CN101657883B - 用于形成精细图形的方法 - Google Patents

用于形成精细图形的方法 Download PDF

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Publication number
CN101657883B
CN101657883B CN2008800119102A CN200880011910A CN101657883B CN 101657883 B CN101657883 B CN 101657883B CN 2008800119102 A CN2008800119102 A CN 2008800119102A CN 200880011910 A CN200880011910 A CN 200880011910A CN 101657883 B CN101657883 B CN 101657883B
Authority
CN
China
Prior art keywords
forming
master
film
fine patterns
ink
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN2008800119102A
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English (en)
Chinese (zh)
Other versions
CN101657883A (zh
Inventor
成知玹
李承宪
洪瑛晙
金志洙
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LG Corp
Original Assignee
LG Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by LG Chemical Co Ltd filed Critical LG Chemical Co Ltd
Publication of CN101657883A publication Critical patent/CN101657883A/zh
Application granted granted Critical
Publication of CN101657883B publication Critical patent/CN101657883B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41F—PRINTING MACHINES OR PRESSES
    • B41F3/00—Cylinder presses, i.e. presses essentially comprising at least one cylinder co-operating with at least one flat type-bed
    • B41F3/02—Cylinder presses, i.e. presses essentially comprising at least one cylinder co-operating with at least one flat type-bed with impression cylinder or cylinders rotating unidirectionally
    • B41F3/06—Cylinder presses, i.e. presses essentially comprising at least one cylinder co-operating with at least one flat type-bed with impression cylinder or cylinders rotating unidirectionally continuously
    • B41F3/10—Two-revolution presses
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41F—PRINTING MACHINES OR PRESSES
    • B41F3/00—Cylinder presses, i.e. presses essentially comprising at least one cylinder co-operating with at least one flat type-bed
    • B41F3/18—Cylinder presses, i.e. presses essentially comprising at least one cylinder co-operating with at least one flat type-bed of special construction or for particular purposes
    • B41F3/36—Cylinder presses, i.e. presses essentially comprising at least one cylinder co-operating with at least one flat type-bed of special construction or for particular purposes for intaglio or heliogravure printing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41F—PRINTING MACHINES OR PRESSES
    • B41F35/00—Cleaning arrangements or devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N3/00—Preparing for use and conserving printing surfaces
    • B41N3/003—Preparing for use and conserving printing surfaces of intaglio formes, e.g. application of a wear-resistant coating, such as chrome, on the already-engraved plate or cylinder; Preparing for reuse, e.g. removing of the Ballard shell; Correction of the engraving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0017—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor for the production of embossing, cutting or similar devices; for the production of casting means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/2018—Masking pattern obtained by selective application of an ink or a toner, e.g. ink jet printing
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Printing Methods (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
CN2008800119102A 2007-04-13 2008-04-14 用于形成精细图形的方法 Expired - Fee Related CN101657883B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR10-2007-0036402 2007-04-13
KR1020070036402 2007-04-13
KR1020070036402A KR100957703B1 (ko) 2007-04-13 2007-04-13 미세패턴 형성 방법
PCT/KR2008/002094 WO2008127055A1 (en) 2007-04-13 2008-04-14 Method for forming fine patterns

Publications (2)

Publication Number Publication Date
CN101657883A CN101657883A (zh) 2010-02-24
CN101657883B true CN101657883B (zh) 2012-06-06

Family

ID=39864104

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2008800119102A Expired - Fee Related CN101657883B (zh) 2007-04-13 2008-04-14 用于形成精细图形的方法

Country Status (6)

Country Link
US (1) US9365025B2 (enExample)
JP (1) JP5044691B2 (enExample)
KR (1) KR100957703B1 (enExample)
CN (1) CN101657883B (enExample)
TW (1) TWI388433B (enExample)
WO (1) WO2008127055A1 (enExample)

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* Cited by examiner, † Cited by third party
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KR101733585B1 (ko) * 2009-07-28 2017-05-11 삼성디스플레이 주식회사 잉크 패턴 형성 방법 및 잉크 패턴 인쇄 장치
TWI519425B (zh) * 2011-02-24 2016-02-01 Ｌｇ化學股份有限公司 滾輪印刷設備及使用其之滾輪印刷方法
CN103443214B (zh) 2011-03-15 2016-01-20 Lg化学株式会社 导电墨水组合物，使用该导电墨水组合物的印刷方法及由该导电墨水组合物制备的导电图案
KR101324493B1 (ko) * 2011-03-22 2013-11-01 (주)뉴옵틱스 원통 금형에 패턴을 복제하는 방법
TWI481510B (zh) * 2011-06-10 2015-04-21 Au Optronics Corp 移印方法
KR101094864B1 (ko) * 2011-07-07 2011-12-15 한국기계연구원 일회용 클리쉐를 이용한 리버스 그라비아 옵셋 인쇄 방법 및 장치
US20140198270A1 (en) * 2011-12-23 2014-07-17 Lg Chem, Ltd. Touch panel and display device including same
TWI508279B (zh) * 2012-01-19 2015-11-11 Joled Inc 顯示器及其製造方法，單元，轉印方法，有機電致發光單元及其製造方法，以及電子裝置
CN102778715B (zh) * 2012-05-11 2015-01-21 深圳市华星光电技术有限公司 彩色滤光片及其制作方法
WO2013180546A1 (ko) 2012-05-31 2013-12-05 주식회사 엘지화학 반전 오프셋 인쇄 장치 및 방법
WO2014025164A1 (ko) * 2012-08-07 2014-02-13 주식회사 엘지화학 인쇄물 및 인쇄물의 제조방법
EP2973114A4 (en) 2013-03-15 2016-11-02 United Technologies Corp COMPACT AERO-THERMOMODEL-BASED DEGRADED MODEL CONTROL
US10434809B2 (en) * 2013-10-16 2019-10-08 Lg Chem, Ltd. Blanket manufacturing apparatus and blanket manufacturing method
KR102761503B1 (ko) * 2024-05-02 2025-02-04 (주)서린 수용성 바인더를 이용한 세라믹 소재의 제조방법 및 이에 따라 제조된 세라믹 물품

Citations (4)

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JPH0929927A (ja) 1995-07-21 1997-02-04 Sumitomo Rubber Ind Ltd オフセット印刷機
JPH11135916A (ja) 1997-08-29 1999-05-21 Corning Inc 電極および電子回路パターンの印刷方法
JP2006179215A (ja) * 2004-12-21 2006-07-06 Toppan Printing Co Ltd 有機エレクトロルミネッセンス素子の製造方法及び凸版反転オフセット法用凸刷版
JP2006272606A (ja) * 2005-03-28 2006-10-12 Toppan Printing Co Ltd 反転オフセット印刷用凸版及び有機エレクトロルミネッセンス素子

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US5272980A (en) * 1990-08-31 1993-12-28 Dai Nippon Printing Co. Ltd. Alignment method for transfer and alignment device
JPH04312889A (ja) * 1991-04-12 1992-11-04 Toppan Printing Co Ltd 印刷用凹版およびその製造方法
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KR100631017B1 (ko) * 2004-04-30 2006-10-04 엘지.필립스 엘시디 주식회사 인쇄방식을 이용한 패턴 형성방법
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Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0929927A (ja) 1995-07-21 1997-02-04 Sumitomo Rubber Ind Ltd オフセット印刷機
JPH11135916A (ja) 1997-08-29 1999-05-21 Corning Inc 電極および電子回路パターンの印刷方法
JP2006179215A (ja) * 2004-12-21 2006-07-06 Toppan Printing Co Ltd 有機エレクトロルミネッセンス素子の製造方法及び凸版反転オフセット法用凸刷版
JP2006272606A (ja) * 2005-03-28 2006-10-12 Toppan Printing Co Ltd 反転オフセット印刷用凸版及び有機エレクトロルミネッセンス素子

Also Published As

Publication number Publication date
WO2008127055A1 (en) 2008-10-23
JP5044691B2 (ja) 2012-10-10
US20100139513A1 (en) 2010-06-10
KR20080092707A (ko) 2008-10-16
CN101657883A (zh) 2010-02-24
KR100957703B1 (ko) 2010-05-12
US9365025B2 (en) 2016-06-14
JP2010523378A (ja) 2010-07-15
TW200848267A (en) 2008-12-16
TWI388433B (zh) 2013-03-11

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Granted publication date: 20120606