DE602005014974D1 - Gaszufuhrsystem für eine pumpanordnung - Google Patents

Gaszufuhrsystem für eine pumpanordnung

Info

Publication number
DE602005014974D1
DE602005014974D1 DE200560014974 DE602005014974T DE602005014974D1 DE 602005014974 D1 DE602005014974 D1 DE 602005014974D1 DE 200560014974 DE200560014974 DE 200560014974 DE 602005014974 T DE602005014974 T DE 602005014974T DE 602005014974 D1 DE602005014974 D1 DE 602005014974D1
Authority
DE
Germany
Prior art keywords
gas supply
supply system
pump assembly
gas
pumping arrangement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE200560014974
Other languages
English (en)
Inventor
Phillip North
David Paul Manson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Edwards Ltd
Original Assignee
Edwards Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Edwards Ltd filed Critical Edwards Ltd
Publication of DE602005014974D1 publication Critical patent/DE602005014974D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04D—NON-POSITIVE-DISPLACEMENT PUMPS
    • F04D19/00—Axial-flow pumps
    • F04D19/02—Multi-stage pumps
    • F04D19/04—Multi-stage pumps specially adapted to the production of a high vacuum, e.g. molecular pumps
    • F04D19/046—Combinations of two or more different types of pumps
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B53/00—Component parts, details or accessories not provided for in, or of interest apart from, groups F04B1/00 - F04B23/00 or F04B39/00 - F04B47/00
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B53/00—Component parts, details or accessories not provided for in, or of interest apart from, groups F04B1/00 - F04B23/00 or F04B39/00 - F04B47/00
    • F04B53/06—Venting
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04D—NON-POSITIVE-DISPLACEMENT PUMPS
    • F04D19/00—Axial-flow pumps
    • F04D19/02—Multi-stage pumps
    • F04D19/04—Multi-stage pumps specially adapted to the production of a high vacuum, e.g. molecular pumps
    • F04D19/042—Turbomolecular vacuum pumps
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/0318—Processes
    • Y10T137/0324—With control of flow by a condition or characteristic of a fluid
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/0318—Processes
    • Y10T137/0402—Cleaning, repairing, or assembling
    • Y10T137/0419—Fluid cleaning or flushing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/877—With flow control means for branched passages
    • Y10T137/87877—Single inlet with multiple distinctly valved outlets

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Reciprocating Pumps (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Supply Devices, Intensifiers, Converters, And Telemotors (AREA)
  • Compressor (AREA)
  • Pipeline Systems (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Chemical Vapour Deposition (AREA)
  • Jet Pumps And Other Pumps (AREA)
DE200560014974 2004-05-25 2005-04-26 Gaszufuhrsystem für eine pumpanordnung Active DE602005014974D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB0411679A GB0411679D0 (en) 2004-05-25 2004-05-25 Gas supply system
PCT/GB2005/001580 WO2005116452A1 (en) 2004-05-25 2005-04-26 Gas supply system for a pumping arrangement

Publications (1)

Publication Number Publication Date
DE602005014974D1 true DE602005014974D1 (de) 2009-07-30

Family

ID=32671040

Family Applications (1)

Application Number Title Priority Date Filing Date
DE200560014974 Active DE602005014974D1 (de) 2004-05-25 2005-04-26 Gaszufuhrsystem für eine pumpanordnung

Country Status (9)

Country Link
US (1) US7900652B2 (de)
EP (1) EP1753958B1 (de)
JP (1) JP5284640B2 (de)
KR (1) KR101320706B1 (de)
CN (1) CN100485190C (de)
AT (1) ATE434132T1 (de)
DE (1) DE602005014974D1 (de)
GB (1) GB0411679D0 (de)
WO (1) WO2005116452A1 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110108128A1 (en) * 2008-07-04 2011-05-12 Katsushi Kishimoto Vacuum treatment apparatus and gas supply method
DE102008037160A1 (de) * 2008-08-08 2010-02-11 Krones Ag Versorgungsvorrichtung
US8318102B2 (en) * 2008-12-15 2012-11-27 Syntroleum Corporation Process for increasing the efficiency of heat removal from a Fischer-Tropsch slurry reactor
DE102009017648A1 (de) * 2009-04-16 2010-10-21 Siemens Aktiengesellschaft Gasinjektionssystem und Verfahren zum Betrieb eines Gasinjektionssystems, insbesondere für eine Partikeltherapieanlage
GB2535703B (en) * 2015-02-23 2019-09-18 Edwards Ltd Gas supply apparatus
KR102308929B1 (ko) * 2016-04-08 2021-10-05 어플라이드 머티어리얼스, 인코포레이티드 진공 척 압력 제어 시스템
JP7025844B2 (ja) * 2017-03-10 2022-02-25 エドワーズ株式会社 真空ポンプの排気システム、真空ポンプの排気システムに備わる真空ポンプ、パージガス供給装置、温度センサユニット、および真空ポンプの排気方法
US10656662B2 (en) * 2017-09-15 2020-05-19 Kabushiki Kaisha Toshiba Variable pressure device and actuator
JP7187186B2 (ja) * 2018-06-27 2022-12-12 エドワーズ株式会社 真空ポンプ、ステータコラム、ベースおよび真空ポンプの排気システム

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1118136A (fr) * 1954-12-31 1956-05-31 Procédé de revêtement de surfaces de matériaux par des couches de gallium, de germanium et d'indium
JPS62222629A (ja) * 1986-03-25 1987-09-30 Matsushita Electric Ind Co Ltd 気相反応処理装置
JPS63106389A (ja) 1986-10-24 1988-05-11 Hitachi Ltd スクリユ−形真空ポンプの注入装置
US4725204A (en) * 1986-11-05 1988-02-16 Pennwalt Corporation Vacuum manifold pumping system
JPH08145270A (ja) * 1994-11-22 1996-06-07 Showa Sci:Kk 除振装置
JPH10232070A (ja) * 1997-02-19 1998-09-02 Sanyo Electric Co Ltd 空気調和機用キャピラリチューブ、流量制御装置および流量制御方法
JP3794775B2 (ja) 1997-03-19 2006-07-12 株式会社大阪真空機器製作所 分子ポンプ
US6258170B1 (en) * 1997-09-11 2001-07-10 Applied Materials, Inc. Vaporization and deposition apparatus
TW428677U (en) * 1999-05-07 2001-04-01 Ind Tech Res Inst Nozzle device for eliminating function of vacuum pump
TW576873B (en) * 2000-04-14 2004-02-21 Asm Int Method of growing a thin film onto a substrate
US6341615B1 (en) * 2000-09-13 2002-01-29 Air Products And Chemicals, Inc. Self-cleaning vacuum purge system
JP4168683B2 (ja) * 2002-07-09 2008-10-22 栗田工業株式会社 流量調整器及び水処理装置
US7690396B2 (en) * 2006-07-20 2010-04-06 Baxter International Inc. Multirate tubing flow restrictor

Also Published As

Publication number Publication date
JP5284640B2 (ja) 2013-09-11
EP1753958A1 (de) 2007-02-21
KR20070020459A (ko) 2007-02-21
KR101320706B1 (ko) 2013-10-21
US7900652B2 (en) 2011-03-08
ATE434132T1 (de) 2009-07-15
CN1957180A (zh) 2007-05-02
CN100485190C (zh) 2009-05-06
JP2008500895A (ja) 2008-01-17
US20090101214A1 (en) 2009-04-23
EP1753958B1 (de) 2009-06-17
GB0411679D0 (en) 2004-06-30
WO2005116452A1 (en) 2005-12-08

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