CN101897027B - 半导体装置及其制造方法和沟槽栅的制造方法 - Google Patents

半导体装置及其制造方法和沟槽栅的制造方法 Download PDF

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Publication number
CN101897027B
CN101897027B CN200880120102XA CN200880120102A CN101897027B CN 101897027 B CN101897027 B CN 101897027B CN 200880120102X A CN200880120102X A CN 200880120102XA CN 200880120102 A CN200880120102 A CN 200880120102A CN 101897027 B CN101897027 B CN 101897027B
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CN
China
Prior art keywords
region
trench
semiconductor region
trench gate
gate
Prior art date
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Expired - Fee Related
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CN200880120102XA
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English (en)
Chinese (zh)
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CN101897027A (zh
Inventor
青井佐智子
杉山隆英
铃木隆司
添野明高
西脇刚
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Toyota Motor Corp
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Toyota Motor Corp
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D12/00—Bipolar devices controlled by the field effect, e.g. insulated-gate bipolar transistors [IGBT]
    • H10D12/411—Insulated-gate bipolar transistors [IGBT]
    • H10D12/441—Vertical IGBTs
    • H10D12/461—Vertical IGBTs having non-planar surfaces, e.g. having trenches, recesses or pillars in the surfaces of the emitter, base or collector regions
    • H10D12/481—Vertical IGBTs having non-planar surfaces, e.g. having trenches, recesses or pillars in the surfaces of the emitter, base or collector regions having gate structures on slanted surfaces, on vertical surfaces, or in grooves, e.g. trench gate IGBTs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D12/00—Bipolar devices controlled by the field effect, e.g. insulated-gate bipolar transistors [IGBT]
    • H10D12/01—Manufacture or treatment
    • H10D12/031—Manufacture or treatment of IGBTs
    • H10D12/032—Manufacture or treatment of IGBTs of vertical IGBTs
    • H10D12/038—Manufacture or treatment of IGBTs of vertical IGBTs having a recessed gate, e.g. trench-gate IGBTs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/01—Manufacture or treatment
    • H10D30/021—Manufacture or treatment of FETs having insulated gates [IGFET]
    • H10D30/028—Manufacture or treatment of FETs having insulated gates [IGFET] of double-diffused metal oxide semiconductor [DMOS] FETs
    • H10D30/0291—Manufacture or treatment of FETs having insulated gates [IGFET] of double-diffused metal oxide semiconductor [DMOS] FETs of vertical DMOS [VDMOS] FETs
    • H10D30/0297—Manufacture or treatment of FETs having insulated gates [IGFET] of double-diffused metal oxide semiconductor [DMOS] FETs of vertical DMOS [VDMOS] FETs using recessing of the gate electrodes, e.g. to form trench gate electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/13—Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
    • H10D62/141—Anode or cathode regions of thyristors; Collector or emitter regions of gated bipolar-mode devices, e.g. of IGBTs
    • H10D62/142—Anode regions of thyristors or collector regions of gated bipolar-mode devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions 
    • H10D64/27—Electrodes not carrying the current to be rectified, amplified, oscillated or switched, e.g. gates
    • H10D64/311—Gate electrodes for field-effect devices
    • H10D64/411—Gate electrodes for field-effect devices for FETs
    • H10D64/511—Gate electrodes for field-effect devices for FETs for IGFETs
    • H10D64/512—Disposition of the gate electrodes, e.g. buried gates
    • H10D64/513—Disposition of the gate electrodes, e.g. buried gates within recesses in the substrate, e.g. trench gates, groove gates or buried gates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions 
    • H10D64/27—Electrodes not carrying the current to be rectified, amplified, oscillated or switched, e.g. gates
    • H10D64/311—Gate electrodes for field-effect devices
    • H10D64/411—Gate electrodes for field-effect devices for FETs
    • H10D64/511—Gate electrodes for field-effect devices for FETs for IGFETs
    • H10D64/514—Gate electrodes for field-effect devices for FETs for IGFETs characterised by the insulating layers

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  • Electrodes Of Semiconductors (AREA)
CN200880120102XA 2007-12-10 2008-12-02 半导体装置及其制造方法和沟槽栅的制造方法 Expired - Fee Related CN101897027B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2007-317913 2007-12-10
JP2007317913 2007-12-10
JP2008156240A JP2009164558A (ja) 2007-12-10 2008-06-16 半導体装置とその製造方法、並びにトレンチゲートの製造方法
JP2008-156240 2008-06-16
PCT/JP2008/071858 WO2009075200A1 (ja) 2007-12-10 2008-12-02 半導体装置とその製造方法、並びにトレンチゲートの製造方法

Publications (2)

Publication Number Publication Date
CN101897027A CN101897027A (zh) 2010-11-24
CN101897027B true CN101897027B (zh) 2012-02-29

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CN200880120102XA Expired - Fee Related CN101897027B (zh) 2007-12-10 2008-12-02 半导体装置及其制造方法和沟槽栅的制造方法

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Country Link
US (1) US20100276729A1 (enExample)
EP (1) EP2234163A4 (enExample)
JP (1) JP2009164558A (enExample)
CN (1) CN101897027B (enExample)
WO (1) WO2009075200A1 (enExample)

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DE112009005299B4 (de) * 2009-10-01 2015-08-06 Toyota Jidosha Kabushiki Kaisha Halbleitervorrichtung
CN103327960A (zh) 2010-08-09 2013-09-25 蒙特雷尖端科技研究所 富含生物活性化合物的鳄梨提取物的抗微生物、抗菌及抑制芽孢萌发活性
US8866222B2 (en) 2012-03-07 2014-10-21 Infineon Technologies Austria Ag Charge compensation semiconductor device
US8901642B2 (en) * 2012-03-07 2014-12-02 Infineon Technologies Austria Ag Charge compensation semiconductor device
CN103390650B (zh) * 2012-05-04 2017-08-08 朱江 一种具有无源金属肖特基半导体装置及其制备方法
JP5747891B2 (ja) * 2012-10-09 2015-07-15 トヨタ自動車株式会社 半導体装置
DE102013207829A1 (de) * 2012-12-27 2014-07-03 Ihp Gmbh - Innovations For High Performance Microelectronics / Leibniz-Institut Für Innovative Mikroelektronik Chip-Antenne, Elektronisches Bauelement und Herstellungsverfahren dafür
US8823084B2 (en) 2012-12-31 2014-09-02 Infineon Technologies Austria Ag Semiconductor device with charge compensation structure arrangement for optimized on-state resistance and switching losses
JP5807653B2 (ja) * 2013-03-26 2015-11-10 トヨタ自動車株式会社 半導体装置の製造方法
JP6052065B2 (ja) * 2013-05-31 2016-12-27 豊田合成株式会社 半導体素装置および半導体装置の製造方法
US9147763B2 (en) 2013-09-23 2015-09-29 Infineon Technologies Austria Ag Charge-compensation semiconductor device
JP6453634B2 (ja) * 2014-12-10 2019-01-16 トヨタ自動車株式会社 半導体装置
JP2016213374A (ja) * 2015-05-12 2016-12-15 株式会社豊田中央研究所 半導体装置
CA2998291C (en) 2015-09-23 2022-07-12 Instituto Tecnologico Y De Estudios Superiores De Monterrey Acetogenin molecules having antiplatelet and/or antithrombic activities, and methods and compositions thereof
US10932484B2 (en) 2016-10-19 2021-03-02 Instituto Tecnologico Y De Estudios Superiores De Monterrey Inhibitory activity of acetogenins against Listeria monocytogenes
JP7059556B2 (ja) * 2017-10-05 2022-04-26 富士電機株式会社 半導体装置
JP7204454B2 (ja) * 2018-11-30 2023-01-16 株式会社豊田中央研究所 半導体装置
DE102019216145A1 (de) * 2019-10-21 2021-04-22 Robert Bosch Gmbh Verfahren zum herstellen einer halbleitervorrichtung
CN111261713B (zh) * 2020-03-25 2022-09-09 广东芯聚能半导体有限公司 沟槽型igbt器件结构
JP7513553B2 (ja) * 2021-03-11 2024-07-09 株式会社東芝 半導体装置
CN119451146B (zh) * 2024-11-04 2026-05-19 南京南瑞半导体有限公司 低米勒电容的沟槽型igbt器件

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Publication number Priority date Publication date Assignee Title
JP3288218B2 (ja) * 1995-03-14 2002-06-04 三菱電機株式会社 絶縁ゲート型半導体装置およびその製造方法
JP2007129259A (ja) * 1996-08-01 2007-05-24 Kansai Electric Power Co Inc:The 絶縁ゲート半導体装置
US7132712B2 (en) * 2002-11-05 2006-11-07 Fairchild Semiconductor Corporation Trench structure having one or more diodes embedded therein adjacent a PN junction
JP2005056868A (ja) * 2001-06-04 2005-03-03 Matsushita Electric Ind Co Ltd 炭化珪素半導体装置の製造方法
EP1525621B1 (en) * 2002-05-31 2011-10-12 Nxp B.V. Method of operating a trench gate semiconductor device
JP2004022941A (ja) * 2002-06-19 2004-01-22 Toshiba Corp 半導体装置
JP3927111B2 (ja) * 2002-10-31 2007-06-06 株式会社東芝 電力用半導体装置
WO2005065385A2 (en) * 2003-12-30 2005-07-21 Fairchild Semiconductor Corporation Power semiconductor devices and methods of manufacture
JP2005276931A (ja) * 2004-03-23 2005-10-06 Toshiba Corp 半導体装置およびその製造方法
JP4491307B2 (ja) * 2004-09-21 2010-06-30 トヨタ自動車株式会社 半導体装置およびその製造方法
JP4059510B2 (ja) 2004-10-22 2008-03-12 株式会社東芝 半導体装置及びその製造方法
JP2006332591A (ja) 2005-04-28 2006-12-07 Denso Corp 半導体装置
WO2007012490A2 (de) * 2005-07-27 2007-02-01 Infineon Technologies Austria Ag Halbleiterbauelement mit einer driftzone und einer driftsteuerzone
JP4817827B2 (ja) * 2005-12-09 2011-11-16 株式会社東芝 半導体装置
JP4957005B2 (ja) * 2006-01-31 2012-06-20 富士電機株式会社 炭化珪素半導体素子の製造方法
JP4735414B2 (ja) * 2006-05-24 2011-07-27 トヨタ自動車株式会社 絶縁ゲート型半導体装置

Also Published As

Publication number Publication date
EP2234163A4 (en) 2012-07-04
EP2234163A1 (en) 2010-09-29
WO2009075200A1 (ja) 2009-06-18
US20100276729A1 (en) 2010-11-04
CN101897027A (zh) 2010-11-24
JP2009164558A (ja) 2009-07-23

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Termination date: 20121202