CN102754028B - 感光性树脂组合物、结构体的生产方法和液体排出头 - Google Patents

感光性树脂组合物、结构体的生产方法和液体排出头 Download PDF

Info

Publication number
CN102754028B
CN102754028B CN201180008124.9A CN201180008124A CN102754028B CN 102754028 B CN102754028 B CN 102754028B CN 201180008124 A CN201180008124 A CN 201180008124A CN 102754028 B CN102754028 B CN 102754028B
Authority
CN
China
Prior art keywords
atoms
component
photosensitive polymer
polymer combination
carbon atom
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201180008124.9A
Other languages
English (en)
Chinese (zh)
Other versions
CN102754028A (zh
Inventor
高桥表
池龟健
下村雅子
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of CN102754028A publication Critical patent/CN102754028A/zh
Application granted granted Critical
Publication of CN102754028B publication Critical patent/CN102754028B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1601—Production of bubble jet print heads
    • B41J2/1603—Production of bubble jet print heads of the front shooter type
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1621—Manufacturing processes
    • B41J2/1637—Manufacturing processes molding
    • B41J2/1639—Manufacturing processes molding sacrificial molding
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B69/00—Dyes not provided for by a single group of this subclass
    • C09B69/001—Dyes containing an onium group attached to the dye skeleton via a bridge
    • C09B69/004—Sulfonium group
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B69/00—Dyes not provided for by a single group of this subclass
    • C09B69/10—Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds
    • C09B69/109—Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds containing other specific dyes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Micromachines (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
CN201180008124.9A 2010-02-05 2011-02-01 感光性树脂组合物、结构体的生产方法和液体排出头 Active CN102754028B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2010024681 2010-02-05
JP2010-024681 2010-02-05
PCT/JP2011/000549 WO2011096195A1 (en) 2010-02-05 2011-02-01 Photosensitive resin composition, method for producing structure, and liquid discharge head

Publications (2)

Publication Number Publication Date
CN102754028A CN102754028A (zh) 2012-10-24
CN102754028B true CN102754028B (zh) 2015-06-03

Family

ID=44355213

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201180008124.9A Active CN102754028B (zh) 2010-02-05 2011-02-01 感光性树脂组合物、结构体的生产方法和液体排出头

Country Status (6)

Country Link
US (1) US8980968B2 (enExample)
EP (2) EP2531890B1 (enExample)
JP (1) JP5822477B2 (enExample)
CN (1) CN102754028B (enExample)
RU (1) RU2526258C2 (enExample)
WO (1) WO2011096195A1 (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5787720B2 (ja) * 2010-12-16 2015-09-30 キヤノン株式会社 感光性ネガ型樹脂組成物
JP6120574B2 (ja) * 2012-01-31 2017-04-26 キヤノン株式会社 感光性ネガ型樹脂組成物、微細構造体、微細構造体の製造方法及び液体吐出ヘッド
JP5739497B2 (ja) * 2012-09-15 2015-06-24 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ 酸発生剤化合物およびそれを含むフォトレジスト
JP6071718B2 (ja) 2013-04-10 2017-02-01 キヤノン株式会社 感光性ネガ型樹脂組成物
JP6278367B2 (ja) * 2014-05-13 2018-02-14 東洋合成工業株式会社 オニウム塩、光酸発生剤、感光性樹脂組成物及びデバイスの製造方法
KR102272225B1 (ko) * 2016-06-09 2021-07-01 산아프로 가부시키가이샤 술포늄염, 광산 발생제, 경화성 조성물 및 레지스트 조성물
US9938136B2 (en) * 2016-08-18 2018-04-10 Stmicroelectronics Asia Pacific Pte Ltd Fluid ejection device
US20190056659A1 (en) * 2017-08-21 2019-02-21 Funai Electric Co., Ltd. Method for manufacturing mems devices using multiple photoacid generators in a composite photoimageable dry film
JP7413039B2 (ja) * 2020-01-22 2024-01-15 キヤノン株式会社 液体吐出ヘッド及び液体吐出ヘッドの製造方法
JP2021151992A (ja) * 2020-03-23 2021-09-30 住友化学株式会社 カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP2021175721A (ja) * 2020-04-22 2021-11-04 住友化学株式会社 カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP2023069242A (ja) * 2021-11-05 2023-05-18 東京応化工業株式会社 レジスト組成物及びレジストパターン形成方法
JP7777969B2 (ja) * 2021-12-02 2025-12-01 東京応化工業株式会社 感光性組成物、積層体の製造方法、硬化パターン形成方法及び積層体

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1195356A (zh) * 1996-06-12 1998-10-07 日本化药株式会社 光聚合引发剂和包含它的可能量射线固化的组合物
CN1637052A (zh) * 2003-11-04 2005-07-13 国家淀粉及化学投资控股公司 铳盐光敏引发剂及其用途
US20080292993A1 (en) * 2006-12-22 2008-11-27 Canon Kabushiki Kaisha Photo-cationic polymerizable epoxy resin composition, liquid discharge head, and manufacturing method thereof
CN101334588A (zh) * 2007-06-27 2008-12-31 住友化学株式会社 化学放大型正性抗蚀剂组合物
JP2009269849A (ja) * 2008-05-06 2009-11-19 San Apro Kk スルホニウム塩、光酸発生剤、光硬化性組成物及びこの硬化体

Family Cites Families (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1526923A (en) 1974-09-18 1978-10-04 Ici Ltd Photopolymerisable compositions
IE42085B1 (en) 1974-09-18 1980-06-04 Ici Ltd Photopolymerisable compositions
JPH0412859A (ja) 1990-04-28 1992-01-17 Canon Inc 液体噴射方法、該方法を用いた記録ヘッド及び該方法を用いた記録装置
ES2073614T3 (es) 1990-04-27 1995-08-16 Canon Kk Metodo y aparato de impresion.
US5639802A (en) * 1991-05-20 1997-06-17 Spectra Group Limited, Inc. Cationic polymerization
JPH07145346A (ja) 1993-11-22 1995-06-06 Dainippon Ink & Chem Inc ソルダーレジストインキ用樹脂組成物
JPH08157510A (ja) 1994-12-09 1996-06-18 Nippon Kayaku Co Ltd 光重合開始剤、これを含有するエネルギー線硬化性組成物及びその硬化物
JPH0925393A (ja) 1995-05-09 1997-01-28 Toray Ind Inc 繊維強化複合材料用エポキシ樹脂組成物、プリプレグおよび繊維強化複合材料
JPH0912615A (ja) 1995-06-29 1997-01-14 Nippon Kayaku Co Ltd エネルギー線硬化性組成物及びその硬化物
JPH107680A (ja) * 1996-06-18 1998-01-13 Nippon Kayaku Co Ltd 光重合開始剤、これを含有するエネルギー線硬化性組成物及びその硬化物
JPH10152554A (ja) 1996-11-21 1998-06-09 Nippon Kayaku Co Ltd エネルギー線硬化性組成物及びその硬化物
JPH10212286A (ja) * 1997-01-30 1998-08-11 Nippon Kayaku Co Ltd 光重合開始剤、これを含有するエネルギー線硬化性組成物及びその硬化物
JPH11322900A (ja) 1998-03-19 1999-11-26 Nippon Soda Co Ltd 光硬化性組成物および硬化方法
JP4385437B2 (ja) 1999-05-10 2009-12-16 Ｊｓｒ株式会社 カラーフィルタ用感放射線性組成物およびそれを用いたカラーフィルタ
EP1295180B1 (en) 2000-06-15 2013-05-22 3M Innovative Properties Company Process for producing microfluidic articles
JP3978601B2 (ja) * 2001-09-27 2007-09-19 信越化学工業株式会社 化学増幅レジスト材料及びパターン形成方法
JP3880912B2 (ja) 2002-10-10 2007-02-14 ジャパンエポキシレジン株式会社 半導体封止用エポキシ樹脂組成物
JP4593309B2 (ja) 2005-01-21 2010-12-08 東京応化工業株式会社 精密微細空間の天板部形成方法
JP2006241384A (ja) 2005-03-07 2006-09-14 Fuji Photo Film Co Ltd インク組成物、インクジェット記録方法、印刷物、平版印刷版及びその製造方法
JP2007034153A (ja) 2005-07-29 2007-02-08 Toyo Ink Mfg Co Ltd 感エネルギー線重合性組成物およびそれを用いたネガ型レジストおよびそれを用いた画像パターン形成方法。
JP4355725B2 (ja) 2006-12-25 2009-11-04 信越化学工業株式会社 ポジ型レジスト材料及びパターン形成方法
JP4564977B2 (ja) 2007-04-05 2010-10-20 東京応化工業株式会社 感光性樹脂組成物、レジストパターンの製造方法、積層体、及びデバイス
JP2008292993A (ja) 2007-04-24 2008-12-04 Ricoh Co Ltd 画像形成装置
JP5039442B2 (ja) 2007-06-15 2012-10-03 東京応化工業株式会社 感光性樹脂組成物、感光性樹脂積層体、及びパターン形成方法
JP2010276623A (ja) 2008-03-26 2010-12-09 Panasonic Electric Works Co Ltd 立体基板上に透明樹脂構造体を形成させる方法
JP2009244779A (ja) 2008-03-31 2009-10-22 Fujifilm Corp ネガ型レジスト組成物及びパターン形成方法
JP2009258506A (ja) 2008-04-18 2009-11-05 Fujifilm Corp ネガ型レジスト組成物およびレジストパターン形成方法
JP5247396B2 (ja) 2008-07-02 2013-07-24 日本化薬株式会社 Ｍｅｍｓ用感光性樹脂組成物及びその硬化物
KR101486692B1 (ko) 2009-06-08 2015-01-29 산요가세이고교 가부시키가이샤 감광성 조성물

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1195356A (zh) * 1996-06-12 1998-10-07 日本化药株式会社 光聚合引发剂和包含它的可能量射线固化的组合物
CN1637052A (zh) * 2003-11-04 2005-07-13 国家淀粉及化学投资控股公司 铳盐光敏引发剂及其用途
US20080292993A1 (en) * 2006-12-22 2008-11-27 Canon Kabushiki Kaisha Photo-cationic polymerizable epoxy resin composition, liquid discharge head, and manufacturing method thereof
CN101334588A (zh) * 2007-06-27 2008-12-31 住友化学株式会社 化学放大型正性抗蚀剂组合物
JP2009269849A (ja) * 2008-05-06 2009-11-19 San Apro Kk スルホニウム塩、光酸発生剤、光硬化性組成物及びこの硬化体

Also Published As

Publication number Publication date
EP2531890A1 (en) 2012-12-12
EP2531890A4 (en) 2013-11-06
EP3064996B1 (en) 2020-07-22
CN102754028A (zh) 2012-10-24
RU2526258C2 (ru) 2014-08-20
WO2011096195A1 (en) 2011-08-11
JP2011180586A (ja) 2011-09-15
EP3064996A1 (en) 2016-09-07
US8980968B2 (en) 2015-03-17
RU2012137721A (ru) 2014-03-10
EP2531890B1 (en) 2019-08-28
US20120292412A1 (en) 2012-11-22
JP5822477B2 (ja) 2015-11-24

Similar Documents

Publication Publication Date Title
CN102754028B (zh) 感光性树脂组合物、结构体的生产方法和液体排出头
JP5159823B2 (ja) 構造体の製造方法および液体吐出ヘッドの製造方法
JP6193715B2 (ja) 液体吐出ヘッド
JP6120574B2 (ja) 感光性ネガ型樹脂組成物、微細構造体、微細構造体の製造方法及び液体吐出ヘッド
CN102741749B (zh) 负型感光性树脂组合物、图案形成方法和液体排出头
CN102754029B (zh) 感光性树脂组合物、结构体的制造方法和液体排出头
EP2628050B1 (en) Photosensitive negative resin composition
EP1839089A1 (en) Photosensitive laminate film for forming top plate portion of precision fine space and method of forming precision fine space
TWI310483B (en) Photosensitive resin composition, ink jet head using photosensitive resin composition, and process for manufacturing ink jet head
JP6071718B2 (ja) 感光性ネガ型樹脂組成物
KR100881245B1 (ko) 양이온 광중합성 에폭시 수지 조성물, 이것을 사용한 미세구조체, 및 미세 구조체의 제조 방법
JP5361498B2 (ja) インクジェットヘッドの製造方法およびインクジェットヘッド
JP7071179B2 (ja) 液体吐出ヘッドの製造方法
JP2018083143A (ja) 液体吐出ヘッドの製造方法、液体吐出ヘッド、印字装置および印字方法
JP2010000667A (ja) 液体吐出ヘッドの製造方法
JP2007196436A (ja) インクジェット記録ヘッド

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant