CN101790775B - 无掩模曝光方法 - Google Patents

无掩模曝光方法 Download PDF

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Publication number
CN101790775B
CN101790775B CN2008800239532A CN200880023953A CN101790775B CN 101790775 B CN101790775 B CN 101790775B CN 2008800239532 A CN2008800239532 A CN 2008800239532A CN 200880023953 A CN200880023953 A CN 200880023953A CN 101790775 B CN101790775 B CN 101790775B
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CN
China
Prior art keywords
maskless exposure
pattern
light
maskless
dmd
Prior art date
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Active
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CN2008800239532A
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English (en)
Chinese (zh)
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CN101790775A (zh
Inventor
慎瑛勋
徐园镐
朴明周
李炯振
车相焕
李泰昊
李昌柱
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LG Electronics Inc
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LG Electronics Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020070069238A external-priority patent/KR101374954B1/ko
Priority claimed from KR1020070069282A external-priority patent/KR101234932B1/ko
Priority claimed from KR1020070073431A external-priority patent/KR101353810B1/ko
Priority claimed from KR1020070099194A external-priority patent/KR101347410B1/ko
Application filed by LG Electronics Inc filed Critical LG Electronics Inc
Publication of CN101790775A publication Critical patent/CN101790775A/zh
Application granted granted Critical
Publication of CN101790775B publication Critical patent/CN101790775B/zh
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7015—Reference, i.e. alignment of original or workpiece with respect to a reference not on the original or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
CN2008800239532A 2007-07-10 2008-06-25 无掩模曝光方法 Active CN101790775B (zh)

Applications Claiming Priority (9)

Application Number Priority Date Filing Date Title
KR1020070069238A KR101374954B1 (ko) 2007-07-10 2007-07-10 마스크리스 노광 장치와 방법, 및 평판 디스플레이 패널의제조 방법
KR1020070069282A KR101234932B1 (ko) 2007-07-10 2007-07-10 마스크리스 노광 장치와 방법, 및 평판 디스플레이 패널의제조 방법
KR10-2007-0069238 2007-07-10
KR10-2007-0069282 2007-07-10
KR1020070073431A KR101353810B1 (ko) 2007-07-23 2007-07-23 마스크리스 노광 장치와 방법, 및 평판 디스플레이 패널의 제조 방법
KR10-2007-0073431 2007-07-23
KR1020070099194A KR101347410B1 (ko) 2007-10-02 2007-10-02 마스크리스 노광 장치와 방법
KR10-2007-0099194 2007-10-02
PCT/KR2008/003632 WO2009008605A2 (en) 2007-07-10 2008-06-25 Maskless exposure method

Publications (2)

Publication Number Publication Date
CN101790775A CN101790775A (zh) 2010-07-28
CN101790775B true CN101790775B (zh) 2012-05-30

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CN2008800239532A Active CN101790775B (zh) 2007-07-10 2008-06-25 无掩模曝光方法

Country Status (4)

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US (1) US8363209B2 (enExample)
JP (1) JP5597535B2 (enExample)
CN (1) CN101790775B (enExample)
WO (1) WO2009008605A2 (enExample)

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KR101678050B1 (ko) * 2009-11-16 2016-12-07 삼성전자 주식회사 오프 액시스 정렬을 이용한 마스크리스 노광 장치 및 방법
KR20110072630A (ko) * 2009-12-23 2011-06-29 삼성전자주식회사 빔의 위치 측정 장치 및 방법
KR101678070B1 (ko) * 2009-12-24 2016-11-22 삼성전자 주식회사 마스크리스 노광장치 및 그 제어방법
JP2011237684A (ja) * 2010-05-12 2011-11-24 Hitachi High-Technologies Corp 露光装置、露光方法、及び表示用パネル基板の製造方法
KR101929906B1 (ko) * 2010-12-28 2018-12-18 엘지디스플레이 주식회사 노광장치 및 노광장치의 정렬 방법
KR101899781B1 (ko) * 2010-12-28 2018-09-21 엘지디스플레이 주식회사 노광장치
JP5837693B2 (ja) * 2011-08-18 2015-12-24 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置及びデバイス製造方法
CN102662313B (zh) * 2012-05-09 2016-03-23 上海华虹宏力半导体制造有限公司 光刻对准参数预测方法以及光刻方法
KR102015844B1 (ko) * 2012-11-08 2019-08-30 엘지디스플레이 주식회사 마스크리스 노광장비 및 이를 이용한 크로스토크 검사방법
KR102024785B1 (ko) * 2012-11-23 2019-09-24 엘지디스플레이 주식회사 마스크리스 노광 장치의 얼라인 방법
KR102020934B1 (ko) * 2012-12-07 2019-09-11 엘지디스플레이 주식회사 마스크리스 노광 장치의 얼라인 방법
KR101984898B1 (ko) 2012-12-27 2019-06-03 삼성디스플레이 주식회사 마스크리스 노광 장치를 이용한 표시 장치의 제조 방법 및 그 표시 장치
KR102120624B1 (ko) 2013-04-04 2020-06-10 삼성디스플레이 주식회사 Glv를 이용한 디지털 노광기 및 dmd를 이용한 디지털 노광기
KR102171301B1 (ko) * 2013-07-09 2020-10-29 삼성디스플레이 주식회사 Dmd를 이용한 디지털 노광기 및 그 제어 방법
KR102151254B1 (ko) 2013-08-19 2020-09-03 삼성디스플레이 주식회사 노광장치 및 그 방법
JP2016539384A (ja) * 2013-11-03 2016-12-15 ドルビー ラボラトリーズ ライセンシング コーポレイション マルチ変調ディスプレイにおいて局所暗化するシステム及び方法
CN105527795B (zh) 2014-09-28 2018-09-18 上海微电子装备（集团）股份有限公司 曝光装置及离焦倾斜误差补偿方法
KR20160115682A (ko) * 2015-03-25 2016-10-06 삼성전자주식회사 대상에 대하여 공간적으로 가변하는 오토 포커싱을 가능하게 하는 방법 및 이를 이용하는 촬상 시스템
CN104950592B (zh) * 2015-06-10 2017-02-01 中国科学院长春光学精密机械与物理研究所 校准dmd光刻系统中投影镜头焦面和相机焦面位置的方法
CN104950593B (zh) * 2015-06-10 2017-04-05 中国科学院长春光学精密机械与物理研究所 用于定位dmd光刻系统中相机焦平面位置的分划板
KR20170105247A (ko) 2016-03-09 2017-09-19 삼성전자주식회사 마스크리스 노광 장치 및 이를 이용한 누적 광량의 측정 방법
CN106023069B (zh) * 2016-05-31 2019-04-16 西安嵌牛电子科技有限公司 一种基于视频流的多dmd曝光方法
CN106647184B (zh) * 2016-12-31 2019-06-14 江苏九迪激光装备科技有限公司 一种直写式丝网制版设备的曝光方法
JP2019028331A (ja) * 2017-08-01 2019-02-21 株式会社ブイ・テクノロジー 露光装置
KR101985857B1 (ko) * 2017-09-27 2019-06-04 주식회사 리텍 노광 광학계에서 dmd를 정렬하기 위한 장치
JP7111348B2 (ja) * 2018-06-15 2022-08-02 ミタニマイクロニクス株式会社 スクリーンマスクの製造方法
US10503076B1 (en) * 2018-08-29 2019-12-10 Applied Materials, Inc. Reserving spatial light modulator sections to address field non-uniformities
CN109739073A (zh) * 2019-02-25 2019-05-10 钧迪智能装备科技(苏州)有限公司 一种弧形工件激光直写曝光方法
CN109782552A (zh) * 2019-02-25 2019-05-21 钧迪智能装备科技(苏州)有限公司 一种弧形工件激光直接曝光设备
KR101985859B1 (ko) * 2019-02-28 2019-06-05 주식회사 리텍 노광 광학계에서 dmd를 정렬하기 위한 장치 및 그 방법
EP3926403A1 (en) * 2020-06-17 2021-12-22 Mycronic Ab Maskless second layer alignment method and apparatus
CN117651911A (zh) * 2021-07-05 2024-03-05 株式会社尼康 曝光装置以及器件制造方法
JP7754172B2 (ja) * 2021-07-12 2025-10-15 株式会社ニコン 露光装置及び配線パターン形成方法
CN114200781B (zh) * 2021-12-13 2023-01-06 南京大学 一种无掩膜光刻校准方法
US20250076768A1 (en) * 2022-04-19 2025-03-06 Applied Materials, Inc. Digital lithography apparatus with autofocus position control and methods of use thereof
CN116482927B (zh) * 2023-04-26 2024-02-20 江苏镭创高科光电科技有限公司 一种胶片运动曝光装置与方法

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Also Published As

Publication number Publication date
JP2010533310A (ja) 2010-10-21
WO2009008605A3 (en) 2009-03-05
US8363209B2 (en) 2013-01-29
US20100208229A1 (en) 2010-08-19
CN101790775A (zh) 2010-07-28
JP5597535B2 (ja) 2014-10-01
WO2009008605A2 (en) 2009-01-15

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