CN102754026B - 具有酯基书写单体的光聚合物制剂 - Google Patents
具有酯基书写单体的光聚合物制剂 Download PDFInfo
- Publication number
- CN102754026B CN102754026B CN201180008165.8A CN201180008165A CN102754026B CN 102754026 B CN102754026 B CN 102754026B CN 201180008165 A CN201180008165 A CN 201180008165A CN 102754026 B CN102754026 B CN 102754026B
- Authority
- CN
- China
- Prior art keywords
- photopolymer
- residue
- acrylate
- hologram
- preparation according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/2403—Layers; Shape, structure or physical properties thereof
- G11B7/24035—Recording layers
- G11B7/24044—Recording layers for storing optical interference patterns, e.g. holograms; for storing data in three dimensions, e.g. volume storage
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
- G11B7/245—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing a polymeric component
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H2001/026—Recording materials or recording processes
- G03H2001/0264—Organic recording material
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/004—Recording, reproducing or erasing methods; Read, write or erase circuits therefor
- G11B7/0065—Recording, reproducing or erasing by using optical interference patterns, e.g. holograms
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Holo Graphy (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Polymerisation Methods In General (AREA)
- Polyurethanes Or Polyureas (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP10001010.7 | 2010-02-02 | ||
| EP10001010 | 2010-02-02 | ||
| PCT/EP2011/051247 WO2011095442A1 (de) | 2010-02-02 | 2011-01-28 | Photopolymer-formulierung mit ester-basierten schreibmonomeren |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102754026A CN102754026A (zh) | 2012-10-24 |
| CN102754026B true CN102754026B (zh) | 2015-10-07 |
Family
ID=42289536
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201180008165.8A Expired - Fee Related CN102754026B (zh) | 2010-02-02 | 2011-01-28 | 具有酯基书写单体的光聚合物制剂 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US9057950B2 (enExample) |
| EP (1) | EP2531889B1 (enExample) |
| JP (1) | JP5792746B2 (enExample) |
| KR (1) | KR101804591B1 (enExample) |
| CN (1) | CN102754026B (enExample) |
| WO (1) | WO2011095442A1 (enExample) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20120237856A1 (en) * | 2009-11-03 | 2012-09-20 | Bayer Intellectual Property Gmbh | Selection method for additives in photopolymers |
| TWI489209B (zh) * | 2009-11-03 | 2015-06-21 | Bayer Materialscience Ag | 在光聚合物配製物中作為添加劑的胺甲酸乙酯 |
| EP2497082B1 (de) * | 2009-11-03 | 2013-09-04 | Bayer Intellectual Property GmbH | Fluorurethane als additive in einer photopolymer-formulierung |
| PT2497085E (pt) * | 2009-11-03 | 2014-03-27 | Bayer Ip Gmbh | Processo para a produção de um filme holográfico |
| TWI489204B (zh) * | 2009-11-03 | 2015-06-21 | Bayer Materialscience Ag | 製造全像媒體之方法 |
| ATE548730T1 (de) * | 2009-11-03 | 2012-03-15 | Bayer Materialscience Ag | Photopolymerformulierungen mit einstellbarem mechanischem modul guv |
| CN102741925B (zh) * | 2009-11-03 | 2015-12-16 | 拜尔材料科学股份公司 | 生产全息膜的方法 |
| JP5638085B2 (ja) * | 2009-11-03 | 2014-12-10 | バイエル・マテリアルサイエンス・アクチェンゲゼルシャフトBayer MaterialScience AG | 異なった書込コモノマーを含有する感光性ポリマー組成物 |
| BR112012019378A2 (pt) * | 2010-02-02 | 2016-05-03 | Bayer Ip Gmbh | formulação de fotopolímero apresentando monômeros graváveis à base de triazina |
| JP2017504827A (ja) * | 2013-12-20 | 2017-02-09 | コベストロ、ドイチュラント、アクチエンゲゼルシャフトCovestro Deutschland Ag | 改善された光感受性を備えるホログラフィック媒体 |
| CN106232651B (zh) * | 2014-04-25 | 2019-08-13 | 科思创德国股份有限公司 | 作为全息光聚合物组合物中的书写单体的芳族二醇醚 |
| JP6722672B2 (ja) * | 2014-12-19 | 2020-07-15 | コベストロ、ドイチュラント、アクチエンゲゼルシャフトCovestro Deutschland Ag | 水分に安定なホログラフィック媒体 |
| US10073416B2 (en) | 2015-04-24 | 2018-09-11 | Lg Display Co., Ltd. | Method for producing a holographic optical element |
| KR101976116B1 (ko) * | 2017-07-17 | 2019-05-07 | 주식회사 엘지화학 | 포토폴리머 조성물 |
| KR102156872B1 (ko) * | 2017-09-27 | 2020-09-16 | 주식회사 엘지화학 | 포토폴리머 조성물 |
| CN112759701B (zh) * | 2019-10-21 | 2022-12-30 | 杭州光粒科技有限公司 | 光致聚合物组合物、反射式衍射光栅及其制备方法 |
| CN113527143B (zh) * | 2020-04-20 | 2023-06-20 | 杭州光粒科技有限公司 | 书写单体及其制备方法以及光致聚合物组合物及其光栅 |
| DE102021108433A1 (de) | 2021-04-01 | 2022-10-06 | Bundesdruckerei Gmbh | Verfahren und Vorrichtung zum Herstellen eines Hologramms für ein Sicherheitselement sowie Verfahren zum Herstellen eines Wert- oder Sicherheitsdokuments |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4339527A (en) * | 1979-01-31 | 1982-07-13 | E. I. Du Pont De Nemours And Company | Process for using photopolymerizable compositions |
| US20050031986A1 (en) * | 2003-07-28 | 2005-02-10 | Fuji Photo Film Co., Ltd. | Radical polymerizable composition and lithographic printing plate precursor using the same |
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| GB1429649A (en) | 1972-06-22 | 1976-03-24 | Agfagevaert | Unsaturated carboxylic esters of hydroxyalkyl carbamates addition polymers derived thereform and photographic silver halide materials containing said polymers |
| US3832176A (en) | 1973-04-06 | 1974-08-27 | Eastman Kodak Co | Novel photoresist article and process for its use |
| US4230790A (en) * | 1979-01-31 | 1980-10-28 | E. I. Du Pont De Nemours And Company | Photopolymerizable compositions useful in dry film photoresist |
| JPS5986616A (ja) | 1982-11-11 | 1984-05-18 | Showa Denko Kk | 高屈折率樹脂の製造方法 |
| CH663224A5 (de) | 1984-06-22 | 1987-11-30 | Heberlein Hispano Sa | Drallgeber fuer ein laufendes faseraggregat. |
| JPS61127713A (ja) * | 1984-11-26 | 1986-06-16 | Mitsubishi Rayon Co Ltd | 高屈折率プラスチツクレンズ材料の製造方法 |
| DE3677527D1 (de) | 1985-11-20 | 1991-03-21 | Mead Corp | Ionische farbstoffe als initiatoren enthaltende fotosensitive materialien. |
| JPS63251408A (ja) * | 1987-04-07 | 1988-10-18 | Nippon Shokubai Kagaku Kogyo Co Ltd | 高屈折率樹脂 |
| US4902605A (en) * | 1987-07-24 | 1990-02-20 | Eastman Kodak Company | Photoresist composition comprising cyclohexyleneoxyalkyl acrylates |
| US6479193B1 (en) * | 1992-06-30 | 2002-11-12 | Nippon Sheet Glass Co., Ltd. | Optical recording film and process for production thereof |
| GB9410578D0 (en) * | 1994-05-26 | 1994-07-13 | London Hospital Med Coll | Novel (meth)acrylate monomers and denture base compositions prepared therefrom |
| US5679710A (en) * | 1994-11-01 | 1997-10-21 | London Hospital Medical College | High refractive index and/or radio-opaque resins systems |
| KR100385910B1 (ko) * | 1995-12-30 | 2003-08-21 | 고려화학 주식회사 | 우레탄 아크릴레이트 올리고머를 함유한 광경화형도막조성물 |
| US5747629A (en) * | 1996-12-16 | 1998-05-05 | Bayer Corporation | Low surface energy polyisocyanates and their use in one-or two-component coating compositions |
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| US6403702B1 (en) * | 1999-12-03 | 2002-06-11 | Bayer Corporation | Diurethane plasticizer containing one-shot polyurethane cast elastomers |
| US20030044690A1 (en) | 2001-06-27 | 2003-03-06 | Imation Corp. | Holographic photopolymer data recording media, method of manufacture and method of holographically reading, recording and storing data |
| US6765061B2 (en) * | 2001-09-13 | 2004-07-20 | Inphase Technologies, Inc. | Environmentally durable, self-sealing optical articles |
| JP4441352B2 (ja) * | 2003-07-28 | 2010-03-31 | 富士フイルム株式会社 | 重合性組成物及びそれを用いた平版印刷版原版 |
| JP2006045278A (ja) * | 2004-08-02 | 2006-02-16 | Toyo Ink Mfg Co Ltd | 感光性組成物及び該感光性組成物を用いてなる積層体 |
| JP4248020B2 (ja) * | 2005-04-08 | 2009-04-02 | 日東電工株式会社 | ホログラム記録材料 |
| JP2007058095A (ja) | 2005-08-26 | 2007-03-08 | Fujifilm Corp | ホログラム記録方法、ホログラム記録材料、光記録媒体、光記録媒体への記録方法、3dディスプレイホログラム、及び3dディスプレイホログラムの製造方法 |
| JP2007264373A (ja) * | 2006-03-29 | 2007-10-11 | Toppan Printing Co Ltd | インモールド成形容器用ラベルおよびインモールド成形容器 |
| PL2004703T3 (pl) * | 2006-04-19 | 2011-04-29 | Stepan Co | Kompozycje utwardzalne przez napromienianie do ulepszania odporności na wpływy atmosferyczne |
| WO2007124459A2 (en) * | 2006-04-20 | 2007-11-01 | Inphase Technologies, Inc. | Index-contrasting-photoactive polymerizable materials, and articles and methods using same |
| US7771587B2 (en) | 2006-04-27 | 2010-08-10 | Anna Madeleine Leone | Method for removing nitrogen compounds from gasoline or diesel fuel using molecularly imprinted polymers |
| EP2137732B1 (en) * | 2007-04-11 | 2012-07-25 | Bayer MaterialScience AG | Advantageous recording media for holographic applications |
| ATE501193T1 (de) * | 2007-04-11 | 2011-03-15 | Bayer Materialscience Ag | Strahlungsvernetzende und wärmevernetzende pu- systeme auf der basis von isocyanat-reaktiven blockcopolymeren |
| RU2009141367A (ru) * | 2007-04-11 | 2011-05-20 | Байер МатириальСайенс АГ (DE) | Ароматические уретанакрилаты, имеющие высокий показатель преломления |
| JP4879157B2 (ja) * | 2007-12-27 | 2012-02-22 | 富士フイルム株式会社 | ホログラフィック記録用化合物、ホログラフィック記録用組成物、およびホログラフィック記録媒体 |
| WO2010011899A1 (en) * | 2008-07-24 | 2010-01-28 | Inphase Technologies, Inc. | Holographic storage medium and method for gated diffusion of photoactive monomer |
| DE502008002161D1 (de) * | 2008-08-08 | 2011-02-10 | Bayer Materialscience Ag | Phenylisocyanat-basierte Urethanacrylate mit hohem Brechungsindex |
| PT2497085E (pt) * | 2009-11-03 | 2014-03-27 | Bayer Ip Gmbh | Processo para a produção de um filme holográfico |
| US20120237856A1 (en) * | 2009-11-03 | 2012-09-20 | Bayer Intellectual Property Gmbh | Selection method for additives in photopolymers |
| EP2496549B1 (de) * | 2009-11-03 | 2014-10-08 | Bayer Intellectual Property GmbH | Neue, nicht kristallisierende methacrylate, deren herstellung und verwendung |
| JP5638085B2 (ja) * | 2009-11-03 | 2014-12-10 | バイエル・マテリアルサイエンス・アクチェンゲゼルシャフトBayer MaterialScience AG | 異なった書込コモノマーを含有する感光性ポリマー組成物 |
| CN102741925B (zh) * | 2009-11-03 | 2015-12-16 | 拜尔材料科学股份公司 | 生产全息膜的方法 |
| ATE548730T1 (de) * | 2009-11-03 | 2012-03-15 | Bayer Materialscience Ag | Photopolymerformulierungen mit einstellbarem mechanischem modul guv |
| TWI489204B (zh) * | 2009-11-03 | 2015-06-21 | Bayer Materialscience Ag | 製造全像媒體之方法 |
| BR112012019378A2 (pt) * | 2010-02-02 | 2016-05-03 | Bayer Ip Gmbh | formulação de fotopolímero apresentando monômeros graváveis à base de triazina |
| EP2372454A1 (de) * | 2010-03-29 | 2011-10-05 | Bayer MaterialScience AG | Photopolymer-Formulierung zur Herstellung sichtbarer Hologramme |
| EP2450387A1 (de) * | 2010-11-08 | 2012-05-09 | Bayer MaterialScience AG | Photopolymer-Formulierung für die Herstellung holographischer Medien |
| EP2450893A1 (de) * | 2010-11-08 | 2012-05-09 | Bayer MaterialScience AG | Photopolymer-Formulierung zur Herstellung holographischer Medien mit hoch vernetzten Matrixpolymeren |
| US20140302425A1 (en) * | 2012-04-30 | 2014-10-09 | Bayer Intellectual Property Gmbh | Method for producing holographic media |
-
2011
- 2011-01-28 JP JP2012551584A patent/JP5792746B2/ja not_active Expired - Fee Related
- 2011-01-28 US US13/576,723 patent/US9057950B2/en not_active Expired - Fee Related
- 2011-01-28 KR KR1020127020244A patent/KR101804591B1/ko not_active Expired - Fee Related
- 2011-01-28 CN CN201180008165.8A patent/CN102754026B/zh not_active Expired - Fee Related
- 2011-01-28 WO PCT/EP2011/051247 patent/WO2011095442A1/de not_active Ceased
- 2011-01-28 EP EP11701280.7A patent/EP2531889B1/de active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4339527A (en) * | 1979-01-31 | 1982-07-13 | E. I. Du Pont De Nemours And Company | Process for using photopolymerizable compositions |
| US20050031986A1 (en) * | 2003-07-28 | 2005-02-10 | Fuji Photo Film Co., Ltd. | Radical polymerizable composition and lithographic printing plate precursor using the same |
Also Published As
| Publication number | Publication date |
|---|---|
| EP2531889B1 (de) | 2020-06-03 |
| US20120302659A1 (en) | 2012-11-29 |
| US9057950B2 (en) | 2015-06-16 |
| KR101804591B1 (ko) | 2017-12-04 |
| CN102754026A (zh) | 2012-10-24 |
| RU2568189C2 (ru) | 2015-11-10 |
| KR20120124430A (ko) | 2012-11-13 |
| JP5792746B2 (ja) | 2015-10-14 |
| JP2013518952A (ja) | 2013-05-23 |
| RU2012137135A (ru) | 2014-03-10 |
| EP2531889A1 (de) | 2012-12-12 |
| WO2011095442A1 (de) | 2011-08-11 |
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