CN101989537B - 液体处理装置和液体处理方法 - Google Patents

液体处理装置和液体处理方法 Download PDF

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Publication number
CN101989537B
CN101989537B CN201010239045.6A CN201010239045A CN101989537B CN 101989537 B CN101989537 B CN 101989537B CN 201010239045 A CN201010239045 A CN 201010239045A CN 101989537 B CN101989537 B CN 101989537B
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CN
China
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mentioned
liquid
main pipe
close valve
mentioned main
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Expired - Fee Related
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CN201010239045.6A
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English (en)
Chinese (zh)
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CN101989537A (zh
Inventor
松本和久
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Devices For Dispensing Beverages (AREA)
CN201010239045.6A 2009-07-31 2010-07-23 液体处理装置和液体处理方法 Expired - Fee Related CN101989537B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2009179428 2009-07-31
JP2009-179428 2009-07-31
JP2010127914A JP5474666B2 (ja) 2009-07-31 2010-06-03 液処理装置、液処理方法、プログラムおよびプログラム記録媒体
JP2010-127914 2010-06-03

Publications (2)

Publication Number Publication Date
CN101989537A CN101989537A (zh) 2011-03-23
CN101989537B true CN101989537B (zh) 2014-04-16

Family

ID=43525832

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201010239045.6A Expired - Fee Related CN101989537B (zh) 2009-07-31 2010-07-23 液体处理装置和液体处理方法

Country Status (5)

Country Link
US (1) US8425686B2 (https=)
JP (1) JP5474666B2 (https=)
KR (1) KR101470673B1 (https=)
CN (1) CN101989537B (https=)
TW (1) TWI460775B (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6227895B2 (ja) * 2013-05-24 2017-11-08 株式会社荏原製作所 基板処理装置
JP6352143B2 (ja) * 2013-11-13 2018-07-04 東京エレクトロン株式会社 基板液処理装置及び基板液処理方法
JP6090144B2 (ja) 2013-12-13 2017-03-08 東京エレクトロン株式会社 切替弁、液処理装置
JP6482979B2 (ja) * 2015-07-29 2019-03-13 東京エレクトロン株式会社 液処理装置
CN109127599B (zh) * 2018-07-06 2023-09-26 江苏星A包装机械集团有限公司 用于旋转式洗瓶机的双通道介质分配机构
KR102087773B1 (ko) * 2018-07-13 2020-04-23 씨앤지하이테크 주식회사 액체 혼합 공급장치

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4242841A (en) * 1979-07-30 1981-01-06 Ushakov Vladimir F Apparatus for preparing and feeding an abrasive-containing suspension into the zone of action of work tools of polishing and finishing lathes
JP2739419B2 (ja) 1992-09-25 1998-04-15 大日本スクリーン製造株式会社 基板処理装置
JPH1076153A (ja) * 1996-09-05 1998-03-24 Fujitsu Ltd 液体自動供給装置及びその異常検出装置
JP3841945B2 (ja) * 1997-10-29 2006-11-08 大日本スクリーン製造株式会社 基板処理装置
US6168048B1 (en) * 1998-09-22 2001-01-02 American Air Liquide, Inc. Methods and systems for distributing liquid chemicals
JP2002096030A (ja) * 2000-09-26 2002-04-02 Shibaura Mechatronics Corp ノズルを用いた処理装置
US6783429B2 (en) * 2001-08-17 2004-08-31 The Boc Group, Inc. Apparatus and method for sampling a chemical-mechanical polishing slurry
US6579446B1 (en) * 2002-04-04 2003-06-17 Agrimond, Llc Multi-process disinfectant delivery control system
JP2005175228A (ja) * 2003-12-11 2005-06-30 Dainippon Screen Mfg Co Ltd レジスト剥離方法およびレジスト剥離装置
JP2005175183A (ja) * 2003-12-11 2005-06-30 Kitz Sct:Kk 液体加圧機構及びこれを用いた液体制御装置と液体制御方法
KR100598913B1 (ko) * 2004-09-02 2006-07-10 세메스 주식회사 약액 혼합 공급 장치 및 그 방법
JP2007123393A (ja) * 2005-10-26 2007-05-17 Dainippon Screen Mfg Co Ltd 基板処理装置
JP4940123B2 (ja) * 2007-12-21 2012-05-30 東京エレクトロン株式会社 基板処理装置および基板処理方法

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
JP特开2005-175183A 2005.06.30
JP特开2007-123393A 2007.05.17

Also Published As

Publication number Publication date
KR101470673B1 (ko) 2014-12-08
US8425686B2 (en) 2013-04-23
JP2011049526A (ja) 2011-03-10
JP5474666B2 (ja) 2014-04-16
TWI460775B (zh) 2014-11-11
TW201133578A (en) 2011-10-01
US20110023912A1 (en) 2011-02-03
KR20110013239A (ko) 2011-02-09
CN101989537A (zh) 2011-03-23

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