CN102443780A - 气体排出管及相关的方法 - Google Patents
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Abstract
本发明的实施例涉及气体排出管及相关的方法,所述气体排出管包括第一排出通道和至少一个第二排出通道,所述第一排出通道和至少一个第二排出通道设计成一方面分别连接到第一真空泵和至少一第二真空泵,另一方面连接到反应器的出口,其中所述第一排出通道和至少所述第二排出通道包括用于喷注惰性气体的第一器件和至少第二器件,所述第一器件和至少第二器件的喷注方向分别与所述真空泵的抽吸方向相反地定向。
Description
技术领域
本发明涉及气体从反应器的排出,更具体地涉及离开化学反应器(例如,一件原子层沉积设备的反应器)的反应气体残余物的排出。
背景技术
根据现有技术的一件原子层沉积设备的通常运行描述如下。两种反应气体G1和G2被顺次引入反应器中,在反应器内存在基底(“晶片”)以允许原子层沉积在晶片上。在反应器中通过加热元件来维持高温。反应气体(G1或G2)的残余物通过位于反应器出口的排出管排出到真空泵。
这种方法的问题在于,两种反应气体G1和G2会在真空泵混合。这种混合物会产生化学反应,从而导致在用于排出气体G1和G2的真空泵中形成固体颗粒和粉末。在真空泵中积聚的固体颗粒和粉末会导致真空泵的故障和/或过早磨损,从而影响晶片的制造总成本。
为了克服该问题,现有技术的解决方案在于使用两个不同的真空泵,每个真空泵专用于一种反应气体。向一个或另一个真空泵的传送由位于排出管入口的一机械阀系统来进行,所述机械阀系统将反应气体引导到排出管的与真空泵连接的一个或另一个排出通道。
然而,对于这种解决方案,会在机械阀处发生反应气体的混合,从而在所述阀处引起副产物层的沉积,这会妨碍所述阀的工作并导致故障。
发明内容
因此,本发明的目的是提出一种装置,其能够防止反应气体在运动的机械元件中混合以便防止会导致工作故障的副产物形成,其还允许反应气体以更快且由此更适合于脉冲式方法(如原子层沉积法)的方式从一个排出通道被引导到另一个排出通道。
因此,根据本发明的装置是一种气体排出管,其包括第一排出通道和至少一个第二排出通道,所述第一排出通道和至少一个第二排出通道设计成一方面分别连接到第一真空泵和至少一第二真空泵,另一方面连接到反应器的出口,其中所述第一排出通道和至少所述第二排出通道包括用于喷注惰性气体的第一器件和至少第二器件,所述第一器件和至少第二器件的喷注方向分别与所述真空泵的抽吸方向相反地定向。
“惰性气体”应理解为单种惰性气体或多种惰性气体的混合物。惰性气体可例如为氮N2、氩Ar和/或氦He。
根据本发明的另一个方面,所述管包括安置成一方面与所述反应器的出口连通、另一方面与所述第一排出通道和至少所述第二排出通道连通的中央主干部,所述第一排出通道和至少所述第二排出通道具有相同量级的传导性。
根据本发明的又一个方面,所述排出通道的数量为两个,并且所述中央主干部一方面包括与所述第一排出通道连通的内部部分,另一方面包括由一壁与所述内部部分分开、与所述第二排出通道连通的周边部分。
根据本发明的一补充方面,所述中央主干部的内部部分和周边部分各自的传导性具有相同的量级。
根据本发明的另一个方面,用于喷注惰性气体的所述第一喷注器件沿所述中央主干部的内部部分的轴线安设并朝着所述反应器的出口定向,而用于喷注惰性气体的所述第二喷注器件安设在所述中央主干部的周边部分的周界上并大致朝着所述中央主干部的截面的中央定向。
本发明的另一个主题在于一种用于通过排出管排出源自反应器的第一反应气体和至少一种第二反应气体的方法,所述第一反应气体和至少所述第二反应气体通过与第一真空泵和至少一个第二真空泵连接的第一排出通道和至少一个第二排出通道被顺次排出,其中通过大致沿与相应真空泵的抽吸方向相反的方向喷注惰性气体来控制对于反应气体朝所述排出通道之一流动的引导。
根据本发明的另一个方面,在所述第一和第二排出通道中至少一者的入口处进行惰性气体的喷注。
根据本发明的一附加方面,源自所述反应器的所述第一反应气体和至少第二反应气体被顺次接纳,并且所述第一真空泵和至少第二真空泵分别专用于所述第一反应气体和至少第二反应气体,使得在要排出的反应气体被送至所述第二真空泵时在所述第一排出通道喷注惰性气体,而在要排出的反应气体被送至所述第一真空泵时在所述第二排出通道喷注惰性气体。
根据本发明的一补充方面,源自所述反应器的所述第一反应气体和至少所述第二反应气体被交替地接纳,使得在所述排出通道喷注惰性气体也交替地进行。
根据本发明的另一个方面,被喷注的惰性气体的量对于所述交替的两种序列(two sequences of the alternation)来说是相同的,并且被计算为在所述真空泵处的气体混合物中获得20%的反应气体浓度,所述真空泵处的气体混合物由反应气体和所喷注的惰性气体构成。
附图说明
在将要参照附图所作的描述中可清楚看到本发明的其它特征和优点,附图作为非限制性的表征代表了本发明的一个可能的实施例。
在这些图中:
-图1示出根据本发明的排出管的第一实施例的图示;
-图2示出根据本发明的排出管的第一实施例在用于喷注惰性气体的第一器件被致动时的图示;
-图3示出根据本发明的排出管的第二实施例的图示;
-图4示出对于本发明的第二实施例在所述管的入口处的所述管的剖视图;
-图5示出根据本发明的排出管的第二实施例在用于喷注惰性气体的第一器件被致动时的第一工作步骤的图示;
-图6示出根据本发明的排出管的第二实施例在用于喷注惰性气体的第二器件被致动时的第二工作步骤的图示;
-图7示出在所述管的入口处的所述管的剖视图以及在第二喷注器件被致动时惰性气体的方向。
具体实施方式
在本发明的范畴内,管的“传导性”是流量除以所述管的上下游压差所得的商,并且对应于流体在所述管中流动的便易性。
本发明的实施例涉及在用于源自反应器(例如,原子层沉积反应器)的反应气体的排出管中使用惰性气体,所述排出管包括至少两个排出通道以便将要排出的反应气体引导到所述排出通道之一。
图1示出排出管的第一实施例。
所述管包括:入口1,该入口设计成连接到反应器的出口,以便接纳源自反应器的两种反应气体的残余物或反应气体的两种不同混合物的残余物;分别连接到真空泵7和9的两个排出通道3和5;和将所述管的入口1连接到所述两个排出通道3和5的中央主干部11。所述排出通道例如通过具有相似的尺寸和量级相同的相似泵送能力而获得传导性。
此外,各个排出通道分别包括用于喷注惰性气体的第一和第二器件13和15。这些喷注器件13和15可例如包括第一阀17和第二阀18以便容许或阻止惰性气体通过,以及第一喷嘴19和第二喷嘴20以便使惰性气体沿所选择的方向、沿与泵送方向相反的方向(也就是说,与反应气体在排出通道中的传散方向相逆)扩散。
这样,如图2所示,在排出通道之一中沿相反方向喷注惰性气体21能够朝另一个排出通道引导反应气体。当在所述管的入口1接纳第二气体G2时,第一排出通道3的用于喷注惰性气体21的第一器件13被致动(通过打开第一阀17),以便迫使反应气体G2的残余物朝第二排出通道5行进而被传送到第二真空泵9,第二真空泵9专用于泵送反应气体G2。第二排出通道5的用于喷注惰性气体21的第二器件15保持未致动(第二阀18关闭)。惰性气体可例如为氮N2、氩Ar或氦He。
当在所述管的入口1接纳气体G1时,第二排出通道5的用于喷注惰性气体21的第二器件15被致动,而第一排出通道3的用于喷注惰性气体21的器件13不致动。因此,气体G1朝专用于泵送气体G1的第一真空泵7被引导。
在实际中,两种气体G1和G2通常被交替地喷注到反应器中,从而用于喷注惰性气体的第一和第二器件13和15的致动也根据反应器中存在的反应气体G1或G2交替地进行。
此外,所喷注的惰性气体21的量可根据要排出的反应气体G1或G2的量和在真空泵7或9处反应气体G1或G2的期望浓度来调节。有利地,惰性气体21的量对于交替的两种喷注序列来说是相同的,以便不改变反应器和所述管内部的压力。所喷注的惰性气体的量被计算为在真空泵处的气体混合物中获得20%的反应气体G1或G2的浓度,真空泵处的气体混合物包括反应气体G1、G2以及所喷注的惰性气体21。可认为在反应器的出口处反应气体G1或G2的浓度为100%。
如果有必要,根据泵送系统,在真空泵处反应气体G1或G2的该浓度可降低至1%。
此外,根据一个实施例,第一和第二喷注器件13和15在它们未致动时并不完全阻止惰性气体21通过,而是被置于待命模式,其中少量的惰性气体21持续被喷注以便防止在惰性气体的喷嘴19和20上形成沉积物,从而保护喷嘴19和20。
此外,在排出通道3和5的出口以及在真空泵7和9的入口安设有阀23和25。这些阀23和25是在正常工作时保持常开并在对应的真空泵出故障的情况下关闭以便将出故障的真空泵与所述管隔离的自动阀。
此外,在图1和2中仅示出了两个排出通道,但是也可制造包括更多数量排出通道(以便排出更多种反应气体)的管。在这种情况下,除了与专用于正被提及的反应气体的真空泵连接的通道之外,其它各个排出通道的用于喷注惰性气体的器件都将被致动,从而迫使所述反应气体朝所述专用的真空泵被引导。
图3示出本发明的第二实施例,在此情况下排出通道的数量等于二。在该第二实施例中,与上述的管的区别在于中央主干部27的构型。该构型在于与第二排出通道5连接、截面比所述管的入口1的截面小并形成中央主干部27的内部部分29的第一管道,和与第一排出通道3连接、截面与所述管的入口1的截面对应并形成中央主干部27的周边部分31的第二管道。内部部分29的截面和周边部分的截面被计算为在所述管的入口1和各个排出通道3和5之间获得相同量级的传导性。
图4示出所述管在其入口1处的剖视图,其中中央主干部27的内部部分29和周边部分31具有圆形截面。
然而,本发明也可应用于不同形状的截面,例如椭圆形截面,或甚至矩形或方形截面。
对于前述实施例,用于喷注惰性气体的第一和第二器件33和35被用于将源自反应器的反应气体G1或G2的残余物引导到排出通道中的一个或另一个以传送到专用的真空泵7或9。
周边部分31的用于喷注惰性气体的第一器件33在所述管的入口1处绕周边部分31的周界均匀地分布(例如,通过使用与由阀24控制的惰性气体入口连接的一组喷嘴32)。用于喷注惰性气体的器件33指向所述管的入口1的中央,以便形成如图6和7所示的环形的、稍呈锥形的射流。图7示出图4所示的入口1处的惰性气体的喷注方向。
这样,当在所述管的入口1接纳被送至与连接到中央主干部27的内部部分29的第二排出通道5连接的真空泵9的第二反应气体G2时,周边部分31的用于喷注惰性气体的器件33被致动(内部部分29的用于喷注惰性气体的器件35保持未致动),以便朝中央主干部27的内部部分29及由此朝对应的真空泵9引导第二反应气体G2。
如图5所示,中央主干部27的内部部分29的用于喷注惰性气体的第二器件35沿内部部分29的轴线安设,并位于与通道的入口1相对的端部且指向入口1。
这样,当在所述管的入口1接纳被送至与连接到中央主干部27的周边部分31的第一排出通道3连接的真空泵7的第一反应气体G1时,通过打开阀22致动用于喷注惰性气体的该器件35(周边部分31的用于喷注惰性气体的器件33通过阀24的关闭而保持不致动),以便阻止反应气体G1进入内部部分29并迫使其进入与中央主干部27的周边部分31连接的排出通道3中。
因此,使用所喷注的惰性气体21构成了这样一种气体屏障,其能够防止反应气体进入所选择的排出通道,并由此将反应气体引导到专用于它的排出通道中,而不需要因与反应气体相互作用而经受磨损的阀或其它机械元件。因此,本发明的实施例能避免使用可能会变得不能调动或被阻塞的机械零件,由此改善所述管的寿命,同时减少其维护。此外,与现有技术的解决方案相比,反应气体从一个排出通道到另一个排出通道的方向改变可更快地进行。最后,本发明的实施例允许在泵送系统的上游反应气体的恒定稀释,从而使其处理更容易。
Claims (10)
1.气体排出管,其包括第一排出通道(3)和至少一个第二排出通道(5),所述第一排出通道和至少一个第二排出通道设计成一方面分别连接到第一真空泵(7)和至少一第二真空泵(9),另一方面连接到反应器的出口,其中所述第一排出通道(3)和至少所述第二排出通道(5)包括用于喷注惰性气体(21)的第一器件(13;33)和至少第二器件(15;35),所述第一器件和至少第二器件的喷注方向分别与所述真空泵(7,9)的抽吸方向相反地定向。
2.根据权利要求1所述的气体排出管,其特征在于,所述管包括安置成一方面与所述反应器的出口连通、另一方面与所述第一排出通道(3)和至少所述第二排出通道(5)连通的中央主干部(11;27),所述第一排出通道(3)和至少所述第二排出通道(5)具有相同量级的传导性。
3.根据权利要求2所述的气体排出管,其特征在于,所述排出通道(3,5)的数量为两个,并且所述中央主干部(27)一方面包括与所述第二排出通道(5)连通的内部部分(29),另一方面包括由一壁与所述内部部分(29)分开并与所述第一排出通道(3)连通的周边部分(31)。
4.根据权利要求3所述的气体排出管,其特征在于,所述中央主干部(27)的内部部分(29)和周边部分(31)各自的传导性具有相同的量级。
5.根据权利要求4所述的气体排出管,其特征在于,用于喷注惰性气体(21)的所述第一喷注器件(33)沿所述中央主干部(27)的内部部分(29)的轴线安设并朝着所述反应器的出口定向,而用于喷注惰性气体(21)的所述第二喷注器件(35)安设在所述中央主干部(27)的周边部分(31)的周界上并大致朝着所述中央主干部(27)的截面的中央定向。
6.用于通过根据权利要求1至5中的一项所述的排出管排出源自反应器的第一反应气体(G1)和至少一种第二反应气体(G2)的方法,所述第一反应气体(G1)和至少所述第二反应气体(G2)通过分别与第一真空泵(7)和至少一个第二真空泵(9)连接的第一排出通道(3)和至少一个第二排出通道(5)被顺次排出,其中通过大致沿与相应真空泵(7,9)的抽吸方向相反的方向喷注惰性气体(21)来控制对于反应气体(G1,G2)朝所述排出通道(3,5)之一流动的引导。
7.根据权利要求6所述的排出方法,其特征在于,在所述第一排出通道(3)和至少第二排出通道(5)中至少一者的入口处进行惰性气体(21)的喷注。
8.根据权利要求6或7所述的排出方法,其特征在于,源自所述反应器的所述第一反应气体(G1)和至少第二反应气体(G2)被顺次接纳,并且所述第一真空泵(7)和至少第二真空泵(9)分别专用于所述第一反应气体(G1)和至少第二反应气体(G2),使得在要排出的反应气体(G2)被送至所述第二真空泵(9)时在所述第一排出通道(3)喷注惰性气体(21),而在要排出的反应气体(G1)被送至所述第一真空泵(7)时在所述第二排出通道(5)喷注惰性气体(21)。
9.根据权利要求8所述的排出方法,其特征在于,源自所述反应器的所述第一反应气体(G1)和至少所述第二反应气体(G2)被交替地接纳到所述管中,使得在所述排出通道(3,5)喷注惰性气体(21)也交替地进行。
10.根据权利要求9所述的排出方法,其特征在于,被喷注的惰性气体(21)的量对于所述交替的两种序列来说是相同的,并且被计算为在所述真空泵处的气体混合物中获得20%的反应气体(G1,G2)的浓度,所述真空泵处的气体混合物由反应气体(G1,G2)和所喷注的惰性气体(21)构成。
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Family Cites Families (3)
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JP3107275B2 (ja) * | 1994-08-22 | 2000-11-06 | 東京エレクトロン株式会社 | 半導体製造装置及び半導体製造装置のクリーニング方法 |
JP2000349078A (ja) * | 1999-06-03 | 2000-12-15 | Mitsubishi Electric Corp | 化学気相成長装置および半導体装置の製造方法 |
JP4113755B2 (ja) * | 2002-10-03 | 2008-07-09 | 東京エレクトロン株式会社 | 処理装置 |
-
2010
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2011
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- 2011-10-06 US US13/267,694 patent/US20120088031A1/en not_active Abandoned
- 2011-10-07 SG SG2011073756A patent/SG180099A1/en unknown
- 2011-10-07 KR KR1020110102354A patent/KR20120036772A/ko not_active Application Discontinuation
- 2011-10-08 CN CN2011102955511A patent/CN102443780A/zh active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103966663A (zh) * | 2014-05-12 | 2014-08-06 | 上海先进半导体制造股份有限公司 | 半导体设备 |
CN107785221A (zh) * | 2016-08-25 | 2018-03-09 | Asm知识产权私人控股有限公司 | 排气设备和使用其的衬底处理设备 |
Also Published As
Publication number | Publication date |
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FR2965888B1 (fr) | 2012-12-28 |
FR2965888A1 (fr) | 2012-04-13 |
SG180099A1 (en) | 2012-05-30 |
KR20120036772A (ko) | 2012-04-18 |
US20120088031A1 (en) | 2012-04-12 |
TW201237211A (en) | 2012-09-16 |
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