CN103454668B - 放射线检测装置和成像系统 - Google Patents
放射线检测装置和成像系统 Download PDFInfo
- Publication number
- CN103454668B CN103454668B CN201310218193.3A CN201310218193A CN103454668B CN 103454668 B CN103454668 B CN 103454668B CN 201310218193 A CN201310218193 A CN 201310218193A CN 103454668 B CN103454668 B CN 103454668B
- Authority
- CN
- China
- Prior art keywords
- scintillator layers
- scintillator
- sensor panel
- particle
- layers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000005855 radiation Effects 0.000 title claims abstract description 74
- 238000003384 imaging method Methods 0.000 title claims abstract description 10
- 239000002245 particle Substances 0.000 claims abstract description 89
- 239000004840 adhesive resin Substances 0.000 claims abstract description 70
- 229920006223 adhesive resin Polymers 0.000 claims abstract description 70
- 230000002285 radioactive effect Effects 0.000 claims abstract description 17
- 229920005989 resin Polymers 0.000 claims abstract description 17
- 239000011347 resin Substances 0.000 claims abstract description 17
- 230000001070 adhesive effect Effects 0.000 claims abstract description 8
- 238000000034 method Methods 0.000 claims description 32
- 239000000463 material Substances 0.000 claims description 29
- 230000008569 process Effects 0.000 claims description 23
- 230000001681 protective effect Effects 0.000 claims description 13
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 8
- 239000000843 powder Substances 0.000 claims description 8
- 239000000741 silica gel Substances 0.000 claims description 8
- 229910002027 silica gel Inorganic materials 0.000 claims description 8
- -1 acryl Chemical group 0.000 claims description 5
- DHKHKXVYLBGOIT-UHFFFAOYSA-N 1,1-Diethoxyethane Chemical compound CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 claims description 2
- 239000011354 acetal resin Substances 0.000 claims description 2
- 229920006324 polyoxymethylene Polymers 0.000 claims description 2
- 229920002554 vinyl polymer Polymers 0.000 claims description 2
- 230000035945 sensitivity Effects 0.000 description 24
- 238000007639 printing Methods 0.000 description 17
- 238000012360 testing method Methods 0.000 description 17
- 230000035882 stress Effects 0.000 description 15
- 238000005382 thermal cycling Methods 0.000 description 15
- 238000011156 evaluation Methods 0.000 description 12
- 239000006185 dispersion Substances 0.000 description 10
- 238000010586 diagram Methods 0.000 description 9
- 238000007650 screen-printing Methods 0.000 description 9
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 8
- 239000002585 base Substances 0.000 description 8
- 230000008021 deposition Effects 0.000 description 6
- 238000009826 distribution Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 239000010408 film Substances 0.000 description 6
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 6
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 5
- 238000002360 preparation method Methods 0.000 description 5
- 230000009467 reduction Effects 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 229920002545 silicone oil Polymers 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 238000010023 transfer printing Methods 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N Acrylic acid Chemical compound OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- NPPJLSILDPVHCM-UHFFFAOYSA-N Felbinac ethyl Chemical compound C1=CC(CC(=O)OCC)=CC=C1C1=CC=CC=C1 NPPJLSILDPVHCM-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000006835 compression Effects 0.000 description 3
- 238000007906 compression Methods 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 229920000139 polyethylene terephthalate Polymers 0.000 description 3
- 239000005020 polyethylene terephthalate Substances 0.000 description 3
- 239000004926 polymethyl methacrylate Substances 0.000 description 3
- 238000005096 rolling process Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- NQBXSWAWVZHKBZ-UHFFFAOYSA-N 2-butoxyethyl acetate Chemical compound CCCCOCCOC(C)=O NQBXSWAWVZHKBZ-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229920000049 Carbon (fiber) Polymers 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 210000002469 basement membrane Anatomy 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 239000007767 bonding agent Substances 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000004917 carbon fiber Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000021615 conjugation Effects 0.000 description 2
- 239000013530 defoamer Substances 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000001125 extrusion Methods 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- 238000004898 kneading Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 239000004408 titanium dioxide Substances 0.000 description 2
- 108010022579 ATP dependent 26S protease Proteins 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- 208000020401 Depressive disease Diseases 0.000 description 1
- 239000001856 Ethyl cellulose Substances 0.000 description 1
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
- 229910052693 Europium Inorganic materials 0.000 description 1
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- 229910052777 Praseodymium Inorganic materials 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- 229910004205 SiNX Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910052771 Terbium Inorganic materials 0.000 description 1
- 229910052775 Thulium Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910000416 bismuth oxide Inorganic materials 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 230000037396 body weight Effects 0.000 description 1
- 239000004918 carbon fiber reinforced polymer Substances 0.000 description 1
- 239000004568 cement Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000003745 diagnosis Methods 0.000 description 1
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 229920001249 ethyl cellulose Polymers 0.000 description 1
- 235000019325 ethyl cellulose Nutrition 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000005187 foaming Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000007731 hot pressing Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- 238000007561 laser diffraction method Methods 0.000 description 1
- 238000004020 luminiscence type Methods 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000003020 moisturizing effect Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000002688 persistence Effects 0.000 description 1
- 229920000052 poly(p-xylylene) Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 230000011514 reflex Effects 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 238000000790 scattering method Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- XTQHKBHJIVJGKJ-UHFFFAOYSA-N sulfur monoxide Chemical class S=O XTQHKBHJIVJGKJ-UHFFFAOYSA-N 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 238000007669 thermal treatment Methods 0.000 description 1
- 230000009974 thixotropic effect Effects 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
- G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
- G01T1/16—Measuring radiation intensity
- G01T1/20—Measuring radiation intensity with scintillation detectors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
- G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
- G01T1/16—Measuring radiation intensity
- G01T1/20—Measuring radiation intensity with scintillation detectors
- G01T1/2006—Measuring radiation intensity with scintillation detectors using a combination of a scintillator and photodetector which measures the means radiation intensity
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Physics & Mathematics (AREA)
- High Energy & Nuclear Physics (AREA)
- Molecular Biology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Measurement Of Radiation (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012127535 | 2012-06-04 | ||
| JP2012-127535 | 2012-06-04 | ||
| JP2013-054140 | 2013-03-15 | ||
| JP2013054140A JP6200171B2 (ja) | 2012-06-04 | 2013-03-15 | 放射線検出装置及び撮像システム |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103454668A CN103454668A (zh) | 2013-12-18 |
| CN103454668B true CN103454668B (zh) | 2016-01-20 |
Family
ID=49670254
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310218193.3A Expired - Fee Related CN103454668B (zh) | 2012-06-04 | 2013-06-04 | 放射线检测装置和成像系统 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US9052400B2 (enExample) |
| JP (1) | JP6200171B2 (enExample) |
| CN (1) | CN103454668B (enExample) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6092568B2 (ja) | 2012-10-11 | 2017-03-08 | キヤノン株式会社 | 放射線検出装置及び放射線検出システム |
| JP6100045B2 (ja) | 2013-03-19 | 2017-03-22 | キヤノン株式会社 | 放射線検出装置、放射線検出システム及び放射線検出装置の製造方法 |
| JP6200173B2 (ja) | 2013-03-21 | 2017-09-20 | キヤノン株式会社 | 放射線検出装置及び放射線検出システム |
| JP6226579B2 (ja) * | 2013-06-13 | 2017-11-08 | 東芝電子管デバイス株式会社 | 放射線検出器及びその製造方法 |
| JP6310216B2 (ja) | 2013-09-06 | 2018-04-11 | キヤノン株式会社 | 放射線検出装置及びその製造方法並びに放射線検出システム |
| CN104241436B (zh) * | 2014-06-25 | 2016-05-25 | 京东方科技集团股份有限公司 | 一种x射线探测基板及其制备方法、x射线探测设备 |
| JP2016038324A (ja) * | 2014-08-08 | 2016-03-22 | コニカミノルタ株式会社 | 放射線画像検出器およびその製造方法 |
| JP6576064B2 (ja) * | 2015-03-18 | 2019-09-18 | キヤノン株式会社 | 放射線検出装置、放射線撮像システム及び放射線検出装置の製造方法 |
| JP6575105B2 (ja) * | 2015-03-27 | 2019-09-18 | コニカミノルタ株式会社 | シンチレータパネルおよびその製造方法 |
| JP6487263B2 (ja) * | 2015-04-20 | 2019-03-20 | 浜松ホトニクス株式会社 | 放射線検出器及びその製造方法 |
| JP6590185B2 (ja) * | 2015-04-28 | 2019-10-16 | 国立大学法人徳島大学 | シンチレータ固定化ケイ酸粒子 |
| CN105067518B (zh) * | 2015-09-18 | 2017-11-03 | 吉林大学 | 一种用于片状基材的粘接剂粘接性能测试的方法 |
| EP3226038B1 (en) | 2016-03-28 | 2020-05-06 | Canon Kabushiki Kaisha | Radiation detection apparatus and radiation imaging system |
| JP6763205B2 (ja) * | 2016-06-16 | 2020-09-30 | コニカミノルタ株式会社 | 積層型シンチレータパネル |
| JP2018061753A (ja) * | 2016-10-14 | 2018-04-19 | コニカミノルタ株式会社 | X線タルボ撮影装置用シンチレータパネル、x線タルボ撮影装置用画像検出パネルおよびx線タルボ撮影装置 |
| WO2019012846A1 (ja) | 2017-07-10 | 2019-01-17 | キヤノン株式会社 | 放射線撮像装置および放射線撮像システム |
| JP6882129B2 (ja) | 2017-09-22 | 2021-06-02 | キヤノン株式会社 | 放射線撮像システムおよび放射線撮像システムの制御方法 |
| JP7030478B2 (ja) | 2017-11-09 | 2022-03-07 | キヤノン株式会社 | 撮影台および放射線撮影システム |
| JP7067912B2 (ja) | 2017-12-13 | 2022-05-16 | キヤノン株式会社 | 放射線撮像装置および放射線撮像システム |
| JP7256618B2 (ja) * | 2018-08-29 | 2023-04-12 | タツタ電線株式会社 | 転写フィルム付電磁波シールドフィルム、転写フィルム付電磁波シールドフィルムの製造方法及びシールドプリント配線板の製造方法 |
| JP7278073B2 (ja) | 2018-12-27 | 2023-05-19 | キヤノン株式会社 | 制御装置、表示方法及び放射線撮像装置 |
| US11428824B2 (en) | 2019-04-09 | 2022-08-30 | Ymit Co., Ltd. | Scintillator module, scintillator sensor unit, and manufacturing method |
| JP7308694B2 (ja) | 2019-08-27 | 2023-07-14 | キヤノン株式会社 | 放射線撮像装置の制御装置及び制御方法並びに放射線撮像システム |
| CN116904183A (zh) * | 2020-09-30 | 2023-10-20 | 株式会社博迈立铖 | 闪烁体结构体及其制造方法 |
| JP7619821B2 (ja) | 2021-02-09 | 2025-01-22 | キヤノン株式会社 | 情報処理装置、放射線撮影システム、情報処理方法およびプログラム |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1526361A (zh) * | 2003-03-03 | 2004-09-08 | GEҽҩϵͳ����Ƽ���˾ | 具有整体的气隙的ct检测器 |
| CN101002110A (zh) * | 2004-08-10 | 2007-07-18 | 佳能株式会社 | 放射线探测装置、闪烁体板及其制造方法和放射线探测系统 |
| CN101689556A (zh) * | 2007-05-23 | 2010-03-31 | 特里赛尔公司 | 制造辐射探测器的方法 |
| CN101849197A (zh) * | 2007-11-06 | 2010-09-29 | 皇家飞利浦电子股份有限公司 | 包括光反射材料的射线探测器 |
| US20110133092A1 (en) * | 2009-12-07 | 2011-06-09 | Hansen Marcia K | Digital radiographic detector with bonded phosphor layer |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10268056A (ja) * | 1997-03-27 | 1998-10-09 | Hitachi Medical Corp | 放射線固体検出器及びそれを用いたx線ct装置 |
| JP2001141894A (ja) * | 1999-08-30 | 2001-05-25 | Fuji Photo Film Co Ltd | 画像撮影方法および画像撮影装置 |
| EP1258738B1 (en) * | 2000-01-13 | 2011-08-03 | Hamamatsu Photonics K.K. | Radiation image sensor and scintillator panel |
| JP2002286846A (ja) * | 2001-03-27 | 2002-10-03 | Canon Inc | 放射線検出装置及びそれを用いた放射線撮像システム |
| JP2004239722A (ja) * | 2003-02-05 | 2004-08-26 | Toshiba Corp | 放射線検出器 |
| JP2005049337A (ja) * | 2003-06-30 | 2005-02-24 | Agfa Gevaert Nv | 直接x線検出のための希土類活性化希土類活性化オキシサルファイド燐光体 |
| JP4594188B2 (ja) | 2004-08-10 | 2010-12-08 | キヤノン株式会社 | 放射線検出装置及び放射線検出システム |
| JP2007246873A (ja) * | 2006-02-15 | 2007-09-27 | Mitsubishi Chemicals Corp | 蛍光体薄膜及びその製造方法、蛍光積層体、並びに発光装置 |
| JP5195424B2 (ja) * | 2006-06-28 | 2013-05-08 | コニカミノルタエムジー株式会社 | シンチレータパネル |
| JP5201857B2 (ja) * | 2007-03-16 | 2013-06-05 | 東レ株式会社 | X線診断装置用天板 |
| JP5004848B2 (ja) | 2007-04-18 | 2012-08-22 | キヤノン株式会社 | 放射線検出装置及び放射線検出システム |
| JP5022805B2 (ja) * | 2007-07-26 | 2012-09-12 | 東芝電子管デバイス株式会社 | 放射線検出器 |
| JP2010014666A (ja) * | 2008-07-07 | 2010-01-21 | Fujifilm Corp | 放射線像変換パネル |
| JP2010025620A (ja) * | 2008-07-16 | 2010-02-04 | Konica Minolta Medical & Graphic Inc | 放射線画像変換パネルとその製造方法 |
| US8399842B2 (en) * | 2009-12-07 | 2013-03-19 | Carestream Health, Inc. | Digital radiographic detector with bonded phosphor layer |
| JP5791281B2 (ja) * | 2010-02-18 | 2015-10-07 | キヤノン株式会社 | 放射線検出装置及び放射線検出システム |
| JP2012083186A (ja) * | 2010-10-12 | 2012-04-26 | Konica Minolta Medical & Graphic Inc | シンチレータパネル、及びそれを用いた放射線像検出装置 |
| US9625586B2 (en) * | 2011-03-31 | 2017-04-18 | Japan Atomic Energy Agency | Scintillator plate, radiation measuring apparatus, radiation imaging apparatus, and scintillator plate manufacturing method |
-
2013
- 2013-03-15 JP JP2013054140A patent/JP6200171B2/ja not_active Expired - Fee Related
- 2013-05-28 US US13/903,181 patent/US9052400B2/en not_active Expired - Fee Related
- 2013-06-04 CN CN201310218193.3A patent/CN103454668B/zh not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1526361A (zh) * | 2003-03-03 | 2004-09-08 | GEҽҩϵͳ����Ƽ���˾ | 具有整体的气隙的ct检测器 |
| CN101002110A (zh) * | 2004-08-10 | 2007-07-18 | 佳能株式会社 | 放射线探测装置、闪烁体板及其制造方法和放射线探测系统 |
| CN101689556A (zh) * | 2007-05-23 | 2010-03-31 | 特里赛尔公司 | 制造辐射探测器的方法 |
| CN101849197A (zh) * | 2007-11-06 | 2010-09-29 | 皇家飞利浦电子股份有限公司 | 包括光反射材料的射线探测器 |
| US20110133092A1 (en) * | 2009-12-07 | 2011-06-09 | Hansen Marcia K | Digital radiographic detector with bonded phosphor layer |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2014013230A (ja) | 2014-01-23 |
| US20130322598A1 (en) | 2013-12-05 |
| CN103454668A (zh) | 2013-12-18 |
| US9052400B2 (en) | 2015-06-09 |
| JP6200171B2 (ja) | 2017-09-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103454668B (zh) | 放射线检测装置和成像系统 | |
| CN112904614B (zh) | 一种显示模组及其制备方法、显示装置 | |
| EP3909041B1 (en) | Display device including radiant heat blocking layer | |
| CN103728650B (zh) | 放射线检测装置和放射线检测系统 | |
| US20080213508A1 (en) | Color purity improving sheet, optical apparatus, image display, and liquid crystal display | |
| WO2019035629A1 (ko) | 지문인식센서가 결합된 디스플레이 장치 | |
| CN106647013A (zh) | 显示基板及其制作方法、显示面板及显示装置 | |
| CN101893717A (zh) | 闪烁体面板以及闪烁体组合板 | |
| US20140063372A1 (en) | Touch panel, touch screen structure thereof, and touch display device thereof | |
| CN112785930B (zh) | 双面粘合片和图像显示装置 | |
| US10107922B2 (en) | Scintillation detector and method for forming a structured scintillator | |
| TWI795656B (zh) | 防漏光的觸控顯示裝置 | |
| TWI588790B (zh) | 顯示裝置及其製作方法 | |
| WO2016167334A1 (ja) | 放射線像変換スクリーン、フラットパネルディテクタ、放射線検出装置、及びシンチレータ | |
| JP2014122820A (ja) | シンチレータ、放射線検出装置および放射線検出システム | |
| CN110174970B (zh) | 一种图案化电路及其制备方法、触控传感器 | |
| JP6488575B2 (ja) | 近赤外線吸収構造体 | |
| CN106647051A (zh) | 隔垫物、其制备方法及封框胶和显示装置 | |
| KR20170072483A (ko) | 디스플레이 장치 | |
| CN218122282U (zh) | 一种防窥膜 | |
| JP2024051180A (ja) | 放射線撮像パネル、放射線撮像装置、放射線撮像システム、放射線撮像パネルの製造方法、および、シンチレータプレート | |
| JP2003215253A (ja) | 放射線検出装置とその製造方法および放射線検出システム | |
| JP7503969B2 (ja) | 放射線撮像パネル、放射線撮像装置、放射線撮像システム、および、シンチレータプレート | |
| CN102520435A (zh) | 闪烁体组合板 | |
| JP2002228757A (ja) | 放射線検出装置及びそれに用いる波長変換体 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20160120 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |