CN103608490B - 电化学沉积和补给设备 - Google Patents

电化学沉积和补给设备 Download PDF

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Publication number
CN103608490B
CN103608490B CN201280018375.XA CN201280018375A CN103608490B CN 103608490 B CN103608490 B CN 103608490B CN 201280018375 A CN201280018375 A CN 201280018375A CN 103608490 B CN103608490 B CN 103608490B
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China
Prior art keywords
anode
module
electrochemical deposition
frame
deposition apparatus
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Chinese (zh)
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CN103608490A (zh
Inventor
德梅特留斯·帕帕帕纳约图
阿瑟·凯格勒
大卫·瓜尔纳恰
乔纳森·汉德
约翰内斯·基乌
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Advanced Nix Co Ltd
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Nexx Systems Inc
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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/002—Cell separation, e.g. membranes, diaphragms
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/001—Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/10—Agitating of electrolytes; Moving of racks
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/16—Regeneration of process solutions
    • C25D21/22—Regeneration of process solutions by ion-exchange
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/06—Suspending or supporting devices for articles to be coated
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Electroplating Methods And Accessories (AREA)
CN201280018375.XA 2011-04-14 2012-04-13 电化学沉积和补给设备 Active CN103608490B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201161475417P 2011-04-14 2011-04-14
US61/475,417 2011-04-14
PCT/US2012/033422 WO2012142352A1 (en) 2011-04-14 2012-04-13 Electro chemical deposition and replenishment apparatus

Publications (2)

Publication Number Publication Date
CN103608490A CN103608490A (zh) 2014-02-26
CN103608490B true CN103608490B (zh) 2016-08-10

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CN201280018375.XA Active CN103608490B (zh) 2011-04-14 2012-04-13 电化学沉积和补给设备

Country Status (6)

Country Link
US (1) US9017528B2 (enExample)
JP (1) JP2014510842A (enExample)
KR (1) KR101959095B1 (enExample)
CN (1) CN103608490B (enExample)
TW (2) TWI622667B (enExample)
WO (1) WO2012142352A1 (enExample)

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US9481940B2 (en) 2014-06-26 2016-11-01 International Business Machines Corporation Electrodeposition system and method incorporating an anode having a back side capacitive element
MX2017009630A (es) * 2015-02-05 2018-03-28 A King Forrest Metodo y sistema mejorado de electrolisis de derivacion.
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US10011919B2 (en) * 2015-05-29 2018-07-03 Lam Research Corporation Electrolyte delivery and generation equipment
US10227707B2 (en) * 2015-07-17 2019-03-12 Applied Materials, Inc. Inert anode electroplating processor and replenisher
US9765443B2 (en) * 2015-09-02 2017-09-19 Applied Materials, Inc. Electroplating processor with current thief electrode
US9920448B2 (en) * 2015-11-18 2018-03-20 Applied Materials, Inc. Inert anode electroplating processor and replenisher with anionic membranes
JP6577404B2 (ja) * 2016-04-05 2019-09-18 ファナック株式会社 絞りユニット及びこれを備えた静圧軸受装置並びに溝付きブロックの製造方法
US20170370017A1 (en) * 2016-06-27 2017-12-28 Tel Nexx, Inc. Wet processing system and method of operating
GB201701166D0 (en) * 2017-01-24 2017-03-08 Picofluidics Ltd An apparatus for electrochemically processing semiconductor substrates
WO2018162682A1 (de) * 2017-03-08 2018-09-13 Technische Universität Darmstadt Anordnung und verfahren zum bereitstellen einer vielzahl von nanodrähten sowie galvanikkapsel
JP2022532943A (ja) * 2019-05-24 2022-07-20 ラム リサーチ コーポレーション 光学プローブを含む電気化学的堆積システム
US11608563B2 (en) * 2019-07-19 2023-03-21 Asmpt Nexx, Inc. Electrochemical deposition systems
JP7316908B2 (ja) * 2019-10-30 2023-07-28 株式会社荏原製作所 アノード組立体
US11697887B2 (en) * 2020-10-23 2023-07-11 Applied Materials, Inc. Multi-compartment electrochemical replenishment cell

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Also Published As

Publication number Publication date
CN103608490A (zh) 2014-02-26
TW201305393A (zh) 2013-02-01
TWI537428B (zh) 2016-06-11
US20120298502A1 (en) 2012-11-29
KR101959095B1 (ko) 2019-03-15
TWI622667B (zh) 2018-05-01
JP2014510842A (ja) 2014-05-01
KR20140027247A (ko) 2014-03-06
WO2012142352A1 (en) 2012-10-18
US9017528B2 (en) 2015-04-28
TW201615901A (zh) 2016-05-01

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