JP2008500895A - 排気装置用ガス供給システム - Google Patents
排気装置用ガス供給システム Download PDFInfo
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- JP2008500895A JP2008500895A JP2007514066A JP2007514066A JP2008500895A JP 2008500895 A JP2008500895 A JP 2008500895A JP 2007514066 A JP2007514066 A JP 2007514066A JP 2007514066 A JP2007514066 A JP 2007514066A JP 2008500895 A JP2008500895 A JP 2008500895A
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- Prior art keywords
- purge gas
- exhaust
- port
- capillary
- flexible
- Prior art date
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Links
- 238000010926 purge Methods 0.000 claims abstract description 62
- 239000007789 gas Substances 0.000 claims description 71
- 238000000034 method Methods 0.000 claims description 20
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 6
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- 239000012530 fluid Substances 0.000 claims description 2
- 239000001307 helium Substances 0.000 claims description 2
- 229910052734 helium Inorganic materials 0.000 claims description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 2
- 239000011261 inert gas Substances 0.000 claims 1
- 238000005086 pumping Methods 0.000 abstract 2
- 238000009434 installation Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000008844 regulatory mechanism Effects 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Images
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D19/00—Axial-flow pumps
- F04D19/02—Multi-stage pumps
- F04D19/04—Multi-stage pumps specially adapted to the production of a high vacuum, e.g. molecular pumps
- F04D19/046—Combinations of two or more different types of pumps
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B53/00—Component parts, details or accessories not provided for in, or of interest apart from, groups F04B1/00 - F04B23/00 or F04B39/00 - F04B47/00
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B53/00—Component parts, details or accessories not provided for in, or of interest apart from, groups F04B1/00 - F04B23/00 or F04B39/00 - F04B47/00
- F04B53/06—Venting
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D19/00—Axial-flow pumps
- F04D19/02—Multi-stage pumps
- F04D19/04—Multi-stage pumps specially adapted to the production of a high vacuum, e.g. molecular pumps
- F04D19/042—Turbomolecular vacuum pumps
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/0318—Processes
- Y10T137/0324—With control of flow by a condition or characteristic of a fluid
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/0318—Processes
- Y10T137/0402—Cleaning, repairing, or assembling
- Y10T137/0419—Fluid cleaning or flushing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/8593—Systems
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/8593—Systems
- Y10T137/877—With flow control means for branched passages
- Y10T137/87877—Single inlet with multiple distinctly valved outlets
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Reciprocating Pumps (AREA)
- Pipeline Systems (AREA)
- Sampling And Sample Adjustment (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
- Chemical Vapour Deposition (AREA)
- Jet Pumps And Other Pumps (AREA)
- Supply Devices, Intensifiers, Converters, And Telemotors (AREA)
- Compressor (AREA)
Abstract
【選択図】図3
Description
28 電磁弁
30 定流量制限器
32 可変流量制限器
100 ガス供給システム
102 可撓性毛管
104 パージポート
106 排気装置
Claims (22)
- パージガスを排気装置に供給する方法であって、
パージガスを可撓性毛管を使用して排気装置のポートに搬送する工程を有することを特徴とする方法。 - 毛管は、ポートへのパージガスの流量を決定するように寸法決めされることを特徴とする請求項1に記載の方法。
- 各毛管の内径及び長さの少なくとも一方が、ポートに望ましい流量のパージガスを供給するように選択されることを特徴とする請求項2に記載の方法。
- 毛管の可撓性は、毛管へのパージガス源を、排気装置の使用中に発生する振動から実質的に隔絶するように選択されることを特徴とする請求項1〜3のいずれか1項に記載の方法。
- 毛管に供給されるパージガスの圧力を制御することを特徴とする請求項1〜4のいずれか1項に記載の方法。
- 可撓性毛管を、パージガス源からパージガス流を受けるための吸気口を有する構造体の排気口に連結することを特徴とする請求項1〜5のいずれか1項に記載の方法。
- 構造体は、複数の排気口を有し、各排気口が排気装置のそれぞれのポートに連結されることを特徴とする請求項6に記載の方法。
- 各排気口は、それぞれの毛管を使用してそれぞれのポートに連結されることを特徴とする請求項7に記載の方法。
- 構造体は、マニホールドを有することを特徴とする請求項6〜8のいずれか1項に記載の方法。
- パージガスは不活性ガス、好ましくは窒素及びヘリウムの一方であることを特徴とする請求項1〜9のいずれか1項に記載の方法。
- パージガスを排気装置に供給する方法であって、
パージガス源からパージガス流を受ける工程と、
受けたパージガスを可撓性毛管を使用して排気装置のポートに搬送する工程と、を有することを特徴とする方法。 - パージガスを排気装置に供給するためのシステムであって、
パージガス源からパージガス流を受けるための手段と、
受けたパージガスを排気装置のポートに搬送するための可撓性毛管と、を有することを特徴とするシステム。 - 毛管は、通過するパージガスの流量を決定するように寸法決めされたことを特徴とする請求項12に記載のシステム。
- 毛管の可撓性は、受取り手段を、排気装置の使用中に発生する振動から実質的に隔絶するように選択されることを特徴とする請求項12又は13に記載のシステム。
- 受取り手段は、パージガス源からパージガス流を受けるための吸気口と、可撓性毛管に連結された少なくとも1つの排気口と、を有することを特徴とする請求項12〜14のいずれか1項に記載のシステム。
- 受取り手段は、複数の排気口を有し、各排気口は、排気装置のそれぞれのポートに連結されたことを特徴とする請求項15に記載のシステム。
- 各排気口は、それぞれの毛管を使用してそれぞれのポートに連結されたことを特徴とする請求項16に記載のシステム。
- 受取り手段は、マニホールドを有することを特徴とする請求項12〜17のいずれか1項に記載のシステム。
- マニホールドは、排気口に供給される流体の圧力を調整するための手段を有することを特徴とする請求項18に記載のシステム。
- 部品のキットであって、
パージガス流を受けるための吸気口,及びパージガスを排気装置に供給するための少なくとも1つの排気口,を有する構造体と、
複数の異なる寸法の可撓性毛管と、を有し、
選択された寸法の毛管を、パージガス流を排気装置のポートに搬送するために、それぞれの排気口に連結することができることを特徴とするキット。 - 複数の可撓性毛管の少なくともいくつかは、異なる内径を有することを特徴とする請求項20に記載のキット。
- 可撓性毛管は、所定の長さに切断することができることを特徴とする請求項20又は21に記載のキット。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB0411679A GB0411679D0 (en) | 2004-05-25 | 2004-05-25 | Gas supply system |
GB0411679.4 | 2004-05-25 | ||
PCT/GB2005/001580 WO2005116452A1 (en) | 2004-05-25 | 2005-04-26 | Gas supply system for a pumping arrangement |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008500895A true JP2008500895A (ja) | 2008-01-17 |
JP5284640B2 JP5284640B2 (ja) | 2013-09-11 |
Family
ID=32671040
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007514066A Expired - Fee Related JP5284640B2 (ja) | 2004-05-25 | 2005-04-26 | 排気装置用ガス供給システム |
Country Status (9)
Country | Link |
---|---|
US (1) | US7900652B2 (ja) |
EP (1) | EP1753958B1 (ja) |
JP (1) | JP5284640B2 (ja) |
KR (1) | KR101320706B1 (ja) |
CN (1) | CN100485190C (ja) |
AT (1) | ATE434132T1 (ja) |
DE (1) | DE602005014974D1 (ja) |
GB (1) | GB0411679D0 (ja) |
WO (1) | WO2005116452A1 (ja) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5274557B2 (ja) * | 2008-07-04 | 2013-08-28 | シャープ株式会社 | 真空処理装置及びガス供給方法 |
DE102008037160A1 (de) * | 2008-08-08 | 2010-02-11 | Krones Ag | Versorgungsvorrichtung |
US8318102B2 (en) * | 2008-12-15 | 2012-11-27 | Syntroleum Corporation | Process for increasing the efficiency of heat removal from a Fischer-Tropsch slurry reactor |
DE102009017648A1 (de) * | 2009-04-16 | 2010-10-21 | Siemens Aktiengesellschaft | Gasinjektionssystem und Verfahren zum Betrieb eines Gasinjektionssystems, insbesondere für eine Partikeltherapieanlage |
GB2535703B (en) * | 2015-02-23 | 2019-09-18 | Edwards Ltd | Gas supply apparatus |
JP6875417B2 (ja) * | 2016-04-08 | 2021-05-26 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 真空チャック圧力制御システム |
JP7025844B2 (ja) * | 2017-03-10 | 2022-02-25 | エドワーズ株式会社 | 真空ポンプの排気システム、真空ポンプの排気システムに備わる真空ポンプ、パージガス供給装置、温度センサユニット、および真空ポンプの排気方法 |
US10656662B2 (en) * | 2017-09-15 | 2020-05-19 | Kabushiki Kaisha Toshiba | Variable pressure device and actuator |
JP7187186B2 (ja) * | 2018-06-27 | 2022-12-12 | エドワーズ株式会社 | 真空ポンプ、ステータコラム、ベースおよび真空ポンプの排気システム |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JPS62222629A (ja) * | 1986-03-25 | 1987-09-30 | Matsushita Electric Ind Co Ltd | 気相反応処理装置 |
JPH08145270A (ja) * | 1994-11-22 | 1996-06-07 | Showa Sci:Kk | 除振装置 |
JPH10232070A (ja) * | 1997-02-19 | 1998-09-02 | Sanyo Electric Co Ltd | 空気調和機用キャピラリチューブ、流量制御装置および流量制御方法 |
JP2004044637A (ja) * | 2002-07-09 | 2004-02-12 | Kurita Water Ind Ltd | 流量調整器及び水処理装置 |
Family Cites Families (9)
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FR1118136A (fr) | 1954-12-31 | 1956-05-31 | Procédé de revêtement de surfaces de matériaux par des couches de gallium, de germanium et d'indium | |
JPS63106389A (ja) | 1986-10-24 | 1988-05-11 | Hitachi Ltd | スクリユ−形真空ポンプの注入装置 |
US4725204A (en) * | 1986-11-05 | 1988-02-16 | Pennwalt Corporation | Vacuum manifold pumping system |
JP3794775B2 (ja) | 1997-03-19 | 2006-07-12 | 株式会社大阪真空機器製作所 | 分子ポンプ |
US6258170B1 (en) * | 1997-09-11 | 2001-07-10 | Applied Materials, Inc. | Vaporization and deposition apparatus |
TW428677U (en) * | 1999-05-07 | 2001-04-01 | Ind Tech Res Inst | Nozzle device for eliminating function of vacuum pump |
TW576873B (en) * | 2000-04-14 | 2004-02-21 | Asm Int | Method of growing a thin film onto a substrate |
US6341615B1 (en) * | 2000-09-13 | 2002-01-29 | Air Products And Chemicals, Inc. | Self-cleaning vacuum purge system |
US7690396B2 (en) * | 2006-07-20 | 2010-04-06 | Baxter International Inc. | Multirate tubing flow restrictor |
-
2004
- 2004-05-25 GB GB0411679A patent/GB0411679D0/en not_active Ceased
-
2005
- 2005-04-26 DE DE200560014974 patent/DE602005014974D1/de active Active
- 2005-04-26 CN CNB2005800165516A patent/CN100485190C/zh not_active Expired - Fee Related
- 2005-04-26 US US11/596,794 patent/US7900652B2/en active Active
- 2005-04-26 KR KR1020067024593A patent/KR101320706B1/ko active IP Right Grant
- 2005-04-26 WO PCT/GB2005/001580 patent/WO2005116452A1/en not_active Application Discontinuation
- 2005-04-26 JP JP2007514066A patent/JP5284640B2/ja not_active Expired - Fee Related
- 2005-04-26 EP EP05738125A patent/EP1753958B1/en not_active Not-in-force
- 2005-04-26 AT AT05738125T patent/ATE434132T1/de not_active IP Right Cessation
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62222629A (ja) * | 1986-03-25 | 1987-09-30 | Matsushita Electric Ind Co Ltd | 気相反応処理装置 |
JPH08145270A (ja) * | 1994-11-22 | 1996-06-07 | Showa Sci:Kk | 除振装置 |
JPH10232070A (ja) * | 1997-02-19 | 1998-09-02 | Sanyo Electric Co Ltd | 空気調和機用キャピラリチューブ、流量制御装置および流量制御方法 |
JP2004044637A (ja) * | 2002-07-09 | 2004-02-12 | Kurita Water Ind Ltd | 流量調整器及び水処理装置 |
Also Published As
Publication number | Publication date |
---|---|
JP5284640B2 (ja) | 2013-09-11 |
KR20070020459A (ko) | 2007-02-21 |
KR101320706B1 (ko) | 2013-10-21 |
GB0411679D0 (en) | 2004-06-30 |
CN1957180A (zh) | 2007-05-02 |
EP1753958A1 (en) | 2007-02-21 |
ATE434132T1 (de) | 2009-07-15 |
WO2005116452A1 (en) | 2005-12-08 |
EP1753958B1 (en) | 2009-06-17 |
US20090101214A1 (en) | 2009-04-23 |
US7900652B2 (en) | 2011-03-08 |
DE602005014974D1 (de) | 2009-07-30 |
CN100485190C (zh) | 2009-05-06 |
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