CN101639624B - 掺杂二氧化钛的石英玻璃元件及制备方法 - Google Patents

掺杂二氧化钛的石英玻璃元件及制备方法 Download PDF

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Publication number
CN101639624B
CN101639624B CN2009101586137A CN200910158613A CN101639624B CN 101639624 B CN101639624 B CN 101639624B CN 2009101586137 A CN2009101586137 A CN 2009101586137A CN 200910158613 A CN200910158613 A CN 200910158613A CN 101639624 B CN101639624 B CN 101639624B
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titania
quartz glass
doped quartz
refractive index
doped
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Chinese (zh)
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CN101639624A (zh
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每田繁
大塚久利
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Shin Etsu Chemical Co Ltd
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Shin Etsu Chemical Co Ltd
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1469—Means for changing or stabilising the shape or form of the shaped article or deposit
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B23/00—Re-forming shaped glass
    • C03B23/0026—Re-forming shaped glass by gravity, e.g. sagging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/23—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with hydroxyl groups
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03B2201/42—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn doped with titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/30—Doped silica-based glasses containing metals
    • C03C2201/40—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03C2201/42—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn containing titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/40—Gas-phase processes
    • C03C2203/42—Gas-phase processes using silicon halides as starting materials
    • C03C2203/46—Gas-phase processes using silicon halides as starting materials fluorine containing
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/50—After-treatment
    • C03C2203/52—Heat-treatment
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
    • Y10T428/31616—Next to polyester [e.g., alkyd]

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Geochemistry & Mineralogy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Thermal Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Glass Compositions (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Glass Melting And Manufacturing (AREA)
CN2009101586137A 2008-07-07 2009-07-07 掺杂二氧化钛的石英玻璃元件及制备方法 Active CN101639624B (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201210297275.7A CN102849929B (zh) 2008-07-07 2009-07-07 掺杂二氧化钛的石英玻璃元件及制备方法

Applications Claiming Priority (3)

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JP2008177076 2008-07-07
JP2008177076A JP5202141B2 (ja) 2008-07-07 2008-07-07 チタニアドープ石英ガラス部材及びその製造方法
JP2008-177076 2008-07-07

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CN101639624A CN101639624A (zh) 2010-02-03
CN101639624B true CN101639624B (zh) 2013-08-07

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US (2) US8105734B2 (enExample)
EP (2) EP2145865B1 (enExample)
JP (1) JP5202141B2 (enExample)
KR (1) KR101513310B1 (enExample)
CN (2) CN101639624B (enExample)
TW (2) TWI541212B (enExample)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9399000B2 (en) 2006-06-20 2016-07-26 Momentive Performance Materials, Inc. Fused quartz tubing for pharmaceutical packaging
EP2463250B2 (en) * 2009-05-13 2019-09-25 Asahi Glass Company, Limited Methods for producing and for heat-treating a tio2-sio2 glass body
EP2508492A4 (en) * 2009-12-04 2014-07-30 Asahi Glass Co Ltd METHOD FOR PRODUCING A SILICONE-BASED GLASS SUBSTRATE FOR A MOLDING FORM AND METHOD FOR PRODUCING THE MOLDING SHAPE
JP5476982B2 (ja) 2009-12-25 2014-04-23 信越化学工業株式会社 チタニアドープ石英ガラスの選定方法
JP5637062B2 (ja) * 2010-05-24 2014-12-10 信越化学工業株式会社 合成石英ガラス基板及びその製造方法
US8567214B2 (en) * 2010-06-28 2013-10-29 Asahi Glass Company, Limited Method for producing glass body and method for producing optical member for EUV lithography
WO2012005333A1 (ja) * 2010-07-08 2012-01-12 旭硝子株式会社 ＴｉＯ２含有石英ガラス基材およびその製造方法
JP5737070B2 (ja) * 2010-09-02 2015-06-17 信越化学工業株式会社 チタニアドープ石英ガラス及びその製造方法
JPWO2012105513A1 (ja) * 2011-01-31 2014-07-03 旭硝子株式会社 チタニアを含有するシリカガラス体の製造方法およびチタニアを含有するシリカガラス体
JP5768452B2 (ja) 2011-04-11 2015-08-26 信越化学工業株式会社 チアニアドープ石英ガラスの製造方法
WO2013084978A1 (ja) * 2011-12-09 2013-06-13 信越石英株式会社 チタニア－シリカガラス製ｅｕｖリソグラフィ用フォトマスク基板
JP5935765B2 (ja) * 2012-07-10 2016-06-15 信越化学工業株式会社 ナノインプリントモールド用合成石英ガラス、その製造方法、及びナノインプリント用モールド
JP6241276B2 (ja) 2013-01-22 2017-12-06 信越化学工業株式会社 Ｅｕｖリソグラフィ用部材の製造方法
JP6336792B2 (ja) * 2013-04-25 2018-06-06 Hoya株式会社 マスクブランクの製造方法および転写用マスクの製造方法
DE102013219808A1 (de) 2013-09-30 2015-04-02 Heraeus Quarzglas Gmbh & Co. Kg Spiegelblank für EUV Lithographie ohne Ausdehnung unter EUV-Bestrahlung
EP2960219B1 (de) * 2014-06-27 2019-01-16 Heraeus Quarzglas GmbH & Co. KG Rohling aus Titan-dotiertem Kieselglas für ein Spiegelsubstrat für den Einsatz in der EUV-Lithographie und Verfahren für seine Herstellung
US9822030B2 (en) 2015-02-13 2017-11-21 Corning Incorporated Ultralow expansion titania-silica glass
JP6819451B2 (ja) * 2017-05-08 2021-01-27 信越化学工業株式会社 大型合成石英ガラス基板並びにその評価方法及び製造方法
DE102018211234A1 (de) 2018-07-06 2020-01-09 Carl Zeiss Smt Gmbh Substrat für ein reflektives optisches Element
JP7122997B2 (ja) 2019-04-05 2022-08-22 信越石英株式会社 紫外線吸収性に優れたチタン含有石英ガラス及びその製造方法
JP2025527429A (ja) * 2022-08-26 2025-08-22 コーニング インコーポレイテッド 均質なシリカ・チタニアガラス
WO2025193428A1 (en) * 2024-03-12 2025-09-18 Corning Incorporated Methods to produce titania-silica glass using a directional temperature difference

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1500230A (zh) * 2001-03-30 2004-05-26 ض� 具有改进了的吸收层的远紫外线掩模
WO2004089839A1 (en) * 2003-04-03 2004-10-21 Asahi Glass Company Limited Silica glass containing tio2 and process for its production
WO2006080241A2 (en) * 2005-01-25 2006-08-03 Asahi Glass Company, Limited PROCESS FOR PRODUCING SILICA GLASS CONTAINING TiO2, AND OPTICAL MATERIAL FOR EUV LITHOGRAPHY EMPLOYING SILICA GLASS CONTAINING TiO2
JP2006240978A (ja) * 2005-02-01 2006-09-14 Shinetsu Quartz Prod Co Ltd 均質なシリカ・チタニアガラスの製造方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3520541B2 (ja) * 1993-12-27 2004-04-19 株式会社ニコン 石英ガラス製バーナー、これを用いて製造される石英ガラス、石英ガラスバーナーを用いた石英ガラスの製造方法
JP3071362B2 (ja) 1994-07-15 2000-07-31 信越化学工業株式会社 ＡｒＦエキシマレーザリソグラフィー用合成石英マスク基板およびその製造方法
JPH0959034A (ja) 1995-08-22 1997-03-04 Sumitomo Metal Ind Ltd 合成石英ガラス材及びその製造方法
JP3223873B2 (ja) * 1997-12-24 2001-10-29 住友金属工業株式会社 シリコンウエーハ及びその製造方法
US6990836B2 (en) 2000-02-23 2006-01-31 Shin-Etsu Chemical Co., Ltd. Method of producing fluorine-containing synthetic quartz glass
JP3796653B2 (ja) 2000-02-23 2006-07-12 信越化学工業株式会社 フッ素含有合成石英ガラス及びその製造方法
JP3975321B2 (ja) 2001-04-20 2007-09-12 信越化学工業株式会社 フォトマスク用シリカガラス系基板及びフォトマスク用シリカガラス系基板の平坦化方法
JP4792706B2 (ja) * 2003-04-03 2011-10-12 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびその製造方法
JP5367204B2 (ja) * 2003-04-03 2013-12-11 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびＥＵＶリソグラフィ用光学部材
WO2004092082A1 (ja) * 2003-04-11 2004-10-28 Nikon Corporation SiO2-TiO2系ガラスの製造方法、SiO2-TiO2系ガラス及び露光装置
JP4665443B2 (ja) 2004-06-22 2011-04-06 旭硝子株式会社 ガラス基板の研磨方法
JP5035516B2 (ja) * 2005-12-08 2012-09-26 信越化学工業株式会社 フォトマスク用チタニアドープ石英ガラスの製造方法
US20070263281A1 (en) * 2005-12-21 2007-11-15 Maxon John E Reduced striae low expansion glass and elements, and a method for making same

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1500230A (zh) * 2001-03-30 2004-05-26 ض� 具有改进了的吸收层的远紫外线掩模
WO2004089839A1 (en) * 2003-04-03 2004-10-21 Asahi Glass Company Limited Silica glass containing tio2 and process for its production
WO2006080241A2 (en) * 2005-01-25 2006-08-03 Asahi Glass Company, Limited PROCESS FOR PRODUCING SILICA GLASS CONTAINING TiO2, AND OPTICAL MATERIAL FOR EUV LITHOGRAPHY EMPLOYING SILICA GLASS CONTAINING TiO2
JP2006240978A (ja) * 2005-02-01 2006-09-14 Shinetsu Quartz Prod Co Ltd 均質なシリカ・チタニアガラスの製造方法

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Publication number Publication date
CN102849929A (zh) 2013-01-02
CN102849929B (zh) 2016-02-24
EP2145865B1 (en) 2016-08-10
TW201011331A (en) 2010-03-16
EP2341036A1 (en) 2011-07-06
TW201512131A (zh) 2015-04-01
US8105734B2 (en) 2012-01-31
TWI541212B (zh) 2016-07-11
US8377612B2 (en) 2013-02-19
JP5202141B2 (ja) 2013-06-05
EP2145865A1 (en) 2010-01-20
JP2010013335A (ja) 2010-01-21
KR20100005679A (ko) 2010-01-15
TWI471281B (zh) 2015-02-01
US20120104336A1 (en) 2012-05-03
KR101513310B1 (ko) 2015-04-17
CN101639624A (zh) 2010-02-03
US20100003609A1 (en) 2010-01-07

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