CN102396154B - 弹性波元件和使用它的电子设备 - Google Patents
弹性波元件和使用它的电子设备 Download PDFInfo
- Publication number
- CN102396154B CN102396154B CN201080016666.6A CN201080016666A CN102396154B CN 102396154 B CN102396154 B CN 102396154B CN 201080016666 A CN201080016666 A CN 201080016666A CN 102396154 B CN102396154 B CN 102396154B
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- China
- Prior art keywords
- elastic wave
- dielectric layer
- interdigital transducer
- transducer electrode
- wave device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 230000005540 biological transmission Effects 0.000 claims description 8
- 230000008878 coupling Effects 0.000 abstract 1
- 238000010168 coupling process Methods 0.000 abstract 1
- 238000005859 coupling reaction Methods 0.000 abstract 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 15
- 238000004519 manufacturing process Methods 0.000 description 10
- 235000012239 silicon dioxide Nutrition 0.000 description 7
- 239000000377 silicon dioxide Substances 0.000 description 7
- 238000004544 sputter deposition Methods 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- WSMQKESQZFQMFW-UHFFFAOYSA-N 5-methyl-pyrazole-3-carboxylic acid Chemical compound CC1=CC(C(O)=O)=NN1 WSMQKESQZFQMFW-UHFFFAOYSA-N 0.000 description 2
- 230000002730 additional effect Effects 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 230000003321 amplification Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- GQYHUHYESMUTHG-UHFFFAOYSA-N lithium niobate Chemical compound [Li+].[O-][Nb](=O)=O GQYHUHYESMUTHG-UHFFFAOYSA-N 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000003199 nucleic acid amplification method Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 230000000644 propagated effect Effects 0.000 description 2
- 238000002310 reflectometry Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910017083 AlN Inorganic materials 0.000 description 1
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- UKDIAJWKFXFVFG-UHFFFAOYSA-N potassium;oxido(dioxo)niobium Chemical compound [K+].[O-][Nb](=O)=O UKDIAJWKFXFVFG-UHFFFAOYSA-N 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02818—Means for compensation or elimination of undesirable effects
- H03H9/02842—Means for compensation or elimination of undesirable effects of reflections
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
- H03H3/10—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves for obtaining desired frequency or temperature coefficient
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02818—Means for compensation or elimination of undesirable effects
- H03H9/02834—Means for compensation or elimination of undesirable effects of temperature influence
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/70—Multiple-port networks for connecting several sources or loads, working on different frequencies or frequency bands, to a common load or source
- H03H9/72—Networks using surface acoustic waves
- H03H9/725—Duplexers
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
Abstract
Description
Claims (12)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201510012562.2A CN104734662B (zh) | 2009-04-22 | 2010-04-19 | 弹性波元件和使用它的电子设备 |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009103572 | 2009-04-22 | ||
JP2009-103572 | 2009-04-22 | ||
PCT/JP2010/002817 WO2010122767A1 (ja) | 2009-04-22 | 2010-04-19 | 弾性波素子と、これを用いた電子機器 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201510012562.2A Division CN104734662B (zh) | 2009-04-22 | 2010-04-19 | 弹性波元件和使用它的电子设备 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN102396154A CN102396154A (zh) | 2012-03-28 |
CN102396154B true CN102396154B (zh) | 2015-02-04 |
Family
ID=43010894
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201080016666.6A Active CN102396154B (zh) | 2009-04-22 | 2010-04-19 | 弹性波元件和使用它的电子设备 |
CN201510012562.2A Active CN104734662B (zh) | 2009-04-22 | 2010-04-19 | 弹性波元件和使用它的电子设备 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201510012562.2A Active CN104734662B (zh) | 2009-04-22 | 2010-04-19 | 弹性波元件和使用它的电子设备 |
Country Status (5)
Country | Link |
---|---|
US (1) | US8564172B2 (zh) |
JP (2) | JP5093403B2 (zh) |
CN (2) | CN102396154B (zh) |
HK (1) | HK1207484A1 (zh) |
WO (1) | WO2010122767A1 (zh) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20130026881A1 (en) * | 2010-06-17 | 2013-01-31 | Shoji Okamoto | Acoustic wave element |
KR101516653B1 (ko) | 2011-01-18 | 2015-05-04 | 가부시키가이샤 무라타 세이사쿠쇼 | 탄성 표면파 필터장치 |
JP5182459B2 (ja) | 2011-06-23 | 2013-04-17 | パナソニック株式会社 | ラダー型弾性波フィルタ及びこれを用いたアンテナ共用器 |
JP5797979B2 (ja) * | 2011-08-31 | 2015-10-21 | 太陽誘電株式会社 | 弾性波デバイス |
US20140142584A1 (en) * | 2012-11-16 | 2014-05-22 | Spinal Generations, Llc | Multichannel cannula and methods for using same |
JP5891198B2 (ja) * | 2013-04-12 | 2016-03-22 | スカイワークス・パナソニック フィルターソリューションズ ジャパン株式会社 | アンテナ共用器およびこれを用いた電子機器 |
CN105580273B (zh) * | 2013-09-26 | 2018-06-12 | 京瓷株式会社 | 弹性波装置以及弹性波模块 |
JP2017522822A (ja) * | 2014-07-28 | 2017-08-10 | スカイワークスフィルターソリューションズジャパン株式会社 | 弾性波素子、アンテナデュプレクサ、モジュール及びこれらを使用する電子機器 |
US9634644B2 (en) | 2014-07-28 | 2017-04-25 | Skyworks Filter Solutions Japan Co., Ltd. | Acoustic wave elements and antenna duplexers, and modules and electronic devices using same |
DE102014118897B4 (de) * | 2014-12-17 | 2019-02-21 | Snaptrack, Inc. | Wandler für SAW mit unterdrückter Modenkonversion |
WO2016117483A1 (ja) * | 2015-01-22 | 2016-07-28 | 株式会社村田製作所 | 弾性波装置の製造方法、および弾性波装置 |
JP6390819B2 (ja) * | 2016-04-25 | 2018-09-19 | 株式会社村田製作所 | 弾性波装置及びその製造方法 |
JP6784073B2 (ja) * | 2016-06-21 | 2020-11-11 | 株式会社村田製作所 | 弾性表面波フィルタ |
JP6624289B2 (ja) * | 2016-06-28 | 2019-12-25 | 株式会社村田製作所 | 弾性波装置 |
WO2018070369A1 (ja) * | 2016-10-11 | 2018-04-19 | 京セラ株式会社 | 弾性波装置 |
WO2018116602A1 (ja) * | 2016-12-20 | 2018-06-28 | 株式会社村田製作所 | 弾性波装置、高周波フロントエンド回路及び通信装置 |
JP2018182354A (ja) * | 2017-04-03 | 2018-11-15 | 株式会社村田製作所 | 弾性波装置 |
CN111066241B (zh) * | 2017-09-05 | 2023-10-03 | 株式会社村田制作所 | 滤波器装置 |
WO2019138812A1 (ja) * | 2018-01-12 | 2019-07-18 | 株式会社村田製作所 | 弾性波装置、マルチプレクサ、高周波フロントエンド回路、及び通信装置 |
JP2021078013A (ja) * | 2019-11-09 | 2021-05-20 | 株式会社弾性波デバイスラボ | 弾性波素子およびその製造方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA2038474C (en) * | 1990-03-19 | 1994-09-20 | Yoshio Satoh | Surface-acoustic-waver filter having a plurality of electrodes |
JPH06152299A (ja) | 1992-11-09 | 1994-05-31 | Fujitsu Ltd | 弾性表面波デバイス |
JP3515131B2 (ja) * | 1997-07-28 | 2004-04-05 | 株式会社東芝 | 弾性表面波素子およびその製造方法 |
JP2000196409A (ja) * | 1998-12-28 | 2000-07-14 | Kyocera Corp | 弾性表面波フィルタ |
JP3317274B2 (ja) * | 1999-05-26 | 2002-08-26 | 株式会社村田製作所 | 弾性表面波装置及び弾性表面波装置の製造方法 |
JP3419402B2 (ja) * | 2001-04-16 | 2003-06-23 | 株式会社村田製作所 | 弾性表面波装置、通信装置 |
JP4259576B2 (ja) * | 2004-03-12 | 2009-04-30 | 株式会社村田製作所 | 分波器及び弾性表面波フィルタ |
KR101161903B1 (ko) * | 2004-06-30 | 2012-07-03 | 파나소닉 주식회사 | 전자 부품 및 그 제조 방법 |
DE102004037819B4 (de) | 2004-08-04 | 2021-12-16 | Snaptrack, Inc. | Elektroakustisches Bauelement mit geringen Verlusten |
-
2010
- 2010-04-19 WO PCT/JP2010/002817 patent/WO2010122767A1/ja active Application Filing
- 2010-04-19 JP JP2011510190A patent/JP5093403B2/ja active Active
- 2010-04-19 CN CN201080016666.6A patent/CN102396154B/zh active Active
- 2010-04-19 US US13/260,798 patent/US8564172B2/en active Active
- 2010-04-19 CN CN201510012562.2A patent/CN104734662B/zh active Active
-
2012
- 2012-07-30 JP JP2012167961A patent/JP5663744B2/ja active Active
-
2015
- 2015-08-18 HK HK15107944.5A patent/HK1207484A1/zh unknown
Also Published As
Publication number | Publication date |
---|---|
WO2010122767A1 (ja) | 2010-10-28 |
US8564172B2 (en) | 2013-10-22 |
US20120019102A1 (en) | 2012-01-26 |
JP5093403B2 (ja) | 2012-12-12 |
CN104734662B (zh) | 2017-09-22 |
JPWO2010122767A1 (ja) | 2012-10-25 |
CN102396154A (zh) | 2012-03-28 |
CN104734662A (zh) | 2015-06-24 |
JP2012209980A (ja) | 2012-10-25 |
HK1207484A1 (zh) | 2016-01-29 |
JP5663744B2 (ja) | 2015-02-04 |
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Legal Events
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ASS | Succession or assignment of patent right |
Owner name: SKYWORKS PANASONIC FILTRATE SOLUTIONS JAPAN CO., L Free format text: FORMER OWNER: MATSUSHITA ELECTRIC INDUSTRIAL CO, LTD. Effective date: 20141222 |
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Effective date of registration: 20141222 Address after: Osaka Japan Applicant after: PANASONIC CORPORATION Address before: Osaka Japan Applicant before: Matsushita Electric Industrial Co., Ltd. |
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C14 | Grant of patent or utility model | ||
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CP01 | Change in the name or title of a patent holder |
Address after: Osaka Japan Patentee after: Japan Industrial Co., Ltd. Address before: Osaka Japan Patentee before: PANASONIC CORPORATION |