CN105487334B - 压印装置、压印方法及物品制造方法 - Google Patents

压印装置、压印方法及物品制造方法 Download PDF

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Publication number
CN105487334B
CN105487334B CN201510622590.6A CN201510622590A CN105487334B CN 105487334 B CN105487334 B CN 105487334B CN 201510622590 A CN201510622590 A CN 201510622590A CN 105487334 B CN105487334 B CN 105487334B
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substrate
receiving unit
unit
impression materials
virtual
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Chinese (zh)
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CN105487334A (zh
Inventor
近藤阳介
小桥敏范
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Kato Corp
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Kato Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN201510622590.6A 2014-10-03 2015-09-25 压印装置、压印方法及物品制造方法 Active CN105487334B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014205201A JP6429573B2 (ja) 2014-10-03 2014-10-03 インプリント装置、インプリント方法および物品製造方法
JP2014-205201 2014-10-03

Publications (2)

Publication Number Publication Date
CN105487334A CN105487334A (zh) 2016-04-13
CN105487334B true CN105487334B (zh) 2019-11-05

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ID=55632750

Family Applications (1)

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CN201510622590.6A Active CN105487334B (zh) 2014-10-03 2015-09-25 压印装置、压印方法及物品制造方法

Country Status (5)

Country Link
US (1) US9405193B2 (enExample)
JP (1) JP6429573B2 (enExample)
KR (1) KR101993501B1 (enExample)
CN (1) CN105487334B (enExample)
TW (1) TWI610795B (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6025079B2 (ja) * 2014-10-07 2016-11-16 大日本印刷株式会社 インプリント装置およびその制御方法
JP6821414B2 (ja) * 2016-12-13 2021-01-27 キヤノン株式会社 インプリント装置、及び物品の製造方法
CN106681105A (zh) * 2017-02-09 2017-05-17 深圳市华星光电技术有限公司 光阻涂布装置检测机构及光阻涂布机
JP6993791B2 (ja) 2017-05-08 2022-01-14 キヤノン株式会社 インプリント装置
JP7154839B2 (ja) * 2018-06-26 2022-10-18 キヤノン株式会社 インプリント装置、インプリント方法および、物品製造方法
JP7495814B2 (ja) * 2020-05-13 2024-06-05 キヤノン株式会社 インプリント装置、および物品の製造方法
JP7596134B2 (ja) * 2020-12-09 2024-12-09 キヤノン株式会社 形成装置、形成方法及び物品の製造方法
JP2025075158A (ja) * 2023-10-31 2025-05-15 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法。

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101009218A (zh) * 2006-01-24 2007-08-01 株式会社日立制作所 图形形成方法及图形形成装置
JP2009266841A (ja) * 2008-04-21 2009-11-12 Toshiba Corp ナノインプリント方法
US7670530B2 (en) * 2006-01-20 2010-03-02 Molecular Imprints, Inc. Patterning substrates employing multiple chucks
WO2010062328A2 (en) * 2008-10-27 2010-06-03 Molecular Imprints, Inc. Dispense system
JP2012049471A (ja) * 2010-08-30 2012-03-08 Canon Inc インプリント装置及び物品の製造方法
CN103048879A (zh) * 2011-10-14 2013-04-17 佳能株式会社 压印设备和使用该压印设备的物品制造方法
JP2014041861A (ja) * 2012-08-21 2014-03-06 Dainippon Printing Co Ltd インプリント装置およびインプリント方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5565034A (en) * 1993-10-29 1996-10-15 Tokyo Electron Limited Apparatus for processing substrates having a film formed on a surface of the substrate
JP3760131B2 (ja) * 2002-01-22 2006-03-29 東京エレクトロン株式会社 処理方法
US7094440B2 (en) * 2002-01-22 2006-08-22 Tokyo Electron Limited Substrate treatment method and substrate treatment apparatus
US7309225B2 (en) 2004-08-13 2007-12-18 Molecular Imprints, Inc. Moat system for an imprint lithography template
EP1825502A4 (en) * 2004-12-01 2008-01-23 Molecular Imprints Inc EXPOSURE METHOD FOR HEAT MANAGEMENT FOR IMPRINT LITHOGRAPHIC PROCESSES
JP2010080630A (ja) * 2008-09-25 2010-04-08 Canon Inc 押印装置および物品の製造方法
JP5451450B2 (ja) * 2010-02-24 2014-03-26 キヤノン株式会社 インプリント装置及びそのテンプレート並びに物品の製造方法
JP5754965B2 (ja) * 2011-02-07 2015-07-29 キヤノン株式会社 インプリント装置、および、物品の製造方法
JP6123321B2 (ja) * 2013-02-06 2017-05-10 大日本印刷株式会社 インプリント方法およびインプリント装置
JP6234207B2 (ja) * 2013-12-18 2017-11-22 キヤノン株式会社 インプリント方法、インプリント装置および物品の製造方法
WO2016052345A1 (ja) * 2014-10-01 2016-04-07 大日本印刷株式会社 インプリント装置、インプリント方法およびインプリント装置の制御方法

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7670530B2 (en) * 2006-01-20 2010-03-02 Molecular Imprints, Inc. Patterning substrates employing multiple chucks
CN101009218A (zh) * 2006-01-24 2007-08-01 株式会社日立制作所 图形形成方法及图形形成装置
JP2009266841A (ja) * 2008-04-21 2009-11-12 Toshiba Corp ナノインプリント方法
WO2010062328A2 (en) * 2008-10-27 2010-06-03 Molecular Imprints, Inc. Dispense system
JP2012049471A (ja) * 2010-08-30 2012-03-08 Canon Inc インプリント装置及び物品の製造方法
CN103048879A (zh) * 2011-10-14 2013-04-17 佳能株式会社 压印设备和使用该压印设备的物品制造方法
JP2014041861A (ja) * 2012-08-21 2014-03-06 Dainippon Printing Co Ltd インプリント装置およびインプリント方法

Also Published As

Publication number Publication date
CN105487334A (zh) 2016-04-13
JP2016076558A (ja) 2016-05-12
TWI610795B (zh) 2018-01-11
US20160097975A1 (en) 2016-04-07
TW201613740A (en) 2016-04-16
KR20160040425A (ko) 2016-04-14
US9405193B2 (en) 2016-08-02
KR101993501B1 (ko) 2019-06-26
JP6429573B2 (ja) 2018-11-28

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