CN102481679B - 保持垫 - Google Patents

保持垫 Download PDF

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Publication number
CN102481679B
CN102481679B CN200980160742.8A CN200980160742A CN102481679B CN 102481679 B CN102481679 B CN 102481679B CN 200980160742 A CN200980160742 A CN 200980160742A CN 102481679 B CN102481679 B CN 102481679B
Authority
CN
China
Prior art keywords
foaming
supporting pad
thickness direction
ethyl formate
maintenance face
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN200980160742.8A
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English (en)
Chinese (zh)
Other versions
CN102481679A (zh
Inventor
川村佳秀
久米贵宏
佐藤章子
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujibo Holdins Inc
Original Assignee
Fujibo Holdins Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujibo Holdins Inc filed Critical Fujibo Holdins Inc
Publication of CN102481679A publication Critical patent/CN102481679A/zh
Application granted granted Critical
Publication of CN102481679B publication Critical patent/CN102481679B/zh
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/22—Lapping pads for working plane surfaces characterised by a multi-layered structure

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
CN200980160742.8A 2009-09-03 2009-09-24 保持垫 Active CN102481679B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2009204003A JP5355310B2 (ja) 2009-09-03 2009-09-03 保持パッド
JP2009-204003 2009-09-03
PCT/JP2009/004791 WO2011027411A1 (fr) 2009-09-03 2009-09-24 Patin de support

Publications (2)

Publication Number Publication Date
CN102481679A CN102481679A (zh) 2012-05-30
CN102481679B true CN102481679B (zh) 2014-06-18

Family

ID=43648974

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200980160742.8A Active CN102481679B (zh) 2009-09-03 2009-09-24 保持垫

Country Status (5)

Country Link
JP (1) JP5355310B2 (fr)
KR (1) KR101588925B1 (fr)
CN (1) CN102481679B (fr)
TW (1) TWI432287B (fr)
WO (1) WO2011027411A1 (fr)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5484145B2 (ja) * 2010-03-24 2014-05-07 東洋ゴム工業株式会社 研磨パッド
JP5917236B2 (ja) * 2012-03-30 2016-05-11 富士紡ホールディングス株式会社 研磨パッド用シート及びその製造方法、研磨パッド及びその製造方法、並びに研磨方法
JP5854910B2 (ja) * 2012-03-30 2016-02-09 富士紡ホールディングス株式会社 研磨パッド
KR101666477B1 (ko) * 2013-06-04 2016-10-14 주식회사 엘지화학 폴리우레탄 지지 패드의 제조 방법 및 폴리우레탄 지지 패드
WO2015046203A1 (fr) * 2013-09-30 2015-04-02 富士紡ホールディングス株式会社 Coussinet de retenue
JP6279309B2 (ja) * 2013-12-20 2018-02-14 スリーエム イノベイティブ プロパティズ カンパニー 研磨用クッション、研磨装置、研磨方法、及び当該研磨方法により研磨された対象物を含む物品
KR101527348B1 (ko) * 2014-03-04 2015-06-09 대원화성 주식회사 내구성이 향상된 유지패드
CN105269451A (zh) * 2014-07-02 2016-01-27 大元化成株式会社 具有高精度的平坦度的保持垫
US20210323116A1 (en) * 2020-04-18 2021-10-21 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Offset pore poromeric polishing pad

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1711153A (zh) * 2002-12-26 2005-12-21 Hoya株式会社 用于信息记录介质的玻璃衬底及其制造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5840356U (ja) * 1981-09-10 1983-03-16 株式会社三興技研 研摩加工物の保護具
JPH11277407A (ja) * 1998-03-30 1999-10-12 Sony Corp 研磨パッド、研磨装置および研磨方法
JP2004358588A (ja) * 2003-06-03 2004-12-24 Unitika Ltd 研磨パッド及びその製造方法
JP2005349502A (ja) * 2004-06-09 2005-12-22 Nitta Haas Inc 被研磨加工物保持材
JP4455230B2 (ja) * 2004-08-30 2010-04-21 富士紡ホールディングス株式会社 保持パッド及び保持パッドの製造方法
JP2007160474A (ja) * 2005-12-15 2007-06-28 Nitta Haas Inc 研磨布およびその製造方法
JP5216238B2 (ja) * 2007-05-21 2013-06-19 富士紡ホールディングス株式会社 保持パッドおよび保持パッドの製造方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1711153A (zh) * 2002-12-26 2005-12-21 Hoya株式会社 用于信息记录介质的玻璃衬底及其制造方法

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
JP特开2005-11972A 2005.01.13
JP特开2006-62059A 2006.03.09
JP特开2007-160474A 2007.06.28
JP特开平11-277407A 1999.10.12

Also Published As

Publication number Publication date
TW201109123A (en) 2011-03-16
TWI432287B (zh) 2014-04-01
JP5355310B2 (ja) 2013-11-27
CN102481679A (zh) 2012-05-30
JP2011051074A (ja) 2011-03-17
KR101588925B1 (ko) 2016-01-26
KR20120060812A (ko) 2012-06-12
WO2011027411A1 (fr) 2011-03-10

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