JP2011222732A - パターン形成方法及びパターン基板製造方法 - Google Patents

パターン形成方法及びパターン基板製造方法 Download PDF

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Publication number
JP2011222732A
JP2011222732A JP2010090080A JP2010090080A JP2011222732A JP 2011222732 A JP2011222732 A JP 2011222732A JP 2010090080 A JP2010090080 A JP 2010090080A JP 2010090080 A JP2010090080 A JP 2010090080A JP 2011222732 A JP2011222732 A JP 2011222732A
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Japan
Prior art keywords
pattern
resist layer
substrate
mold
acrylate
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JP2010090080A
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Inventor
Tei Daimatsu
Tetsushi Wakamatsu
禎 大松
哲史 若松
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Fujifilm Corp
富士フイルム株式会社
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Priority to JP2010090080A priority Critical patent/JP2011222732A/ja
Publication of JP2011222732A publication Critical patent/JP2011222732A/ja
Withdrawn legal-status Critical Current

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