CN101916735A - 碳纳米管团簇作芯片凸点的倒装芯片封装结构的制作方法 - Google Patents
碳纳米管团簇作芯片凸点的倒装芯片封装结构的制作方法 Download PDFInfo
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- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
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Abstract
本发明涉及一种碳纳米管团簇作为芯片凸点的倒装芯片封装结构的制作方法,所述方法包含以下三个步骤:步骤一、在衬底上生长碳纳米管团簇阵列;步骤二、将步骤一得到的碳纳米管团簇阵列转移到芯片表面;步骤三、将具有碳纳米管团簇凸点的芯片倒装到基板上。本发明方法制作的倒装芯片封装结构,能减小芯片与凸点间热应力,缓解芯片与基板间热应力以及克服锡基焊球凸点的形变累计损伤。
Description
(一)技术领域
本发明涉及一种具有凸点结构的倒装芯片封装结构的制作方法。属半导体技术领域。
(二)背景技术
随着半导体技术的发展,芯片的特征尺寸不断缩小,集成度不断提高,其端子数目不断增加,端子间的节距也不断缩小。当端子间的节距缩小到70um以下、端子数目多于1000以上时,传统的引线键和的封装方式已经不再适用。对于这种多端子数和端子的节距小的芯片的封装目前大部分采用倒装芯片的封装方式来实现。
目前倒装芯片所采用的通常是铜柱凸点或者锡基焊料凸点。然而,由于铜/焊料与半导体材料(通常为硅或者砷化镓)热膨胀系数相差比较大,在芯片服役过程中由于温度变化而产生的热应力通常会集中在凸点与芯片结合处的边角部位,从而造成凸点断裂失效。铜柱凸点由于其刚性大,变形困难,很难缓解芯片与基板之间由于热适配造成的热应力,从而造成芯片的断裂失效。虽然锡基焊料凸点可以通过蠕变塑性变形在一定程度上缓解芯片与基板热失配造成的应力,但是这种变形会对锡基焊料凸点造成不可逆转的损伤累积,最终导致锡基焊料凸点的断裂失效。因此必须寻找一种新的凸点材料及封装方法来解决目前倒装芯片封装中存在的上述问题。
(三)发明内容
本发明的目的在于克服上述不足,提供一种能减小芯片与凸点间热应力、缓解芯片与基板间热应力以及克服焊球凸点的形变累计损伤的碳纳米管团簇作为芯片凸点的倒装芯片封装结构的制作方法。
本发明的目的是这样实现的:一种碳纳米管团簇作芯片凸点的倒装芯片封装结构的制作方法,包含以下三个步骤:
步骤一、在衬底上生长碳纳米管团簇阵列
首先在衬底上形成掩膜,该掩膜根据芯片上芯片端子的分布来设计,然后在形成掩膜的衬底上生长碳纳米管团簇阵列,碳纳米管团簇阵列生长结束后将掩膜移除,至此便得到了与芯片端子分布相同的碳纳米管团簇阵列;
步骤二、将步骤一得到的碳纳米管团簇阵列转移到芯片表面
首先在芯片表面涂布一层第一导电胶或导电膜,然后将步骤一得到的碳纳米管团簇阵列与芯片上对应的芯片端子对准后粘连到芯片表面,粘连结束后将衬底去除,最终在芯片表面制备了碳纳米管团簇凸点;
步骤三、将具有碳纳米管团簇凸点的芯片倒装到基板上
首先在基板上涂布一层第二导电胶或导电膜,然后将步骤二制备的具有碳纳米管团簇凸点的芯片倒装到基板上,倒装结束后,用底填料填充所述凸点的间隙,最后在基板背面的焊盘上放置焊球并回流,得到碳纳米管团簇作为芯片凸点的倒装芯片封装结构。
本发明的有益效果是:
1、由于本发明采用的碳纳米管团簇具有与半导体材料硅相近的热膨胀系数,因此减小了芯片与凸点间由于热失配而产生的热应力,增加了封装结构的可靠性。
2、由于碳纳米管团簇凸点比铜柱凸点刚性低易发生弹性变形,因此可以通过碳纳米管团簇凸点的弹性变形有效的缓解芯片与基板间由于热失配导致的热应力。
3、由于碳纳米管团簇凸点屈服强度高不会发生塑性变形,因此本发明克服了焊球凸点的塑性形变累计损伤的缺点,提高了凸点本身的可靠性。
(四)附图说明
图1A~图1C为本发明形成碳纳米管团簇阵列的流程示意图。
图2A~图2D为本发明在芯片表面形成碳纳米管团簇凸点的流程示意图。
图3A~图3E为本发明将具有碳纳米管团簇凸点的芯片倒装到基板上并形成球栅封装结构的流程示意图。
附图标记:
衬底101、掩膜102、碳纳米管团簇103;
芯片201、芯片端子202、第一导电胶或导电膜203;
基板301、焊盘302、第二导电胶或导电膜303、底填料304、焊球305。
(五)具体实施方式
本发明碳纳米管团簇作为芯片凸点的倒装芯片封装结构的制作方法,主要包含以下三个步骤:
步骤一、在衬底上生长碳纳米管团簇阵列
参见图1A~图1C,图1A~图1C为本发明形成碳纳米管团簇阵列的流程示意图。如图1A所示,首先在衬底101上通过光刻或其他等效的方式形成掩膜102,掩膜要根据芯片上芯片端子202的分布来设计。衬底101可以是硅或者陶瓷等材料。然后在形成掩膜的衬底上生长碳纳米管团簇阵列103,如图1B所示。碳纳米管团簇阵列103生长结束后将掩膜移除。至此便得到了与芯片端子分布相同的碳纳米管团簇阵列。如图1C所示。一般情况下碳纳米管团簇直径可以在几微米到几百微米,高度也可以达到100微米以上。
步骤二、碳纳米管团簇阵列转移到芯片表面
参见图2A~图2D,图2A~图2D为本发明在芯片表面形成碳纳米管团簇凸点的流程示意图。如图2B所示,首先在芯片201表面涂布一层第一导电胶或导电膜203。将步骤一得到的碳纳米管团簇与芯片上对应的芯片端子202对准后(如图1C所示)粘连到芯片表面。粘连结束后将用于碳纳米管团簇生长的衬底去除,如图2D所示。最终在芯片表面制备了碳纳米管团簇凸点。
步骤三、将具有或碳纳米管团簇凸点的芯片倒装到基板上
参见图3A~图3E,图3A~图3E为本发明将具有碳纳米管团簇凸点的芯片倒装到基板上并形成球栅(BGA)封装结构的流程示意图。如图3B所示,首先在基板301上涂布一层第二导电胶或导电膜303。用于该结构的基板301可以是(但不局限于)FR-4、陶瓷和玻璃等。然后将步骤二制备的具有碳纳米管团簇凸点的芯片倒装到基板301上,如图3C所示。倒装结束后,用底填料304填充所述凸点的间隙,以此来提高封装结构的可靠性。如图3D所示。最后在基板301背面的焊盘302上放置焊球305并回流,最终得到如图3E所示的倒装芯片封装结构。
Claims (1)
1.一种碳纳米管团簇作为芯片凸点的倒装芯片封装结构的制作方法,其特征在于所述方法包含以下三个步骤:
步骤一、在衬底上生长碳纳米管团簇阵列
首先在衬底上形成掩膜,该掩膜根据芯片上芯片端子的分布来设计,然后在形成掩膜的衬底上生长碳纳米管团簇阵列,碳纳米管团簇阵列生长结束后将掩膜移除,至此便得到了与芯片端子分布相同的碳纳米管团簇阵列;
步骤二、将步骤一得到的碳纳米管团簇阵列转移到芯片表面
首先在芯片表面涂布一层第一导电胶或导电膜,然后将步骤一得到的碳纳米管团簇阵列与芯片上对应的芯片端子对准后粘连到芯片表面,粘连结束后将衬底去除,最终在芯片表面制备了碳纳米管团簇凸点;
步骤三、将具有碳纳米管团簇凸点的芯片倒装到基板上
首先在基板上涂布一层第二导电胶或导电膜,然后将步骤二制备的具有碳纳米管团簇凸点的芯片倒装到基板上,倒装结束后,用底填料填充所述凸点的间隙,最后在基板背面的焊盘上放置焊球并回流,得到碳纳米管团簇作为芯片凸点的倒装芯片封装结构。
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CN103367185A (zh) * | 2013-07-25 | 2013-10-23 | 中国科学院微电子研究所 | 一种采用转移法制作碳纳米管柔性微凸点的方法 |
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CN103011066A (zh) * | 2011-09-21 | 2013-04-03 | 叶哲良 | 芯片 |
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CN103367185A (zh) * | 2013-07-25 | 2013-10-23 | 中国科学院微电子研究所 | 一种采用转移法制作碳纳米管柔性微凸点的方法 |
CN104701245A (zh) * | 2013-12-10 | 2015-06-10 | 展讯通信(上海)有限公司 | 芯片形成方法、提高芯片封装成品良率的方法 |
CN104701246A (zh) * | 2013-12-10 | 2015-06-10 | 展讯通信(上海)有限公司 | 芯片及形成方法、封装成品、提高封装成品良率的方法 |
CN104701246B (zh) * | 2013-12-10 | 2018-03-23 | 展讯通信(上海)有限公司 | 芯片及形成方法、封装成品、提高封装成品良率的方法 |
CN104701245B (zh) * | 2013-12-10 | 2018-07-31 | 展讯通信(上海)有限公司 | 芯片形成方法、提高芯片封装成品良率的方法 |
CN107634029A (zh) * | 2017-09-25 | 2018-01-26 | 广东工业大学 | 一种芯片的转移方法 |
CN107634029B (zh) * | 2017-09-25 | 2019-12-10 | 广东工业大学 | 一种芯片的转移方法 |
CN108109981A (zh) * | 2017-12-05 | 2018-06-01 | 上海无线电设备研究所 | 采用竖直碳纳米管纤维阵列提高焊点热疲劳抗性的方法 |
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