CN106946454B - 用于生产具有高硅酸含量的材料的复合体的方法 - Google Patents
用于生产具有高硅酸含量的材料的复合体的方法 Download PDFInfo
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- CN106946454B CN106946454B CN201611053257.9A CN201611053257A CN106946454B CN 106946454 B CN106946454 B CN 106946454B CN 201611053257 A CN201611053257 A CN 201611053257A CN 106946454 B CN106946454 B CN 106946454B
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- 239000000463 material Substances 0.000 title claims abstract description 147
- 239000002131 composite material Substances 0.000 title claims abstract description 68
- 235000012239 silicon dioxide Nutrition 0.000 title claims abstract description 25
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 title claims abstract description 23
- 238000004519 manufacturing process Methods 0.000 title claims description 16
- 239000002002 slurry Substances 0.000 claims abstract description 154
- 238000000034 method Methods 0.000 claims abstract description 52
- 239000002245 particle Substances 0.000 claims abstract description 47
- 239000013067 intermediate product Substances 0.000 claims abstract description 15
- 239000002270 dispersing agent Substances 0.000 claims abstract description 14
- 238000010438 heat treatment Methods 0.000 claims abstract description 14
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 61
- 239000007787 solid Substances 0.000 claims description 29
- 229910052906 cristobalite Inorganic materials 0.000 claims description 25
- 239000000377 silicon dioxide Substances 0.000 claims description 24
- 229910052681 coesite Inorganic materials 0.000 claims description 23
- 229910052682 stishovite Inorganic materials 0.000 claims description 23
- 229910052905 tridymite Inorganic materials 0.000 claims description 23
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 20
- 229910052799 carbon Inorganic materials 0.000 claims description 20
- 239000011159 matrix material Substances 0.000 claims description 12
- 230000002745 absorbent Effects 0.000 claims description 11
- 239000002250 absorbent Substances 0.000 claims description 11
- 238000002360 preparation method Methods 0.000 claims description 10
- 230000015572 biosynthetic process Effects 0.000 claims description 6
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- 239000006228 supernatant Substances 0.000 claims description 4
- 238000002156 mixing Methods 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 86
- 239000011521 glass Substances 0.000 description 15
- 238000005304 joining Methods 0.000 description 13
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
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- 238000005266 casting Methods 0.000 description 7
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- 229910052602 gypsum Inorganic materials 0.000 description 6
- 239000010440 gypsum Substances 0.000 description 6
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- 238000001035 drying Methods 0.000 description 5
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- 229910052710 silicon Inorganic materials 0.000 description 4
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- 238000005660 chlorination reaction Methods 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 230000003760 hair shine Effects 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 239000004071 soot Substances 0.000 description 3
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- 238000007596 consolidation process Methods 0.000 description 2
- 239000008367 deionised water Substances 0.000 description 2
- 229910021641 deionized water Inorganic materials 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 238000003801 milling Methods 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
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- 230000000007 visual effect Effects 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000001311 chemical methods and process Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000010574 gas phase reaction Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- XZWYZXLIPXDOLR-UHFFFAOYSA-N metformin Chemical compound CN(C)C(=N)NC(N)=N XZWYZXLIPXDOLR-UHFFFAOYSA-N 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 150000003961 organosilicon compounds Chemical class 0.000 description 1
- 235000011837 pasties Nutrition 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 239000011505 plaster Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000007569 slipcasting Methods 0.000 description 1
- 239000007779 soft material Substances 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 238000007669 thermal treatment Methods 0.000 description 1
- 230000009974 thixotropic effect Effects 0.000 description 1
- 230000036962 time dependent Effects 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
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- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
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- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
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- C03B19/066—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction for the production of quartz or fused silica articles
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- C03C4/00—Compositions for glass with special properties
- C03C4/08—Compositions for glass with special properties for glass selectively absorbing radiation of specified wave lengths
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- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
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- C03B2201/58—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with metals in non-oxide form, e.g. CdSe
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- C03C2201/00—Glass compositions
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- C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
- C03C2201/26—Doped silica-based glasses containing non-metals other than boron or halide containing carbon
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- C03C2201/00—Glass compositions
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- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/20—Wet processes, e.g. sol-gel process
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- C03C2203/00—Production processes
- C03C2203/20—Wet processes, e.g. sol-gel process
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- C03C2214/00—Nature of the non-vitreous component
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/42—Non metallic elements added as constituents or additives, e.g. sulfur, phosphor, selenium or tellurium
- C04B2235/422—Carbon
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/42—Non metallic elements added as constituents or additives, e.g. sulfur, phosphor, selenium or tellurium
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
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Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP15196193.5 | 2015-11-25 | ||
| EP15196193.5A EP3173386B1 (de) | 2015-11-25 | 2015-11-25 | Verfahren zur herstellung eines verbundkörpers aus hochkieselsäurehaltigem werkstoff |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106946454A CN106946454A (zh) | 2017-07-14 |
| CN106946454B true CN106946454B (zh) | 2020-03-03 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201611053257.9A Active CN106946454B (zh) | 2015-11-25 | 2016-11-25 | 用于生产具有高硅酸含量的材料的复合体的方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US10106453B2 (he) |
| EP (1) | EP3173386B1 (he) |
| JP (1) | JP6336014B2 (he) |
| KR (1) | KR101930998B1 (he) |
| CN (1) | CN106946454B (he) |
| IL (1) | IL248569B (he) |
| SG (1) | SG10201608956XA (he) |
| TW (1) | TWI616341B (he) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7183838B2 (ja) | 2019-02-05 | 2022-12-06 | 株式会社リコー | 液体吐出装置、液体吐出方法、及びプログラム |
| DE102022201253A1 (de) | 2022-02-07 | 2023-08-10 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Strahlungsemittierendes bauteil und verfahren zur herstellung eines strahlungsemittierenden bauteils |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101687680A (zh) * | 2007-06-30 | 2010-03-31 | 赫罗伊斯石英玻璃股份有限两合公司 | 从不透明石英玻璃和致密封闭层的基体生产复合体的方法 |
| CN103332868A (zh) * | 2013-06-24 | 2013-10-02 | 武汉利之达科技有限公司 | 一种梯度折射率玻璃片及其制备方法 |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3511456A1 (de) * | 1985-03-29 | 1986-10-09 | Philips Patentverwaltung Gmbh, 2000 Hamburg | Verfahren und vorrichtungen zur herstellung von glaskoerpern |
| JPH0320211A (ja) | 1989-06-16 | 1991-01-29 | Eiichi Nakagawa | 入浴剤 |
| JPH03202112A (ja) * | 1989-12-28 | 1991-09-03 | Toshiba Ceramics Co Ltd | シリカガラスフィルターの製造方法 |
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| DE10243954B3 (de) * | 2002-09-20 | 2004-07-08 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren für die Herstellung eines opaken Quarzglas-Kompositwerkstoffs sowie Verwendung desselben |
| DE102004052312A1 (de) * | 2004-08-23 | 2006-03-02 | Heraeus Quarzglas Gmbh & Co. Kg | Beschichtetes Bauteil aus Quarzglas sowie Verfahren zur Herstellung des Bauteils |
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| EP2878584B1 (de) * | 2013-11-28 | 2017-01-04 | Heraeus Quarzglas GmbH & Co. KG | Verfahren zur Herstellung eines beschichteten Bauteils aus Quarzglas oder Quarzgut |
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- 2016-11-25 JP JP2016229022A patent/JP6336014B2/ja active Active
- 2016-11-25 TW TW105138844A patent/TWI616341B/zh active
- 2016-11-25 CN CN201611053257.9A patent/CN106946454B/zh active Active
- 2016-11-25 KR KR1020160158467A patent/KR101930998B1/ko active IP Right Grant
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101687680A (zh) * | 2007-06-30 | 2010-03-31 | 赫罗伊斯石英玻璃股份有限两合公司 | 从不透明石英玻璃和致密封闭层的基体生产复合体的方法 |
| CN103332868A (zh) * | 2013-06-24 | 2013-10-02 | 武汉利之达科技有限公司 | 一种梯度折射率玻璃片及其制备方法 |
Also Published As
| Publication number | Publication date |
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| TW201722741A (zh) | 2017-07-01 |
| EP3173386A1 (de) | 2017-05-31 |
| US10106453B2 (en) | 2018-10-23 |
| JP2017095349A (ja) | 2017-06-01 |
| CN106946454A (zh) | 2017-07-14 |
| KR20170061091A (ko) | 2017-06-02 |
| US20170144916A1 (en) | 2017-05-25 |
| IL248569A0 (he) | 2017-01-31 |
| JP6336014B2 (ja) | 2018-06-06 |
| TWI616341B (zh) | 2018-03-01 |
| IL248569B (he) | 2019-12-31 |
| SG10201608956XA (en) | 2017-06-29 |
| KR101930998B1 (ko) | 2018-12-19 |
| EP3173386B1 (de) | 2018-05-02 |
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