TWI388433B - 精密圖樣形成用之方法 - Google Patents

精密圖樣形成用之方法 Download PDF

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Publication number
TWI388433B
TWI388433B TW097113176A TW97113176A TWI388433B TW I388433 B TWI388433 B TW I388433B TW 097113176 A TW097113176 A TW 097113176A TW 97113176 A TW97113176 A TW 97113176A TW I388433 B TWI388433 B TW I388433B
Authority
TW
Taiwan
Prior art keywords
forming
printing plate
pattern according
precision pattern
hard mold
Prior art date
Application number
TW097113176A
Other languages
English (en)
Chinese (zh)
Other versions
TW200848267A (en
Inventor
成知玹
李承憲
洪瑛晙
金志洙
Original Assignee
Ｌｇ化學公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ｌｇ化學公司 filed Critical Ｌｇ化學公司
Publication of TW200848267A publication Critical patent/TW200848267A/zh
Application granted granted Critical
Publication of TWI388433B publication Critical patent/TWI388433B/zh

Links

Classifications

    • H10P76/2041—
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41F—PRINTING MACHINES OR PRESSES
    • B41F3/00—Cylinder presses, i.e. presses essentially comprising at least one cylinder co-operating with at least one flat type-bed
    • B41F3/02—Cylinder presses, i.e. presses essentially comprising at least one cylinder co-operating with at least one flat type-bed with impression cylinder or cylinders rotating unidirectionally
    • B41F3/06—Cylinder presses, i.e. presses essentially comprising at least one cylinder co-operating with at least one flat type-bed with impression cylinder or cylinders rotating unidirectionally continuously
    • B41F3/10—Two-revolution presses
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41F—PRINTING MACHINES OR PRESSES
    • B41F3/00—Cylinder presses, i.e. presses essentially comprising at least one cylinder co-operating with at least one flat type-bed
    • B41F3/18—Cylinder presses, i.e. presses essentially comprising at least one cylinder co-operating with at least one flat type-bed of special construction or for particular purposes
    • B41F3/36—Cylinder presses, i.e. presses essentially comprising at least one cylinder co-operating with at least one flat type-bed of special construction or for particular purposes for intaglio or heliogravure printing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41F—PRINTING MACHINES OR PRESSES
    • B41F35/00—Cleaning arrangements or devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N3/00—Preparing for use and conserving printing surfaces
    • B41N3/003—Preparing for use and conserving printing surfaces of intaglio formes, e.g. application of a wear-resistant coating, such as chrome, on the already-engraved plate or cylinder; Preparing for reuse, e.g. removing of the Ballard shell; Correction of the engraving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0017—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor for the production of embossing, cutting or similar devices; for the production of casting means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/2018—Masking pattern obtained by selective application of an ink or a toner, e.g. ink jet printing
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Printing Methods (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
TW097113176A 2007-04-13 2008-04-11 精密圖樣形成用之方法 TWI388433B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020070036402A KR100957703B1 (ko) 2007-04-13 2007-04-13 미세패턴 형성 방법

Publications (2)

Publication Number Publication Date
TW200848267A TW200848267A (en) 2008-12-16
TWI388433B true TWI388433B (zh) 2013-03-11

Family

ID=39864104

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097113176A TWI388433B (zh) 2007-04-13 2008-04-11 精密圖樣形成用之方法

Country Status (6)

Country Link
US (1) US9365025B2 (enExample)
JP (1) JP5044691B2 (enExample)
KR (1) KR100957703B1 (enExample)
CN (1) CN101657883B (enExample)
TW (1) TWI388433B (enExample)
WO (1) WO2008127055A1 (enExample)

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KR101733585B1 (ko) * 2009-07-28 2017-05-11 삼성디스플레이 주식회사 잉크 패턴 형성 방법 및 잉크 패턴 인쇄 장치
KR101445442B1 (ko) * 2011-02-24 2014-09-26 주식회사 엘지화학 롤 프린팅 장치 및 이를 이용한 롤 프린팅 방법
KR101417254B1 (ko) 2011-03-15 2014-07-10 주식회사 엘지화학 도전성 잉크 조성물, 이를 이용한 인쇄 방법 및 이에 의하여 제조된 도전성 패턴
KR101324493B1 (ko) * 2011-03-22 2013-11-01 (주)뉴옵틱스 원통 금형에 패턴을 복제하는 방법
TWI481510B (zh) * 2011-06-10 2015-04-21 Au Optronics Corp 移印方法
KR101094864B1 (ko) * 2011-07-07 2011-12-15 한국기계연구원 일회용 클리쉐를 이용한 리버스 그라비아 옵셋 인쇄 방법 및 장치
JP6056861B2 (ja) * 2011-12-23 2017-01-11 エルジー・ケム・リミテッド タッチパネルおよびそれを含むディスプレイ装置
TWI508279B (zh) * 2012-01-19 2015-11-11 Joled Inc 顯示器及其製造方法，單元，轉印方法，有機電致發光單元及其製造方法，以及電子裝置
CN102778715B (zh) * 2012-05-11 2015-01-21 深圳市华星光电技术有限公司 彩色滤光片及其制作方法
WO2013180546A1 (ko) 2012-05-31 2013-12-05 주식회사 엘지화학 반전 오프셋 인쇄 장치 및 방법
WO2014025164A1 (ko) * 2012-08-07 2014-02-13 주식회사 엘지화학 인쇄물 및 인쇄물의 제조방법
EP2972603A4 (en) 2013-03-15 2017-02-01 United Technologies Corporation Compact aero-thermo model based engine power control
US10434809B2 (en) * 2013-10-16 2019-10-08 Lg Chem, Ltd. Blanket manufacturing apparatus and blanket manufacturing method
KR102761503B1 (ko) * 2024-05-02 2025-02-04 (주)서린 수용성 바인더를 이용한 세라믹 소재의 제조방법 및 이에 따라 제조된 세라믹 물품

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US5272980A (en) * 1990-08-31 1993-12-28 Dai Nippon Printing Co. Ltd. Alignment method for transfer and alignment device
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Also Published As

Publication number Publication date
CN101657883A (zh) 2010-02-24
KR20080092707A (ko) 2008-10-16
TW200848267A (en) 2008-12-16
JP2010523378A (ja) 2010-07-15
WO2008127055A1 (en) 2008-10-23
US9365025B2 (en) 2016-06-14
US20100139513A1 (en) 2010-06-10
CN101657883B (zh) 2012-06-06
JP5044691B2 (ja) 2012-10-10
KR100957703B1 (ko) 2010-05-12

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