CN105359254A - 压印方法和设备 - Google Patents

压印方法和设备 Download PDF

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Publication number
CN105359254A
CN105359254A CN201480036290.3A CN201480036290A CN105359254A CN 105359254 A CN105359254 A CN 105359254A CN 201480036290 A CN201480036290 A CN 201480036290A CN 105359254 A CN105359254 A CN 105359254A
Authority
CN
China
Prior art keywords
mold
photocurable composition
gas
condensable gas
imprint method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201480036290.3A
Other languages
English (en)
Chinese (zh)
Inventor
伊藤俊树
吉田贵志
佐藤仁至
川崎阳司
饭村晶子
山下敬司
上野武彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of CN105359254A publication Critical patent/CN105359254A/zh
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/002—Component parts, details or accessories; Auxiliary operations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/005—Surface shaping of articles, e.g. embossing; Apparatus therefor characterised by the choice of material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/026—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing of layered or coated substantially flat surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2033/00—Use of polymers of unsaturated acids or derivatives thereof as moulding material
    • B29K2033/04—Polymers of esters
    • B29K2033/08—Polymers of acrylic acid esters, e.g. PMA, i.e. polymethylacrylate
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2105/00—Condition, form or state of moulded material or of the material to be shaped
    • B29K2105/0005—Condition, form or state of moulded material or of the material to be shaped containing compounding ingredients

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN201480036290.3A 2013-06-26 2014-06-18 压印方法和设备 Pending CN105359254A (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2013-133541 2013-06-26
JP2013133541 2013-06-26
JP2014121911A JP6494185B2 (ja) 2013-06-26 2014-06-12 インプリント方法および装置
JP2014-121911 2014-06-12
PCT/JP2014/066753 WO2014208571A1 (en) 2013-06-26 2014-06-18 Imprint method and apparatus

Publications (1)

Publication Number Publication Date
CN105359254A true CN105359254A (zh) 2016-02-24

Family

ID=52141903

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201480036290.3A Pending CN105359254A (zh) 2013-06-26 2014-06-18 压印方法和设备

Country Status (7)

Country Link
US (1) US10386717B2 (https=)
EP (1) EP3000120B1 (https=)
JP (1) JP6494185B2 (https=)
KR (1) KR101967966B1 (https=)
CN (1) CN105359254A (https=)
TW (1) TWI541857B (https=)
WO (1) WO2014208571A1 (https=)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG11201604509UA (en) * 2013-12-10 2016-07-28 Canon Nanotechnologies Inc Imprint lithography template and method for zero-gap imprinting
JP6632200B2 (ja) 2015-02-27 2020-01-22 キヤノン株式会社 パターンの形成方法、加工基板の製造方法、光学部品の製造方法、回路基板の製造方法、電子部品の製造方法
JP2016164977A (ja) * 2015-02-27 2016-09-08 キヤノン株式会社 ナノインプリント用液体材料、ナノインプリント用液体材料の製造方法、硬化物パターンの製造方法、光学部品の製造方法、回路基板の製造方法、および電子部品の製造方法
KR102484517B1 (ko) * 2015-02-27 2023-01-05 캐논 가부시끼가이샤 나노임프린트용 액체 재료, 나노임프린트용 액체 재료의 제조 방법, 경화물 패턴의 제조 방법, 광학 부품의 제조 방법, 및 회로 기판의 제조 방법
JP2016162863A (ja) * 2015-02-27 2016-09-05 キヤノン株式会社 パターンの形成方法、加工基板の製造方法、光学部品の製造方法、回路基板の製造方法、電子部品の製造方法
JP6562707B2 (ja) * 2015-05-13 2019-08-21 キヤノン株式会社 インプリント装置、インプリント方法及び物品の製造方法
JP6503606B2 (ja) * 2015-10-29 2019-04-24 国立研究開発法人産業技術総合研究所 インプリント装置
JP6643048B2 (ja) * 2015-11-09 2020-02-12 キヤノン株式会社 基板を処理する装置、物品の製造方法、および気体供給経路
US11194247B2 (en) 2018-01-31 2021-12-07 Canon Kabushiki Kaisha Extrusion control by capillary force reduction
JP7278828B2 (ja) * 2019-03-26 2023-05-22 キヤノン株式会社 成形方法、成形装置、インプリント方法、および物品の製造方法
CN120742616A (zh) 2019-12-25 2025-10-03 Ｓｃｉｖａｘ株式会社 使用印模的传送方法以及印模的应用
JP7581033B2 (ja) 2020-12-11 2024-11-12 キヤノン株式会社 インプリント装置、インプリント方法、物品の製造方法、およびコンピュータプログラム
TWI898644B (zh) * 2024-06-07 2025-09-21 志聖工業股份有限公司 壓合裝置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011096766A (ja) * 2009-10-28 2011-05-12 Toshiba Corp インプリントシステムおよびインプリント方法
US20120199997A1 (en) * 2011-02-07 2012-08-09 Canon Kabushiki Kaisha Imprint apparatus and article manufacturing method
WO2013035761A1 (en) * 2011-09-05 2013-03-14 Canon Kabushiki Kaisha Imprint apparatus, imprint method, and manufacturing method of commodities
US20130329971A1 (en) * 2010-12-10 2013-12-12 Nagravision S.A. Method and device to speed up face recognition

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01229024A (ja) 1988-03-08 1989-09-12 Mitsubishi Rayon Co Ltd 光硬化性被覆組成物
TW430672B (en) 1997-07-03 2001-04-21 Sumitomo Chemical Co A photo-curing resin composition for DVD
JP4011811B2 (ja) 2000-01-14 2007-11-21 Ｊｓｒ株式会社 光硬化性樹脂組成物及び光学部材
JP3700001B2 (ja) * 2002-09-10 2005-09-28 独立行政法人産業技術総合研究所 インプリント方法及び装置
JP2007144995A (ja) 2005-10-25 2007-06-14 Dainippon Printing Co Ltd 光硬化ナノインプリント用モールド及びその製造方法
KR100790899B1 (ko) * 2006-12-01 2008-01-03 삼성전자주식회사 얼라인 마크가 형성된 템플릿 및 그 제조 방법
US9573319B2 (en) * 2007-02-06 2017-02-21 Canon Kabushiki Kaisha Imprinting method and process for producing a member in which a mold contacts a pattern forming layer
TW200923003A (en) 2007-09-11 2009-06-01 Fujifilm Corp Curable composition for nanoimprint, cured product and production method thereof
US8119052B2 (en) 2007-11-02 2012-02-21 Molecular Imprints, Inc. Drop pattern generation for imprint lithography
NL2003762A (en) * 2008-11-18 2010-05-20 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
WO2010146983A1 (ja) 2009-06-19 2010-12-23 日産化学工業株式会社 低誘電率インプリント材料
JP5546893B2 (ja) * 2010-02-16 2014-07-09 東京エレクトロン株式会社 インプリント方法
JP2011222732A (ja) * 2010-04-09 2011-11-04 Fujifilm Corp パターン形成方法及びパターン基板製造方法
KR101615795B1 (ko) 2010-07-02 2016-04-26 가부시끼가이샤 도꾸야마 광경화성 임프린트용 조성물 및 상기 조성물을 이용한 패턴의 형성 방법
JP5762245B2 (ja) 2010-10-20 2015-08-12 株式会社トクヤマ 光硬化性ナノインプリント用組成物、該組成物を用いたパターンの形成方法、及び該組成物の硬化体を有するナノインプリント用レプリカ金型
JP5829177B2 (ja) 2011-07-12 2015-12-09 富士フイルム株式会社 インプリント用硬化性組成物、パターン形成方法およびパターン
JP5710553B2 (ja) 2011-08-25 2015-04-30 富士フイルム株式会社 インプリント用硬化性組成物、パターン形成方法およびパターン
TWI471693B (zh) 2011-11-10 2015-02-01 Canon Kk 光可固化組成物，及使用彼之圖案化方法
JP5882922B2 (ja) 2012-01-19 2016-03-09 キヤノン株式会社 インプリント方法、およびインプリント装置
JP6071312B2 (ja) 2012-08-03 2017-02-01 株式会社東芝 テンプレート作製方法、パターン形成方法、半導体素子の製造方法、テンプレート製造装置、及びテンプレート材料
JP6278645B2 (ja) 2012-09-24 2018-02-14 キヤノン株式会社 光硬化性組成物及びこれを用いた膜の製造方法
US20140239529A1 (en) * 2012-09-28 2014-08-28 Nanonex Corporation System and Methods For Nano-Scale Manufacturing
JP6748399B2 (ja) 2012-11-30 2020-09-02 キヤノン株式会社 インプリント方法およびインプリント用硬化性組成物
JP6305058B2 (ja) 2013-03-05 2018-04-04 キヤノン株式会社 感光性ガス発生剤、光硬化性組成物

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011096766A (ja) * 2009-10-28 2011-05-12 Toshiba Corp インプリントシステムおよびインプリント方法
US20130329971A1 (en) * 2010-12-10 2013-12-12 Nagravision S.A. Method and device to speed up face recognition
US20120199997A1 (en) * 2011-02-07 2012-08-09 Canon Kabushiki Kaisha Imprint apparatus and article manufacturing method
WO2013035761A1 (en) * 2011-09-05 2013-03-14 Canon Kabushiki Kaisha Imprint apparatus, imprint method, and manufacturing method of commodities

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
QING WANG等: "《Effects of Environmental Gas in UV Nanoimprint on the Characteristics of UV-Curable Resin》", 《JAPANESE JOURNAL OF APPLIED PHYSICS》 *

Also Published As

Publication number Publication date
TW201506996A (zh) 2015-02-16
KR101967966B1 (ko) 2019-04-10
JP6494185B2 (ja) 2019-04-03
KR20160021274A (ko) 2016-02-24
US20160147143A1 (en) 2016-05-26
JP2015029073A (ja) 2015-02-12
US10386717B2 (en) 2019-08-20
WO2014208571A1 (en) 2014-12-31
EP3000120A4 (en) 2017-03-15
TWI541857B (zh) 2016-07-11
EP3000120A1 (en) 2016-03-30
EP3000120B1 (en) 2022-01-12

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Application publication date: 20160224

RJ01 Rejection of invention patent application after publication