CN107254059A - 涂层剂 - Google Patents
涂层剂 Download PDFInfo
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- CN107254059A CN107254059A CN201710303677.6A CN201710303677A CN107254059A CN 107254059 A CN107254059 A CN 107254059A CN 201710303677 A CN201710303677 A CN 201710303677A CN 107254059 A CN107254059 A CN 107254059A
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- 239000011248 coating agent Substances 0.000 title claims abstract description 74
- 150000001875 compounds Chemical class 0.000 claims abstract description 63
- 239000000463 material Substances 0.000 claims abstract description 40
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 15
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 15
- 125000001931 aliphatic group Chemical group 0.000 claims abstract description 14
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 14
- 239000004033 plastic Substances 0.000 claims abstract description 14
- 229920003023 plastic Polymers 0.000 claims abstract description 14
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 13
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical group [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims abstract description 11
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 10
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical group [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 claims abstract description 9
- 125000000524 functional group Chemical group 0.000 claims abstract description 9
- 125000004430 oxygen atom Chemical group O* 0.000 claims abstract description 9
- 229910052711 selenium Inorganic materials 0.000 claims abstract description 9
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract 2
- 239000000126 substance Substances 0.000 claims description 38
- 238000000576 coating method Methods 0.000 claims description 23
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 14
- 239000005001 laminate film Substances 0.000 claims description 9
- 229920000642 polymer Polymers 0.000 claims description 2
- 125000002252 acyl group Chemical group 0.000 claims 1
- 125000003277 amino group Chemical group 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 17
- 229910052710 silicon Inorganic materials 0.000 abstract description 15
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract description 14
- 150000001408 amides Chemical group 0.000 abstract description 7
- 125000001624 naphthyl group Chemical group 0.000 abstract description 4
- 125000001424 substituent group Chemical group 0.000 abstract description 2
- KXDHJXZQYSOELW-UHFFFAOYSA-N Carbamic acid Chemical group NC(O)=O KXDHJXZQYSOELW-UHFFFAOYSA-N 0.000 abstract 1
- 125000001118 alkylidene group Chemical group 0.000 abstract 1
- -1 triphenyl-silyl Chemical group 0.000 description 101
- 239000010408 film Substances 0.000 description 66
- 239000002585 base Substances 0.000 description 49
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 33
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical class CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 31
- 229910000077 silane Inorganic materials 0.000 description 30
- 238000000034 method Methods 0.000 description 28
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 24
- 230000015572 biosynthetic process Effects 0.000 description 24
- 238000006243 chemical reaction Methods 0.000 description 24
- 239000010410 layer Substances 0.000 description 24
- 229910052751 metal Inorganic materials 0.000 description 21
- BZLZKLMROPIZSR-UHFFFAOYSA-N triphenylsilicon Chemical compound C1=CC=CC=C1[Si](C=1C=CC=CC=1)C1=CC=CC=C1 BZLZKLMROPIZSR-UHFFFAOYSA-N 0.000 description 21
- 239000002184 metal Substances 0.000 description 20
- 239000007788 liquid Substances 0.000 description 19
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 17
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 14
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 14
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 14
- 239000002904 solvent Substances 0.000 description 14
- 238000003786 synthesis reaction Methods 0.000 description 13
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 12
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 12
- 239000007859 condensation product Substances 0.000 description 12
- 238000003756 stirring Methods 0.000 description 12
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 11
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 11
- 239000000203 mixture Substances 0.000 description 11
- 150000002924 oxiranes Chemical class 0.000 description 11
- 239000010936 titanium Substances 0.000 description 11
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 10
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 10
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 10
- 150000002148 esters Chemical class 0.000 description 10
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 10
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 10
- 150000003839 salts Chemical class 0.000 description 10
- 239000010703 silicon Substances 0.000 description 10
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 10
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 9
- 239000002253 acid Substances 0.000 description 9
- 150000007524 organic acids Chemical class 0.000 description 9
- 239000003960 organic solvent Substances 0.000 description 9
- 150000003254 radicals Chemical class 0.000 description 9
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 8
- 238000005481 NMR spectroscopy Methods 0.000 description 8
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 8
- 125000003118 aryl group Chemical group 0.000 description 8
- 238000009833 condensation Methods 0.000 description 8
- 230000005494 condensation Effects 0.000 description 8
- 229910000765 intermetallic Inorganic materials 0.000 description 8
- 239000012046 mixed solvent Substances 0.000 description 8
- 125000000538 pentafluorophenyl group Chemical group FC1=C(F)C(F)=C(*)C(F)=C1F 0.000 description 8
- 230000008569 process Effects 0.000 description 8
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 8
- 238000010898 silica gel chromatography Methods 0.000 description 8
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 7
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 7
- 239000003054 catalyst Substances 0.000 description 7
- 239000013522 chelant Substances 0.000 description 7
- 229910052757 nitrogen Inorganic materials 0.000 description 7
- 239000001301 oxygen Substances 0.000 description 7
- 229910052760 oxygen Inorganic materials 0.000 description 7
- 239000002245 particle Substances 0.000 description 7
- 239000000049 pigment Substances 0.000 description 7
- 238000002360 preparation method Methods 0.000 description 7
- 229910052719 titanium Inorganic materials 0.000 description 7
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 6
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 6
- 238000001816 cooling Methods 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 6
- 239000011734 sodium Substances 0.000 description 6
- 229910052708 sodium Inorganic materials 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 235000010215 titanium dioxide Nutrition 0.000 description 6
- 238000005160 1H NMR spectroscopy Methods 0.000 description 5
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 5
- 229920000089 Cyclic olefin copolymer Polymers 0.000 description 5
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 5
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 5
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 5
- 239000004411 aluminium Substances 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 230000001186 cumulative effect Effects 0.000 description 5
- ZSWFCLXCOIISFI-UHFFFAOYSA-N cyclopentadiene Chemical compound C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 description 5
- FAMRKDQNMBBFBR-BQYQJAHWSA-N diethyl azodicarboxylate Chemical compound CCOC(=O)\N=N\C(=O)OCC FAMRKDQNMBBFBR-BQYQJAHWSA-N 0.000 description 5
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 5
- 229910044991 metal oxide Inorganic materials 0.000 description 5
- 150000004706 metal oxides Chemical class 0.000 description 5
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 5
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 5
- 239000003505 polymerization initiator Substances 0.000 description 5
- 239000000377 silicon dioxide Substances 0.000 description 5
- 229910000029 sodium carbonate Inorganic materials 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 5
- 229910052718 tin Inorganic materials 0.000 description 5
- 239000004408 titanium dioxide Substances 0.000 description 5
- 229910001928 zirconium oxide Inorganic materials 0.000 description 5
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 235000011054 acetic acid Nutrition 0.000 description 4
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 4
- 125000004423 acyloxy group Chemical group 0.000 description 4
- 230000006978 adaptation Effects 0.000 description 4
- 150000001335 aliphatic alkanes Chemical class 0.000 description 4
- 125000004104 aryloxy group Chemical group 0.000 description 4
- 150000001721 carbon Chemical group 0.000 description 4
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 4
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 4
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 4
- 150000002576 ketones Chemical class 0.000 description 4
- 239000011133 lead Substances 0.000 description 4
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 4
- 235000019341 magnesium sulphate Nutrition 0.000 description 4
- 239000003595 mist Substances 0.000 description 4
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 4
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- 235000005985 organic acids Nutrition 0.000 description 4
- 238000001228 spectrum Methods 0.000 description 4
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 4
- 150000003568 thioethers Chemical class 0.000 description 4
- JNELGWHKGNBSMD-UHFFFAOYSA-N xanthone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3OC2=C1 JNELGWHKGNBSMD-UHFFFAOYSA-N 0.000 description 4
- 239000011701 zinc Substances 0.000 description 4
- 229910052725 zinc Inorganic materials 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical class CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- QOSMNYMQXIVWKY-UHFFFAOYSA-N Propyl levulinate Chemical compound CCCOC(=O)CCC(C)=O QOSMNYMQXIVWKY-UHFFFAOYSA-N 0.000 description 3
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 3
- HFBMWMNUJJDEQZ-UHFFFAOYSA-N acryloyl chloride Chemical compound ClC(=O)C=C HFBMWMNUJJDEQZ-UHFFFAOYSA-N 0.000 description 3
- 125000003342 alkenyl group Chemical group 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N alpha-methacrylic acid Natural products CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 229940075614 colloidal silicon dioxide Drugs 0.000 description 3
- 239000000084 colloidal system Substances 0.000 description 3
- 150000002170 ethers Chemical class 0.000 description 3
- 239000000945 filler Substances 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 3
- 229910052738 indium Inorganic materials 0.000 description 3
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 3
- 239000012528 membrane Substances 0.000 description 3
- 229910000000 metal hydroxide Inorganic materials 0.000 description 3
- 150000004692 metal hydroxides Chemical class 0.000 description 3
- ARYZCSRUUPFYMY-UHFFFAOYSA-N methoxysilane Chemical compound CO[SiH3] ARYZCSRUUPFYMY-UHFFFAOYSA-N 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 239000012044 organic layer Substances 0.000 description 3
- 150000003961 organosilicon compounds Chemical class 0.000 description 3
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 3
- HVAMZGADVCBITI-UHFFFAOYSA-M pent-4-enoate Chemical compound [O-]C(=O)CCC=C HVAMZGADVCBITI-UHFFFAOYSA-M 0.000 description 3
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 3
- CIHOLLKRGTVIJN-UHFFFAOYSA-N tert‐butyl hydroperoxide Chemical compound CC(C)(C)OO CIHOLLKRGTVIJN-UHFFFAOYSA-N 0.000 description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 239000010937 tungsten Substances 0.000 description 3
- 239000011787 zinc oxide Substances 0.000 description 3
- 235000014692 zinc oxide Nutrition 0.000 description 3
- 0 *CCCCN=C=O Chemical compound *CCCCN=C=O 0.000 description 2
- VUHMIPWBDMGTNL-MHCZMQLOSA-N 1,2-dimethoxy-4-[(e)-prop-1-enyl]benzene;1,2,4-trimethoxy-5-[(e)-prop-1-enyl]benzene Chemical compound COC1=CC=C(\C=C\C)C=C1OC.COC1=CC(OC)=C(\C=C\C)C=C1OC VUHMIPWBDMGTNL-MHCZMQLOSA-N 0.000 description 2
- WKBPZYKAUNRMKP-UHFFFAOYSA-N 1-[2-(2,4-dichlorophenyl)pentyl]1,2,4-triazole Chemical compound C=1C=C(Cl)C=C(Cl)C=1C(CCC)CN1C=NC=N1 WKBPZYKAUNRMKP-UHFFFAOYSA-N 0.000 description 2
- ZPCMJYDANICQEY-UHFFFAOYSA-N 1-benzyl-2h-pyridine-2-carbonitrile Chemical compound N#CC1C=CC=CN1CC1=CC=CC=C1 ZPCMJYDANICQEY-UHFFFAOYSA-N 0.000 description 2
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 2
- AIDLAEPHWROGFI-UHFFFAOYSA-N 2-methylbenzene-1,3-dicarboxylic acid Chemical compound CC1=C(C(O)=O)C=CC=C1C(O)=O AIDLAEPHWROGFI-UHFFFAOYSA-N 0.000 description 2
- RZVINYQDSSQUKO-UHFFFAOYSA-N 2-phenoxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC1=CC=CC=C1 RZVINYQDSSQUKO-UHFFFAOYSA-N 0.000 description 2
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical class CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 2
- QGHDLJAZIIFENW-UHFFFAOYSA-N 4-[1,1,1,3,3,3-hexafluoro-2-(4-hydroxy-3-prop-2-enylphenyl)propan-2-yl]-2-prop-2-enylphenol Chemical group C1=C(CC=C)C(O)=CC=C1C(C(F)(F)F)(C(F)(F)F)C1=CC=C(O)C(CC=C)=C1 QGHDLJAZIIFENW-UHFFFAOYSA-N 0.000 description 2
- 125000004172 4-methoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C([H])C([H])=C1* 0.000 description 2
- UJOBWOGCFQCDNV-UHFFFAOYSA-N 9H-carbazole Chemical compound C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- 229920002799 BoPET Polymers 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
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Abstract
本发明涉及涂层剂。本发明的课题在于提供能够形成与塑料基材的密合性优异、具有透明性和高折射率的层的涂层剂。本发明的涂层剂含有下式(I)表示的化合物。式中,A表示任选具有供电子性基团作为取代基的苯基、萘基;Z为碳原子或硅原子;R2为氢原子、羟基、直链或支链的烷基、直链或支链的烷氧基、环状烷基或环状烷氧基;X为单键,可包含氧原子、硫原子、硒原子、‑NR‑、二价脂肪族环基、亚芳基、酰胺结构或氨基甲酸酯结构的亚烷基,二价脂肪族环基,或亚芳基;Y为可聚合的官能团;n为整数2或3;m为整数1或2;l为整数0或1;n+m+l=4;n为整数2或3时,A可以相同也可以不同。
Description
本申请是申请日为2013年11月27日、发明名称为“涂层剂”的中国发明专利申请No.201380071019.9(国际申请号为PCT/JP2013/006973)的分案申请。
技术领域
本发明涉及一种新型的涂层剂,尤其是涉及与塑料基材的密合性优异的涂层剂。
本申请对2013年1月28日提出申请的第2013-013092号日本专利申请主张优先权,并将该申请的内容并入本文中。
背景技术
具有芳基的化合物作为提供具有透明性和高折射率的聚合物(光学材料)的单体而为人们所知。例如,专利文献1、2中记载了具有三苯基甲硅烷基的化合物可作为透镜、棱镜等的光学材料使用。此外,专利文献3中记载了具有4个苯基的化合物可用于光学元件中。
但是,含有上述化合物的涂层剂与塑料基材的密合性优异这点尚未为人所知。
现有技术文献
专利文献
专利文献1:日本特开昭63-145310号公报
专利文献2:日本特开昭63-145287号公报
专利文献3:WO2009/139476号小册子
发明内容
本发明的课题在于提供一种涂层剂,所述涂层剂能够形成与塑料基材的密合性优异、具有透明性和高折射率的层。
为了解决上述课题,本申请的发明人进行了锐意研究,结果发现式(I)表示的化合物可提供能形成与塑料基材的密合性优异的层的涂层剂,从而完成了本发明。
即,本发明涉及:
(1)一种涂层剂,含有式(I)表示的化合物。
式(I)
[式(I)中,
A为下述化学式2;
Z为碳原子或硅原子;
R2为氢原子、羟基、直链或支链的C1~C6的烷基、直链或支链的C1~C6的烷氧基、C3~C6的环状烷基、或C3~C6的环状烷氧基;
X为:
单键,
可包含氧原子、硫原子、硒原子、-NR-(式中,R表示氢原子或C1~C6的烷基。)、C3~C6的二价脂肪族环基、C6~C10的亚芳基、酰胺结构或氨基甲酸酯结构的C1~C20的亚烷基,
C3~C10的二价脂肪族环基,或
C6~C10的亚芳基;
Y为可聚合的官能团;
n为整数2或3;
m为整数1或2;
l为整数0或1,n+m+l=4。
n为整数2或3时,A可以相同也可以不同。
化学式2
(R1表示供电子性基团,a表示0~5的整数,a’表示0~7的整数。)]
(2)一种涂层剂,含有式(I)表示的化合物。
式(I)
[式中,
A为下述化学式4;
Z为碳原子或硅原子;
R2为氢原子、羟基、直链或支链的C1~C6的烷基、直链或支链的C1~C6的烷氧基、C3~C6的环状烷基、或C3~C6的环状烷氧基;
X为:
单键,
可包含氧原子、硫原子、硒原子、-NR-(式中,R表示氢原子或C1~C6的烷基。)、C3~C6的二价脂肪族环基、C6~C10的亚芳基、酰胺结构或氨基甲酸酯结构的C1~C20的亚烷基,
C3~C10的二价脂肪族环基,或
C6~C10的亚芳基;
Y为可聚合的官能团;
n为整数2或3;
m为1;
l为整数0或1,n+m+l=4。
n为整数2或3时,A可以相同也可以不同。
化学式4
(R1表示供电子性基团,a表示0~5的整数,a’表示0~7的整数。)]
(3)一种涂层剂,含有式(I)表示的化合物。
式(I)
[式中,
A为下述化学式6;
Z为碳原子或硅原子;
R2为氢原子、羟基、直链或支链的C1~C6的烷基、直链或支链的C1~C6的烷氧基、C3~C6的环状烷基、或C3~C6的环状烷氧基;
X为:
单键,
可包含氧原子、硫原子、硒原子、-NR-(式中,R表示氢原子或C1~C6的烷基。)、C3~C6的二价脂肪族环基、C6~C10的亚芳基、酰胺结构或氨基甲酸酯结构的C1~C20的亚烷基,
C3~C10的二价脂肪族环基,或
C6~C10的亚芳基;
Y为可聚合的官能团;
n为3;
m为1;
l为0。
A可以相同也可以不同。
化学式6
(R1表示供电子性基团,a表示0~5的整数,a’表示0~7的整数。)]
(4)如上述(1)~(3)中任一项所述的涂层剂,其特征在于,含有式(I)表示的化合物的涂层剂还含有金属化合物。
(5)如上述(4)所述的涂层剂,其特征在于,金属化合物为氧化锆。
(6)如上述(1)~(5)中任一项所述的涂层剂,其特征在于,含有式(I)表示的化合物的涂层剂还含有式(II)表示的有机硅烷化合物的缩合物,
R4Si(R3)3 (II)
(式中,R4表示C2~C8的链烯基、C6~C10的芳基、或可以被环氧基、缩水甘油基氧基或(甲基)丙烯酰氧基取代的C1~C30的烷基,R3为羟基或水解性基团。)
(7)一种成型体,其特征在于,直接设置有下述层,所述层是将上述(1)~(6)中任一项所述的涂层剂涂布在基材上、使上述涂层剂固化而得到的。
(8)如上述(7)所述的成型体,其特征在于,基材为塑料基材。
(9)一种成型体,其特征在于,在上述(7)或(8)所述的成型体上还设置有具有功能性的层合膜。
(10)如上述(9)所述的成型体,其特征在于,具有功能性的层合膜为氧化铟锡膜。
根据本发明,可提供能形成对塑料基材(特别是环烯烃聚合物基材)的密合性优异的高折射率层的涂层剂。此外,上述涂层剂中含有有机硅烷化合物的缩合物时,可作为有机-无机复合膜或用于形成有机-无机复合膜的组合物使用。此外,利用本发明的涂层剂形成的层的密合性优异,可将该层用作粘合层、中间层。可以介由本发明的膜层合以往不能直接涂布在塑料基材上的功能性膜。
具体实施方式
1涂层剂
(式(I)的化合物)
本发明的涂层剂含有下式(I)表示的化合物。式(I)表示的化合物可以为单独一种,也可以为两种以上的混合物。
式(I)
式中,A为下述化学式8;
Z为碳原子或硅原子;
R2为氢原子、羟基、直链或支链的C1~C6的烷基、直链或支链的C1~C6的烷氧基、C3~C6的环状烷基、或C3~C6的环状烷氧基;
X为:
单键,
可包含氧原子、硫原子、硒原子、-NR-(式中,R表示氢原子或C1~C6的烷基。)、C3~C6的二价脂肪族环基、C6~C10的亚芳基、酰胺结构或氨基甲酸酯结构的C1~C20的亚烷基,
C3~C10的二价脂肪族环基,或
C6~C10的亚芳基;
Y为可聚合的官能团;
n为整数2或3;
m为整数1或2;
l为整数0或1,n+m+l=4。
n为整数2或3时,A可以相同也可以不同。
化学式8
(R1表示供电子性基团,a表示0~5的整数,a’表示0~7的整数。)
作为供电子性基团R1,可举出羟基、C1~C6的烷基、C1~C6的烷氧基、C1~C6的烷基硫基、C6~C10的芳基、C6~C10的芳基氧基。
供电子性基团R1的具体示例如下所述。
作为“C1~C6的烷基”,可举出甲基、乙基、正丙基、异丙基、正丁基、仲丁基、异丁基、叔丁基、正戊基、正己基等。
作为“C1~C6的烷氧基”,可举出甲氧基、乙氧基、正丙氧基、异丙氧基、正丁氧基、仲丁氧基、异丁氧基、叔丁氧基、正戊氧基、正己氧基等。
作为“C1~C6的烷基硫基”,可举出甲基硫基、乙基硫基、正丙基硫基、异丙基硫基、正丁基硫基、仲丁基硫基、异丁基硫基、叔丁基硫基、正戊基硫基、正己基硫基等。
作为“C6~C10的芳基”,可举出苯基、萘基等。
作为“C6~C10的芳基氧基”,可举出苯氧基、萘氧基等。
取代基X的具体示例如下所述。
“C1~C20的亚烷基”为二价碳链,例如可举出亚甲基链、1,2-亚乙基链、1,3-亚丙基链、甲基-1,2-亚乙基链、1,4-亚丁基链、1,2-二甲基-1,2-亚乙基链、1,5-亚戊基链、1-甲基-1,4-亚丁基链、2-甲基-1,4-亚丁基链、1,6-亚己基链、1,8-亚辛基链、1,10-亚癸基链、1,20-亚二十烷基等。
作为-NR-中的R的“C1~C6的烷基”,可举出甲基、乙基、正丙基、异丙基、正丁基、仲丁基、异丁基、叔丁基、正戊基、正己基等。
作为“C3~C6的二价脂肪族环基”,可举出1,1-亚环丙基、1,2-亚环丙基、1,2-亚环丁基、1,3-亚环丁基、1,2-亚环己基、1,4-亚环己基等。
作为“C6~C10的亚芳基”,可举出1,2-亚苯基、1,4-亚苯基、1,2-亚萘基、1,5-亚萘基等。
关于氧原子、硫原子、硒原子,例如为氧原子时,包括为-O-和-CO-的情形。
作为为“可包含氧原子、硫原子、硒原子、-NR-(式中,R表示氢原子或C1~C6的烷基。)、C3~C6的二价脂肪族环基、C6~C10的亚芳基、酰胺结构或氨基甲酸酯结构的C1~C20的亚烷基”的X,具体而言,可举出下述基团。
化学式9
化学式10
化学式10表示的结构中,下述化学式11表示的结构是优选的。
化学式11
化学式12
化学式13
化学式13表示的结构中,下述化学式14表示的结构是优选的。
化学式14
化学式15
本文中,R5、R6表示供电子性基团,可举出羟基、C1~C6的烷基、C1~C6的烷氧基、C1~C6的烷基硫基、C6~C10的芳基、C6~C10的芳基氧基。
供电子性基团R5、R6的具体示例如下所述。
作为“C1~C6的烷基”,可举出甲基、乙基、正丙基、异丙基、正丁基、仲丁基、异丁基、叔丁基、正戊基、正己基等。
作为“C1~C6的烷氧基”,可举出甲氧基、乙氧基、正丙氧基、异丙氧基、正丁氧基、仲丁氧基、异丁氧基、叔丁氧基、正戊氧基、正己氧基等。
作为“C1~C6的烷基硫基”,可举出甲基硫基、乙基硫基、正丙基硫基、异丙基硫基、正丁基硫基、仲丁基硫基、异丁基硫基、叔丁基硫基、正戊基硫基、正己基硫基等。
作为“C6~C10的芳基”,可举出苯基、萘基等。
作为“C6~C10的芳基氧基”,可举出苯氧基、萘氧基等。
此外,a”、a”’独立地为0~4的整数,优选为0或1,
n1为1~20的整数,优选为1~10的整数,更优选为1~5的整数。
n2为1~10的整数,优选为1~5的整数,更优选为1~2的整数。
n3和n4独立地为1~10的整数,优选为1~5的整数。
m1为整数0或1。
作为可聚合的官能团Y,可举出-O-CO-(O)m2-CR=CH2(其中,式中m2表示0或1,R表示氢原子或甲基)、-CH=CH2、烯丙基氧基、烯丙基氧基羰基氧基、环氧基、或下述化学式16所示的官能团等用于形成聚酯、聚氨酯、多异氰酸酯或聚碳酸酯的官能团等。
化学式16
作为本发明的式(I)表示的化合物的具体示例,可举出下述化合物。
化学式17
本发明的式(I)表示的化合物可通过已知的方法进行制造,例如可通过日本特开昭63-145287号公报、WO2009/139476号小册子等中记载的方法进行制造。
具体如下所述。
1)3-(甲基)丙烯酰基氧基丙基三苯基硅烷、3-烯丙基氧基羰基氧基丙基三苯基硅烷的情况下
在吡啶、三乙胺等脱氯化氢剂的存在下分别使(甲基)丙烯酰氯或氯甲酸烯丙酯与3-羟基丙基三苯基硅烷(其是在碱性条件下将市售的三苯基硅烷与乙酸烯丙酯的加成物水解而得到的)反应,由此进行制造。
2)3-烯丙基氧基丙基三苯基硅烷的情况下
可使市售的三苯基硅烷与二烯丙基醚加成从而进行制造。
3)3-丙烯酰基氧基乙基氧基四苯基硅烷的情况下
可按照如下所述方法进行制造。
化学式18
上式中,TIPS表示三异丙基甲硅烷基。
(其他成分)
其他共聚性化合物
此外,还可以包含式(I)表示的化合物以外的其他共聚性化合物。
式(I)表示的化合物以外的其他共聚性化合物,可根据熔点、粘度或折射率等调整目的适宜地选择,没有特别限定,例如可举出以下化合物。
可举出(甲基)丙烯酸甲酯、(甲基)丙烯酸苄酯、(甲基)丙烯酸苯酯、(甲基)丙烯酸溴苯酯、二(甲基)丙烯酸乙二醇酯、(甲基)丙烯酸环己酯、三(2-(甲基)丙烯酰氧基乙基)异氰酸酯等(甲基)丙烯酸酯类,邻苯二甲酸二烯丙酯、间苯二甲酸二烯丙酯、对苯二甲酸二烯丙酯、烯丙基二甘醇二碳酸酯、三烯丙基氰脲酸酯、三烯丙基异氰脲酸酯等烯丙基酯类,苯乙烯、氯苯乙烯、溴苯乙烯等芳香族烯烃类等。
全部聚合性化合物中所包含的式(I)的化合物的比例,优选为30mol%以上,更优选为50mol%以上。
聚合引发剂
此外,本发明的涂层剂也可以包含聚合引发剂。这里,作为聚合反应,可举出光聚合反应、热聚合反应等,但无需考虑热对塑料基材的影响的光聚合反应是优选的。作为用于光聚合反应中的光线,可举出紫外线或可见光线,但从聚合速度快的方面考虑优选紫外线。
作为光聚合引发剂,可举出(a)通过光照射产生阳离子种类(cationic species)的化合物,和(b)通过光照射产生活性自由基种类(radical species)的化合物等。
作为通过光照射产生阳离子种类的化合物,例如可举出如下构成的鎓盐,其中,阳离子部分为锍、碘鎓、重氮鎓(diazonium)、铵、(2,4-环戊二烯-1-基)[(1-甲基乙基)苯]-Fe阳离子,阴离子部分为BF4 -、PF6 -、SbF6 -、[BX4]-(其中,X为至少经2个以上的氟或三氟甲基取代的苯基)。
具体而言,作为锍盐,可举出双[4-(二苯硫鎓)苯基]硫醚双六氟磷酸盐、双[4-(二苯硫鎓)苯基]硫醚双六氟锑酸盐、双[4-(二苯硫鎓)苯基]硫醚双四氟硼酸盐、双[4-(二苯硫鎓)苯基]硫醚四(五氟苯基)硼酸盐、二苯基-4-(苯硫基)苯基锍六氟磷酸盐、二苯基-4-(苯硫基)苯基锍六氟锑酸盐、二苯基-4-(苯硫基)苯基锍四氟硼酸盐、二苯基-4-(苯硫基)苯基锍四(五氟苯基)硼酸盐、三苯基锍六氟磷酸盐等。
作为碘鎓盐,可举出二苯基碘鎓六氟磷酸盐、二苯基碘鎓六氟锑酸盐、二苯基碘鎓四氟硼酸盐、二苯基碘鎓四(五氟苯基)硼酸盐、双(十二烷基苯基)碘鎓六氟磷酸盐、双(十二烷基苯基)碘鎓六氟锑酸盐、双(十二烷基苯基)碘鎓四氟硼酸盐、双(十二烷基苯基)碘鎓四(五氟苯基)硼酸盐等。
作为重氮鎓盐,可举出苯基重氮鎓六氟磷酸盐、苯基重氮鎓六氟锑酸盐、苯基重氮鎓四氟硼酸盐、苯基重氮鎓四(五氟苯基)硼酸盐等。
作为铵盐,可举出1-苄基-2-氰基吡啶鎓六氟磷酸盐、1-苄基-2-氰基吡啶鎓六氟锑酸盐、1-苄基-2-氰基吡啶鎓四氟硼酸盐、1-苄基-2-氰基吡啶鎓四(五氟苯基)硼酸盐、1-(萘基甲基)-2-氰基吡啶鎓六氟磷酸盐、1-(萘基甲基)-2-氰基吡啶鎓六氟锑酸盐、1-(萘基甲基)-2-氰基吡啶鎓四氟硼酸盐、1-(萘基甲基)-2-氰基吡啶鎓四(五氟苯基)硼酸盐等。
作为(2,4-环戊二烯-1-基)[(1-甲基乙基)苯]-Fe盐,可举出(2,4-环戊二烯-1-基)[(1-甲基乙基)苯]-Fe(II)六氟磷酸盐、(2,4-环戊二烯-1-基)[(1-甲基乙基)苯]-Fe(II)六氟锑酸盐、2,4-环戊二烯-1-基)[(1-甲基乙基)苯]-Fe(II)四氟硼酸盐、2,4-环戊二烯-1-基)[(1-甲基乙基)苯]-Fe(II)四(五氟苯基)硼酸盐等。
作为通过光照射产生活性自由基种类的化合物,例如可举出苯乙酮、苯乙酮苄基缩酮、1-羟基环己基苯甲酮、2,2-二甲氧基-1,2-二苯基乙烷-1-酮、氧杂蒽酮(xanthone)、芴酮、苯甲醛、芴、蒽醌、三苯基胺、咔唑、3-甲基苯乙酮、4-氯二苯甲酮、4,4’-二甲氧基二苯甲酮、4,4’-二氨基二苯甲酮、苯偶姻丙醚、苯偶姻乙醚、苯偶酰二甲基缩酮(benzildimethyl ketal)、1-(4-异丙基苯基)-2-羟基-2-甲基丙烷-1-酮、2-羟基-2-甲基-1-苯基丙烷-1-酮、噻吨酮、二乙基噻吨酮、2-异丙基噻吨酮、2-氯噻吨酮、2-甲基-1-[4-(甲硫基)苯基]-2-吗啉基丙-1-酮、2-苄基-2-二甲基氨基-1-(4-吗啉基苯基)-丁酮-1,4-(2-羟基乙氧基)苯基-(2-羟基-2-丙基)酮、2,4,6-三甲基苯甲酰基二苯基氧化膦、双(2,6-二甲氧基苯甲酰基)-2,4,4-三甲基戊基氧化膦、低聚(2-羟基-2-甲基-1-(4-(1-甲基乙烯基)苯基)丙酮)等。
热聚合引发剂是指通过加热产生自由基的化合物,例如可举出有机过氧化物、偶氮化合物及氧化还原引发剂等。
作为上述有机过氧化物,可举出过氧化苯甲酰、氢过氧化枯烯、二叔丁基过氧化物、叔丁基过氧化氢及过氧化二异丙苯、过氧化乙酰、过氧化月桂酰、过氧化环己酮、过氧化二苯甲酰、过氧化马来酸叔丁酯之类的过氧化物;1,6-双(叔丁基过氧化碳酰氧基)己烷等过氧化碳酸酯;过氧化缩酮;过硫酸钾、过硫酸钠、过硫酸铵等过硫酸盐等。
作为上述偶氮化合物,可举出2,2’-偶氮双丙烷、2,2’-二氯-2,2’-偶氮双丙烷、1,1’-偶氮(甲基乙基)二乙酸酯、2,2’-偶氮双异丁烷、2,2’-偶氮双异丁基酰胺、2,2’-偶氮双异丁腈(AIBN)、2,2’-偶氮双(2-甲基丙酸甲酯)、2,2’-二氯-2,2’-偶氮双丁烷、2,2’-偶氮双(2-甲基丁腈)、2,2’-偶氮双异丁酸二甲酯、3,5-二羟基甲基苯基偶氮-2-甲基丙二腈、2,2’-偶氮双(2-甲基戊腈)、4,4’-偶氮双(4-氰基戊酸)二甲酯、2,2’-偶氮双(2,4-二甲基戊腈)等。
作为上述氧化还原引发剂,例如可举出过氧化氢-铁(II)盐、有机过氧化物-二甲基苯胺、铈(IV)盐-醇等的组合。
关于本发明中所使用的聚合引发剂的配合量,相对于全部聚合性化合物的总量而言,优选配合0.01~20质量%,进一步优选为0.1~10质量%。
需要说明的是,本发明中,可根据需要添加敏化剂。例如,可使用三甲基胺、甲基二甲醇胺、三乙醇胺、对二甲基氨基苯乙酮、对二甲基氨基苯甲酸乙酯、对二甲基氨基苯甲酸异戊酯、N,N-二甲基苄胺及4,4’-双(二乙基氨基)二苯甲酮等。
(其他成分)
此外,根据需要,可以在无损于本发明的目的的范围内向本发明的涂层剂中配合有机硅烷化合物的缩合物、金属化合物、有机溶剂、紫外线吸收剂、染料、防锈剂、防腐剂等添加成分。
有机硅烷化合物的缩合物
为了层合有机-无机层,本发明的涂层剂中可以含有有机硅烷化合物的缩合物。由此,可形成与基材粘接性良好的有机-无机复合膜。
可采用已知的硅醇缩合方法将式(II)表示的有机硅烷化合物制造成有机硅烷化合物的缩合物。
R4Si(R3)3 (II)
式中,R4表示C2~C8的链烯基、C6~C10的芳基、或可以被环氧基、缩水甘油基氧基或(甲基)丙烯酰氧基取代的C1~C30的烷基,R3表示羟基或水解性基团。
作为R4中的C2~C8的链烯基,可举出乙烯基、烯丙基、2-丙烯基等。
作为C1~C30的烷基,可举出甲基、乙基、正丙基、异丙基、正丁基、异丁基、仲丁基、叔丁基、正戊基、异戊基、新戊基、2-甲基丁基、2,2-二甲基丙基、正己基、异己基、正庚基、正辛基、壬基、异壬基、癸基、十二烷基、十三烷基、十四烷基、十五烷基、十六烷基、十七烷基、十八烷基等。
作为C6~C10的芳基,可举出苯基、萘基等。
所谓R3的水解性基团,例如是指下述基团,所述基团通过在无催化剂且共存有过量的水的条件下于25℃~100℃进行加热,可水解生成硅醇基、或形成硅氧烷缩合物,具体而言,可举出烷氧基、酰氧基、卤素基团、异氰酸酯基等,优选为碳原子数1~4的烷氧基或碳原子数1~6的酰氧基。
这里,作为碳原子数1~4的烷氧基,可举出甲氧基、乙氧基、正丙氧基、异丙氧基、正丁氧基、异丁氧基、叔丁氧基等;作为碳原子数1~6的酰氧基,可举出乙酰基氧基、苯甲酰基氧基等。作为卤素,可举出氟原子、氯原子、溴原子、碘原子等。
此外,对于本发明中使用的式(II)表示的有机硅烷化合物而言,优选以下基团:所述基团使得式(II)表示的有机硅烷化合物的由Fedors推算法求出的溶解度参数(SP1)小于式(I)表示的化合物的由Fedors推算法求出的溶解度参数(SP2),并且二者之差为1.6以上。
SP1比SP2小、且二者之差为1.6以上时,具有无机成分容易偏析在涂膜表面上的优点。
这里,所谓溶解度参数(SP值),是基于下述Fedors推算法计算出的值。
Fedors式:SP值(δ)=(Ev/v)1/2=(ΣΔei/ΣΔvi)
1/2Ev:蒸发能
v:摩尔体积
Δei:各成分的原子或原子团的蒸发能
Δvi:各原子或原子团的摩尔体积
用于上述式的计算的各原子或原子团的蒸发能、摩尔体积可参照R.F.Fedors,Polym.Eng.Sci.,14,147(1974)。
由于式(I)表示的化合物和式(II)表示的有机硅化合物的溶解度参数(SP值)可基于Fedors推算法进行计算,因此可基于预先算出的SP值来确定式(I)表示的化合物和式(II)表示的有机硅化合物的组合。
例如,使用3-丙烯酰基氧基丙基三苯基硅烷(SP值:10.21)作为式(I)表示的化合物时,作为SP值比三苯基硅烷化合物的SP值小1.6以上的有机硅烷化合物,可举出例如甲基三甲氧基硅烷、二甲基二甲氧基硅烷、乙基三甲氧基硅烷、乙烯基三甲氧基硅烷、正丙基三甲氧基硅烷、异丙基三甲氧基硅烷、烯丙基三甲氧基硅烷、正丁基三甲氧基硅烷、叔丁基三甲氧基硅烷、仲丁基三甲氧基硅烷、异丁基三甲氧基硅烷、戊基三甲氧基硅烷、己基三甲氧基硅烷、环己基三甲氧基硅烷、癸基三甲氧基硅烷等(这些化合物的SP值均为8.61以下)。
层中的式(I)表示的化合物(和其他共聚性化合物(若存在的话))与式(II)表示的有机硅烷化合物的缩合物的质量比优选为99:1~55:45。
作为硅醇缩合催化剂,只要能使式(II)表示的化合物中的水解性基团水解、使硅醇缩合从而形成硅氧烷键,则没有特别限定,可举出选自由有机金属、有机酸金属盐、金属氢氧化物、酸、碱、金属螯合物、它们的水解物、及它们的缩合物组成的组中的至少1种。硅醇缩合催化剂可单独使用1种,或组合使用2种以上。
作为有机金属,例如可举出四甲基钛、四丙基锆等烷基金属化合物;金属丙醇盐、金属异丙醇盐、金属正丁醇盐(具体而言为四异丙醇钛、四丁醇锆)等金属醇化物等。
有机酸金属盐是由从金属离子和有机酸获得的盐构成的化合物,作为有机酸,可举出羧酸类(乙酸、草酸、酒石酸、苯甲酸等)、含硫有机酸(磺酸、亚磺酸等)、酚类化合物、烯醇类化合物、肟类化合物、酰亚胺类化合物、芳香族磺酰胺等呈酸性的有机化合物。具体可举出羧酸金属盐、磺酸金属盐、苯酚金属盐等。
金属氢氧化物是具有氢氧化物离子作为阴离子的金属化合物。
作为金属螯合物,优选为具有羟基或水解性基团的金属螯合物,更优选为具有2个以上的羟基或水解性基团的金属螯合物。需要说明的是,所谓具有2个以上的羟基或水解性基团,是指水解性基团和羟基的总数为2个以上。作为水解性基团,例如可举出烷氧基、酰氧基、卤素基团、异氰酸酯基,优选为碳原子数1~4的烷氧基、碳原子数1~4的酰氧基。
此外,作为上述金属螯合物,优选为β-酮羰基化合物、β-酮酸酯化合物及α-羟基酯化合物,具体而言,可举出乙酰乙酸甲酯、乙酰乙酸正丙酯、乙酰乙酸异丙酯、乙酰乙酸正丁酯、乙酰乙酸仲丁酯、乙酰乙酸叔丁酯等β-酮酸酯类;乙酰丙酮、己烷-2,4-二酮、庚烷-2,4-二酮、庚烷-3,5-二酮、辛烷-2,4-二酮、壬烷-2,4-二酮、5-甲基-己烷-2,4-二酮等β-二酮类;乙醇酸、乳酸等羟基羧酸等配位的化合物。
此外,作为上述有机金属、有机酸金属盐、金属氢氧化物、金属螯合物中的金属,可举出钛(Ti)、锆(Zr)、铝(Al)、硅(Si)、锗(Ge)、铟(In)、锡(Sn)、钽(Ta)、锌(Zn)、钨(W)、铅(Pb)等,其中优选钛(Ti)、锆(Zr)、铝(Al)、锡(Sn),特别优选钛(Ti)。这些化合物可以单独使用1种,也可以使用2种以上。
作为酸,可举出有机酸、无机酸,具体而言,例如,作为有机酸,可举出乙酸、甲酸、草酸、碳酸、邻苯二甲酸、三氟乙酸、对甲苯磺酸、甲磺酸等,作为无机酸,可举出盐酸、硝酸、硼酸、氟硼酸等。
这里,通过光照射产生酸的光产酸剂具体为二苯基碘鎓六氟磷酸盐、三苯基鏻六氟磷酸盐等也包括在酸中。
作为碱,可举出四甲基胍、四甲基胍基丙基三甲氧基硅烷等强碱类,有机胺类、有机胺的羧酸中和盐、季铵盐等。
硅醇缩合催化剂的配合比相对于有机硅烷化合物的质量而言为1:99~99:1,优选为1:99~50:50。
金属化合物
为了提高所形成的层的折射率和硬度,可以在本发明的涂层剂中添加金属化合物。作为金属化合物,可举出作为上述有机硅烷化合物、硅醇缩合催化剂而示例的有机金属、有机酸金属盐、金属氢氧化物、金属螯合物,但作为除此以外的金属化合物,可举出金属氧化物,具体而言,可举出二氧化硅、二氧化钛、氧化铝、氧化铬、氧化锰、氧化铁、氧化锆、氧化钴之类的金属氧化物粒子等。特别优选氧化锆。
作为粒子的形状,可举出球状、多孔质粉末、鳞片状、纤维状等,但更优选为多孔质粉末状。
此外,作为本发明的金属氧化物粒子,也可以使用胶体状金属氧化物粒子。具体而言,可举出胶体状二氧化硅、胶体状锆,可举出水分散胶体状、或有机溶剂(甲醇或异丙醇等)分散胶体状的金属氧化物粒子。
有机溶剂
本发明的涂层剂中可以包含有机溶剂。作为可使用的代表性的有机溶剂,包括醚类、酯类、脂肪族烃类、芳香族烃类、酮类、有机卤化物类等,其中,从安全性等方面考虑,优选醚类、酯类、脂肪族烃类。作为醚类的具体化合物,可举出二乙醚、二丙醚、二丁醚、二戊醚;作为酯类的具体化合物,可举出乙酸乙酯、乙酸丙酯、乙酸丁酯、乙酸戊酯、乙酸庚酯、丁酸乙酯、异戊酸异戊酯;作为脂肪族系烃类的具体化合物,可举出正己烷、正庚烷、环己烷;作为芳香族系的具体化合物,可举出甲苯、二甲苯;作为酮类的具体化合物,可举出甲基乙基酮、甲基异丁基酮;作为有机卤化物类的具体化合物,可举出三氯乙烷、三氯乙烯等。此外,也可以使用丙二醇单甲醚、丙二醇单乙醚等比较不活性的溶剂。其中,考虑到本发明在自然环境下的开放体系中使用的情况较多,具有芳香性的包含乙酸丙酯、乙酸丁酯、乙酸异戊酯、乙酸庚酯、丁酸乙酯、异戊酸异戊酯等酯类而成的溶剂是优选的。
2成型体
本发明的成型体中直接设置有下述层,所述层是将上述含有式(I)表示的化合物的涂层剂涂布在塑料基材上、使上述涂层剂固化而得到的层。
(基材)
作为本发明的涂层剂可使用的基材,优选塑料基材,例如可举出环烯烃树脂、聚碳酸酯树脂、丙烯酸树脂、聚酰亚胺树脂、聚酯树脂、环氧树脂、液晶聚合物树脂、聚醚砜,可特别合适地使用环烯烃树脂。
(涂层的形成)
1)涂层剂的制备
通常,将上式(I)表示的化合物、以及根据需要将上述有机硅烷化合物的缩合物、光聚合引发剂、金属化合物等混合在有机溶剂中来制备本发明的涂层剂。
需要说明的是,含有有机硅烷化合物的缩合物时,也称为有机-无机复合膜或用于形成有机-无机复合膜的组合物。
作为使用的溶剂,可举出上文所述的有机溶剂。这些溶剂可以单独使用1种,或组合使用2种以上。
此外,为了提高所得到的涂膜的硬度,也可以添加四官能硅烷、胶体状二氧化硅。作为四官能硅烷,例如可举出四氨基硅烷、四氯硅烷、四乙酰氧基硅烷、四甲氧基硅烷、四乙氧基硅烷、四丁氧基硅烷、四苄氧基硅烷、四苯氧基硅烷、四(甲基)丙烯酰氧基硅烷、四[2-(甲基)丙烯酰氧基乙氧基]硅烷、四(2-乙烯氧基乙氧基)硅烷、四环氧丙氧基硅烷、四(2-乙烯氧基丁氧基)硅烷、四(3-甲基-3-氧杂环丁烷基甲氧基)硅烷。此外,作为胶体状二氧化硅,可举出水分散胶体状二氧化硅、有机溶剂(甲醇或异丙醇等)分散胶体状二氧化硅。
此外,为了实现所得到的涂膜的着色、厚膜化、防止紫外线透过至基底、抗蚀性的赋予、耐热性等各种特性,还可以另外添加·分散填充剂。作为该填充剂,可举出例如有机颜料、无机颜料等非水溶性的颜料或颜料以外的粒子状、纤维状或鳞片状的金属和合金及它们的氧化物、氢氧化物、碳化物、氮化物、硫化物等。作为该填充剂的具体例,可举出粒子状、纤维状或鳞片状的铁、铜、铝、镍、银、锌、铁氧体、炭黑、不锈钢、二氧化硅、二氧化钛、氧化铝、氧化铬、氧化锰、氧化铁、氧化锆、氧化钴、合成莫来石、氢氧化铝、氢氧化铁、碳化硅、氮化硅、氮化硼、粘土、硅藻土、消石灰、石膏、滑石、碳酸钡、碳酸钙、碳酸镁、硫酸钡、膨润土、云母、锌绿、铬绿、钴绿、维利迪安颜料(viridian)、吉勒特绿(Guignet’s green)、钴铬绿、舍勒绿(Scheele’s green)、绿土、锰绿、颜料绿(pigment green)、群青、铁蓝、石青、钴青、青天蓝、硼酸铜、钼蓝、硫化铜、钴紫、马尔斯紫、锰紫、颜料紫、氧化亚铅、铅酸钙、锌黄、硫化铅、铬黄、黄土、镉黄、锶黄、钛黄、密陀僧、颜料黄、氧化亚铜、镉红、硒红、钼朱红(chrome vermilion)、氧化铁红、锌白、锑白、碱式硫酸铅、钛白、锌钡白(lithopone)、硅酸铅、氧化锆、钨白、含铅氧化锌、Banchison白(Banchison white)、邻苯二甲酸铅、锰白、硫酸铅、石墨、骨炭(bone black)、金刚黑(diamond black)、热裂解炭黑、植物性黑、钛酸钾晶须、二硫化钼等。
除此以外,还可以添加原甲酸甲酯、原乙酸甲酯、四乙氧基硅烷等已知的脱水剂、各种表面活性剂、上述以外的硅烷偶联剂、钛偶联剂、染料、分散剂、增稠剂、匀染剂等添加剂。
作为用于形成本发明的涂层的溶液中的固态成分,优选为1~90质量%,更优选为5~60质量%。
2)涂层的形成
关于本发明的涂层,使用光聚合引发剂时,可经由下述工序来制造,所述工序为:工序(A),将上述涂层剂涂布在基体上,进行干燥;工序(B),照射包含紫外线的光,将涂层剂固化。使用热聚合引发剂时,作为上述工序(B),代替照射光而进行加热即可。
经由上述工序(B)来进行式(I)表示的化合物的聚合,并且含有式(II)表示的有机硅烷化合物的缩合物时,本发明中的涂层膜成为膜表面部的碳原子含量较之膜内部(与基材的接合部附近)的碳原子含量少的构成,可在膜表面形成硅烷化合物的缩合物的浓缩层。
作为涂层剂的涂布方法,可以采用已知的涂布方法,例如可举出浸涂法、喷涂法、棒涂法、辊涂法、旋涂法、帘式涂布法、凹版印刷法、丝网印刷法、喷射法等。此外,对于形成的膜厚没有特别限定,例如为0.1~200μm左右。
作为涂布涂层剂而形成的层的干燥处理,例如,优选于40~200℃进行0.5~120分钟左右,更优选于60~120℃进行1~60分钟左右。
紫外线的照射可使用例如高压汞灯、低压汞灯、金属卤化物灯、准分子灯等已知的装置进行。
(功能性层合膜)
可以在使用本发明的涂层剂形成的层上设置功能性层合膜。
由于使用本发明的涂层剂形成的层与塑料基材的密合性非常好,因此可以将该层用作粘合层、中间层。可以介由本发明的膜使功能性膜(其以往是不能直接涂布在塑料基材上的)层合。可以层合多层,此外,也可以在多层上进一步涂布本发明的涂层剂,再进行层合。
作为功能性层合膜,可举出透明导电膜、气体阻隔性膜。
作为透明导电膜,可举出掺杂锡的氧化铟膜(ITO膜)、掺杂氟的氧化锡膜(FTO膜)、掺杂锑的氧化锌膜、掺杂铟的氧化锌膜等。
气体阻隔性膜只要具有对氧、水蒸气等的气体阻隔性即可,没有特别限定,优选为无机化合物的薄膜,特别优选为含有选自由钛、锆、铝、硅、锗、铟、锡、钽、锌、钨及铅组成的组中的金属元素的金属氧化物、金属氮化物、金属碳化物或它们的复合物的薄膜。
上述功能性层合膜的厚度通常为10~300nm,优选为10~200nm,更优选为10~100nm。
关于在使用涂层剂形成的层上形成由无机化合物构成的透明导电性膜或气体阻隔性膜的方法,可通过已知的方法形成,可通过溅射法、真空蒸镀法、离子电镀法等物理方法、喷涂法、浸渍法、热CVD法、等离子体CVD法等化学方法等进行。
例如,利用溅射法等,通过将例如使硅化合物在氧气的存在下烧结而成的物体等用作为靶,也可以形成由氧化硅构成的膜,也可以通过以金属硅为靶在氧的存在下进行反应性溅射来成膜。此外,利用等离子体CVD法,将硅烷气体与氧气和氮气一同供给至已产生等离子体的腔室中,使其发生反应,由此可在基板上形成由氮氧化硅构成的膜。此外,利用热CVD法等,通过例如将含有硅化合物的有机溶剂溶液等用作蒸发物,可形成由氧化硅构成的膜。
本发明中,特别优选通过溅射法、真空蒸镀法、离子电镀法或等离子体CVD法成膜。
此外,形成功能性层合膜时,根据需要,可以对使用涂层剂形成的层的表面预先实施等离子体处理、或预先实施UV臭氧处理。
以下示出实施例,但本发明的技术范围并不受这些实施例的限定。
实施例
1-1化合物的合成-1
(合成例1)
3-甲基丙烯酰氧基丙基三苯基硅烷(A-1)的制造
用经充分干燥的空气置换反应烧瓶。向其中装入25.04g(0.0962mol)三苯基硅烷,安装冷却管、温度计、氮封管后,在N2气流下装入36.41g(0.364mol)乙酸烯丙酯,在N2气流下于室温下进行搅拌。滴加0.5g氯铂酸的乙醇溶液(以Pt换算为10wt%),于N2气流下在室温下搅拌3小时。通过H-NMR确认Si-H的信号(5.5ppm)消失从而确认反应结束后,减压下蒸馏除去过量的乙酸烯丙酯,进而对其残渣和Pt催化剂实施柱纯化,得到白色结晶的3-乙酰氧基丙基三苯基硅烷(Mw 360.52)27.78g(收率80.1%)。对得到的产物进行核磁共振(NMR)测定,结果如下所示。需要说明的是,下述测定是使用四甲基硅烷作为基准物质、使用氘代氯仿作为溶剂进行的。H-NMR谱值:7.4ppm、7.6ppm、4.1ppm、2.0ppm、1.8ppm、1.5ppm。
向反应烧瓶中装入12.97g(0.036mol)的3-乙酰氧基丙基三苯基硅烷,安装冷却管、温度计后,加入1N的碳酸钠、乙醇溶液,于70-80℃加热5小时,进行水解,得到白色结晶的3-羟基丙基三苯基硅烷(Mw 318.48)11.4g(0.0358mol)(收率99.4%)。对得到的产物进行核磁共振(NMR)测定,结果如下所示。需要说明的是,下述测定是使用四甲基硅烷作为基准物质、使用氘代氯仿作为溶剂进行的。H-NMR谱值:7.4ppm、7.6ppm、3.6ppm、1.7ppm、1.4ppm。
向经干燥非活性气体(氮)充分置换的反应烧瓶中加入300g超脱水甲苯,在其中溶解5.01g(0.01573mol)的3-羟基丙基三苯基硅烷、1.91g(0.01888mol)三乙胺。向其中缓慢加入1.976g(0.01890mol)甲基丙烯酰氯。滴加结束后,在室温下搅拌6小时后,依次用水、0.5N盐酸、水、1N碳酸钠、水清洗反应液,用硫酸镁进行干燥。蒸馏除去甲苯,得到透明液体的3-甲基丙烯酰氧基丙基三苯基硅烷(A-1)(Mw 386.56)4.976g(0.012874mol)(收率82%)。对得到的产物进行核磁共振(NMR)测定,结果如下所示。需要说明的是,下述测定是使用四甲基硅烷作为基准物质、使用氘代氯仿作为溶剂进行的。H-NMR谱值:7.4ppm、7.6ppm、6.4ppm、6.1ppm、5.8ppm、4.2ppm、1.8ppm、1.4ppm。
(合成例2)
3-丙烯酰氧基丙基三苯基硅烷(A-2)的制造
向经干燥惰性气体(氮)充分置换的反应烧瓶中加入300g超脱水甲苯,在其中溶解5.28g(0.01658mol)的3-羟基丙基三苯基硅烷、2.01g(0.01989mol)三乙胺。向其中缓慢加入1.801g(0.0199mol)丙烯酰氯。滴加结束后,在室温下搅拌6小时后,依次用水、0.5N盐酸、水、1N碳酸钠、水清洗反应液,用硫酸镁进行干燥。蒸馏除去甲苯,得到透明液体的3-丙烯酰氧基丙基三苯基硅烷(A-2)(Mw 372.53)5.56g(0.01492mol)(收率89.99%)。对得到的产物进行核磁共振(NMR)测定,结果如下所示。需要说明的是,下述测定是使用四甲基硅烷作为基准物质、使用氘代氯仿作为溶剂进行的。H-NMR谱值:7.4ppm、7.6ppm、6.4ppm、6.1ppm、5.8ppm、4.2ppm、1.8ppm、1.4ppm。
1-2涂层剂的制备-1
将2g的上述产物(A-1)或(A-2)用8g的甲基乙基酮(MEK)溶解。然后,添加0.08g的光聚合引发剂Irgacure(注册商标)907(BASF公司制,UV聚合引发剂,2-甲基-1-[4-(甲硫基)苯基]-2-吗啉基丙-1-酮),搅拌溶解15分钟,制备涂层剂(B-1)、(B-2)。
1-3添加有氧化锆粒子的涂层剂的制备
将2.5g的(B-2)与2.5g的20wt%MEK分散氧化锆胶体混合,得到涂层剂(B-2’)。
1-4添加有有机硅烷化合物的涂层剂的制备
1)硅醇缩合催化剂的合成
将303.03g二异丙氧基双乙酰丙酮钛(日本曹达制,T-50,以二氧化钛换算的固态成分量:16.5重量%)溶解在584.21g乙醇中后,在搅拌的同时加入112.76g(10倍摩尔/二氧化钛的摩尔数)离子交换水。一边将该溶液加热至40℃一边搅拌2小时,进行水解。然后将溶液过滤,得到黄色透明的以二氧化钛换算的浓度为5重量%的纳米二氧化钛分散液[C-1]。二氧化钛的平均粒径为4.1nm,为单分散性。
2)有机硅烷化合物的水解缩合物的制备
作为有机硅烷化合物,使用了将264.76g乙烯基三甲氧基硅烷(信越化学工业株式会社制,KBM-1003)与190.19g的3-甲基丙烯酰氧基丙基三甲氧基硅烷(信越化学工业株式会社制,KBM-503)混合而得的溶液[D-1](乙烯基三甲氧基硅烷/3-甲基丙烯酰氧基丙基三甲氧基硅烷=70/30(摩尔比))。
然后,将453.09g的[C-1]与454.95g的[D-1]混合以使得元素比Ti/Si=1/9,进而加入91.96g(2倍摩尔/有机硅化合物的摩尔数)的离子交换水,搅拌24小时从而制作溶液[E-1]。
3)涂层剂(用于形成有机-无机复合膜的组合物)的制备
以固态成分的比例为10重量%/90重量%=[E-1]/[B-2]的量将上述[E-1]液与[B-2]液混合,制作涂层剂(用于形成有机-无机复合膜的组合物)[B-2”]。
1-5涂层的形成-1
·膜试样
使用棒式涂布机将涂层剂[(B-1)、(B-2)、(B-2’)、(B-2”)]涂布在厚188μm的COP膜(日本Zeon株式会社ZF-16)上从而形成膜,用热风循环型干燥器于130℃加热3分钟。然后,利用聚光型高压汞灯(以365nm、313nm、254nm的波长的光为主成分的UV光,EYE GRAPHICS公司制,120W/cm,灯高9.8cm,输送机(conveyor)速度5m/分钟),照射累积照射量为400mJ/cm2的紫外线,从而得到薄膜。使用该薄膜进行膜厚测定、棋盘格胶带剥离试验、雾度率的测定。
·折射率测定用试样
使用浸涂机将涂膜形成用组合物[(B-1)、(B-2)、(B-2’)]涂布在硅晶片上从而形成膜,用热风循环型干燥器于130℃加热3分钟。然后,利用聚光型高压汞灯(以365nm、313nm、254nm的波长的光为主成分的UV光,Eye Graphics公司制,120W/cm,灯高9.8cm,输送机速度5m/分钟),照射累积照射量为400mJ/cm2的紫外线,从而得到薄膜。
[测定条件]
·涂膜折射率
使用J.A.Woollam公司制的高速分光椭圆率计M-2000D进行了测定。
·膜厚测定
使用Filmetrics株式会社制的非接触式膜厚测定装置(型号F-20)进行了测定。
·棋盘格胶带剥离试验(密合性)
按照JIS K5600,以纵横线各11条的方式在涂膜上刻入间隔为1mm的切口,制作100个棋盘格。在各试样上粘贴Cellotape(注册商标),用指腹磨擦多次使其密合后,剥掉胶带,以涂膜不剥离而残存的格子的格数进行评价。
·雾度率
使用雾度计(日本电色工业制)测定了涂膜的雾度率。
·全光线透过率
使用颜色·浊度同时测定器(日本电色工业,COH 400)对膜切片进行了测定。
[表1]
(B-1) | (B-2) | (B-2’) | (B-2”) | ||
折射率 | 589nm | 1.621 | 1.620 | 1.682 | - |
膜厚 | μm | 2.5 | 2.5 | 2.5 | 2.5 |
密合性 | 100/100 | 100/100 | 100/100 | 100/100 | |
雾度率 | % | 0.4 | 0.23 | 0.36 | 0.28 |
全光线透过率 | % | 91.48 | 92.03 | 89.89 | 90.95 |
对于全部基材而言,未观察到涂层的剥离,确认了其密合性优异。此外,涂层的透明性优异,折射率也高。
2-1化合物的合成-2
(合成例3)
丙烯酸二苯基甲基甲硅烷基丙酯(A-3)
向经干燥惰性气体(氮)充分置换的反应烧瓶中加入60.00g超脱水THF、7.30g(0.02355mol)的3-(甲基二苯基甲硅烷基)-1-丙醇、4.29g(0.0428mol)三乙胺,在溶解的同时进行冷却直至液温变为10℃以下。向其中缓慢加入3.87g(0.0428mol)丙烯酰氯,搅拌1小时。滴加结束后,在室温下搅拌一夜。依次用水、0.5N盐酸、水、1N碳酸钠、水清洗反应混合物,用硫酸镁干燥有机层后,蒸馏除去甲苯。使用乙酸乙酯/己烷混合溶剂,利用硅胶柱色谱法进行纯化。以94%的收率得到了6.87g(0.02214mol)化合物A-3。1H-NMR谱值:7.6ppm、7.4ppm、6.4ppm、6.1ppm、5.7ppm、4.1ppm、1.7ppm、1.2ppm、0.5ppm。
(合成例4)
丙烯酸三苯基甲硅烷基苯氧基乙酯(A-4)
向反应烧瓶中加入44.00g的THF和3.00g(0.00851mol)的4-三苯基甲硅烷基苯酚、3.35g(0.01277mol)三苯基膦、1.48g(0.01277mol)丙烯酸羟基乙酯,在溶解的同时进行冷却直至液温变为0℃以下。缓慢加入5.56g(0.01277mol)偶氮二甲酸二乙酯(40%甲苯溶液,约2.2mol/L),搅拌1小时。然后,在室温下搅拌一夜后,进而在液温50℃下搅拌3小时。蒸馏除去溶剂后,使用乙酸乙酯/己烷混合溶剂,利用硅胶柱色谱法进行纯化。以51%的收率得到了3.29g(0.0076mol)化合物A-4。1H-NMR谱值:7.7ppm、7.4ppm、7.2ppm、6.9ppm、6.4ppm、6.2ppm、5.8ppm、4.5ppm、4.3ppm。
(合成例5)
二苯基甲硅烷基二苯氧基乙基丙烯酸酯(A-5)
向反应烧瓶中加入50.00g的THF和5.00g(0.01357mol)的4,4’-二苯基硅烷双酚、10.68g(0.04071mol)三苯基膦、4.73g(0.04071mol)丙烯酸羟基乙酯,在溶解的同时进行冷却直至液温变为0℃以下。缓慢加入17.73g(0.04071mol)偶氮二甲酸二乙酯(40%甲苯溶液,约2.2mol/L),搅拌1小时。然后,在室温下搅拌一夜后,进而在液温50℃下搅拌3小时。蒸馏除去溶剂后,使用乙酸乙酯/己烷混合溶剂,利用硅胶柱色谱法进行纯化。以61%的收率得到了4.67g(0.0083mol)化合物A-5。1H-NMR谱值:7.3-7.6ppm、6.9-7.0ppm、6.4ppm、6.2ppm、5.8ppm、4.5ppm、4.3ppm。
(合成例6)
丙烯酸三苯基甲基丙酯(A-6)
向经干燥惰性气体(氮)充分置换的反应烧瓶中加入42.36g超脱水THF、5.00g(0.01653mol)的4,4,4-三苯基丁醇、3.35g(0.03307mol)三乙胺,在溶解的同时进行冷却直至液温变为10℃以下。向其中缓慢加入2.24g(0.02480mol)丙烯酰氯,搅拌1小时。滴加结束后,在室温下搅拌一夜。依次用水、0.5N盐酸、水、1N碳酸钠、水清洗反应混合物,用硫酸镁干燥有机层后,蒸馏除去甲苯。使用乙酸乙酯/己烷混合溶剂,利用硅胶柱色谱法进行纯化。以91%的收率得到了5.36g(0.0150mol)化合物A-6。1H-NMR谱值:7.3ppm、7.2ppm、6.4ppm、6.1ppm、5.8ppm、4.1ppm、2.7ppm、1.5ppm。
(合成例7)
丙烯酸三苯基甲基苯氧基乙酯(A-7)
向反应烧瓶中加入50.00g的THF和5.00g(0.01486mol)的4-三苯基甲基苯酚、5.85g(0.02229mol)三苯基膦、2.59g(0.02229mol)丙烯酸羟基乙酯,在溶解的同时进行冷却直至液温变为0℃以下。缓慢加入9.71g(0.02229mol)偶氮二甲酸二乙酯(40%甲苯溶液,约2.2mol/L),搅拌1小时。然后,在室温下搅拌一夜后,进而在液温50℃下搅拌3小时。蒸馏除去溶剂后,使用乙酸乙酯/己烷混合溶剂,利用硅胶柱色谱法进行纯化。以51%的收率得到了3.29g(0.0076mol)化合物A-7。1H-NMR谱值:7.3-7.0ppm、6.9ppm、6.4ppm、6.2ppm、5.8ppm、4.5ppm、4.3ppm。
(合成例8)
丙烯酸-4-[三(4-甲氧基苯基)甲基]苯氧基乙酯(A-8)
向反应烧瓶中加入30.00g的THF和3.00g(0.00703mol)的4-[三(4-甲氧基苯基)甲基]苯酚、2.27g(0.01055mol)三苯基膦、1.23g(0.01055mol)丙烯酸羟基乙酯,在溶解的同时进行冷却直至液温变为0℃以下。缓慢加入4.56g(0.01055mol)偶氮二甲酸二乙酯(40%甲苯溶液,约2.2mol/L),搅拌1小时。然后,在室温下搅拌一夜后,进而在液温50℃下搅拌3小时。蒸馏除去溶剂后,使用乙酸乙酯/己烷混合溶剂,利用硅胶柱色谱法进行纯化。以55%的收率得到了2.03g(0.00387mol)化合物A-8。1H-NMR谱值:7.1ppm、7.0ppm、6.9ppm、6.7ppm、6.4ppm、6.2ppm、5.8ppm、4.5ppm、4.3ppm。
(合成例9)
二苯基甲基二苯氧基乙基丙烯酸酯(A-9)
向反应烧瓶中加入50.00g的THF和5.00g(0.01419mol)的4,4’-二羟基四苯基甲烷、11.16g(0.04256mol)三苯基膦、4.94g(0.04256mol)丙烯酸羟基乙酯,在溶解的同时进行冷却直至液温变为0℃以下。缓慢加入18.53g(0.04256mol)偶氮二甲酸二乙酯(40%甲苯溶液,约2.2mol/L),搅拌1小时。然后,在室温下搅拌一夜后,进而在液温50℃下搅拌3小时。蒸馏除去溶剂后,使用乙酸乙酯/己烷混合溶剂,利用硅胶柱色谱法进行纯化。以51%的收率得到了3.66g(0.0067mol)化合物A-9。1H-NMR谱值:7.3-7.0ppm、6.9ppm、6.4ppm、6.2ppm、5.8ppm、4.5ppm、4.3ppm。
(合成例10)
丙烯酸三苯基甲硅烷基丙氧基羰基氨基乙酯(A-10)
向经氮置换的反应烧瓶中加入50.00g甲苯和2.50g(0.01884mol)丙烯酸-2-异氰酸酯基乙酯、5.04g(0.01570mol)的3-三苯基甲硅烷基-1-丙醇、催化量的月桂酸二丁基锡,在溶解的同时进行加热直至液温变为70℃,反应6小时。反应结束后,将反应液冷却至室温,加入20g蒸馏水,使未反应的异氰酸酯化合物失活。蒸馏除去有机层的溶剂后,使用乙酸乙酯/己烷混合溶剂,利用硅胶柱色谱法进行纯化。以81%的收率得到了5.84g(0.01272mol)化合物A-10。1H-NMR谱值:7.2-7.5ppm、6.4ppm、6.1ppm、5.8ppm、4.9ppm、4.2-4.1ppm、3.5ppm、1.8ppm、1.4ppm。
2-2涂层剂的制备-2
分别取1g的上述化合物(A-3)~(A-9),加入至4g环己烷中,搅拌直至完全溶解。然后,添加0.04g的光聚合引发剂Irgacure(注册商标)907(BASF公司制,UV聚合引发剂,2-甲基-1-[4-(甲硫基)苯基]-2-吗啉基丙-1-酮),制作涂层剂(B-3)~(B-9)。
2-3涂层的形成-2
使用棒式涂布机将(B-3)~(B-9)的涂层剂涂布在下述塑料基底上从而形成膜,用热风循环型干燥机于100℃加热3分钟。利用聚光型高压汞灯(以365nm、313nm、254nm的波长的光为主成分的UV光,Eye Graphics公司制,单灯型,120W/cm,灯高9.8cm,输送机速度5m/分钟),照射累积照射量为400mJ/cm2的紫外线,从而得到薄膜。
基材1:PET膜Cosmo Shine A4300(188μm),东洋纺绩
基材2:PEN膜Teonex Q65F(125μm),帝人-杜邦
基材3:丙烯酸板DELAGLAS A(2mm),旭化成
基材4:聚酰亚胺Kapton 500H(126.7μm),东丽-杜邦
·密合性试验
按照JIS K5600-5-6的交叉切割法进行了密合性试验。
对于全部基材而言,未观察到涂层的剥离,确认了其密合性优异。
2-4涂层的形成-3
使用棒式涂布机将(B-4)~(B-8)的涂层剂涂布在下述塑料基底上从而形成膜,用热风循环型干燥机于100℃加热3分钟。利用聚光型高压汞灯(以365nm、313nm、254nm的波长的光为主成分的UV光,Eye Graphics公司制,单灯型,120W/cm,灯高9.8cm,输送机速度5m/分钟),照射累积照射量为400mJ/cm2的紫外线,从而得到薄膜。
基材5:COP板ZEONOR 1600(1mm),日本Zeon
基材6:COP板ZEONOR 1430R(1mm),日本Zeon
基材7:COC板TOPAS COC 5018L-10(1mm),Polyplastics
基材8:COC板TOPAS COC 6017S-04(1mm),Polyplastics
·密合性试验
按照JIS K5600-5-6的交叉切割法进行了密合性试验。
对于全部基材而言,未观察到涂层的剥离,确认了其密合性优异。
2-5涂层的形成-4
使用棒式涂布机将(B-4)、(B-6)~(B-8)的涂层剂涂布在下述塑料基底上从而形成膜,用热风循环型干燥机于100℃加热3分钟。利用聚光型高压汞灯(以365nm、313nm、254nm的波长的光为主成分的UV光,Eye Graphics公司制,单灯型,120W/cm,灯高9.8cm,输送机速度5m/分钟),照射累积照射量为400mJ/cm2的紫外线,从而得到薄膜。
基材9:COP膜ZEONOR Film ZF-14(188μm),日本Zeon(拉伸膜)
基材10:COP膜ZEONOR Film ZF-16(188μm),日本Zeon(拉伸膜)
基材11:PET膜LUMIRROR T60、东丽(拉伸膜)
·密合性试验
按照JIS K5600-5-6的交叉切割法进行了密合性试验。
对于全部基材而言,未观察到涂层的剥离,确认了其密合性优异。
2-6功能性层合膜的形成
使用涂层剂(B-2)、(B-2’)、(B-2”)、(B-4)、(B-6)、(B-7),采用实施例1-5记载的方法制作涂层。采用DC溅射法在该薄膜上层合约40nm的掺杂有锡的氧化铟膜(ITO膜)。
·密合性试验
按照JIS K5600-5-6的交叉切割法进行了密合性试验,结果未观察到ITO膜的剥离,确认了其密合性优异。
Claims (3)
1.一种成型体,其特征在于,在基材上直接设置有下述涂层,所述涂层含有式(I)表示的化合物的聚合物,
式(I)
式(I)中,
A为下述化学式2;
Z为碳原子;
R2为氢原子、羟基、直链或支链的C1~C6的烷基、直链或支链的C1~C6的烷氧基、C3~C6的环状烷基、或C3~C6的环状烷氧基;
X为:
单键,
可包含氧原子、硫原子、硒原子、-NR-、C3~C6的二价脂肪族环基、C6~C10的亚芳基、酰胺结构或氨基甲酸酯结构的C1~C20的亚烷基,式-NR-中,R表示氢原子或C1~C6的烷基,
C3~C10的二价脂肪族环基,或
C6~C10的亚芳基;
Y为可聚合的官能团;
n为整数2或3;
m为整数1或2;
l为整数0或1,n+m+l=4;
n为整数2或3时,A可以相同也可以不同;
化学式2
化学式2中,R1表示供电子性基团,a表示0~5的整数,a’表示0~7的整数。
2.如权利要求1所述的成型体,其特征在于,基材为塑料基材。
3.一种成型体,其特征在于,在权利要求1或2所述的成型体上还设置有具有功能性的层合膜。
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JP2012153825A (ja) * | 2011-01-27 | 2012-08-16 | Showa Denko Kk | (メタ)アクリロイル基含有共重合体 |
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MY174180A (en) * | 2013-01-28 | 2020-03-12 | Nippon Soda Co | Coating agent |
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2013
- 2013-11-27 MY MYPI2015702318A patent/MY174180A/en unknown
- 2013-11-27 CN CN201710303677.6A patent/CN107254059A/zh active Pending
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- 2013-11-27 WO PCT/JP2013/006973 patent/WO2014115210A1/ja active Application Filing
- 2013-11-27 KR KR1020177035816A patent/KR102105241B1/ko active IP Right Grant
- 2013-11-27 KR KR1020177035814A patent/KR20170141278A/ko not_active Application Discontinuation
- 2013-11-27 CN CN201810019075.2A patent/CN108047866A/zh active Pending
- 2013-11-27 CN CN201380071019.9A patent/CN104937055B/zh not_active Expired - Fee Related
- 2013-11-27 KR KR1020157018225A patent/KR101828139B1/ko active IP Right Grant
- 2013-11-27 EP EP13872476.0A patent/EP2949716B1/en active Active
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CN86103331A (zh) * | 1985-05-14 | 1986-11-12 | 国际油漆有限公司 | 防污涂料的基料 |
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KR102105241B1 (ko) | 2020-04-27 |
CN108047866A (zh) | 2018-05-18 |
JP2017071782A (ja) | 2017-04-13 |
EP2949716B1 (en) | 2020-04-29 |
KR101828139B1 (ko) | 2018-02-09 |
JP6035350B2 (ja) | 2016-11-30 |
US20150353738A1 (en) | 2015-12-10 |
SG11201505710UA (en) | 2015-08-28 |
KR20170141279A (ko) | 2017-12-22 |
US10947393B2 (en) | 2021-03-16 |
CN104937055B (zh) | 2018-04-13 |
JPWO2014115210A1 (ja) | 2017-01-19 |
MY174180A (en) | 2020-03-12 |
KR20170141278A (ko) | 2017-12-22 |
KR20150095776A (ko) | 2015-08-21 |
TWI557107B (zh) | 2016-11-11 |
TW201527276A (zh) | 2015-07-16 |
JP6227743B2 (ja) | 2017-11-08 |
WO2014115210A1 (ja) | 2014-07-31 |
TW201527277A (zh) | 2015-07-16 |
EP2949716A4 (en) | 2016-10-05 |
JP6335244B2 (ja) | 2018-05-30 |
TW201439059A (zh) | 2014-10-16 |
EP2949716A1 (en) | 2015-12-02 |
TWI557106B (zh) | 2016-11-11 |
TWI522346B (zh) | 2016-02-21 |
JP2017094723A (ja) | 2017-06-01 |
CN104937055A (zh) | 2015-09-23 |
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