same manner as the situation of above-mentioned 1st sample, use the metal sheet of the 2nd coiling body, manufacture multiple deposition mask being provided with a large amount of communicating pores.Then, in the same manner as the situation of above-mentioned 1st sample, measure total spacing of each deposition mask obtained, and calculate the deviation (3 σ) of the measured value of total spacing.As a result, the value of 3 σ is 16.1 μm.
(the 3rd sample)
By cutting the leading section of 3rd coiling body different with the 2nd coiling body from above-mentioned 1st coiling body, obtain the 3rd sample be made up of the metal sheet of wide 500mm, projecting length 700mm.Then, in the same manner as the situation of above-mentioned 1st sample, measure the length of the 3rd sample in each position of width, and calculate extension rate.As a result, the extension rate of an end is 18.1 × 10
-5, another end extension rate be 19.0 × 10
-5, middle body the maximum value of extension rate of each position be 13.2 × 10
-5.
The calculation result of the extension rate of the 3rd sample contrasted with above-mentioned condition (1) ~ (3), result, in the 3rd sample, satisfy condition (2) and (3), but do not satisfy condition (1).Therefore judge that the 3rd sample can not use as the material for the manufacture of deposition mask.
In addition, in the same manner as the situation of above-mentioned 1st sample, use the metal sheet of the 3rd coiling body, manufacture multiple deposition mask being provided with a large amount of communicating pores.Then, in the same manner as the situation of above-mentioned 1st sample, measure total spacing of each deposition mask obtained, and calculate the deviation (3 σ) of the measured value of total spacing.As a result, the value of 3 σ is 14.2 μm.
(the 4th sample)
By cutting the leading section of 4th coiling body different from above-mentioned 1st coiling body ~ the 3rd coiling body, obtain the 4th sample be made up of the metal sheet of wide 500mm, projecting length 700mm.Then, in the same manner as the situation of above-mentioned 1st sample, measure the length of the 4th sample in each position of width, and calculate extension rate.As a result, the extension rate of an end is 26.8 × 10
-5, another end extension rate be 18.6 × 10
-5, middle body the maximum value of extension rate of each position be 3.9 × 10
-5.
The calculation result of the extension rate of the 4th sample contrasted with above-mentioned condition (1) ~ (3), result, satisfy condition (1) and (3) in the 4th sample, but do not satisfy condition (2).Therefore judge that the 4th sample can not use as the material for the manufacture of deposition mask.
In addition, in the same manner as the situation of above-mentioned 1st sample, use the metal sheet of the 4th coiling body, manufacture multiple deposition mask being provided with a large amount of communicating pores.Then, in the same manner as the situation of above-mentioned 1st sample, measure total spacing of each deposition mask obtained, and calculate the deviation (3 σ) of the measured value of total spacing.As a result, the value of 3 σ is 13.5 μm.
(the 5th sample)
By cutting the leading section of 5th coiling body different from above-mentioned 1st coiling body ~ the 4th coiling body, obtain the 5th sample be made up of the metal sheet of wide 500mm, projecting length 700mm.Then, in the same manner as the situation of above-mentioned 1st sample, measure the length of the 5th sample in each position of width, and calculate extension rate.As a result, the extension rate of an end is 18.2 × 10
-5, another end extension rate be 12.3 × 10
-5, middle body the maximum value of extension rate of each position be 9.1 × 10
-5.
The calculation result of the extension rate of the 5th sample contrasted with above-mentioned condition (1) ~ (3), result, satisfy condition (1) ~ (3) whole in the 5th sample.Therefore judge that the 5th sample can use as the material for the manufacture of deposition mask.
In addition, in the same manner as the situation of above-mentioned 1st sample, use the metal sheet of the 5th coiling body, manufacture multiple deposition mask being provided with a large amount of communicating pores.Then, in the same manner as the situation of above-mentioned 1st sample, measure total spacing of each deposition mask obtained, and calculate the deviation (3 σ) of the measured value of total spacing.As a result, the value of 3 σ is 5.6 μm.
(the 6th sample)
By cutting the leading section of 6th coiling body different from above-mentioned 1st coiling body ~ the 5th coiling body, obtain the 6th sample be made up of the metal sheet of wide 500mm, projecting length 700mm.Then, in the same manner as the situation of above-mentioned 1st sample, measure the length of the 6th sample in each position of width, and calculate extension rate.As a result, the extension rate of an end is 18.2 × 10
-5, another end extension rate be 8.8 × 10
-5, middle body the maximum value of extension rate of each position be 9.1 × 10
-5.
The calculation result of the extension rate of the 6th sample contrasted with above-mentioned condition (1) ~ (3), result, satisfy condition (1) and (2) in the 3rd sample, but do not satisfy condition (3).Therefore judge that the 6th sample can not use as the material for the manufacture of deposition mask.
In addition, in the same manner as the situation of above-mentioned 1st sample, use the metal sheet of the 6th coiling body, manufacture multiple deposition mask being provided with a large amount of communicating pores.Then, in the same manner as the situation of above-mentioned 1st sample, measure total spacing of each deposition mask obtained, and calculate the deviation (3 σ) of the measured value of total spacing.As a result, the value of 3 σ is 12.6 μm.
(the 7th sample)
By cutting the leading section of 7th coiling body different from above-mentioned 1st coiling body ~ the 6th coiling body, obtain the 7th sample be made up of the metal sheet of wide 500mm, projecting length 700mm.Then, in the same manner as the situation of above-mentioned 1st sample, measure the length of the 7th sample in each position of width, and calculate extension rate.As a result, the extension rate of an end is 16.5 × 10
-5, another end extension rate be 3.2 × 10
-5, middle body the maximum value of extension rate of each position be 0.8 × 10
-5.
The calculation result of the extension rate of the 7th sample contrasted with above-mentioned condition (1) ~ (3), result, satisfy condition (1) ~ (3) whole in the 7th sample.Therefore judge that the 7th sample can use as the material for the manufacture of deposition mask.
In addition, in the same manner as the situation of above-mentioned 1st sample, use the metal sheet of the 7th coiling body, manufacture multiple deposition mask being provided with a large amount of communicating pores.Then, in the same manner as the situation of above-mentioned 1st sample, measure total spacing of each deposition mask obtained, and calculate the deviation (3 σ) of the measured value of total spacing.As a result, the value of 3 σ is 4.3 μm.
So, achieve in the metal sheet of 5th, the 7th coiling body and make the good sample 5,7 judged based on above-mentioned condition (1) ~ (3), employ the metal sheet of described 5th, the 7th coiling body when, the value of the deviation (3 σ) of the measured value of total spacing of deposition mask is reduced, specifically can be less than 10 μm.On the other hand, achieve in the metal sheet of the 1st ~ 4th and the 6th coiling body and be judged to be bad sample 1 ~ 4 and 6 based on above-mentioned condition (1) ~ (3), when employing the metal sheet of the 1st ~ 4th and the 6th coiling body, the value of the deviation (3 σ) of the measured value of total spacing of deposition mask is large, specifically, 10 μm are greater than.Can think, based between the result of determination of above-mentioned condition (1) ~ (3) and the performance of deposition mask obtained, there is very large dependency thus.That is, by utilizing above-mentioned condition (1) ~ (3), in the stage of coiling body, precision the characteristic of the deposition mask obtained by the metal sheet of this coiling body can be predicted well.Therefore, can think, above-mentioned condition (1) ~ (3) are strong determination methods.
Nomenclature
20 deposition masks
21 metal sheets
The 1st of 21a metal sheet
The 2nd of 21b metal sheet
22 effective areas
23 peripheral regions
25 communicating poress
30 the 1st recesses
31 walls
35 the 2nd recesses
36 walls
55 mother metals
56 reduction units
57 annealing devices
61 cores
62 coiling bodies
64 long metal sheets
The 1st of 64a long metal sheet
The 2nd of 64b long metal sheet
The central part of the width of 64c long metal sheet
The end of the width of 64e long metal sheet
65a, 65b Resist patterns
65c, 65d resist film
The curve of 80 extension rates
81 reference lines
85a, 85b exposed mask
Claims (13)
1. a manufacture method for metal sheet, this metal sheet by formation more than 2 communicating poress and for the manufacture of deposition mask, wherein,
The described communicating pores of described deposition mask is formed by etching described metal sheet,
The manufacture method of described metal sheet possesses following operation:
Rolling process, in this operation, is rolled mother metal and obtains described metal sheet; With
Cut off operation, in this operation, cut away the two ends of the width of described metal sheet with pre-determined range,
Described metal sheet after described cut-out operation at least local has undulations, and this undulations is different due to the position of length its width corresponding of the length direction of this metal sheet,
The minimum value of the described length of the described metal sheet after described cut-out operation is called datum length, by the described length of the described metal sheet of the position of the width of the described metal sheet after described cut-out operation and the difference of described datum length relative to the ratio of described datum length be called extend rate time, meet the following conditions (1) ~ (3)
(1) the described extension rate of the middle body of the width of the described metal sheet after described cut-out operation is 10 × 10
-5below;
(2) the described extension rate of the end of the width of the described metal sheet after described cut-out operation is 20 × 10
-5below; With
(3) the described extension rate of described end is greater than the maximum value of the described extension rate of described middle body;
Described middle body comprises the central part of the width of the described metal sheet after described cut-out operation, and it is the part of 40% of the width accounting for described metal sheet.
2. the manufacture method of metal sheet as claimed in claim 1, wherein, this manufacture method possesses annealing operation further, in this operation, by the described metal sheet annealing obtained by described rolling process, to remove the internal stress of described metal sheet.
3. the manufacture method of metal sheet as claimed in claim 2, wherein, the mother metal after length direction stretches described rolling, while implement described annealing operation.
4. the manufacture method of metal sheet as claimed in claim 2, wherein, the mother metal after described rolling implements described annealing operation under batching the state on core.
5. the manufacture method of the metal sheet as described in any one of Claims 1 to 4, wherein, the thermal expansivity of described mother metal and the thermal expansivity of substrate are equal value, and on this substrate, across the deposition mask manufactured by described metal sheet, film forming has deposition material.
6. the manufacture method of metal sheet as claimed in claim 1, wherein, described mother metal contains Invar alloy material.
7. a metal sheet, this metal sheet is by forming more than 2 communicating poress and for the manufacture of the metal sheet of deposition mask, wherein,
Described metal sheet at least local has undulations, and this undulations is different due to the position of length its width corresponding of the length direction of this metal sheet,
The minimum value of the described length of described metal sheet is called datum length, by the described length of the described metal sheet of the position of the width of described metal sheet and the difference of described datum length relative to the ratio of described datum length be called extend rate time, meet the following conditions (1) ~ (3)
(1) the described extension rate of the middle body of the width of described metal sheet is 10 × 10
-5below;
(2) the described extension rate of the end of the width of described metal sheet is 20 × 10
-5below; With
(3) the described extension rate of described end is greater than the maximum value of the described extension rate of described middle body;
Described middle body comprises the central part of the width of described metal sheet, and it is the part of 40% of the width accounting for described metal sheet.
8. metal sheet as claimed in claim 7, wherein, the thermal expansivity of described metal sheet and the thermal expansivity of substrate are equal value, and on described substrate, across the deposition mask manufactured by described metal sheet, film forming has deposition material.
9. metal sheet as claimed in claim 7, wherein, described metal sheet contains Invar alloy material.
10. a manufacture method for deposition mask, this deposition mask possesses the peripheral region of the effective area being formed with more than 2 communicating poress and the surrounding being positioned at described effective area, and wherein, this manufacture method comprises following operation:
Prepare the operation of metal sheet, this metal sheet at least local has undulations, and this undulations is different due to the position of length its width corresponding of the length direction of this metal sheet;
Resist patterns formation process, in this operation, described metal sheet forms Resist patterns; With
Etching work procedure, in this operation, etches described Resist patterns described metal sheet as mask, forms the recess for marking described communicating pores in the region of the described metal sheet for the formation of described effective area;
The minimum value of the described length of described metal sheet is called datum length, by the described length of the described metal sheet of the position of the width of described metal sheet and the difference of described datum length relative to the ratio of described datum length be called extend rate time, meet the following conditions (1) ~ (3)
(1) the described extension rate of the middle body of the width of described metal sheet is 10 × 10
-5below;
(2) the described extension rate of the end of the width of described metal sheet is 20 × 10
-5below; With
(3) the described extension rate of described end is greater than the maximum value of the described extension rate of described middle body;
Described middle body comprises the central part of the width of described metal sheet, and it is the part of 40% of the width accounting for described metal sheet.
The manufacture method of 11. deposition masks as claimed in claim 10, wherein,
Described Resist patterns formation process has:
Described metal sheet is formed the operation of resist film,
Make exposed mask and the closely sealed operation of described resist film vacuum and
Across described exposed mask by described resist film with the operation of predetermined pattern exposure.
The manufacture method of 12. deposition masks as described in claim 10 or 11, wherein, the thermal expansivity of described metal sheet and the thermal expansivity of substrate are equal value, and on this substrate, across the deposition mask manufactured by described metal sheet, film forming has deposition material.
The manufacture method of 13. deposition masks as claimed in claim 10, wherein, described metal sheet contains Invar alloy material.
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| CN201711266191.6A CN107858643A (en) | 2013-01-10 | 2014-01-10 | Metallic plate, the manufacture method of metallic plate and the method using metallic plate manufacture deposition mask |
| CN201711266179.5A CN107937870A (en) | 2013-01-10 | 2014-01-10 | Metallic plate, the manufacture method of metallic plate and the method using metallic plate manufacture deposition mask |
| CN201910715831.XA CN110306155B (en) | 2013-01-10 | 2014-01-10 | Method for manufacturing vapor deposition mask |
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| JP2013-002923 | 2013-01-10 | ||
| JP2013002923 | 2013-01-10 | ||
| JP2013-162712 | 2013-08-05 | ||
| JP2013162712A JP5382259B1 (en) | 2013-01-10 | 2013-08-05 | Metal plate, method for producing metal plate, and method for producing vapor deposition mask using metal plate |
| PCT/JP2014/050345 WO2014109393A1 (en) | 2013-01-10 | 2014-01-10 | Metal plate, metal plate production method, and method for producing vapor deposition mask using metal plate |
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| CN201711266179.5A Division CN107937870A (en) | 2013-01-10 | 2014-01-10 | Metallic plate, the manufacture method of metallic plate and the method using metallic plate manufacture deposition mask |
| CN201910715831.XA Division CN110306155B (en) | 2013-01-10 | 2014-01-10 | Method for manufacturing vapor deposition mask |
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| CN201711266179.5A Pending CN107937870A (en) | 2013-01-10 | 2014-01-10 | Metallic plate, the manufacture method of metallic plate and the method using metallic plate manufacture deposition mask |
| CN201910715831.XA Active CN110306155B (en) | 2013-01-10 | 2014-01-10 | Method for manufacturing vapor deposition mask |
| CN201480003445.3A Active CN104854254B (en) | 2013-01-10 | 2014-01-10 | Metallic plate, the manufacture method of metallic plate and the method using metallic plate manufacture deposition mask |
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|---|---|---|---|
| CN201711266191.6A Pending CN107858643A (en) | 2013-01-10 | 2014-01-10 | Metallic plate, the manufacture method of metallic plate and the method using metallic plate manufacture deposition mask |
| CN201711266179.5A Pending CN107937870A (en) | 2013-01-10 | 2014-01-10 | Metallic plate, the manufacture method of metallic plate and the method using metallic plate manufacture deposition mask |
| CN201910715831.XA Active CN110306155B (en) | 2013-01-10 | 2014-01-10 | Method for manufacturing vapor deposition mask |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP5382259B1 (en) |
| KR (6) | KR20170071610A (en) |
| CN (4) | CN107858643A (en) |
| WO (1) | WO2014109393A1 (en) |
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- 2014-01-10 KR KR1020227044685A patent/KR20230007527A/en not_active Application Discontinuation
- 2014-01-10 WO PCT/JP2014/050345 patent/WO2014109393A1/en active Application Filing
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| TWI689606B (en) * | 2017-01-17 | 2020-04-01 | 日商大日本印刷股份有限公司 | Vapor deposition mask and method for manufacturing vapor deposition mask |
| CN114752891A (en) * | 2017-09-07 | 2022-07-15 | Lg伊诺特有限公司 | Deposition mask |
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| US10697069B2 (en) | 2017-10-13 | 2020-06-30 | Toppan Printing Co., Ltd. | Vapor deposition mask substrate, vapor deposition mask substrate manufacturing method, vapor deposition mask manufacturing method, and display device manufacturing method |
| CN108504991A (en) * | 2017-10-13 | 2018-09-07 | 凸版印刷株式会社 | The manufacturing method of deposition mask base material, the manufacturing method of deposition mask base material, the manufacturing method of deposition mask and display device |
| CN115094375A (en) * | 2017-10-13 | 2022-09-23 | 凸版印刷株式会社 | Substrate for vapor deposition mask, method for producing vapor deposition mask, and method for producing display device |
| US11499235B2 (en) | 2017-10-13 | 2022-11-15 | Toppan Printing Co., Ltd. | Vapor deposition mask substrate, vapor deposition mask substrate manufacturing method, vapor deposition mask manufacturing method, and display device manufacturing method |
| TWI757562B (en) * | 2017-11-14 | 2022-03-11 | 日商大日本印刷股份有限公司 | Metal plate for manufacturing vapor deposition hood, metal plate manufacturing method, vapor deposition hood, and manufacturing method of vapor deposition hood, and vapor deposition hood device provided with vapor deposition hood |
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| CN111218644B (en) * | 2018-11-27 | 2022-05-17 | Tgo科技株式会社 | Method for manufacturing frame-integrated mask and method for separating/replacing mask of frame-integrated mask |
Also Published As
| Publication number | Publication date |
|---|---|
| CN110306155B (en) | 2022-04-26 |
| JP2014148743A (en) | 2014-08-21 |
| WO2014109393A1 (en) | 2014-07-17 |
| CN107858643A (en) | 2018-03-30 |
| KR101749435B1 (en) | 2017-06-20 |
| KR20170071610A (en) | 2017-06-23 |
| KR20190116559A (en) | 2019-10-14 |
| KR20210112420A (en) | 2021-09-14 |
| KR20150103654A (en) | 2015-09-11 |
| KR20210112419A (en) | 2021-09-14 |
| CN110306155A (en) | 2019-10-08 |
| KR20230007527A (en) | 2023-01-12 |
| CN107937870A (en) | 2018-04-20 |
| CN104854254B (en) | 2017-11-10 |
| JP5382259B1 (en) | 2014-01-08 |
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