CN102472611B - 光学式膜厚计以及具有光学式膜厚计的薄膜形成装置 - Google Patents

光学式膜厚计以及具有光学式膜厚计的薄膜形成装置 Download PDF

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Publication number
CN102472611B
CN102472611B CN201080029355.3A CN201080029355A CN102472611B CN 102472611 B CN102472611 B CN 102472611B CN 201080029355 A CN201080029355 A CN 201080029355A CN 102472611 B CN102472611 B CN 102472611B
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CN
China
Prior art keywords
light
actual substrate
film thickness
measurement
optical film
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CN201080029355.3A
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English (en)
Chinese (zh)
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CN102472611A (zh
Inventor
佐井旭阳
日向阳平
大泷芳幸
姜友松
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Shincron Co Ltd
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Shincron Co Ltd
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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Physical Vapour Deposition (AREA)
CN201080029355.3A 2009-07-03 2010-06-29 光学式膜厚计以及具有光学式膜厚计的薄膜形成装置 Active CN102472611B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2009-158798 2009-07-03
JP2009158798A JP4878632B2 (ja) 2009-07-03 2009-07-03 光学式膜厚計及び光学式膜厚計を備えた薄膜形成装置
PCT/JP2010/061041 WO2011001968A1 (ja) 2009-07-03 2010-06-29 光学式膜厚計及び光学式膜厚計を備えた薄膜形成装置

Publications (2)

Publication Number Publication Date
CN102472611A CN102472611A (zh) 2012-05-23
CN102472611B true CN102472611B (zh) 2015-06-17

Family

ID=43411040

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201080029355.3A Active CN102472611B (zh) 2009-07-03 2010-06-29 光学式膜厚计以及具有光学式膜厚计的薄膜形成装置

Country Status (7)

Country Link
US (1) US8625111B2 (https=)
EP (1) EP2450662A1 (https=)
JP (1) JP4878632B2 (https=)
KR (1) KR101317536B1 (https=)
CN (1) CN102472611B (https=)
TW (1) TWI404908B (https=)
WO (1) WO2011001968A1 (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8922790B2 (en) * 2012-02-15 2014-12-30 Shincron Co., Ltd. Optical film thickness measuring device and thin film forming apparatus using the optical film thickness measuring device
HK1204491A1 (en) * 2012-02-27 2015-11-20 株式会社新柯隆 Led light source apparatus, film thickness measuring apparatus, and thin-film forming apparatus
WO2013186879A1 (ja) * 2012-06-13 2013-12-19 株式会社シンクロン 膜厚測定装置及び成膜装置
JP5367196B1 (ja) * 2012-09-10 2013-12-11 株式会社シンクロン 測定装置及び成膜装置
CN105143500B (zh) * 2012-10-04 2017-10-10 康宁股份有限公司 光学涂覆方法、设备和产品
KR101544968B1 (ko) 2013-07-05 2015-08-19 한국표준과학연구원 두께 측정 장치 및 두께 측정 방법
JP6800800B2 (ja) * 2017-04-06 2020-12-16 株式会社ニューフレアテクノロジー 成長速度測定装置および成長速度検出方法
JP6923344B2 (ja) * 2017-04-13 2021-08-18 株式会社Ｓｃｒｅｅｎホールディングス 周縁処理装置および周縁処理方法
US11313670B2 (en) * 2020-09-30 2022-04-26 National Tsing Hua University Inspection method for multilayer semiconductor device
CN115452337B (zh) * 2022-08-24 2023-04-07 东莞艾塔极新材料科技有限公司 一种oca光学膜模切加工用的尺寸检验台

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005301032A (ja) * 2004-04-14 2005-10-27 Olympus Corp 光学薄膜成膜装置及び光学薄膜成膜方法並びに光学素子
US20060033057A1 (en) * 2004-07-30 2006-02-16 Delta Electronics, Inc. Deposition system and film thickness monitoring device thereof
CN1815138A (zh) * 2005-02-04 2006-08-09 欧姆龙株式会社 薄膜检查装置以及薄膜检查方法
JP2006330485A (ja) * 2005-05-27 2006-12-07 Olympus Corp 薄膜形成装置及び薄膜形成方法並びに光学薄膜

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5491263A (en) * 1977-12-28 1979-07-19 Ulvac Corp Film thickness detector
JPS5644802A (en) * 1979-09-20 1981-04-24 Hideo Takada System and method of measuring film thickness and coating varnish film thickness
JPS5972010A (ja) 1982-10-19 1984-04-23 Ulvac Corp 光学膜形成装置における膜厚監視装置
JPH0611442A (ja) * 1992-06-29 1994-01-21 Kurabo Ind Ltd 赤外線光学装置
US7304744B1 (en) 1998-12-24 2007-12-04 Sharp Kabushiki Kaisha Apparatus and method for measuring the thickness of a thin film via the intensity of reflected light
JPWO2002063064A1 (ja) 2001-02-07 2004-06-10 旭硝子株式会社 スパッタ装置及びスパッタ成膜方法
JP3737409B2 (ja) * 2001-10-15 2006-01-18 日本電信電話株式会社 膜厚モニタリング装置および方法
JP2004219108A (ja) * 2003-01-09 2004-08-05 Dainippon Printing Co Ltd 着色膜の膜厚ムラ検査方法及び装置
JP4547489B2 (ja) * 2003-05-01 2010-09-22 株式会社昭和真空 膜厚計測装置搭載の光学薄膜形成用装置及び光学薄膜の成膜方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005301032A (ja) * 2004-04-14 2005-10-27 Olympus Corp 光学薄膜成膜装置及び光学薄膜成膜方法並びに光学素子
US20060033057A1 (en) * 2004-07-30 2006-02-16 Delta Electronics, Inc. Deposition system and film thickness monitoring device thereof
CN1815138A (zh) * 2005-02-04 2006-08-09 欧姆龙株式会社 薄膜检查装置以及薄膜检查方法
JP2006330485A (ja) * 2005-05-27 2006-12-07 Olympus Corp 薄膜形成装置及び薄膜形成方法並びに光学薄膜

Also Published As

Publication number Publication date
US8625111B2 (en) 2014-01-07
EP2450662A1 (en) 2012-05-09
JP4878632B2 (ja) 2012-02-15
CN102472611A (zh) 2012-05-23
TWI404908B (zh) 2013-08-11
WO2011001968A1 (ja) 2011-01-06
KR20120052270A (ko) 2012-05-23
HK1168417A1 (en) 2012-12-28
JP2011013145A (ja) 2011-01-20
KR101317536B1 (ko) 2013-10-15
US20120105872A1 (en) 2012-05-03
TW201109617A (en) 2011-03-16

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