CN107382090A - 透明面板 - Google Patents
透明面板 Download PDFInfo
- Publication number
- CN107382090A CN107382090A CN201710543972.9A CN201710543972A CN107382090A CN 107382090 A CN107382090 A CN 107382090A CN 201710543972 A CN201710543972 A CN 201710543972A CN 107382090 A CN107382090 A CN 107382090A
- Authority
- CN
- China
- Prior art keywords
- layer
- nitride
- stiffening layer
- thickness
- transparent panel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 150000004767 nitrides Chemical class 0.000 claims abstract description 119
- 238000003475 lamination Methods 0.000 claims abstract description 11
- 239000000463 material Substances 0.000 claims description 46
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 14
- 229910052757 nitrogen Inorganic materials 0.000 claims description 7
- 150000001875 compounds Chemical class 0.000 claims 2
- 239000010410 layer Substances 0.000 description 273
- 239000011521 glass Substances 0.000 description 23
- 239000000758 substrate Substances 0.000 description 23
- 229910052581 Si3N4 Inorganic materials 0.000 description 19
- 230000008859 change Effects 0.000 description 15
- 239000012528 membrane Substances 0.000 description 14
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 13
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 12
- 238000000034 method Methods 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- 229910017083 AlN Inorganic materials 0.000 description 6
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 6
- KMWBBMXGHHLDKL-UHFFFAOYSA-N [AlH3].[Si] Chemical compound [AlH3].[Si] KMWBBMXGHHLDKL-UHFFFAOYSA-N 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 239000000377 silicon dioxide Substances 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 5
- 238000007747 plating Methods 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 4
- 239000004411 aluminium Substances 0.000 description 4
- 230000003666 anti-fingerprint Effects 0.000 description 4
- 230000003667 anti-reflective effect Effects 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000010276 construction Methods 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 4
- PBZHKWVYRQRZQC-UHFFFAOYSA-N [Si+4].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O Chemical compound [Si+4].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O PBZHKWVYRQRZQC-UHFFFAOYSA-N 0.000 description 3
- CXOWYMLTGOFURZ-UHFFFAOYSA-N azanylidynechromium Chemical compound [Cr]#N CXOWYMLTGOFURZ-UHFFFAOYSA-N 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 230000002633 protecting effect Effects 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- FKNQFGJONOIPTF-UHFFFAOYSA-N Sodium cation Chemical compound [Na+] FKNQFGJONOIPTF-UHFFFAOYSA-N 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- -1 chromium-silicon-aluminium Chemical compound 0.000 description 2
- 239000012459 cleaning agent Substances 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000005457 optimization Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 229910001415 sodium ion Inorganic materials 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 239000012780 transparent material Substances 0.000 description 2
- 238000004506 ultrasonic cleaning Methods 0.000 description 2
- 238000002604 ultrasonography Methods 0.000 description 2
- ZVWKZXLXHLZXLS-UHFFFAOYSA-N zirconium nitride Chemical compound [Zr]#N ZVWKZXLXHLZXLS-UHFFFAOYSA-N 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229910052774 Proactinium Inorganic materials 0.000 description 1
- 229910003978 SiClx Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229910010037 TiAlN Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910026551 ZrC Inorganic materials 0.000 description 1
- CKUAXEQHGKSLHN-UHFFFAOYSA-N [C].[N] Chemical compound [C].[N] CKUAXEQHGKSLHN-UHFFFAOYSA-N 0.000 description 1
- UMVBXBACMIOFDO-UHFFFAOYSA-N [N].[Si] Chemical compound [N].[Si] UMVBXBACMIOFDO-UHFFFAOYSA-N 0.000 description 1
- UGACIEPFGXRWCH-UHFFFAOYSA-N [Si].[Ti] Chemical compound [Si].[Ti] UGACIEPFGXRWCH-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- UQZIWOQVLUASCR-UHFFFAOYSA-N alumane;titanium Chemical compound [AlH3].[Ti] UQZIWOQVLUASCR-UHFFFAOYSA-N 0.000 description 1
- 239000006116 anti-fingerprint coating Substances 0.000 description 1
- IVHJCRXBQPGLOV-UHFFFAOYSA-N azanylidynetungsten Chemical compound [W]#N IVHJCRXBQPGLOV-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000013467 fragmentation Methods 0.000 description 1
- 238000006062 fragmentation reaction Methods 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910017464 nitrogen compound Inorganic materials 0.000 description 1
- 150000002830 nitrogen compounds Chemical class 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 230000003678 scratch resistant effect Effects 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 210000002268 wool Anatomy 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/225—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/28—Other inorganic materials
- C03C2217/281—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/155—Deposition methods from the vapour phase by sputtering by reactive sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Laminated Bodies (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
Description
Claims (10)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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CN201611260052 | 2016-12-30 | ||
CN2016112600528 | 2016-12-30 |
Publications (1)
Publication Number | Publication Date |
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CN107382090A true CN107382090A (zh) | 2017-11-24 |
Family
ID=60335414
Family Applications (8)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201710543549.9A Pending CN107522409A (zh) | 2016-12-30 | 2017-07-05 | 透明面板及其制造方法和应用 |
CN201720809527.8U Active CN207669894U (zh) | 2016-12-30 | 2017-07-05 | 透明面板及其应用 |
CN201720809583.1U Active CN207347401U (zh) | 2016-12-30 | 2017-07-05 | 一种面板 |
CN201720808097.8U Active CN207671933U (zh) | 2016-12-30 | 2017-07-05 | 透明面板 |
CN201710543972.9A Pending CN107382090A (zh) | 2016-12-30 | 2017-07-05 | 透明面板 |
CN201720808091.0U Active CN207581671U (zh) | 2016-12-30 | 2017-07-05 | 透明面板 |
CN201710543548.4A Pending CN107445490A (zh) | 2016-12-30 | 2017-07-05 | 透明面板 |
CN201710543551.6A Pending CN107417133A (zh) | 2016-12-30 | 2017-07-05 | 一种面板 |
Family Applications Before (4)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201710543549.9A Pending CN107522409A (zh) | 2016-12-30 | 2017-07-05 | 透明面板及其制造方法和应用 |
CN201720809527.8U Active CN207669894U (zh) | 2016-12-30 | 2017-07-05 | 透明面板及其应用 |
CN201720809583.1U Active CN207347401U (zh) | 2016-12-30 | 2017-07-05 | 一种面板 |
CN201720808097.8U Active CN207671933U (zh) | 2016-12-30 | 2017-07-05 | 透明面板 |
Family Applications After (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201720808091.0U Active CN207581671U (zh) | 2016-12-30 | 2017-07-05 | 透明面板 |
CN201710543548.4A Pending CN107445490A (zh) | 2016-12-30 | 2017-07-05 | 透明面板 |
CN201710543551.6A Pending CN107417133A (zh) | 2016-12-30 | 2017-07-05 | 一种面板 |
Country Status (1)
Country | Link |
---|---|
CN (8) | CN107522409A (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108490514A (zh) * | 2018-07-03 | 2018-09-04 | 佛山王氏航空光学科技有限公司 | 一种非球曲面塑料导热防雾透明面罩 |
CN109650740A (zh) * | 2018-12-17 | 2019-04-19 | 佛山市易晟达科技有限公司 | 一种盖板 |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107522409A (zh) * | 2016-12-30 | 2017-12-29 | 深圳市晟砡科技有限公司 | 透明面板及其制造方法和应用 |
CN207958152U (zh) * | 2017-12-28 | 2018-10-12 | 华为技术有限公司 | 移动终端壳体以及移动终端 |
CN108191260B (zh) * | 2018-02-13 | 2019-12-13 | 江苏奥蓝工程玻璃有限公司 | 一种耐高温低辐射镀膜玻璃 |
CN109270622B (zh) * | 2018-10-22 | 2020-12-11 | 东莞市银泰丰光学科技有限公司 | 一种改变玻璃导光板表面张力和水滴角的加工方法 |
Citations (7)
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JPH02164744A (ja) * | 1988-12-20 | 1990-06-25 | Asahi Glass Co Ltd | 耐久性の優れた熱線反射性を有する光学体 |
US5508092A (en) * | 1990-09-27 | 1996-04-16 | Diamonex, Incorporated | Abrasion wear resistant coated substrate product |
JP2007248562A (ja) * | 2006-03-14 | 2007-09-27 | Shincron:Kk | 光学物品およびその製造方法 |
CN204894653U (zh) * | 2015-02-15 | 2015-12-23 | 深圳南玻伟光导电膜有限公司 | 减反射膜及减反射玻璃 |
CN205501124U (zh) * | 2016-02-02 | 2016-08-24 | 深圳新晶泉技术有限公司 | 减反膜玻璃 |
WO2016138195A1 (en) * | 2015-02-25 | 2016-09-01 | Corning Incorporated | Optical structures and articles with multilayer stacks having high hardness and methods for making the same |
CN207581671U (zh) * | 2016-12-30 | 2018-07-06 | 佛山市易晟达科技有限公司 | 透明面板 |
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US5637353A (en) * | 1990-09-27 | 1997-06-10 | Monsanto Company | Abrasion wear resistant coated substrate product |
FR2856627B1 (fr) * | 2003-06-26 | 2006-08-11 | Saint Gobain | Substrat transparent muni d'un revetement avec proprietes de resistance mecanique |
DE102007033338B4 (de) * | 2007-07-16 | 2010-06-02 | Schott Ag | Hartstoffbeschichteter Glas- oder Glaskeramik-Artikel und Verfahren zu dessen Herstellung sowie Verwendung des Glas- oder Glaskeramik-Artikels |
WO2009041528A1 (ja) * | 2007-09-26 | 2009-04-02 | Citizen Holdings Co., Ltd. | 時計用カバーガラス |
JP5326407B2 (ja) * | 2008-07-31 | 2013-10-30 | セイコーエプソン株式会社 | 時計用カバーガラス、および時計 |
DE102008054139B4 (de) * | 2008-10-31 | 2010-11-11 | Schott Ag | Glas- oder Glaskeramik-Substrat mit Kratzschutzbeschichtung, dessen Verwendung und Verfahren zu dessen Herstellung |
DE102013102221B4 (de) * | 2013-03-06 | 2014-11-13 | Schott Ag | Kratzfester Glasgegenstand und Verfahren zur Herstellung kratzfester Oberflächen von Glasgegenständen |
CN104044313B (zh) * | 2014-07-01 | 2015-03-25 | 深圳市三鑫精美特玻璃有限公司 | 防刮伤超硬玻璃及其制备方法 |
CN204360356U (zh) * | 2014-12-17 | 2015-05-27 | 汕头超声显示器技术有限公司 | 一种带有硬质涂层的单片式电容触摸屏 |
CN104553126B (zh) * | 2014-12-24 | 2017-08-11 | 宜昌南玻显示器件有限公司 | 减反射玻璃及其制备方法 |
CN105882069B (zh) * | 2015-01-26 | 2018-10-09 | 南昌欧菲光学技术有限公司 | 镀膜玻璃及其制备方法 |
CN104691040B (zh) * | 2015-02-15 | 2017-07-04 | 宜昌南玻显示器件有限公司 | 减反射膜、其制备方法及减反射玻璃 |
CN105417964B (zh) * | 2015-11-02 | 2018-05-22 | 浙江星星科技股份有限公司 | 一种具有高耐磨性和透光性的盖板 |
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2017
- 2017-07-05 CN CN201710543549.9A patent/CN107522409A/zh active Pending
- 2017-07-05 CN CN201720809527.8U patent/CN207669894U/zh active Active
- 2017-07-05 CN CN201720809583.1U patent/CN207347401U/zh active Active
- 2017-07-05 CN CN201720808097.8U patent/CN207671933U/zh active Active
- 2017-07-05 CN CN201710543972.9A patent/CN107382090A/zh active Pending
- 2017-07-05 CN CN201720808091.0U patent/CN207581671U/zh active Active
- 2017-07-05 CN CN201710543548.4A patent/CN107445490A/zh active Pending
- 2017-07-05 CN CN201710543551.6A patent/CN107417133A/zh active Pending
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
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CN207347401U (zh) | 2018-05-11 |
CN207671933U (zh) | 2018-07-31 |
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