KR101804591B1 - 에스테르-기재 기록 단량체를 갖는 광중합체 배합물 - Google Patents
에스테르-기재 기록 단량체를 갖는 광중합체 배합물 Download PDFInfo
- Publication number
- KR101804591B1 KR101804591B1 KR1020127020244A KR20127020244A KR101804591B1 KR 101804591 B1 KR101804591 B1 KR 101804591B1 KR 1020127020244 A KR1020127020244 A KR 1020127020244A KR 20127020244 A KR20127020244 A KR 20127020244A KR 101804591 B1 KR101804591 B1 KR 101804591B1
- Authority
- KR
- South Korea
- Prior art keywords
- acrylate
- formula
- hologram
- photopolymer
- radicals
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/2403—Layers; Shape, structure or physical properties thereof
- G11B7/24035—Recording layers
- G11B7/24044—Recording layers for storing optical interference patterns, e.g. holograms; for storing data in three dimensions, e.g. volume storage
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
- G11B7/245—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing a polymeric component
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H2001/026—Recording materials or recording processes
- G03H2001/0264—Organic recording material
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/004—Recording, reproducing or erasing methods; Read, write or erase circuits therefor
- G11B7/0065—Recording, reproducing or erasing by using optical interference patterns, e.g. holograms
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Holo Graphy (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Polyurethanes Or Polyureas (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP10001010.7 | 2010-02-02 | ||
| EP10001010 | 2010-02-02 | ||
| PCT/EP2011/051247 WO2011095442A1 (de) | 2010-02-02 | 2011-01-28 | Photopolymer-formulierung mit ester-basierten schreibmonomeren |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20120124430A KR20120124430A (ko) | 2012-11-13 |
| KR101804591B1 true KR101804591B1 (ko) | 2017-12-04 |
Family
ID=42289536
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020127020244A Expired - Fee Related KR101804591B1 (ko) | 2010-02-02 | 2011-01-28 | 에스테르-기재 기록 단량체를 갖는 광중합체 배합물 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US9057950B2 (enExample) |
| EP (1) | EP2531889B1 (enExample) |
| JP (1) | JP5792746B2 (enExample) |
| KR (1) | KR101804591B1 (enExample) |
| CN (1) | CN102754026B (enExample) |
| WO (1) | WO2011095442A1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20190036473A (ko) * | 2017-09-27 | 2019-04-04 | 주식회사 엘지화학 | 포토폴리머 조성물 |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW201133264A (en) * | 2009-11-03 | 2011-10-01 | Bayer Materialscience Ag | Method for selecting additives in photopolymers |
| CN102741925B (zh) * | 2009-11-03 | 2015-12-16 | 拜尔材料科学股份公司 | 生产全息膜的方法 |
| RU2542984C2 (ru) * | 2009-11-03 | 2015-02-27 | Байер Матириальсайенс Аг | Способ изготовления голографической пленки |
| WO2011054799A2 (de) * | 2009-11-03 | 2011-05-12 | Bayer Materialscience Ag | Urethane als additive in einer photopolymer-formulierung |
| RU2542981C9 (ru) * | 2009-11-03 | 2015-12-10 | Байер Матириальсайенс Аг | Способ изготовления голографических сред |
| TWI489205B (zh) * | 2009-11-03 | 2015-06-21 | Bayer Materialscience Ag | 包含不同寫入共聚單體之光聚合物調配物 |
| ES2381808T3 (es) * | 2009-11-03 | 2012-05-31 | Bayer Materialscience Ag | Formulaciones de fotopolímeros con módulo mecánico ajustable Guv |
| JP2013510203A (ja) * | 2009-11-03 | 2013-03-21 | バイエル・マテリアルサイエンス・アクチェンゲゼルシャフト | 感光性ポリマー組成物における添加剤としてのフルオロウレタン |
| RU2012137134A (ru) * | 2010-02-02 | 2014-03-10 | Байер Интеллектуэль Проперти Гмбх | Фотополимерная композиция с записывающими мономерами на основе триазина |
| US9804490B2 (en) | 2013-12-20 | 2017-10-31 | Covestro Deutschland Ag | Holographic media with improved light sensitivity |
| JP6586106B2 (ja) * | 2014-04-25 | 2019-10-02 | コベストロ、ドイチュラント、アクチエンゲゼルシャフトCovestro Deutschland Ag | ホログラフィックフォトポリマー配合物における書込モノマーとしての芳香族グリコールエーテル |
| CN107223121B (zh) * | 2014-12-19 | 2020-10-27 | 科思创德国股份有限公司 | 湿稳定的全息介质 |
| US10073416B2 (en) * | 2015-04-24 | 2018-09-11 | Lg Display Co., Ltd. | Method for producing a holographic optical element |
| KR101976116B1 (ko) * | 2017-07-17 | 2019-05-07 | 주식회사 엘지화학 | 포토폴리머 조성물 |
| CN112759701B (zh) * | 2019-10-21 | 2022-12-30 | 杭州光粒科技有限公司 | 光致聚合物组合物、反射式衍射光栅及其制备方法 |
| CN113527143B (zh) * | 2020-04-20 | 2023-06-20 | 杭州光粒科技有限公司 | 书写单体及其制备方法以及光致聚合物组合物及其光栅 |
| DE102021108433A1 (de) | 2021-04-01 | 2022-10-06 | Bundesdruckerei Gmbh | Verfahren und Vorrichtung zum Herstellen eines Hologramms für ein Sicherheitselement sowie Verfahren zum Herstellen eines Wert- oder Sicherheitsdokuments |
Citations (3)
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| KR100385910B1 (ko) * | 1995-12-30 | 2003-08-21 | 고려화학 주식회사 | 우레탄 아크릴레이트 올리고머를 함유한 광경화형도막조성물 |
| JP2005062856A (ja) * | 2003-07-28 | 2005-03-10 | Fuji Photo Film Co Ltd | 重合性組成物及びそれを用いた平版印刷版原版 |
| WO2008125229A1 (en) | 2007-04-11 | 2008-10-23 | Bayer Materialscience Ag | Advantageous recording media for holographic applications |
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| JP2007058095A (ja) * | 2005-08-26 | 2007-03-08 | Fujifilm Corp | ホログラム記録方法、ホログラム記録材料、光記録媒体、光記録媒体への記録方法、3dディスプレイホログラム、及び3dディスプレイホログラムの製造方法 |
| JP2007264373A (ja) * | 2006-03-29 | 2007-10-11 | Toppan Printing Co Ltd | インモールド成形容器用ラベルおよびインモールド成形容器 |
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| ATE493383T1 (de) * | 2008-08-08 | 2011-01-15 | Bayer Materialscience Ag | Phenylisocyanat-basierte urethanacrylate mit hohem brechungsindex |
| CN102741925B (zh) * | 2009-11-03 | 2015-12-16 | 拜尔材料科学股份公司 | 生产全息膜的方法 |
| TWI489205B (zh) * | 2009-11-03 | 2015-06-21 | Bayer Materialscience Ag | 包含不同寫入共聚單體之光聚合物調配物 |
| TW201133264A (en) * | 2009-11-03 | 2011-10-01 | Bayer Materialscience Ag | Method for selecting additives in photopolymers |
| JP5793147B2 (ja) * | 2009-11-03 | 2015-10-14 | バイエル・マテリアルサイエンス・アクチェンゲゼルシャフトBayer MaterialScience AG | 新規な非結晶化メタクリレート、その製造方法およびその使用 |
| RU2542984C2 (ru) * | 2009-11-03 | 2015-02-27 | Байер Матириальсайенс Аг | Способ изготовления голографической пленки |
| ES2381808T3 (es) * | 2009-11-03 | 2012-05-31 | Bayer Materialscience Ag | Formulaciones de fotopolímeros con módulo mecánico ajustable Guv |
| RU2542981C9 (ru) * | 2009-11-03 | 2015-12-10 | Байер Матириальсайенс Аг | Способ изготовления голографических сред |
| RU2012137134A (ru) * | 2010-02-02 | 2014-03-10 | Байер Интеллектуэль Проперти Гмбх | Фотополимерная композиция с записывающими мономерами на основе триазина |
| EP2372454A1 (de) * | 2010-03-29 | 2011-10-05 | Bayer MaterialScience AG | Photopolymer-Formulierung zur Herstellung sichtbarer Hologramme |
| EP2450387A1 (de) * | 2010-11-08 | 2012-05-09 | Bayer MaterialScience AG | Photopolymer-Formulierung für die Herstellung holographischer Medien |
| EP2450893A1 (de) * | 2010-11-08 | 2012-05-09 | Bayer MaterialScience AG | Photopolymer-Formulierung zur Herstellung holographischer Medien mit hoch vernetzten Matrixpolymeren |
| US20140302425A1 (en) * | 2012-04-30 | 2014-10-09 | Bayer Intellectual Property Gmbh | Method for producing holographic media |
-
2011
- 2011-01-28 CN CN201180008165.8A patent/CN102754026B/zh not_active Expired - Fee Related
- 2011-01-28 KR KR1020127020244A patent/KR101804591B1/ko not_active Expired - Fee Related
- 2011-01-28 WO PCT/EP2011/051247 patent/WO2011095442A1/de not_active Ceased
- 2011-01-28 US US13/576,723 patent/US9057950B2/en not_active Expired - Fee Related
- 2011-01-28 JP JP2012551584A patent/JP5792746B2/ja not_active Expired - Fee Related
- 2011-01-28 EP EP11701280.7A patent/EP2531889B1/de active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100385910B1 (ko) * | 1995-12-30 | 2003-08-21 | 고려화학 주식회사 | 우레탄 아크릴레이트 올리고머를 함유한 광경화형도막조성물 |
| JP2005062856A (ja) * | 2003-07-28 | 2005-03-10 | Fuji Photo Film Co Ltd | 重合性組成物及びそれを用いた平版印刷版原版 |
| WO2008125229A1 (en) | 2007-04-11 | 2008-10-23 | Bayer Materialscience Ag | Advantageous recording media for holographic applications |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20190036473A (ko) * | 2017-09-27 | 2019-04-04 | 주식회사 엘지화학 | 포토폴리머 조성물 |
| KR102156872B1 (ko) | 2017-09-27 | 2020-09-16 | 주식회사 엘지화학 | 포토폴리머 조성물 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20120124430A (ko) | 2012-11-13 |
| CN102754026B (zh) | 2015-10-07 |
| RU2012137135A (ru) | 2014-03-10 |
| US20120302659A1 (en) | 2012-11-29 |
| EP2531889A1 (de) | 2012-12-12 |
| US9057950B2 (en) | 2015-06-16 |
| CN102754026A (zh) | 2012-10-24 |
| WO2011095442A1 (de) | 2011-08-11 |
| EP2531889B1 (de) | 2020-06-03 |
| JP2013518952A (ja) | 2013-05-23 |
| RU2568189C2 (ru) | 2015-11-10 |
| JP5792746B2 (ja) | 2015-10-14 |
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