CN104508561B - 曝光装置的除尘装置和除尘方法 - Google Patents

曝光装置的除尘装置和除尘方法 Download PDF

Info

Publication number
CN104508561B
CN104508561B CN201380040503.5A CN201380040503A CN104508561B CN 104508561 B CN104508561 B CN 104508561B CN 201380040503 A CN201380040503 A CN 201380040503A CN 104508561 B CN104508561 B CN 104508561B
Authority
CN
China
Prior art keywords
cleaning roller
dust
exposure device
exposure
dusting surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201380040503.5A
Other languages
English (en)
Chinese (zh)
Other versions
CN104508561A (zh
Inventor
松田政昭
森田亮
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Orc Manufacturing Co Ltd
Original Assignee
Orc Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Orc Manufacturing Co Ltd filed Critical Orc Manufacturing Co Ltd
Publication of CN104508561A publication Critical patent/CN104508561A/zh
Application granted granted Critical
Publication of CN104508561B publication Critical patent/CN104508561B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning

Landscapes

  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning In General (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
CN201380040503.5A 2012-09-19 2013-09-05 曝光装置的除尘装置和除尘方法 Active CN104508561B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012-205315 2012-09-19
JP2012205315A JP5893537B2 (ja) 2012-09-19 2012-09-19 露光装置の除塵装置及び除塵方法
PCT/JP2013/073938 WO2014045885A1 (ja) 2012-09-19 2013-09-05 露光装置の除塵装置及び除塵方法

Publications (2)

Publication Number Publication Date
CN104508561A CN104508561A (zh) 2015-04-08
CN104508561B true CN104508561B (zh) 2016-09-21

Family

ID=50341202

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201380040503.5A Active CN104508561B (zh) 2012-09-19 2013-09-05 曝光装置的除尘装置和除尘方法

Country Status (5)

Country Link
JP (1) JP5893537B2 (ko)
KR (1) KR102062419B1 (ko)
CN (1) CN104508561B (ko)
TW (1) TWI603159B (ko)
WO (1) WO2014045885A1 (ko)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI553423B (zh) * 2014-11-11 2016-10-11 Beac Co Ltd Exposure device
TWI553424B (zh) * 2014-11-11 2016-10-11 Beac Co Ltd Exposure device
CN104716795B (zh) * 2015-03-28 2017-08-08 东莞市森江机电科技有限公司 除尘单元
CN105093854B (zh) * 2015-09-09 2017-04-12 合肥芯碁微电子装备有限公司 一种用于激光直写曝光机的自动粘尘装置
CN105470150B (zh) * 2015-12-21 2018-07-10 中国电子科技集团公司第五十五研究所 一种硅台面二极管的玻璃钝化方法
JP6811015B2 (ja) * 2016-02-02 2021-01-13 株式会社アドテックエンジニアリング ロールツーロール両面露光装置
JP6215986B2 (ja) * 2016-02-24 2017-10-18 株式会社オーク製作所 除塵装置を備えた露光装置
JP6865609B2 (ja) 2017-03-26 2021-04-28 株式会社アドテックエンジニアリング 露光装置
CN108646525B (zh) * 2017-06-16 2020-05-12 深圳市前海野马自动化设备有限公司 一种带升降机构的自动对位装置及其曝光设备
CN108255029A (zh) * 2018-03-09 2018-07-06 广东华恒智能科技有限公司 一种双面曝光机及其曝光方法
CN109739071A (zh) * 2019-01-30 2019-05-10 广东华恒智能科技有限公司 一种卷对卷全自动曝光机
CN112269302B (zh) * 2020-09-16 2023-05-30 上海光起电子设备有限公司 曝光机除尘装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200705108A (en) * 2005-07-20 2007-02-01 Adtec Eng Co Ltd Exposing device
CN101122750A (zh) * 2006-08-09 2008-02-13 株式会社阿迪泰克工程 曝光装置
CN101470357A (zh) * 2007-12-27 2009-07-01 株式会社Orc制作所 曝光装置

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3275990B2 (ja) * 1994-09-29 2002-04-22 ノーリツ鋼機株式会社 除塵装置
JP3478075B2 (ja) * 1997-08-13 2003-12-10 富士電機ホールディングス株式会社 レーザ加工用クリーナ
JP3533380B2 (ja) 2000-09-12 2004-05-31 誠一郎 豊田 露光機の除塵装置及び除塵方法
JP2002169145A (ja) * 2000-11-30 2002-06-14 Minolta Co Ltd 表示パネルの製造方法及び可撓性基板の加工装置
JP2004017362A (ja) * 2002-06-13 2004-01-22 Fuji Photo Film Co Ltd 平面記録装置のクリーニング方法及び平面記録装置
JP2004327485A (ja) * 2003-04-21 2004-11-18 Canon Inc 露光用マスクの異物除去方法
JP2005334836A (ja) * 2004-05-31 2005-12-08 Renesas Technology Corp 搬送台車、およびそれを用いた軌道清掃方法、走行検査方法並びに半導体装置の製造方法
JP2007212765A (ja) * 2006-02-09 2007-08-23 Nsk Ltd 近接露光装置の手動式クリーナ及びクリーナ装置
JP2007306382A (ja) * 2006-05-12 2007-11-22 Pentax Corp 撮像素子用清掃器具
JP2008241987A (ja) * 2007-03-27 2008-10-09 Mitsubishi Paper Mills Ltd 連続露光装置
JP2009157249A (ja) 2007-12-27 2009-07-16 Orc Mfg Co Ltd 露光装置
JP2009300542A (ja) * 2008-06-10 2009-12-24 Orc Mfg Co Ltd 露光描画装置
KR101686609B1 (ko) * 2009-11-25 2016-12-14 엘지디스플레이 주식회사 필름 제진 장치
JP2011133724A (ja) * 2009-12-25 2011-07-07 Nikon Corp 流体静圧軸受、移動体装置、露光装置、デバイス製造方法、及び清掃装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200705108A (en) * 2005-07-20 2007-02-01 Adtec Eng Co Ltd Exposing device
CN101122750A (zh) * 2006-08-09 2008-02-13 株式会社阿迪泰克工程 曝光装置
CN101470357A (zh) * 2007-12-27 2009-07-01 株式会社Orc制作所 曝光装置

Also Published As

Publication number Publication date
KR102062419B1 (ko) 2020-01-03
JP5893537B2 (ja) 2016-03-23
TW201413397A (zh) 2014-04-01
CN104508561A (zh) 2015-04-08
WO2014045885A1 (ja) 2014-03-27
JP2014059494A (ja) 2014-04-03
KR20150056526A (ko) 2015-05-26
TWI603159B (zh) 2017-10-21

Similar Documents

Publication Publication Date Title
CN104508561B (zh) 曝光装置的除尘装置和除尘方法
CN101470357B (zh) 曝光装置
TWI672564B (zh) 輥對輥雙面曝光裝置
KR100393453B1 (ko) 처리장치
CN103640317A (zh) 一种全自动贴膜机
JP2007025436A (ja) 露光装置
JP2010098126A (ja) 基板搬送処理装置
KR20070000366A (ko) 기판처리장치
JP3533380B2 (ja) 露光機の除塵装置及び除塵方法
KR101300853B1 (ko) 기판 반송 시스템, 기판 반송 장치 및 기판 처리 장치
JP2009157249A (ja) 露光装置
JP2006228862A (ja) 異物除去装置，処理システム及び異物除去方法
JP2008306109A (ja) 露光装置用基板搬送機構
JP6215986B2 (ja) 除塵装置を備えた露光装置
JP5004786B2 (ja) 露光装置の反転部
JP2847808B2 (ja) 基板自動露光機の除塵装置
JP5077655B2 (ja) 近接スキャン露光装置及びエアパッド
TW200903186A (en) Ploting device
JP2008304537A (ja) 露光装置及び露光方法
JP5089257B2 (ja) 近接スキャン露光装置
JP5046157B2 (ja) 近接スキャン露光装置
TWI553424B (zh) Exposure device
JP2016140850A (ja) 異物除去装置及び清掃システム

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
EXSB Decision made by sipo to initiate substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant